JP5049232B2 - 画像形成材料の現像処理方法 - Google Patents

画像形成材料の現像処理方法 Download PDF

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Publication number
JP5049232B2
JP5049232B2 JP2008220703A JP2008220703A JP5049232B2 JP 5049232 B2 JP5049232 B2 JP 5049232B2 JP 2008220703 A JP2008220703 A JP 2008220703A JP 2008220703 A JP2008220703 A JP 2008220703A JP 5049232 B2 JP5049232 B2 JP 5049232B2
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Japan
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developer
photosensitive layer
image forming
group
compound
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Japanese (ja)
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JP2010054878A (ja
JP2010054878A5 (enExample
Inventor
靖雄 椿井
雄一朗 小西
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Mitsubishi Paper Mills Ltd
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Mitsubishi Paper Mills Ltd
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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008220703A 2008-08-29 2008-08-29 画像形成材料の現像処理方法 Expired - Fee Related JP5049232B2 (ja)

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JP2008220703A JP5049232B2 (ja) 2008-08-29 2008-08-29 画像形成材料の現像処理方法

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JP2008220703A JP5049232B2 (ja) 2008-08-29 2008-08-29 画像形成材料の現像処理方法

Publications (3)

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JP2010054878A JP2010054878A (ja) 2010-03-11
JP2010054878A5 JP2010054878A5 (enExample) 2010-12-09
JP5049232B2 true JP5049232B2 (ja) 2012-10-17

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JP2008220703A Expired - Fee Related JP5049232B2 (ja) 2008-08-29 2008-08-29 画像形成材料の現像処理方法

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010228356A (ja) * 2009-03-27 2010-10-14 Fujifilm Corp 平版印刷版原版
WO2011122473A1 (ja) * 2010-03-29 2011-10-06 三菱製紙株式会社 感光性組成物及び感光性平版印刷版材料
JP5508085B2 (ja) * 2010-03-29 2014-05-28 三菱製紙株式会社 感光性組成物、感光性平版印刷版材料および感光性平版印刷版材料の製造方法
JP7394171B1 (ja) 2022-05-24 2023-12-07 東京インキ株式会社 無処理版用現像液および現像された無処理版の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2447780B1 (en) * 2007-01-17 2013-08-28 Fujifilm Corporation Method for preparation of lithographic printing plate

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JP2010054878A (ja) 2010-03-11

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