FR2878453B1 - Dispositif de fourniture de vapeurs d'un precurseur solide a un appareil de traitement - Google Patents

Dispositif de fourniture de vapeurs d'un precurseur solide a un appareil de traitement

Info

Publication number
FR2878453B1
FR2878453B1 FR0452817A FR0452817A FR2878453B1 FR 2878453 B1 FR2878453 B1 FR 2878453B1 FR 0452817 A FR0452817 A FR 0452817A FR 0452817 A FR0452817 A FR 0452817A FR 2878453 B1 FR2878453 B1 FR 2878453B1
Authority
FR
France
Prior art keywords
processing apparatus
solid precursor
supplying vapors
vapors
supplying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0452817A
Other languages
English (en)
Other versions
FR2878453A1 (fr
Inventor
Constantin Vahlas
Brigitte Caussat
Francois Senocq
Wayne L Gladfelter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Institut National Polytechnique de Toulouse INPT
University of Minnesota
Original Assignee
Centre National de la Recherche Scientifique CNRS
Institut National Polytechnique de Toulouse INPT
University of Minnesota
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Institut National Polytechnique de Toulouse INPT, University of Minnesota filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR0452817A priority Critical patent/FR2878453B1/fr
Priority to JP2007542005A priority patent/JP5055127B2/ja
Priority to PCT/EP2005/056358 priority patent/WO2006058895A1/fr
Priority to US11/792,020 priority patent/US20080268143A1/en
Priority to EP05816231A priority patent/EP1828427A1/fr
Publication of FR2878453A1 publication Critical patent/FR2878453A1/fr
Application granted granted Critical
Publication of FR2878453B1 publication Critical patent/FR2878453B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
    • B01D3/343—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas
    • B01D3/346—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas the gas being used for removing vapours, e.g. transport gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Chemical Vapour Deposition (AREA)
FR0452817A 2004-11-30 2004-11-30 Dispositif de fourniture de vapeurs d'un precurseur solide a un appareil de traitement Expired - Fee Related FR2878453B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR0452817A FR2878453B1 (fr) 2004-11-30 2004-11-30 Dispositif de fourniture de vapeurs d'un precurseur solide a un appareil de traitement
JP2007542005A JP5055127B2 (ja) 2004-11-30 2005-11-30 固体前駆物質の蒸気を処理装置に供給する装置
PCT/EP2005/056358 WO2006058895A1 (fr) 2004-11-30 2005-11-30 Dispositif d’apport de vapeurs d’un precurseur solide a un dispositif de traitement
US11/792,020 US20080268143A1 (en) 2004-11-30 2005-11-30 Device For Providing Vapors Of A Solid Precursor To A Processing Device
EP05816231A EP1828427A1 (fr) 2004-11-30 2005-11-30 Dispositif d'apport de vapeurs d'un precurseur solide a un dispositif de traitement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0452817A FR2878453B1 (fr) 2004-11-30 2004-11-30 Dispositif de fourniture de vapeurs d'un precurseur solide a un appareil de traitement

Publications (2)

Publication Number Publication Date
FR2878453A1 FR2878453A1 (fr) 2006-06-02
FR2878453B1 true FR2878453B1 (fr) 2007-03-16

Family

ID=34951620

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0452817A Expired - Fee Related FR2878453B1 (fr) 2004-11-30 2004-11-30 Dispositif de fourniture de vapeurs d'un precurseur solide a un appareil de traitement

Country Status (5)

Country Link
US (1) US20080268143A1 (fr)
EP (1) EP1828427A1 (fr)
JP (1) JP5055127B2 (fr)
FR (1) FR2878453B1 (fr)
WO (1) WO2006058895A1 (fr)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2432371B (en) * 2005-11-17 2011-06-15 Epichem Ltd Improved bubbler for the transportation of substances by a carrier gas
DE102006026576A1 (de) * 2006-06-06 2008-01-10 Aixtron Ag Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs
JP5257197B2 (ja) * 2008-03-31 2013-08-07 住友化学株式会社 有機金属化合物供給装置
JP5898624B2 (ja) 2009-11-02 2016-04-06 シグマ−アルドリッチ・カンパニー、エルエルシー 蒸発器
US8758515B2 (en) * 2010-08-09 2014-06-24 Rohm And Haas Electronic Materials Llc Delivery device and method of use thereof
KR101329032B1 (ko) * 2011-04-20 2013-11-14 주식회사 실리콘밸류 다결정 실리콘 제조장치 및 이를 이용한 다결정 실리콘의 제조방법
DE102011121078B4 (de) 2011-12-12 2013-11-07 Oliver Feddersen-Clausen Zyklisches Verdampfungsverfahren
US9598766B2 (en) 2012-05-27 2017-03-21 Air Products And Chemicals, Inc. Vessel with filter
KR101543858B1 (ko) * 2013-02-28 2015-08-11 고려대학교 산학협력단 원자층 증착 장치
KR102344996B1 (ko) * 2017-08-18 2021-12-30 삼성전자주식회사 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법
US10814395B2 (en) * 2018-01-24 2020-10-27 General Electric Company Heated gas circulation system for an additive manufacturing machine
US10814388B2 (en) 2018-01-24 2020-10-27 General Electric Company Heated gas circulation system for an additive manufacturing machine
US11168394B2 (en) * 2018-03-14 2021-11-09 CeeVeeTech, LLC Method and apparatus for making a vapor of precise concentration by sublimation
US20220042174A1 (en) * 2018-03-14 2022-02-10 CeeVeeTech, LLC Method and apparatus for making a vapor of precise concentration by sublimation
WO2020114580A1 (fr) * 2018-12-04 2020-06-11 Applied Materials, Inc. Appareil d'évaporation destiné à l'évaporation d'un matériau et procédé d'évaporation d'un matériau à l'aide d'un appareil d'évaporation
US11566327B2 (en) 2020-11-20 2023-01-31 Applied Materials, Inc. Methods and apparatus to reduce pressure fluctuations in an ampoule of a chemical delivery system
FI20225491A1 (en) * 2022-06-03 2023-12-04 Canatu Oy REAGENT CARTRIDGE AND REACTOR EQUIPMENT

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2612442A (en) * 1949-05-19 1952-09-30 Sintercast Corp America Coated composite refractory body
FR1433497A (fr) * 1965-02-16 1966-04-01 Snecma Procédé de dépôt d'une couche protectrice sur une pièce métallique par une méthode en phase vapeur
US3618655A (en) * 1969-08-05 1971-11-09 Marine Technology Inc Spray drying apparatus
US4359493A (en) * 1977-09-23 1982-11-16 Ppg Industries, Inc. Method of vapor deposition
US4226668A (en) * 1978-12-14 1980-10-07 Sonic Dehydrators, Inc. Spray drying apparatus utilizing pulse jet engines
US4366131A (en) * 1979-05-31 1982-12-28 Irwin Fox Highly reactive iron oxide agents and apparatus for hydrogen sulfide scavenging
FR2576916B1 (fr) * 1985-02-01 1987-02-20 Centre Nat Rech Scient Procede de formation en phase gazeuse constamment renouvelee, sous pression reduite, de revetements protecteurs sur des pieces en alliages refractaires, et dispositif pour sa mise en oeuvre
JPS63230504A (ja) * 1987-03-18 1988-09-27 Mitsui Toatsu Chem Inc 塩素の製造方法
DE3813335A1 (de) * 1988-04-21 1989-11-02 Basf Ag Metalloxidbeschichtete aluminiumpigmente
GB8912838D0 (en) * 1989-06-03 1989-07-19 Tioxide Group Plc Stabilized metal oxide powder compositions
US5277245A (en) * 1992-10-29 1994-01-11 Gte Products Corp. Heat transfer in fluidized bed of cohesive powder
JPH06272047A (ja) * 1993-03-16 1994-09-27 Mitsubishi Cable Ind Ltd 被覆粉体の製造方法及びその装置
JP2636174B2 (ja) * 1994-07-22 1997-07-30 工業技術院長 放電反応利用化学蒸着法による粉末表面改質装置
JP2727436B2 (ja) * 1995-05-31 1998-03-11 川崎重工業株式会社 鉄カーバイドの製造方法及び製造装置
US5553395A (en) * 1995-05-31 1996-09-10 Hughes Aircraft Company Bubbler for solid metal organic source material and method of producing saturated carrying gas
JP3192071B2 (ja) * 1995-11-15 2001-07-23 セントラル硝子株式会社 撥水性複合粒子の製造方法およびこれを用いた撥水性材料
TR200001744T2 (tr) * 1997-12-17 2000-12-21 International Coatings Limited Toz kaplama işlemi.
US6713177B2 (en) * 2000-06-21 2004-03-30 Regents Of The University Of Colorado Insulating and functionalizing fine metal-containing particles with conformal ultra-thin films
US6827786B2 (en) * 2000-12-26 2004-12-07 Stephen M Lord Machine for production of granular silicon
FR2826646B1 (fr) * 2001-06-28 2004-05-21 Toulouse Inst Nat Polytech Procede de fabrication selective de nanotubes de carbone ordonne en lit fluidise
WO2003048412A1 (fr) * 2001-12-04 2003-06-12 Primaxx, Inc. Vaporiseur pour depot chimique en phase vapeur
US6921062B2 (en) * 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US7622153B2 (en) * 2004-08-13 2009-11-24 M&G Usa Corporation Method of making vapour deposited oxygen-scavenging particles
EP1866074A4 (fr) * 2005-03-16 2017-01-04 Entegris Inc. Systeme de distribution de reactifs a partir de sources solides

Also Published As

Publication number Publication date
EP1828427A1 (fr) 2007-09-05
FR2878453A1 (fr) 2006-06-02
US20080268143A1 (en) 2008-10-30
WO2006058895A1 (fr) 2006-06-08
JP2008522022A (ja) 2008-06-26
JP5055127B2 (ja) 2012-10-24

Similar Documents

Publication Publication Date Title
FR2878453B1 (fr) Dispositif de fourniture de vapeurs d'un precurseur solide a un appareil de traitement
FR2887139B1 (fr) Dispositif de traitement d'un vaisseau sanguin.
FR2881341B1 (fr) Appareil de traitement dentaire a reconnaissance automatique d'insert
FR2889962B1 (fr) Procede de commande d'un appareil respiratoire ainsi que dispositif respiratoire
FR2898744B1 (fr) Dispositif emetteur-recepteur et procede de traitement d'un signal
FR2888798B1 (fr) Appareil de commande d'eclairage pour dispositif d'eclairage destine aux vehicules
FR2894059B1 (fr) Appareil de pilotage d'un dispositif a cristaux liquides
FR2921384B1 (fr) Procede et dispositif de traitement d'un gaz de synthese
TW200725170A (en) Reticle carrying device, exposure device, reticle carrying method, and reticle processing method
FR2889890B3 (fr) Couvercle pour un dispositif de raccord
FR2871990B1 (fr) Procede pour eliminer des branches a partir d'un espalier et dispositif approprie
FR2866452B1 (fr) Procede pour faire fonctionner un appareil peripherique sur un systeme de bus d'un systeme d'ordinateur
FR2932118B1 (fr) Dispositif de purge pour un ensemble monte et procede de degonflage d'un ensemble monte
FR2934356B1 (fr) Dispositif de support d'un systeme d'eclairage amovible et autoporte pour hublot.
FR2852194B1 (fr) Dispositif de securite pour un appareil d'elagage
FR2938007B1 (fr) Console pour la fixation d'un dispositif de traitement des gaz brules
FR2872798B1 (fr) Ensemble de blisters pour dispositif d'inhalation
FR2872405B1 (fr) Procede de parametrage d'un dispositif de traitement de la peau utilisant des sources lumineuses
FR2887785B1 (fr) Dispositif pour le traitement de substances organiques
FR2892951B1 (fr) Dispositif de traitement d'un gaz par photocatalyse
DE60306482T8 (de) Verarbeitungsvorrichtung für Kraftstoffdämpfe
FR2892888B1 (fr) Dispositif de traitement de solides divises
FR2869645B1 (fr) Procede de gestion d'un dispositif de traitement des gaz d'echappement
FR2889056B1 (fr) Dispositif portable individuel pour bain d oeil
FR2897552B1 (fr) Dispositif pour deposer une courroie et procede de depose d'une courroie

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 12

PLFP Fee payment

Year of fee payment: 13

ST Notification of lapse

Effective date: 20180731