JP5029209B2 - Electro-optical device and projection display device - Google Patents

Description

  The present invention relates to an electro-optical device such as a liquid crystal device, a method for manufacturing the electro-optical device, and a projection display device including the electro-optical device.

  In the electro-optical device, a grid-like light shielding region extending vertically and horizontally is provided for the purpose of securing a wiring region and preventing color mixing, and modulated light is emitted from a pixel opening region surrounded by the light shielding region. For example, as shown in FIG. 14A, a liquid crystal device, which is a typical electro-optical device, includes an element substrate 10 on which pixel electrodes are formed, a counter substrate 20 disposed opposite to the element substrate 10, and an element A liquid crystal layer 50 held between the substrate 10 and the counter substrate 20 is provided. In the element substrate 10, a region 14 in which wiring and pixel switching transistors are formed, and in the counter substrate 20, a black matrix and a black stripe are provided. A light shielding region 100c is defined by a region where the light shielding layer 24, which is referred to as “a”, is formed. Inside the light shielding region 100c is a pixel opening region 100d having a pixel electrode. The liquid crystal device configured as described above is configured such that light incident from the element substrate 10 side is modulated by the liquid crystal layer 50 and then emitted from the counter substrate 20, or light incident from the counter substrate 20 side is liquid crystal layer. Since the light is modulated by 50 and then emitted from the element substrate 10, in order to efficiently use the incident light, it is necessary to efficiently guide the incident light to the pixel opening region 100d.

Accordingly, in a liquid crystal device having a structure in which light incident from the counter substrate 20 side is modulated by the liquid crystal layer 50 and then emitted from the element substrate 10, in FIG. 14A and FIG. In a region overlapping with the light shielding region 100c, a deflection groove 26 having a V-shaped cross section having a reflective slope 261 that guides incident light to the pixel opening region 100d (a region with a diagonal line slanting to the right in FIG. 14B). It has been proposed to use a deflection substrate 20e formed vertically and horizontally (see Patent Document 1).
JP 2006-215427 A

  In order to form the deflection groove 26 as shown in FIGS. 14A and 14B, as shown in FIG. 15A, the opening 61 corresponding to the etching target region for forming the deflection groove 26 is formed. Is formed on the deflecting substrate 20e, and then the substrate surface of the deflecting substrate 20e and the resist mask 60 are dry-etched. At this time, if the etching selection ratio between the deflecting substrate 20e and the resist mask 60 is, for example, 4: 1, the depth is approximately four times the thickness of the resist mask 60 as shown in FIG. The deflection groove 26 having a V-shaped cross section can be formed. After the deflection groove 26 is formed, the deflection groove 62 is filled with a low refractive index material 267 such as a resin material or air having a lower refractive index than that of the deflection substrate 20e, as shown in FIG. After the cover substrate 20g is attached to the substrate surface of the working substrate 20e via the adhesive 20f, the light shielding layer 24 and the common electrode 21 are sequentially formed on the surface of the cover substrate 20g to obtain the counter substrate 20.

  However, when dry etching is performed on the substrate surface of the deflection substrate 20e and the resist mask 60, the deflection substrate 20e is seen from both sides adjacent to each other through the corner portion when the resist mask 60 is viewed in plan. As shown in FIG. 14B, when the deflection groove 26 is formed in a pattern intersecting vertically and horizontally, the deflection groove 26 extends in the longitudinal direction. As a result of the significant etching in the lateral direction at the intersection between the existing part and the extending part in the lateral direction, the deflection groove 26 protrudes greatly into the pixel opening region 100d as indicated by the dotted line 260 in FIG. There is a problem that. As a result, there is a problem in that the incident light is not reflected in a predetermined direction at the portion of the deflection groove 26 that protrudes greatly to the pixel opening region 100d, and the utilization efficiency of the incident light is reduced and stray light is generated.

In order to solve the above-described problem, in the present invention, an element substrate having a grid-like light shielding region extending in a first direction and a second direction intersecting each other , and incident light to a pixel opening region inside the light shielding region. A groove having a V-shaped cross section having a slope to be reflected is formed on a counter substrate formed along a region overlapping with the light shielding region, and the first extending portion and the second extending in the first direction of the groove . at least one hand of the second extending portion extending in the direction, break portion is provided to avoid the intersection of the first extending portion and the second extending portion of the groove, the facing The substrate does not include a light shielding layer in a region overlapping with the light shielding region, and the light shielding region is defined only by the light shielding layer formed on the element substrate .

The groove is formed in the substrate body having translucency of the counter substrate.

  In the present invention, an electro-optical device having a lattice-shaped light shielding region extending in a first direction and a second direction intersecting each other, and a plurality of pixel opening regions for emitting modulated light in an inner region of the light shielding region When manufacturing a deflection substrate in which a deflection groove having a V-shaped cross section having a reflective slope for guiding incident light to the pixel opening region is formed along a region overlapping the light shielding region, the deflection is performed. In the etching step of forming the deflection groove by etching the substrate surface of the working substrate, the first etching target region and the second direction in which the first extension portion extending in the first direction is formed in the deflection groove At least one of the second etching target regions in which the second extension portion extending in the direction is to be formed includes the first etchant at the intersection of the first direction and the second direction in the deflection groove. And providing a discontinuity portion to avoid X-shaped intersection between the target area and the second etching target region.

  In the present invention, the incident light is efficiently guided to the pixel opening region by the deflection groove having a V-shaped cross section formed on the deflection substrate, so that the utilization efficiency of the incident light can be increased. The deflection groove includes a first extension portion extending in the first direction and a second extension portion extending in the second direction, and at least one of the first extension portion and the second extension portion. On one side, an interrupted portion for avoiding an X-shaped intersection between the first extending portion and the second extending portion is provided. In other words, when manufacturing the deflection substrate, at least one of the first etching target region in which the first extension portion should be formed and the second etching target region in which the second extension portion should be formed has the first An interrupted portion is provided to avoid an X-shaped intersection between the etching target region and the second etching target region. For this reason, it is possible to prevent the deflection groove from being greatly etched in the lateral direction and protruding to the pixel opening region. That is, when the deflection groove is formed by etching the substrate surface of the deflection substrate, the corner portion where the first extension portion (first etching target region) and the second extension portion (second etching target region) intersect. Then, since the substrate surface is significantly etched in the lateral direction as compared with other regions, the first extending portion (first etching target region) and the second extending portion (second etching target region) are X When the crossing of the letter shape is formed, a portion where the deflection groove protrudes greatly in the pixel opening region occurs in any of the four corner portions, and the use efficiency of incident light is reduced and stray light is generated. Since at least one of the first extending portion (first etching target region) and the second extending portion (second etching target region) is provided with a discontinuous portion for avoiding an X-shaped intersection, 4 The deflection groove protrudes greatly into the pixel opening area at one corner. Can be prevented, it is possible to prevent the occurrence of degradation or stray light utilization efficiency of the incident light.

  When the electro-optical device according to the present invention is configured as a liquid crystal device, a light-transmitting element substrate on which a light-transmitting pixel electrode, a pixel transistor, and a wiring are formed, and a light-transmitting element disposed opposite to the element substrate And a liquid crystal layer held between the element substrate and the counter substrate, and the light shielding region includes the pixel transistor and the wiring formation region.

  In the present invention, it is preferable that the counter substrate does not include a light shielding layer in a region overlapping with the light shielding region, and the light shielding region is defined only by the light shielding layer formed on the element substrate. In the present invention, since incident light is guided to the pixel aperture region by a V-shaped deflection groove formed on the deflection substrate, it is not necessary to provide a light shielding layer called a black matrix or a black stripe on the counter substrate. Therefore, the number of manufacturing steps can be reduced accordingly.

  In the present invention, it is preferable that the deflection substrate is included on the counter substrate side.

  In the present invention, one of the first extension part and the second extension part extends continuously and integrally, and the other extension part sandwiches the one extension part. It is preferable to extend intermittently with the discontinuous portions on both sides. With this configuration, since there is no place where the first extension portion and the second extension portion intersect, the deflection groove is large in the pixel opening region at the intersection of the first direction and the second direction in the deflection groove. It is possible to completely prevent the protruding portion from occurring.

  In the present invention, the deflection groove may be directed to another intersection portion adjacent in the first direction and another intersection portion adjacent in the second direction with one of the plurality of intersection portions as a base point. A configuration in which a plurality of extended L-shaped portions are arranged in the same direction at positions where the L-shaped portions are separated from each other may be employed. With this configuration, the portion where the deflection groove protrudes greatly from the pixel opening region is generated only at the inner side of the L-shaped portion at the intersection between the first direction and the second direction in the deflection groove. Decrease in utilization efficiency of incident light and stray light hardly occur.

  In the present invention, it is preferable that a metal material is formed as a reflectivity-imparting material in the deflection groove so as to cover the slope.

  In this invention, you may employ | adopt the structure by which the reflectivity provision material whose refractive index is lower than the said board | substrate for deflection | deviation is arrange | positioned in the said deflection groove so that the said slope may be covered.

  In the present invention, the deflection groove is filled with the reflectivity-imparting material or another filler in addition to the reflectivity-imparting material, and the substrate surface on which the deflection groove opens in the deflection substrate is flattened. It is preferable that With this configuration, an electrode or the like can be formed directly on the surface of the deflection substrate where the deflection groove opens, and there is no need to attach a cover substrate to the surface of the deflection substrate where the deflection groove opens.

  The electro-optical device according to the present invention is preferably used for a projection display device. In this case, the projection display device has a light source unit and a projection optical system, and the light emitted from the light source unit is transmitted to the electro-optical device. Then, the light optically modulated by the electro-optical device is projected by the projection optical system. Particularly in the case of a projection display device, since the use efficiency of incident light is required to be high, the effect when the present invention is applied to an electro-optical device is remarkable.

  In the method of manufacturing an electro-optical device according to the invention, in the etching step, an etching mask provided with an opening corresponding to the first etching target region and the second etching target region is provided in the deflection substrate. A mask forming step to be formed and a dry etching step of performing dry etching on the deflection substrate and the etching mask are performed.

  In the present invention, in the etching step, laser etching for irradiating the deflection substrate with a laser beam along the first etching target region and the second etching target region may be performed.

  With reference to the drawings, a projection display device using an electro-optical device (liquid crystal device) to which the present invention is applied, an electro-optical device, and a method for manufacturing the electro-optical device will be described. For the purpose of clarifying the correspondence, in the following description, parts having the same functions as those described with reference to FIGS. 14 and 15 are denoted by the same reference numerals. In the drawings referred to in the following description, the scales are different for each layer and each member so that each layer and each member have a size that can be recognized on the drawing.

[Embodiment 1]
[Configuration of Projection Display Device]
With reference to FIG. 1, a projection display device using the electro-optical device according to the first embodiment of the present invention as a light valve will be described. FIG. 1 is a schematic configuration diagram of a projection display device to which the present invention is applied.

  The projection display device 110 shown in FIG. 1 irradiates light on a screen 111 (projected surface) provided on the viewer side, and observes the light reflected by the screen 111. The projection display apparatus 110 includes a light source unit 140 including a light source 112, dichroic mirrors 113 and 114, a relay system 120, liquid crystal light valves 115 to 117, a cross dichroic prism 119 (combining optical system), and projection optics. System 118.

  The light source 112 is composed of an ultrahigh pressure mercury lamp that supplies light including red light, green light, and blue light. The dichroic mirror 113 is configured to transmit red light from the light source 112 and reflect green light and blue light. The dichroic mirror 114 is configured to transmit blue light and reflect green light among green light and blue light reflected by the dichroic mirror 113. Thus, the dichroic mirrors 113 and 114 constitute a color separation optical system that separates the light emitted from the light source 112 into red light, green light, and blue light.

  Between the dichroic mirror 113 and the light source 112, an integrator 121 and a polarization conversion element 122 are sequentially arranged from the light source 112. The integrator 121 is configured to make the illuminance distribution of the light emitted from the light source 112 uniform. Further, the polarization conversion element 122 is configured to change the light from the light source 112 into polarized light having a specific vibration direction such as s-polarized light.

  The liquid crystal light valve 115 is a transmissive electro-optical device (liquid crystal device) that modulates red light transmitted through the dichroic mirror 113 and reflected by the reflecting mirror 123 in accordance with an image signal. The liquid crystal light valve 115 includes a λ / 2 phase difference plate 115a, a first polarizing plate 115b, a liquid crystal panel 115c, and a second polarizing plate 115d. Here, the red light incident on the liquid crystal light valve 115 remains s-polarized light because the polarization of the light does not change even if it passes through the dichroic mirror 113.

  The λ / 2 phase difference plate 115a is an optical element that converts s-polarized light incident on the liquid crystal light valve 115 into p-polarized light. The first polarizing plate 115b is a polarizing plate that blocks s-polarized light and transmits p-polarized light. The liquid crystal panel 115c is configured to convert p-polarized light into s-polarized light (circularly polarized light or elliptically polarized light in the case of halftone) by modulation according to an image signal. Furthermore, the second polarizing plate 115d is a polarizing plate that blocks p-polarized light and transmits s-polarized light. Therefore, the liquid crystal light valve 115 is configured to modulate the red light according to the image signal and to emit the modulated red light toward the cross dichroic prism 119.

  The λ / 2 phase difference plate 115a and the first polarizing plate 115b are disposed in contact with a light-transmitting glass plate 115e that does not convert polarized light, and the λ / 2 phase difference plate 115a and the first polarizing plate 115b. It is possible to avoid distortion of 115b due to heat generation.

  The liquid crystal light valve 116 is a transmissive electro-optical device (liquid crystal device) that modulates green light reflected by the dichroic mirror 114 after being reflected by the dichroic mirror 113 in accordance with an image signal. Similar to the liquid crystal light valve 115, the liquid crystal light valve 116 includes a first polarizing plate 116b, a liquid crystal panel 116c, and a second polarizing plate 116d. Green light incident on the liquid crystal light valve 116 is s-polarized light that is reflected by the dichroic mirrors 113 and 114 and then incident. The first polarizing plate 116b is a polarizing plate that blocks p-polarized light and transmits s-polarized light. The liquid crystal panel 116c is configured to convert s-polarized light into p-polarized light (circularly polarized light or elliptically polarized light in the case of halftone) by modulation according to the image signal. The second polarizing plate 116d is a polarizing plate that blocks s-polarized light and transmits p-polarized light. Accordingly, the liquid crystal light valve 116 is configured to modulate green light in accordance with an image signal and to emit the modulated green light toward the cross dichroic prism 119.

  The liquid crystal light valve 117 is a transmissive electro-optical device (liquid crystal device) that modulates blue light reflected by the dichroic mirror 113 and transmitted through the dichroic mirror 114 and then passed through the relay system 120 in accordance with an image signal. Similarly to the liquid crystal light valves 115 and 116, the liquid crystal light valve 117 includes a λ / 2 phase difference plate 117a, a first polarizing plate 117b, a liquid crystal panel 117c, and a second polarizing plate 117d. Here, since the blue light incident on the liquid crystal light valve 117 is reflected by the two reflecting mirrors 125a and 125b described later of the relay system 120 after being reflected by the dichroic mirror 113 and transmitted through the dichroic mirror 114, the s-polarized light is reflected. It has become.

  The λ / 2 phase difference plate 117a is an optical element that converts s-polarized light incident on the liquid crystal light valve 117 into p-polarized light. The first polarizing plate 117b is a polarizing plate that blocks s-polarized light and transmits p-polarized light. The liquid crystal panel 117c is configured to convert p-polarized light into s-polarized light (circularly polarized light or elliptically polarized light in the case of halftone) by modulation according to an image signal. The second polarizing plate 117d is a polarizing plate that blocks p-polarized light and transmits s-polarized light. Accordingly, the liquid crystal light valve 117 is configured to modulate blue light in accordance with an image signal and to emit the modulated blue light toward the cross dichroic prism 119. The λ / 2 phase difference plate 117a and the first polarizing plate 117b are arranged in contact with the glass plate 117e.

  The relay system 120 includes relay lenses 124a and 124b and reflection mirrors 125a and 125b. The relay lenses 124a and 124b are provided to prevent light loss due to a long blue light path. Here, the relay lens 124a is disposed between the dichroic mirror 114 and the reflection mirror 125a. The relay lens 124b is disposed between the reflection mirrors 125a and 125b. The reflection mirror 125a is disposed so as to reflect the blue light transmitted through the dichroic mirror 114 and emitted from the relay lens 124a toward the relay lens 124b. The reflection mirror 125b is arranged to reflect the blue light emitted from the relay lens 124b toward the liquid crystal light valve 117.

  The cross dichroic prism 119 is a color combining optical system in which two dichroic films 119a and 119b are arranged orthogonally in an X shape. The dichroic film 119a is a film that reflects blue light and transmits green light, and the dichroic film 119b is a film that reflects red light and transmits green light. Therefore, the cross dichroic prism 119 is configured to combine the red light, the green light, and the blue light modulated by the liquid crystal light valves 115 to 117 and emit the resultant light toward the projection optical system 118.

  Note that light incident on the cross dichroic prism 119 from the liquid crystal light valves 115 and 117 is s-polarized light, and light incident on the cross dichroic prism 119 from the liquid crystal light valve 116 is p-polarized light. Thus, by making the light incident on the cross dichroic prism 119 different types of polarized light, the light incident from the liquid crystal light valves 115 to 117 in the cross dichroic prism 119 can be effectively combined. Here, in general, the dichroic films 119a and 119b are excellent in the reflection characteristics of s-polarized light. For this reason, red light and blue light reflected by the dichroic films 119a and 119b are s-polarized light, and green light transmitted through the dichroic films 119a and 119b is p-polarized light. The projection optical system 118 has a projection lens (not shown) and is configured to project the light combined by the cross dichroic prism 119 onto the screen 111.

  In the projection display device 110 configured as described above, since the use efficiency of the light emitted from the light source 112 is required to be high, the configuration described below is adopted for the liquid crystal devices as the liquid crystal light valves 115 to 117. Has been.

(Overall configuration of electro-optical device)
FIGS. 2A and 2B are explanatory views schematically showing the configuration of a liquid crystal panel used for a liquid crystal light valve (electro-optical device / liquid crystal device) in the projection display device shown in FIG. It is a block diagram which shows the electric constitution of an apparatus. Note that the liquid crystal light valves 115 to 117 and the liquid crystal panels 115 c to 117 c shown in FIG. 1 differ only in the wavelength range of light to be modulated, and have the same basic configuration, so that the liquid crystal light valves 115 to 117 are connected to the liquid crystal device 100. The liquid crystal panels 115c to 117c will be described as the liquid crystal panel 100x.

  As shown in FIG. 2A, in the liquid crystal device 100, the liquid crystal panel 100x includes an element substrate 10 and a counter substrate 20 facing the element substrate 10, and light incident from the counter substrate 20 side. This is a transmissive liquid crystal panel that modulates the light and emits light from the element substrate 10 side. The element substrate 10 and the counter substrate 20 are bonded to each other via a sealing material (not shown), and a liquid crystal layer 50 made of TN (Twisted Nematic) liquid crystal or the like is held in an inner region of the sealing material. ing. Although details will be described later, island-like pixel electrodes 9a and the like are formed on the surface of the element substrate 10 facing the counter substrate 20, and the surface of the counter substrate 20 facing the element substrate 10 is formed on substantially the entire surface thereof. A common electrode 21 is formed.

  As shown in FIG. 2B, in the element substrate 10 of the liquid crystal device 100, the pixel electrode 9a and the pixel electrode 9a are subjected to switching control in each of the plurality of matrix-like pixels 100a constituting the image display region 10a. For this purpose, a MOS field effect transistor 30 is formed as a pixel transistor. In the image display area 10a, a plurality of data lines 6a for supplying image signals and a plurality of scanning lines 3a for supplying scanning signals extend in directions intersecting with each other. Connected to the data line driving circuit 101, the scanning line 3 a is connected to the scanning line driving circuit 104. The data line 6 a is connected to the source of the field effect transistor 30, and the scanning line 3 a is connected to the gate of the field effect transistor 30. The pixel electrode 9a is electrically connected to the drain of the field effect transistor 30. By turning on the field effect transistor 30 for a certain period, a data signal supplied from the data line 6a is supplied to each pixel. Write to 100a at a predetermined timing. Then, a pixel signal of a predetermined level written in the liquid crystal capacitor 50a formed by the pixel electrode 9a, the liquid crystal layer 50, and the common electrode 21 shown in FIG. 2A is held for a certain period.

  Here, a storage capacitor 55 is formed in parallel with the liquid crystal capacitor 50a, and the voltage of the pixel electrode 9a is held by the storage capacitor 55 for a time that is, for example, three orders of magnitude longer than the time when the source voltage is applied. . Thereby, the charge retention characteristic is improved, and the liquid crystal device 100 capable of performing display with a high contrast ratio can be realized. In this embodiment, in order to configure the storage capacitor 55, a capacitor line 5b is formed in parallel with the scanning line 3a, and the capacitor line 5b is connected to a common potential line (COM) and held at a predetermined potential. Has been. Note that the storage capacitor 55 may be formed between the previous scanning line 3a.

(Specific pixel configuration)
FIG. 3 is a cross-sectional view of one pixel of a liquid crystal device to which the present invention is applied. 4A and 4B are respectively a plan view of adjacent pixels in an element substrate used in a liquid crystal device to which the present invention is applied, and an explanation in which a light-shielding region on the element substrate is indicated by a diagonal line rising to the right. FIG. 3 corresponds to a cross-sectional view when the liquid crystal device 100 is cut at a position corresponding to the line AA ′ in FIG. 4A and 4B, the semiconductor layer is indicated by a thin and short dotted line, the scanning line 3a is indicated by a thick solid line, the data line 6a and a thin film formed simultaneously with it are indicated by an alternate long and short dash line, Reference numeral 5b indicates a two-dot chain line, the pixel electrode 9a and a thin film formed simultaneously with the pixel electrode 9a are indicated by a thick and long dotted line, and a relay electrode described later is indicated by a thin solid line.

  As shown in FIG. 3 and FIG. 4A, a rectangular pixel electrode 9a is formed on each of the plurality of pixels 100a on the element substrate 10, and along the vertical and horizontal boundaries of each pixel electrode 9a. Thus, the data line 6a and the scanning line 3a are formed. Each of the data line 6a and the scanning line 3a extends linearly. A field effect transistor 30 is formed in a region where the data line 6a and the scanning line 3a intersect. On the element substrate 10, a capacitor line 5b is formed so as to overlap the scanning line 3a. In this embodiment, the capacitor line 5b includes a main line portion extending linearly so as to overlap the scanning line 3a, and a sub-line portion extending so as to overlap the data line 6a at the intersection of the data line 6a and the scanning line 3a. It has.

  The element substrate 10 includes a support substrate 11 (substrate body) made of a light-transmitting material such as a quartz substrate or a glass substrate, a pixel electrode 9a formed on the surface of the liquid crystal layer 50, and a field effect transistor 30 for pixel switching. The counter substrate 20 includes a transparent substrate 20b such as a quartz substrate or a glass substrate, a common electrode 21 formed on the surface of the liquid crystal layer 50, and an alignment film 22. It is configured as a subject.

  In the element substrate 10, a field effect transistor 30 is formed at a position adjacent to the pixel electrode 9a. The field effect transistor 30 has, for example, an LDD (Lightly Doped Drain) structure. The semiconductor layer 1 a has a channel region 1 a ′ opposed to the scanning line 3 a through the gate insulating layer 2, a low concentration. A source region 1b, a low concentration drain region 1c, a high concentration source region 1d, and a high concentration drain region 1e are formed.

  The semiconductor layer 1a is constituted by a single crystal silicon layer formed on a support substrate 11 made of, for example, a quartz substrate via a base insulating film 12, and the element substrate 10 having such a configuration includes a quartz substrate and a single crystal silicon. This can be realized by using an SOI (Silicon On Insulator) substrate in which the substrate is bonded through an insulating layer. Such an SOI substrate is formed by, for example, a method in which a silicon oxide film is formed on a single crystal silicon substrate and bonded to a quartz substrate, or a silicon oxide film is formed on both a quartz substrate and a single crystal silicon substrate and then silicon. A method in which the oxide films are brought into contact with each other and bonded can be employed. When such a substrate is used, the gate insulating layer 2 (second insulating film) can be formed by a thermal oxide film for the semiconductor layer 1a. For the scanning line 3a, a silicon film such as polysilicon, amorphous silicon, or a single crystal silicon film, a polycide or a silicide thereof, or a metal film is used.

  On the upper layer side of the scanning line 3a, a first interlayer insulating film 41 made of a silicon oxide film or the like having a contact hole 82 leading to the high concentration source region 1d and a contact hole 83 leading to the high concentration drain region 1e is formed. Yes. Relay electrodes 4 a and 4 b are formed on the first interlayer insulating film 41. The relay electrode 4a is formed in a substantially L shape extending along the scan line 3a and the data line 6a with the position where the scan line 3a and the data line 6a intersect as a base point. The relay electrode 4b It is formed along the data line 6a at a position separated from 4b. The relay electrode 4a is electrically connected to the high-concentration drain region 1e through the contact hole 83, and the relay electrode 4b is electrically connected to the high-concentration source region 1d through the contact hole 82.

  A dielectric film 42 made of a silicon nitride film or the like is formed on the upper layer side of the relay electrodes 4a and 4b, and a capacitor line 5b is formed through the dielectric film 42 so as to face the relay electrode 4a. A storage capacitor 55 is formed. The relay electrodes 4a and 4b are made of a conductive polysilicon film, a metal film, or the like, and the capacitor line 5b is made of a conductive polysilicon film, a metal silicide film containing a refractory metal, a laminated film thereof, or a metal film.

  On the upper layer side of the capacitor line 5b, a second interlayer insulating film 43 made of a silicon oxide film having a contact hole 87 leading to the relay electrode 4a and a contact hole 81 leading to the relay electrode 4b is formed. A data line 6 a and a drain electrode 6 b are formed on the second interlayer insulating film 43. The data line 6a is electrically connected to the relay electrode 4b through the contact hole 81, and is electrically connected to the high concentration source region 1d through the relay electrode 4b. The drain electrode 6b is electrically connected to the relay electrode 4a through the contact hole 87, and is electrically connected to the high concentration drain region 1e through the relay electrode 4a. The data line 6a and the drain electrode 6b are made of a conductive polysilicon film, a metal silicide film containing a refractory metal, a laminated film thereof, and a metal film.

  A third interlayer insulating film 44 made of a silicon oxide film or the like is formed on the upper side of the data line 6a and the drain electrode 6b. A fourth interlayer insulating film 45 made of a silicon oxide film or the like is formed on the upper layer side of the third interlayer insulating film 44. A contact hole 86 leading to the drain electrode 6b is formed in the third interlayer insulating film 44 and the fourth interlayer insulating film 45.

  A translucent pixel electrode 9 a made of an ITO (Indium Tin Oxide) film or the like is formed on the fourth interlayer insulating film 45. The pixel electrode 9 a is electrically connected to the drain electrode 6 b through the contact hole 86. Connected. An alignment film 16 is formed on the surface of the pixel electrode 9a.

  On the other hand, in the counter substrate 20, the common electrode 21 and the alignment film 22 are formed on the side of the translucent substrate 20 b that faces the element substrate 10.

  In the liquid crystal device 100 configured as described above, a lattice-shaped light shielding region 100c that does not contribute linearly to display due to the formation region of the scanning line 3a, the capacitor line 5b, the data line 6a, and the field effect transistor 30 (FIG. 4B). Are formed in the first direction (indicated by the arrow X) and the second direction (indicated by the arrow Y) intersecting each other. A region surrounded by the light shielding region 100c is a pixel opening region 100d that emits modulated light and contributes directly to display. In this embodiment, the counter substrate 20 is not formed with a light shielding film called a so-called black matrix or black stripe. For this reason, the light shielding region 100c is defined by the formation region of the scanning line 3a, the capacitor line 5b, the data line 6a, and the field effect transistor 30.

(Configuration of deflection groove and deflection substrate)
5 (a) and 5 (b) are schematic diagrams each showing a cross section of the liquid crystal device according to the first embodiment of the present invention, illustrating the cross-sectional configuration of the deflection groove, and description illustrating the planar configuration of the deflection groove. FIG. In FIG. 5A, the alignment film and the like are not shown.

  As shown in FIG. 5A, in the liquid crystal device 100 of the present embodiment, light incident from the counter substrate 20 side is modulated by the liquid crystal layer 50 for each pixel and then emitted from the element substrate 10. For this reason, in order to efficiently use the incident light, it is necessary to efficiently guide the incident light to the pixel opening region 100d.

  Therefore, in this embodiment, the translucent substrate 20b of the counter substrate 20 has a V-shaped cross-sectional deflection groove 26 having a reflective slope 261 that guides incident light to the pixel opening region 100d so as to overlap the light shielding region 100c. Is formed as a deflection substrate. That is, light of various incident angles is incident from the light source unit 140 described with reference to FIG. 1, and the light directly incident on the pixel opening region 100d among the incident light remains as it is as indicated by the arrow L1. On the other hand, as indicated by the arrow L2, the light traveling in the direction deviating from the direction toward the pixel opening region 100d is reflected by the reflective slope 261 of the deflection groove 26 as indicated by the arrow L3, and the pixel opening region. Turn to 100d.

  Here, the deflection groove 26 has a substantially isosceles triangular cross section with the slope 261 as one side, and the apex of the triangular shape is located at the center of the light shielding region 100c in the width direction. Further, the width dimension of the deflection groove 26 (the length of the base of the triangular shape) is set to be approximately the same as or slightly wider than the width dimension of the light shielding region 100d, so that from the direction toward the pixel opening region 100d. It can also be used effectively for light traveling in a deviating direction. Note that the inclination of the inclined surface 261 is set so that, for example, the angle formed with the normal to the substrate surface of the translucent substrate 20b is 3 ° or less, as disclosed in JP-A-2006-215427. The According to this configuration, when the light is reflected by the inclined surface 261, the incident light can be deflected while reducing the increase in the light beam angle, and the incident light is, for example, a projection optical system having an F number of 2.5. (See FIG. 1) can be converted into light having a light beam angle that can be sufficiently captured, and the contrast can be improved and the utilization efficiency of incident light can be improved.

  In this embodiment, when providing the reflective property to the inclined surface 261 of the deflection groove 26, a light-reflective metal layer 262 such as aluminum, aluminum alloy, silver, silver alloy or the like is provided on the inclined surface 261 inside the deflection groove 26. Is formed. Further, the inside of the deflection groove 26 is filled with a filler 263 such as a silicon oxide film or a photosensitive resin, and the entire surface of the translucent substrate 20b including the region where the deflection groove 26 is opened is included. Is flattened. Therefore, in the counter substrate 20, the common electrode 21 is formed directly on the substrate surface of the deflection substrate 20b, and the alignment film 22 (see FIG. 3) is formed on the surface thereof.

  Here, as shown in FIG. 5A, the deflection groove 26 is formed along the light shielding region 100c shown in FIG. 4B, and extends in the first direction (the direction indicated by the arrow X). 1 extension part 26x and the 2nd extension part 26y extended in the 2nd direction (direction shown by arrow Y) are provided. However, in the present embodiment, out of the first extending portion 26x and the second extending portion 26y, the first extending portion 26x includes the first extending portion 26w at the intersection 26w between the first direction and the second direction. An interrupted portion 26z is provided to avoid an X-shaped intersection between the first extending portion 26x and the second extending portion 26y. That is, in the present embodiment, the second extending portion 26y extends continuously and continuously in the second direction, while the first extending portion 26x has a discontinuous portion on both sides sandwiching the second extending portion 26y. 26z extends in the first direction intermittently. For this reason, in this embodiment, the first extending portion 26x and the second extending portion 26y are formed so as not to intersect at all.

  Therefore, as will be described in detail later, according to this embodiment, when the deflection groove 26 is formed, the translucent substrate 20b is greatly etched in the lateral direction at the intersecting portion 26w so that the deflection groove 26 becomes larger in the pixel opening region 100d. Protruding can be prevented.

(Manufacturing method of counter substrate 20 and deflection substrate)
FIG. 6 is a process cross-sectional view illustrating a manufacturing method of the counter substrate 20 (deflection substrate) used in the liquid crystal device according to Embodiment 1 of the present invention. In FIG. 6, the counter substrate 20 is shown so that the deflection groove 26 opens upward, contrary to FIGS. 3 and 5.

  In order to manufacture the counter substrate 20 (deflection substrate) used in the liquid crystal device 100 according to this embodiment, first, as shown in FIG. 6A, a photosensitive resist layer 62 is formed on the translucent substrate 20b. For example, after coating with a thickness of 50 to 200 μm, exposure and development are performed to form an etching mask 60 having an aperture 61 as shown in FIG. Here, the opening 61 is formed in substantially the same pattern as the deflection groove 26 shown in FIG. 5B, and defines a first etching target region in which the first extension 26x of the deflection groove 26 is to be formed. And a second opening 61y that defines a second etching target region in which the second extension 26y of the deflection groove 26 is to be formed. Moreover, in the opening part 61, while the 2nd opening part 61y is continuously extended in the 2nd direction integrally, the 1st opening part 61x is a discontinuous part on both sides on both sides of the 2nd opening part 61y. It extends intermittently at 61z. For this reason, in this embodiment, the first aperture 61x and the second extension 61y are formed so as not to intersect at all.

Next, dry etching is performed on the substrate surface of the translucent substrate 20b in a state where the etching mask 60 is formed on the substrate surface of the translucent substrate 20b. For such dry etching, an ICP dry etching apparatus capable of forming high-density plasma is used, and as an etching gas capable of uniformly forming high-density plasma in the etching area, for example, fluoride gas such as C ₄ F ₈ and CHF ₃ Is used. Further, the etching selection ratio between the translucent substrate 20b and the etching mask 60 is, for example, 4: 1. As a result, as shown in FIG. 6C, the deflection groove 26 having a depth approximately four times the thickness of the etching mask 60 can be formed.

  Next, after forming a light reflective metal film such as aluminum, aluminum alloy, silver, silver alloy or the like on the substrate surface of the translucent substrate 20b, patterning is performed, and as shown in FIG. A metal layer 262 for imparting reflectivity to the slope 261 is formed.

  Next, as shown in FIG. 6E, a filling layer 263 such as a silicon oxide film is formed on the substrate surface of the translucent substrate 20b so as to fill the deflection groove 26, and then the translucent substrate 20b. 6B, the filling layer 263 formed outside the deflection groove 26 is removed while leaving the filling layer 263 inside the deflection groove 26, as shown in FIG. In this polishing step, chemical mechanical polishing is performed in this embodiment. In this chemical mechanical polishing, a smooth polished surface can be obtained at high speed by the action of chemical components contained in the polishing liquid and the relative movement of the abrasive and the light-transmitting substrate 20b. More specifically, in a polishing apparatus, polishing is performed while relatively rotating a surface plate to which a polishing cloth (pad) made of a nonwoven fabric, polyurethane foam, porous fluororesin, or the like is attached and a holder that holds a counter substrate. Do. At that time, for example, an abrasive containing cerium oxide particles having an average particle diameter of 0.01 to 20 μm, an acrylate derivative as a dispersant, and water is interposed between the polishing cloth and the substrate surface of the translucent substrate 20b. Supply. In this embodiment, after polishing until the substrate surface of the light-transmitting substrate 20b is exposed, the substrate surface of the light-transmitting substrate 20b is also slightly polished. In this way, the translucent substrate 20b is used as a deflection substrate.

  Thereafter, an ITO film or the like is formed on the substrate surface of the translucent substrate 20b and then patterned to form the common electrode 21 as shown in FIGS. 3, 4A, and 5A. Note that when the common electrode 21 is formed on the substrate surface of the translucent substrate 20b, a mask film is formed, and an ITO film or the like is selectively formed in a predetermined region of the substrate surface of the translucent substrate 20b. Good. Thereafter, as shown in FIG. 3, a compound film 22 is formed on the surface of the common electrode 21. In this way, the counter substrate 20 is obtained.

(Main effects of this form)
As described above, in this embodiment, the translucent substrate 20b used for the counter substrate 20 is configured as a deflection substrate including the deflection groove 26 having a V-shaped cross section, so that incident light is incident on the pixel opening region 100d. In order to guide efficiently, the utilization efficiency of incident light can be improved.

  The deflection groove 26 includes a first extending portion 26x extending in the first direction and a second extending portion 26y extending in the second direction. The first extending portion 26x includes a first extending portion 26x. An interrupted portion 26z for avoiding an X-shaped intersection between the existing portion 26x and the second extending portion 26y is provided. In other words, when the translucent substrate 20b is formed as a deflection substrate, the first opening 61x (first etching target region) where the first extension 26x is to be formed and the second extension 26y are formed. Of the second opening portion 61y (second etching target region) to be processed, the first opening portion 61x (first etching target region) includes the first opening portion 61x (first etching target region) and the second opening portion 61x (second etching target region). An interrupted portion 61z is provided for avoiding an X-shaped intersection with the opening 61y (second etching target region). For this reason, it is possible to prevent the deflection groove 26 from being greatly etched in the lateral direction and protruding to the pixel opening region 100d. That is, when the deflection groove 26 is formed by etching the substrate surface of the translucent substrate 20b, the corner portion where the first opening portion 61x and the second opening portion 61y intersect is compared with other regions. Since the substrate surface is greatly etched in the lateral direction, when the first opening 61x and the second opening 61y form an X-shaped intersection, the deflection groove 26 is formed in any of the four corners. A part that protrudes greatly in the pixel opening region 100d is generated, and the use efficiency of incident light is reduced and stray light is generated. In this embodiment, the interrupted part 26z for avoiding the X-shaped intersection in the first opening 61x. Therefore, it is possible to prevent the deflection groove 26 from greatly protruding into the pixel opening region 100d, and it is possible to prevent a decrease in utilization efficiency of incident light and generation of stray light.

  In the present embodiment, in the opening portion 61, the second opening portion 61y extends continuously and integrally in the second direction, while the first opening portion 61x sandwiches the second opening portion 61y. In the present embodiment, the first opening portion 61x and the second extension portion 61y do not intersect at all because they intermittently extend with the discontinuous portions 61z on both sides. Therefore, it is possible to completely prevent a portion where the deflection groove 26 protrudes greatly from the pixel opening region 100d at the intersection 26w between the first direction and the second direction in the deflection groove 26.

  Further, in this embodiment, since the incident light is guided to the pixel opening region 100d by the deflection groove 26 having a V-shaped cross section, it is not necessary to provide a light shielding layer called a black matrix or a black stripe on the counter substrate 20. Accordingly, the number of manufacturing steps can be reduced.

  Further, since the inside of the deflection groove 26 is filled with the filler 263 and the substrate surface is flattened in the translucent substrate 20b, the common electrode 21 and the like are directly formed on the substrate surface where the deflection groove 26 opens. There is an advantage that it is not necessary to attach the cover substrate to the substrate surface where the deflection groove 26 is opened.

(Another method for manufacturing a deflection substrate)
FIG. 7 is a process cross-sectional view illustrating another method for manufacturing the counter substrate 20 (deflection substrate) used in the liquid crystal device according to Embodiment 1 of the present invention.

  In order to manufacture the counter substrate 20 (deflection substrate) used in the liquid crystal device 100 according to this embodiment, first, as shown in FIG. 7A, the metal layer 71 is formed on the light transmitting substrate 20b. As a material of the metal layer 71, for example, chromium or nickel can be used. Next, as shown in FIG. 7B, a photosensitive resist layer 72 is formed on the metal layer 71, and then exposed and developed to form a resist mask 73 as shown in FIG. 7C. . Next, after patterning the metal layer 71 through the resist mask 73 as shown in FIG. 7C, the metal layer 71 is patterned through the resist mask 73 as shown in FIG. A metal mask 74 is formed. In this way, an etching mask 70 composed of the metal mask 74 and the resist mask 73 is formed. The etching mask 70 includes an opening 75 that defines an etching target region for forming the deflection groove 26. The opening 75 is an opening of the etching mask 60 described with reference to FIG. The pattern has the same pattern as the portion 61.

Next, dry etching is performed on the substrate surface of the translucent substrate 20b with the etching mask 70 formed on the substrate surface of the translucent substrate 20b. For such dry etching, an ICP dry etching apparatus capable of forming high-density plasma is used, and as an etching gas capable of uniformly forming high-density plasma in the etching area, for example, fluoride gas such as C ₄ F ₈ and CHF ₃ Is used. In addition, the etching selectivity is increased by setting the etching rate in the translucent substrate 20b to be high. As a result, as shown in FIGS. 7E and 7F, it is possible to form the deflection groove 26 having a depth approximately four times the thickness of the etching mask 60.

  Next, as shown in FIG. 7G, the etching mask 70 is removed. The subsequent steps are the same as the method described with reference to FIG.

(Another manufacturing method of the deflection substrate)
FIG. 8 is a process cross-sectional view illustrating another method of manufacturing the counter substrate 20 (deflection substrate) used in the liquid crystal device according to Embodiment 1 of the present invention.

  In order to manufacture the counter substrate 20 (deflection substrate) used in the liquid crystal device 100 according to the present embodiment, first, as shown in FIG. 8A, a photosensitive resin 81 is applied to the translucent substrate 20b. Then, exposure and development are performed to form a resin pattern 82 as shown in FIG. Next, as shown in FIG. 8C, after forming a metal layer 83 such as chromium or nickel, the resin pattern 82 is removed. As a result, as shown in FIG. 8D, a portion of the metal layer 83 that has been covered on the resin pattern 82 is removed, and an etching mask 80 is formed by the remaining metal layer. The etching mask 80 includes an opening 85 that defines an etching target region for forming the deflection groove 26, and the opening 85 is an opening of the etching mask 60 described with reference to FIG. The pattern has the same pattern as the portion 61.

Next, dry etching is performed on the substrate surface of the translucent substrate 20b with the etching mask 80 formed on the substrate surface of the translucent substrate 20b. For such dry etching, an ICP dry etching apparatus capable of forming high-density plasma is used, and as an etching gas capable of uniformly forming high-density plasma in the etching area, for example, fluoride gas such as C ₄ F ₈ and CHF ₃ Is used. In addition, the etching selectivity is increased by setting the etching rate in the translucent substrate 20b to be high. As a result, as shown in FIGS. 8E and 8F, the deflection groove 26 having a depth approximately four times the thickness of the etching mask 80 can be formed.

  Next, as shown in FIG. 8G, the etching mask 80 is removed. The subsequent steps are the same as the method described with reference to FIG.

(Another manufacturing method of the deflection substrate)
In the method shown in FIGS. 6 to 8, the substrate surface of the translucent substrate 20 b is etched through the etching mask to form the deflection groove 26. Laser etching may be performed by irradiating a laser beam along the first etching target region and the second etching target region for forming the first extension part 26x and the second extension part 26y shown in FIG.

[Embodiment 2]
FIGS. 9 (a) and 9 (b) are explanatory views schematically showing a cross-sectional configuration of the deflection groove by schematically showing a cross section of the liquid crystal device according to the second embodiment of the present invention, and an explanation showing a planar configuration of the deflection groove. FIG. Since the basic configuration of this embodiment is the same as that of Embodiment 1, common portions are denoted by the same reference numerals and description thereof is omitted.

  As shown in FIG. 9A, in the liquid crystal device 100 of the present embodiment as well, in the same way as in the first embodiment, the light-transmitting substrate 20b of the counter substrate 20 transmits the incident light to the pixel opening so as to overlap the light shielding region 100c. This is configured as a deflection substrate in which a deflection groove 26 having a V-shaped cross section having a reflective slope 261 leading to the region 100d is formed. Here, as shown in FIG. 9A, the deflection groove 26 is formed along the light shielding region 100c shown in FIG. 4B, and extends in the first direction (the direction indicated by the arrow X). 1 extension part 26x and the 2nd extension part 26y extended in the 2nd direction (direction shown by arrow Y) are provided.

  However, in the present embodiment, contrary to the first embodiment, of the first extending portion 26x extending in the first direction and the second extending portion 26y extending in the second direction, the second extending portion 26y Is provided with an interrupted portion 26z for avoiding an X-shaped intersection between the first extending portion 26x and the second extending portion 26y at the intersecting portion 26w between the first direction and the second direction in the deflection groove 26. Yes. That is, in the present embodiment, the first extending portion 26x extends continuously and integrally in the first direction, while the second extending portion 26y has a discontinuous portion on both sides sandwiching the first extending portion 26x. It extends intermittently at 26z. For this reason, in this embodiment, the first extending portion 26x and the second extending portion 26y are formed so as not to intersect at all.

  In FIG. 9B, when the deflection groove 26 is formed by the method described with reference to FIG. 6, the opening portion 61 (the first opening portion 61x and the second opening portion) of the etching mask 60 is formed. 61y) and its discontinuity 61z are also shown.

  Even in such a configuration, as in the first embodiment, when the deflection groove 26 is formed, the translucent substrate 20b is significantly etched in the lateral direction at the intersection 26w so that the deflection groove 26 is formed in the pixel opening region 100d. It can be prevented from protruding greatly.

[Embodiment 3]
FIGS. 10 (a) and 10 (b) are each an explanatory diagram schematically showing a cross section of the liquid crystal device according to the third embodiment of the present invention and showing a cross-sectional configuration of the deflection groove, and an explanation showing a planar configuration of the deflection groove. FIG. Since the basic configuration of this embodiment is the same as that of Embodiment 1, common portions are denoted by the same reference numerals and description thereof is omitted.

  As shown in FIG. 10A, also in the liquid crystal device 100 of the present embodiment, as in the first embodiment, the light-transmitting substrate 20b of the counter substrate 20 transmits incident light to the pixel opening so as to overlap the light shielding region 100c. This is configured as a deflection substrate in which a deflection groove 26 having a V-shaped cross section having a reflective slope 261 leading to the region 100d is formed. Here, as shown in FIG. 9A, the deflection groove 26 is formed along the light shielding region 100c shown in FIG. 4B, and extends in the first direction (the direction indicated by the arrow X). 1 extension part 26x and the 2nd extension part 26y extended in the 2nd direction (direction shown by arrow Y) are provided.

  However, in this embodiment, the deflection groove 26 is directed to another crossing portion 26w adjacent in the first direction and another crossing portion 26w adjacent in the second direction with one of the plurality of crossing portions 26w as a base point. A plurality of L-shaped portions 26 s extending in the same manner are arranged in the same direction at positions where the L-shaped portions 26 s are separated from each other. For this reason, both the 1st extension part 26x and the 2nd extension part 26y are provided with the discontinuous part 26z for avoiding the X-shaped intersection of the 1st extension part 26x and the 2nd extension part 26y. Yes. That is, the first extending portion 26x intermittently extends in the first direction with the discontinuous portion 26z at the intersecting portion 26w, and the second extending portion 26y is intermittently second with the discontinuous portion 26z at the intersecting portion 26w. Extends in the direction. In the present embodiment, the first extending portion 26x and the second extending portion 26y intersect, but only one corner is formed at the intersecting portion 26w.

  In FIG. 10B, when the deflection groove 26 is formed by the method described with reference to FIG. 6, the opening portion 61 (the first opening portion 61x and the second opening portion) of the etching mask 60 is formed. 61y) and its discontinuity 61z are also shown.

  In this case, when the deflection groove 26 is formed, as shown by a dotted line 260, the translucent substrate 20b is greatly etched in the lateral direction inside the corner of the L-shaped portion 26s, so that the deflection groove 26 is formed. Although protruding into the pixel opening region 100d, there is only one protruding portion. Therefore, the utilization efficiency of incident light and stray light hardly occur.

  In this embodiment, as shown in FIG. 4A, the field effect transistor 30 is formed in a region that completely overlaps with the formation region of the data line 6a, the scanning line 3a, and the capacitor line 6b. When the field effect transistor 30 cannot be formed in the formation region and it is necessary to form the field effect transistor 30 so as to protrude from the formation region of the wiring, the deflection groove 26 indicated by a dotted line 260 protrudes into the pixel opening region 100d. If the region is used as a region for forming the field effect transistor 30, it is possible to minimize a decrease in the utilization efficiency of incident light caused by the field effect transistor 30.

[Another embodiment of the deflection substrate]
FIG. 11 and FIG. 12 are explanatory views showing modifications of the deflection substrate used in the liquid crystal device to which the present invention is applied.

In the above embodiment, the metal layer 262 is formed on the inclined surface 261 in order to provide the inclined surface 261 of the deflecting groove 26. However, as shown in FIGS. 11A and 11B, the metal layer 262 is formed. Alternatively, the low refractive index material 267 may be filled in the deflection groove 26. That is, when the refractive index of the material constituting the translucent substrate 20 b is n ₁ , the refractive index of the low refractive index material 267 is n _2, and the incident angle of light with respect to the normal line of the inclined surface 261 is θ ₁ , n ₁ > n ₂ and n ₁ , n ₂ , θ ₁ are the following expressions: sin θ ₁ > n ₂ / n ₁
If this condition is satisfied, total reflection occurs, so that the slope 261 can be provided with reflectivity. Here, the low refractive index material 267 shown in FIG. 11A is a resin, and the low refractive index material 267 shown in FIG. 11B is air. The configuration shown in FIG. 11B can be realized by attaching the cover substrate 20g to the substrate surface of the translucent substrate 20b through the adhesive 20f under a reduced pressure atmosphere.

  In the above-described embodiment, the example in which the cross section of the deflection groove 26 is an isosceles triangle has been described. However, as shown in FIG. 12A, the top of the isosceles triangle is rounded, or FIG. As shown in b), a configuration in which the inclined surface 261 includes a first inclined surface 261a and a second inclined surface 261b having different inclinations with respect to the normal direction to the substrate surface of the translucent substrate 20b may be employed. Here, if the second slope 261b located on the bottom side of the isosceles triangle forms a larger angle with respect to the normal direction with respect to the substrate surface of the translucent substrate 20b than the first slope 261a. The incident light can be guided to the center of the pixel opening region 100d while avoiding the end portion of the pixel opening region 100d in which a liquid crystal domain or the like is likely to be generated.

[Other embodiments]
FIG. 1 illustrates a projection display device using three light valves. However, when the liquid crystal device 100 includes a color filter, the present invention is applied to the projection display device shown in FIG. The liquid crystal device 100 may be used as a light valve, and a color image may be projected and displayed on the screen 211. 13 includes a light source unit 240 including a white light source 212, an integrator 221, and a polarization conversion element 222, the liquid crystal device 100, and a projection optical system 218. The projection display device 210 illustrated in FIG. In the liquid crystal device 100, the first polarizing plate 216a and the second polarizing plate 216b are arranged on both sides of the liquid crystal panel 100x with a built-in color filter.

  In the above embodiment, the transmissive liquid crystal device used in the projection display device is exemplified as the electro-optical device. However, the present invention may be applied to a reflective liquid crystal device used in the projection display device. Also, a direct-view transmissive or transflective liquid crystal device that displays an image using light emitted from a backlight device as incident light, and a direct-view reflective liquid crystal device that displays images using external light as incident light. The present invention may be applied to an apparatus.

  Furthermore, in the above embodiment, the liquid crystal device has been described as an example of the electro-optical device, but for the purpose of preventing color mixing or the like in the electro-optical device that displays an image on the image display surface by the modulated light emitted from the self-light emitting element. Alternatively, the present invention may be applied to an electro-optical device in which a grid-like light shielding region extending in the vertical and horizontal directions is provided and modulated light is emitted from a pixel opening region surrounded by the light shielding region.

It is a schematic block diagram of the projection type display apparatus to which this invention is applied. (A), (b) is explanatory drawing which shows typically the structure of the liquid crystal panel used for the liquid crystal light valve in the projection type display apparatus shown in FIG. 1, and the block diagram which shows the electrical structure of the liquid crystal device. is there. It is sectional drawing for one pixel of the liquid crystal device to which this invention is applied. (A), (b) is the top view of the pixel which adjoins in the element substrate used for the liquid crystal device to which this invention is applied, respectively, and explanatory drawing which showed the light-shielding area | region on this element substrate by the upward slanting oblique line. is there. (A), (b) is explanatory drawing which shows typically the cross section of the liquid crystal device which concerns on Embodiment 1 of this invention, shows the cross-sectional structure of a deflection groove, and is explanatory drawing which shows the plane structure of a deflection groove, respectively. is there. It is process sectional drawing which shows the manufacturing method of the opposing board | substrate (deflection board | substrate) used for the liquid crystal device which concerns on Embodiment 1 of this invention. It is process sectional drawing which shows another manufacturing method of the opposing board | substrate (deflection board | substrate) used for the liquid crystal device which concerns on Embodiment 1 of this invention. It is process sectional drawing which shows another manufacturing method of the opposing board | substrate (deflection board | substrate) used for the liquid crystal device which concerns on Embodiment 1 of this invention. (A), (b) is explanatory drawing which shows typically the cross section of the liquid crystal device which concerns on Embodiment 2 of this invention, shows the cross-sectional structure of a deflection groove, and is explanatory drawing which shows the plane structure of a deflection groove, respectively. is there. (A), (b) is each explanatory drawing which shows typically the cross section of the liquid crystal device which concerns on Embodiment 3 of this invention, and shows the cross-sectional structure of a deflection groove, and explanatory drawing which shows the plane structure of a deflection groove. is there. It is explanatory drawing which shows the modification of the board | substrate for deflection | deviation used with the liquid crystal device to which this invention is applied. It is explanatory drawing which shows another modification of the deflection | deviation board | substrate used with the liquid crystal device to which this invention is applied. It is a schematic block diagram of another projection type display apparatus to which this invention is applied. (A), (b) is explanatory drawing which shows the cross-sectional structure of a deflection | deviation groove | channel by showing typically the cross section of the conventional liquid crystal device, and explanatory drawing which shows the planar structure of a deflection | deviation groove | channel, respectively. It is process sectional drawing which shows the method of forming the deflection | deviation groove | channel shown in FIG.

Explanation of symbols

10. .. element substrate, 20 .. counter substrate, 20 a .. translucent substrate (deflection substrate), 26... Deflection groove, 26 x .. first extension portion of deflection groove, 26 y. 2 extending portion, 26z... Broken portion of deflection groove, 100... Liquid crystal device (electro-optical device), 100 c... Light shielding region, 100 d.

Claims (9)

An element substrate having a lattice-shaped light shielding region extending in a first direction and a second direction intersecting each other ;
A counter substrate in which a V-shaped groove having a slope that reflects incident light to a pixel opening region inside the light shielding region is formed along a region overlapping the light shielding region ;
At least one of the first extension portion extending in the first direction and the second extension portion extending in the second direction of the groove includes the first extension portion and the second extension of the groove. is interrupted portions to avoid intersection of the extending portion is provided,
2. The electro-optical device according to claim 1, wherein the counter substrate does not include a light shielding layer in a region overlapping with the light shielding region, and the light shielding region is defined only by the light shielding layer formed on the element substrate . The electro-optical device according to claim 1, wherein the groove is formed in a light transmitting substrate body of the counter substrate. The element substrate has translucent pixel electrodes, pixel transistors, and wiring , and a liquid crystal layer is held between the element substrate and the counter substrate .
The electro-optical device according to claim 1, wherein the light shielding region includes a formation region of the pixel transistor and the wiring. One extension part of the first extension part and the second extension part extends continuously and integrally, and the other extension part is interrupted on both sides of the one extension part. The electro-optical device according to any one of claims 1 to 3 , wherein the electro-optical device extends intermittently with a portion. The groove is adjacent to another intersecting portion adjacent in the first direction and one adjacent to the second direction from one of the intersecting portions of the first extending portion and the second extending portion. a plurality of L-shaped portion extending toward the other intersections, any one of claims 1 to 3, characterized by being arranged in the same direction to each other in a position where the L-shaped portion to each other separated The electro-optical device according to 1. Wherein the groove, the electro-optical device according to any one of claims 1 to 5 metal material to cover the inclined surface is characterized in that it is formed as a reflective-imparting material. The electro-optical device according to claim 2 , wherein a reflection providing material having a refractive index lower than that of the substrate body of the counter substrate is disposed in the groove so as to cover the inclined surface. The groove is filled with the reflectivity-imparting material or another filler in addition to the reflectivity-imparting material, and the substrate surface where the groove of the counter substrate opens is planarized. The electro-optical device according to claim 6 . A projection display device using the electro-optical device according to any one of claims 1 to 8 ,
A light source unit and a projection optical system,
A projection-type display device, wherein light emitted from the light source unit is incident on the electro-optical device, and light modulated by the electro-optical device is projected by the projection optical system.

Images