JP5039274B2 - 粒子放射装置 - Google Patents
粒子放射装置 Download PDFInfo
- Publication number
- JP5039274B2 JP5039274B2 JP2004276741A JP2004276741A JP5039274B2 JP 5039274 B2 JP5039274 B2 JP 5039274B2 JP 2004276741 A JP2004276741 A JP 2004276741A JP 2004276741 A JP2004276741 A JP 2004276741A JP 5039274 B2 JP5039274 B2 JP 5039274B2
- Authority
- JP
- Japan
- Prior art keywords
- sample holder
- cooler
- heat conductor
- sample
- cooling surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/002—Cooling arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/18—Vacuum control means
- H01J2237/182—Obtaining or maintaining desired pressure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2001—Maintaining constant desired temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2802—Transmission microscopes
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
Description
図1の粒子放射装置はバキュームコラム(1)を有している。バキュームコラム(1)内には個々の電子光学要素が配置されている。本実施形態では、電子光学要素には特にバキュームコラム内部で絶縁体(3)に受容されている電子源(2)が含まれる。他の絶縁体(4)には、電子源(2)に対し正のポテンシャルにある複数個の加速電極(5,6,7)がバキュームコラム内部で受容されている。電子源(2)から最も遠く離れている電極(7)は、電子ビームのエネルギーを決定するアノードを形成している。アノード(7)は電子源(2)よりも典型的には100〜200kV、場合によっては300kV高いポテンシャルにあり、同時にバキュームコラムのポテンシャル(通常は大地電位)にある。アノード(7)は導電性のビームガイドパイプ(8)に接続されている。ビームガイドパイプ(8)は粒子放射装置全体を貫通して検出器(9)まで延びているので、アノード(7)から検出器(9)までアノードポテンシャルが存在している。
Claims (5)
- 粒子線を合焦または結像させる対物レンズと、
試料を前記対物レンズ内または前記対物レンズ付近で受容する試料ホルダ(17)と、
冷却器(21)と、
前記試料ホルダ(17)及び該試料ホルダ(17)の付近に配置される冷却面(18)の双方又はいずれか一方と、前記冷却器(21)とに接続された熱伝導体(19)と、を備え、
該熱伝導体(19)が、熱を前記試料ホルダ(17)から前記冷却器(21)へ、または前記試料ホルダ(17)の付近に配置される前記冷却面(18)から前記冷却器(21)へ逃がすために用いられ、且つ前記熱伝導体(19)が炭素繊維(24)を含んでおり、
前記熱伝導体(19)は、可撓性の炭素繊維束から成り、
前記熱伝導体(19)は、前記炭素繊維の端面を形状拘束的に取り囲む金属製の移行部材を前記熱伝導体(19)の端部に設けて、前記試料ホルダ(17)及び前記冷却面(18)の双方又はいずれか一方と面結合することにより、或いは、前記炭素繊維の端面を形状拘束的に前記試料ホルダ(17)および前記冷却面(18)の双方または何れか一方の金属部分に結合することにより、前記試料ホルダ(17)及び前記冷却面(18)の双方又はいずれか一方と接続され、前記冷却器(21)と前記試料ホルダ(17)および前記冷却面(18)の双方又は何れか一方との熱的結合を確実にすることを特徴とする粒子放射装置。 - 液状冷却剤(22)を収容するための容器(20)が設けられ、前記冷却器(21)が前記容器(20)に配置されている請求項1に記載の粒子放射装置。
- バキュームコラム(1)を有し、前記冷却器(20,21)が前記バキュームコラム(1)の外側に配置され、前記熱伝導体(19)が前記冷却器(20,21)から出て前記バキュームコラム(1)を通り該バキュームコラム(1)の内部まで案内されている請求項1または2に記載の粒子放射装置。
- 粒子源(2)と、磁気レンズ(10,11,12,13)から成る単段または多段の照射システムとが設けられている請求項1から3までのいずれか一つに記載の粒子放射装置。
- 前記熱伝導体(19)が複数の部分束(19a,19b)に分割され、前記熱伝導体(19)の1つの部分束(19a)が汚染防止部の前記冷却面(18)と結合され、前記熱伝導体(19)の第2の部分束(19b)が前記試料ホルダ(17)と結合されている請求項1から4までのいずれか一つに記載の粒子放射装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10344492.0 | 2003-09-24 | ||
DE10344492A DE10344492B4 (de) | 2003-09-24 | 2003-09-24 | Teilchenstrahlgerät |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005100988A JP2005100988A (ja) | 2005-04-14 |
JP5039274B2 true JP5039274B2 (ja) | 2012-10-03 |
Family
ID=34177944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004276741A Expired - Fee Related JP5039274B2 (ja) | 2003-09-24 | 2004-09-24 | 粒子放射装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7211806B2 (ja) |
EP (1) | EP1519399B1 (ja) |
JP (1) | JP5039274B2 (ja) |
AT (1) | ATE529880T1 (ja) |
DE (1) | DE10344492B4 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI274823B (en) * | 2005-05-09 | 2007-03-01 | Li Bing Huan | Method of operating and viewing of high pressure chamber in a vacuum or low pressure environment and the apparatus thereof |
KR100661986B1 (ko) | 2005-05-09 | 2006-12-27 | 리 빙-환 | 진공 또는 저압 환경에서의 기체 조작 및 이의 관찰을 위한장치 |
US8008633B2 (en) * | 2007-03-30 | 2011-08-30 | Jeol, Ltd. | Specimen stage-moving device for charged-particle beam system |
DE102007026847A1 (de) * | 2007-06-06 | 2008-12-11 | Carl Zeiss Nts Gmbh | Teilchenstrahlgerät und Verfahren zur Anwendung bei einem Teilchenstrahlgerät |
JP5001741B2 (ja) * | 2007-07-27 | 2012-08-15 | 住友電気工業株式会社 | 試料用ステージ及び試料の分析方法 |
CN103843106B (zh) * | 2011-09-09 | 2016-12-07 | 独立行政法人科学技术振兴机构 | 利用电子显微镜观察生物试样的方法和蒸发抑制用组合物 |
US20130256558A1 (en) * | 2012-03-29 | 2013-10-03 | Christian Dietl | Apparatus for contaminants being deposited thereon |
CN110376192A (zh) | 2013-01-07 | 2019-10-25 | 安盛生科股份有限公司 | 试片和读取试片的方法 |
JP2014175573A (ja) * | 2013-03-12 | 2014-09-22 | Nuflare Technology Inc | 荷電粒子ビーム描画装置、アパーチャユニット及び荷電粒子ビーム描画方法 |
WO2015041267A1 (ja) | 2013-09-20 | 2015-03-26 | 株式会社日立ハイテクノロジーズ | アンチコンタミネーショントラップおよび真空応用装置 |
EP3477679A1 (en) * | 2017-10-26 | 2019-05-01 | FEI Company | Improved cryogenic cell for mounting a specimen in a charged particle microscope |
EP3591685A1 (en) * | 2018-07-06 | 2020-01-08 | FEI Company | Electron microscope with improved imaging resolution |
JP7008675B2 (ja) * | 2019-10-15 | 2022-01-25 | 日本電子株式会社 | 荷電粒子線装置用冷却装置 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5748274Y2 (ja) * | 1977-07-11 | 1982-10-22 | ||
US4163900A (en) * | 1977-08-17 | 1979-08-07 | Connecticut Research Institute, Inc. | Composite electron microscope grid suitable for energy dispersive X-ray analysis, process for producing the same and other micro-components |
JPS5849566Y2 (ja) * | 1978-05-17 | 1983-11-11 | 日本電子株式会社 | 電子顕微鏡の試料汚染防止装置 |
GB2106325A (en) * | 1981-09-14 | 1983-04-07 | Philips Electronic Associated | Electrostatic chuck |
JPS59500688A (ja) | 1982-04-20 | 1984-04-19 | ザ ユニバ−シテイ コ−ト オブ ザ ユニバ−シテイ オブ グラスゴ− | 微量分析のための低温ステ−ジ |
JPS6042256U (ja) * | 1983-08-31 | 1985-03-25 | 日本電子株式会社 | 電子顕微鏡等における試料汚染防止装置 |
JPS60236223A (ja) * | 1984-05-10 | 1985-11-25 | Ulvac Corp | 基板の冷却装置 |
JPS6142843A (ja) | 1984-08-02 | 1986-03-01 | Ulvac Corp | 基板の冷却装置 |
JPH0323650Y2 (ja) * | 1985-11-15 | 1991-05-23 | ||
US4833330A (en) | 1987-11-03 | 1989-05-23 | Gatan Inc. | Anticontaminator for transmission electron microscopes |
DE3825103A1 (de) | 1988-07-23 | 1990-01-25 | Zeiss Carl Fa | Verfahren zum beleuchten eines objektes in einem transmissions-elektronenmikroskop |
US5077637A (en) * | 1989-09-25 | 1991-12-31 | The Charles Stark Draper Lab., Inc. | Solid state directional thermal cable |
US5390734A (en) * | 1993-05-28 | 1995-02-21 | Lytron Incorporated | Heat sink |
JPH0765770A (ja) * | 1993-08-24 | 1995-03-10 | Central Res Inst Of Electric Power Ind | 冷却通電機能を有する電子顕微鏡装置及びこの装置による超電導電流分布測定方法 |
US6447964B2 (en) * | 2000-03-01 | 2002-09-10 | Nikon Corporation | Charged-particle-beam microlithography methods including chip-exposure sequences for reducing thermally induced lateral shift of exposure position on the substrate |
JP2001319610A (ja) * | 2000-05-10 | 2001-11-16 | Jeol Ltd | 荷電粒子ビーム装置 |
US6469381B1 (en) * | 2000-09-29 | 2002-10-22 | Intel Corporation | Carbon-carbon and/or metal-carbon fiber composite heat spreader |
US6844054B2 (en) * | 2001-04-30 | 2005-01-18 | Thermo Composite, Llc | Thermal management material, devices and methods therefor |
US6965513B2 (en) * | 2001-12-20 | 2005-11-15 | Intel Corporation | Carbon nanotube thermal interface structures |
DE10212807A1 (de) | 2002-03-22 | 2003-10-02 | Leo Elektronenmikroskopie Gmbh | Manipulator für ein optisches oder teilchenoptisches Gerät |
-
2003
- 2003-09-24 DE DE10344492A patent/DE10344492B4/de not_active Expired - Fee Related
-
2004
- 2004-07-23 EP EP04017437A patent/EP1519399B1/de not_active Expired - Fee Related
- 2004-07-23 AT AT04017437T patent/ATE529880T1/de active
- 2004-09-24 US US10/948,225 patent/US7211806B2/en active Active
- 2004-09-24 JP JP2004276741A patent/JP5039274B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE10344492A1 (de) | 2005-05-19 |
EP1519399B1 (de) | 2011-10-19 |
EP1519399A2 (de) | 2005-03-30 |
JP2005100988A (ja) | 2005-04-14 |
EP1519399A3 (de) | 2010-01-27 |
DE10344492B4 (de) | 2006-09-07 |
US7211806B2 (en) | 2007-05-01 |
ATE529880T1 (de) | 2011-11-15 |
US20050103997A1 (en) | 2005-05-19 |
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