JP5012931B2 - 液処理方法及び液処理装置 - Google Patents
液処理方法及び液処理装置 Download PDFInfo
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- JP5012931B2 JP5012931B2 JP2010036589A JP2010036589A JP5012931B2 JP 5012931 B2 JP5012931 B2 JP 5012931B2 JP 2010036589 A JP2010036589 A JP 2010036589A JP 2010036589 A JP2010036589 A JP 2010036589A JP 5012931 B2 JP5012931 B2 JP 5012931B2
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- processing liquid
- liquid supply
- solvent
- nozzle
- processing
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- Photosensitive Polymer And Photoresist Processing (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010036589A JP5012931B2 (ja) | 2010-02-22 | 2010-02-22 | 液処理方法及び液処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010036589A JP5012931B2 (ja) | 2010-02-22 | 2010-02-22 | 液処理方法及び液処理装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005118024A Division JP4606234B2 (ja) | 2005-04-15 | 2005-04-15 | 液処理方法及び液処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010212680A JP2010212680A (ja) | 2010-09-24 |
| JP2010212680A5 JP2010212680A5 (enExample) | 2011-05-26 |
| JP5012931B2 true JP5012931B2 (ja) | 2012-08-29 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010036589A Expired - Lifetime JP5012931B2 (ja) | 2010-02-22 | 2010-02-22 | 液処理方法及び液処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5012931B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102204885B1 (ko) * | 2017-09-14 | 2021-01-19 | 세메스 주식회사 | 기판 처리 방법 |
| JP7318296B2 (ja) * | 2019-04-25 | 2023-08-01 | 東京エレクトロン株式会社 | 液処理装置の運転方法及び液処理装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0494526A (ja) * | 1990-08-11 | 1992-03-26 | Sony Corp | レジストディスペンスノズルのレジスト残り除去方法 |
| JP2923044B2 (ja) * | 1990-11-30 | 1999-07-26 | 東京エレクトロン株式会社 | コーティング装置 |
| JP3414176B2 (ja) * | 1996-12-19 | 2003-06-09 | 富士通株式会社 | 平坦化剤の塗布装置 |
| JP3993496B2 (ja) * | 2001-09-27 | 2007-10-17 | 東京エレクトロン株式会社 | 基板の処理方法および塗布処理装置 |
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2010
- 2010-02-22 JP JP2010036589A patent/JP5012931B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010212680A (ja) | 2010-09-24 |
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