JP5028549B2 - ポリシロキサン含有ナノ構造複合体被覆型構造物及びその製造方法 - Google Patents
ポリシロキサン含有ナノ構造複合体被覆型構造物及びその製造方法 Download PDFInfo
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- JP5028549B2 JP5028549B2 JP2012519825A JP2012519825A JP5028549B2 JP 5028549 B2 JP5028549 B2 JP 5028549B2 JP 2012519825 A JP2012519825 A JP 2012519825A JP 2012519825 A JP2012519825 A JP 2012519825A JP 5028549 B2 JP5028549 B2 JP 5028549B2
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- 229910052788 barium Inorganic materials 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
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- 125000002843 carboxylic acid group Chemical group 0.000 description 1
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- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
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- 229910017052 cobalt Inorganic materials 0.000 description 1
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- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
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- IINNWAYUJNWZRM-UHFFFAOYSA-L erythrosin B Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 IINNWAYUJNWZRM-UHFFFAOYSA-L 0.000 description 1
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
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- 229910052740 iodine Inorganic materials 0.000 description 1
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- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
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- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
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- YZMHQCWXYHARLS-UHFFFAOYSA-N naphthalene-1,2-disulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C21 YZMHQCWXYHARLS-UHFFFAOYSA-N 0.000 description 1
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- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
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- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
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- SGJUITZZLRFAJC-UHFFFAOYSA-N pyrene-1,2-disulfonic acid Chemical compound C1=CC=C2C=CC3=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC4=CC=C1C2=C43 SGJUITZZLRFAJC-UHFFFAOYSA-N 0.000 description 1
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- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
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- 239000013535 sea water Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
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- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- YNHJECZULSZAQK-UHFFFAOYSA-N tetraphenylporphyrin Chemical compound C1=CC(C(=C2C=CC(N2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3N2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 YNHJECZULSZAQK-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
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- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- BJDLPDPRMYAOCM-UHFFFAOYSA-N triethoxy(propan-2-yl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)C BJDLPDPRMYAOCM-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- LGROXJWYRXANBB-UHFFFAOYSA-N trimethoxy(propan-2-yl)silane Chemical compound CO[Si](OC)(OC)C(C)C LGROXJWYRXANBB-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 125000001834 xanthenyl group Chemical group C1=CC=CC=2OC3=CC=CC=C3C(C12)* 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/02—Polyamines
- C08G73/0206—Polyalkylene(poly)amines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/22—Expanded, porous or hollow particles
- C08K7/24—Expanded, porous or hollow particles inorganic
- C08K7/26—Silicon- containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/02—Polyamines
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- Chemical Kinetics & Catalysis (AREA)
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- Nanotechnology (AREA)
- Polymers & Plastics (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Description
本発明において使用する固体基材(X)としては、後述するポリエチレンイミン骨格(a)を有するポリマー(A)が吸着できるものであれば特に限定されず、例えば、ガラス、金属、金属酸化物などの無機材料系基材、樹脂(プラスチック)、セルロースなどの有機材料系基材等、更にはガラス、金属、金属酸化物表面をエッチング処理した基材、樹脂基材の表面をプラズマ処理、オゾン処理した基材などを使用できる。
本発明において、固体基材(X)上に形成するポリマー層には、ポリエチレンイミン骨格(a)を有するポリマー(A)を用いることを必須とする。該ポリエチレンイミン骨格(a)を有するポリマー(A)としては、線状、星状、櫛状構造の単独重合体であっても、他の繰り返し単位を有する共重合体であっても良い。共重合体の場合には、該ポリマー(A)中のポリエチレンイミン骨格(a)のモル比が20%以上であることが、安定なポリマー層を形成できる点から好ましく、該ポリエチレンイミン骨格(a)の繰り返し単位数が10以上である、ブロック共重合体であることがより好ましい。
本発明で得られる構造物の基材表面は、前述のポリマー(A)とオルガノポリシロキサン(B)を含有するナノ構造複合体であることが大きな特徴である。オルガノポリシロキサン(B)形成に必要なソースとしては、{RnSi(OCH3)4−nまたはRnSi(OCH2CH3)4−n、Rは置換基を有していても良い炭化水素基、n=1または2}で表されるオルガノアルコキシシラン(B’)が挙げられる。式中のRとしては、例えば、メルカプトプロピル基、メチル基、ビニル基、グリシドキシプロピル基、フェニル基等が挙げられ、前記一般式中のnが2の場合のRとしては、同一のものであっても、異なるものであっても良い。nが1の場合は通常シランカップリング剤(b)として知られており、例えば、テトラメトキシシラン、メトキシシラン縮合体のオリゴマー、テトラエトキシシラン、エトキシシラン縮合体のオリゴマーを好適に用いることができる。さらに、アルキル置換アルコキシシラン類の、メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、n−プロピルトリメトキシシラン、n−プロピルトリエトキシシラン、iso−プロピルトリメトキシシラン、iso−プロピルトリエトキシシラン等、更に、3−クロロプロピルトリメトキシシラン、3−クロロプロピルトリエトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、3−メルカプトプロピルトリメトキシシラン、3−メルカプトトリエトキシシラン、3,3,3−トリフルオロプロピルトリメトキシシラン、3,3,3−トリフルオロプロピルトリエトキシシラン、3−メタクリルオキシプロピルトリメトキシシラン、3−メタクリルオキシプロピルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、p−クロロメチルフェニルトリメトキシシラン、p−クロロメチルフェニルトリエトキシシラン等が挙げられ、又前記一般式中のnが2の化合物としてはジメチルジメトキシシラン、ジメチルジエトキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン等を挙げることができる。これらのオルガノアルコキシシラン(B’)は、単一で、又は混合して用いることができる。
本発明の構造体における基材表面は、前述のポリエチレンイミン骨格(a)を有するポリマー(A)とオルガノポリシロキサン(B)とからなるナノ構造複合体(Y)で被覆されている。このナノ構造複合体(Y)中には金属イオンを安定に取り込むことができ、従って、金属イオンを含むナノ構造複合体被覆型構造物を得ることができる。
上記した通り、本発明では金属イオンを構造体中のナノ構造複合体(Y)中に取り込むことができる。従って、これらの金属イオンのなかでも、還元反応により還元されやすい金属イオンは、金属ナノ粒子に変換させることで、該複合体(Y)中に金属ナノ粒子を含有させることができる。
本発明において、構造物を被覆するナノ構造複合体(Y)中のポリエチレンイミン骨格(a)はアミノ基、ヒドロキシ基、カルボン酸基、スルホン酸基、リン酸基を有する化合物と、水素結合及び/又は静電気引力により、物理的な結合構造を構成することができる。従って、これらの官能基を有する有機色素分子を該複合体(Y)中に含有させることが可能である。
ポリマー(A)とオルガノポリシロキサン(B)とを含有するナノ構造複合体(Y)は、基本的には前述のポリマー(A)とオルガノポリシロキサン(B)との複合ナノファイバー(y1)または複合ナノ粒子(y2)の集合体であり、その集合体が基材表面全体を覆った状態を構成しながら、様々なパターンまたはモルフォロジーを形成する。例えば、複合ナノファイバー(y1)が固体基材上の全面に該ファイバーの長軸が略垂直方向を向いて生えているような芝状(ナノ芝)または複合ナノファイバー(y1)及び/又は複合ナノ粒子(y2)が基材上の全面でネットワークを形成しているスポンジ状(ナノスポンジ)など、多様多種の階層構造を構成することができる。
本発明の構造物の製造方法は、ポリエチレンイミン骨格(a)を有するポリマー(A)の溶液、ポリエチレンイミン骨格(a)を有するポリマー(A)と金属イオンとの混合溶液、ポリエチレンイミン骨格(a)を有するポリマー(A)と有機色素分子との混合溶液、またはポリエチレンイミン骨格(a)を有するポリマー(A)と金属イオンと有機色素分子との混合溶液を固体基材(X)の表面に接触させた後、該基材(X)を取り出し、基材(X)の表面にポリエチレンイミン骨格(a)を有するポリマー(A)と、併用された金属イオン及び/又は有機色素分子とからなるポリマー層が吸着した基材を得る工程(1)と、前記ポリマー層が吸着した基材と一定濃度に調製したオルガノアルコキシシラン(B’)とを長時間接触させ、基材表面に吸着したポリマー層中のポリエチレンイミン骨格(a)が有する触媒機能により、オルガノポリシロキサン(B)をその上に析出させて、ナノ構造複合体(Y)を形成すると共に基材を被覆する工程(2)、とを有する製造方法である。この手法により固体基材(X)の表面にポリマー(A)とオルガノポリシロキサン(B)とからなるナノ界面、ポリマー(A)/金属イオン/オルガノポリシロキサン(B)からなるナノ界面、ポリマー(A)/有機色素分子/オルガノポリシロキサン(B)からなるナノ界面の被覆層を容易に形成することができる。
単離乾燥したナノ構造体を両面テープにてサンプル支持台に固定し、それをキーエンス製表面観察装置VE−9800にて観察した。
<直鎖状のポリエチレンイミン(L−PEI)の合成>
<直鎖状ポリエチレンイミン塩酸塩(LPEI・HCl)の合成>
市販のポリエチルオキサゾリン(数平均分子量50,000、平均重合度500、Aldrich社製)240gを、5Mの塩酸水溶液1500mLに溶解させた。その溶液をオイルバスにて90℃に加熱し、その温度で10時間攪拌した。反応液にアセトン50mLを加え、ポリマーを完全に沈殿させ、それを濾過し、メタノールで3回洗浄し、白色のポリエチレンイミンの塩酸塩粉末を得た。室温(20〜25℃)乾燥後の収量は178gであった。得られた粉末を1H−NMR(JEOL JNM−LA300型核磁気共鳴吸収スペクトル測定装置:重水)にて同定したところ、ポリエチルオキサゾリンの側鎖エチル基に由来したピーク1.2ppm(CH3)と2.3ppm(CH2)が完全に消失していることが確認された。即ち、ポリエチルオキサゾリンが完全に加水分解され、ポリエチレンイミンに変換されたことが示された。
[ガラス管内壁がポリマー/オルガノポリシロキサンのナノ構造複合体で被覆された構造物]
上記合成例1で得たポリマーL−PEIを蒸留水中に加え、80℃まで加熱し、3%の水溶液を調製した。ソーダライム材質のガラス管(内径6mm、長さ5cm)とシリンジをゴム管で連結し、該ガラス管中に一定目安のところまで前記加温したポリマー水溶液を吸い取ってから、30秒間静置した後、該ポリマー水溶液をシリンジの押し力で排出した。この操作でガラス管内壁にL−PEIポリマー層が形成された。該ガラス管を室温にて5分間静置したのち、ガラス管を表1記載のシランカップリング剤であるメルカプトプロピルトリメトキシシラン(STMS)の水溶液(室温:25〜30℃)中に15時間浸けた。ガラス管を取り出し、ガラス管内壁を水で洗浄した後、それを室温で乾燥した。
[ガラス管内壁がポリマー/オルガノポリシロキサンのナノ構造複合体で被覆された構造物]
実施例1において、STMS/水溶液中浸漬する時間を変えた以外は、実施例1と同様な方法にしてガラス内壁を被覆した構造物を得た(表2)。
[ガラス管内壁がポリマー/オルガノポリシロキサンのナノ構造複合体で被覆された構造物]
実施例1において、シランカップリング剤として、STMSの替わりにメチルトリメトキシシラン(MTMS)を用いた以外、実施例1と同様な方法にしてガラス内壁を被覆した構造物を得た(表3)。
[ガラス管内壁がポリマー/オルガノポリシロキサンのナノ構造複合体で被覆された構造物]
実施例1において、シランカップリング剤としてフェニルトリメトキシシラン(PTMS)を用いた以外、実施例1と同様な方法にしてガラス内壁を被覆した構造物を得た(表4)。
[ガラス管内壁がポリマー/オルガノポリシロキサンのナノ構造複合体で被覆された構造物]
実施例1において、シランカップリング剤をメルカプトプロピルトリメトキシシラン(STMS)とビニルトリメトキシシラン(VTMS)の混合物(等モル混合)を用いた以外、実施例1と同様な方法にしてガラス内壁を被覆した構造物を得た(表5)。
[ガラス板表面にポリマー/オルガノポリシロキサンのナノ構造複合体で被覆された構造物]
濃度が0.5wt%のポリスチレンスルホン酸水溶液を用い、3×2cmのソーダガラス板上にスピンコーター(500rpm/2秒、3000rpm/30秒)にて表面に薄膜を調製した。それを完全乾燥後、上記合成例で得られた3wt%のL−PEIの水溶液(80℃液)に浸け、10秒間静置した。板を取り出し、それを室温状態で5分間静置させた後、STMSの水溶液(STMS/水=0.25mL/50mL)中に15時間浸漬した。板を取り出し、蒸留水で表面洗浄後、空気中乾燥した。これで得た膜の表面をSEMにて観察した(図13)。全体的に緻密なナノ芝構造が形成したことが確認された。
Claims (3)
- ポリエチレンイミン骨格(a)を有するポリマー(A)を含有する溶液中に固体基材(X)を浸漬させた後取り出し、該固体基材(X)の表面にポリマー層を形成させる工程(1)と、
前記工程(1)で得られたポリマー層を有する固体基材(X)と、オルガノアルコキシシラン(B’)の0.05〜0.5体積%溶液とを5時間以上接触させて、固体基材(X)表面のポリマー層中にオルガノポリシロキサン(B)を析出させ、ナノ構造複合体(Y)を形成させる工程(2)と、
を有することを特徴とするポリシロキサン含有ナノ構造複合体被覆型構造物の製造方法。 - 前記工程(2)で用いるオルガノアルコキシシラン(B’)がシランカップリング剤(b)である請求項1記載のポリシロキサン含有ナノ構造複合体被覆型構造物の製造方法。
- 前記オルガノアルコキシシラン(B’)中のオルガノ基がメルカプトプロピル基、メチル基、ビニル基、グリシドキシプロピル基又はフェニル基である請求項1又は2記載のポリシロキサン含有ナノ構造複合体被覆型構造物の製造方法。
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