JP5012931B2 - 液処理方法及び液処理装置 - Google Patents

液処理方法及び液処理装置 Download PDF

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Publication number
JP5012931B2
JP5012931B2 JP2010036589A JP2010036589A JP5012931B2 JP 5012931 B2 JP5012931 B2 JP 5012931B2 JP 2010036589 A JP2010036589 A JP 2010036589A JP 2010036589 A JP2010036589 A JP 2010036589A JP 5012931 B2 JP5012931 B2 JP 5012931B2
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processing liquid
liquid supply
solvent
nozzle
processing
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Japanese (ja)
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JP2010212680A (ja
JP2010212680A5 (enExample
Inventor
常長 中島
健二 浦田
慎二 岡田
伸明 松岡
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010036589A 2010-02-22 2010-02-22 液処理方法及び液処理装置 Expired - Lifetime JP5012931B2 (ja)

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JP2010036589A JP5012931B2 (ja) 2010-02-22 2010-02-22 液処理方法及び液処理装置

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JP2010036589A JP5012931B2 (ja) 2010-02-22 2010-02-22 液処理方法及び液処理装置

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JP2005118024A Division JP4606234B2 (ja) 2005-04-15 2005-04-15 液処理方法及び液処理装置

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JP2010212680A JP2010212680A (ja) 2010-09-24
JP2010212680A5 JP2010212680A5 (enExample) 2011-05-26
JP5012931B2 true JP5012931B2 (ja) 2012-08-29

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102204885B1 (ko) * 2017-09-14 2021-01-19 세메스 주식회사 기판 처리 방법
JP7318296B2 (ja) * 2019-04-25 2023-08-01 東京エレクトロン株式会社 液処理装置の運転方法及び液処理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0494526A (ja) * 1990-08-11 1992-03-26 Sony Corp レジストディスペンスノズルのレジスト残り除去方法
JP2923044B2 (ja) * 1990-11-30 1999-07-26 東京エレクトロン株式会社 コーティング装置
JP3414176B2 (ja) * 1996-12-19 2003-06-09 富士通株式会社 平坦化剤の塗布装置
JP3993496B2 (ja) * 2001-09-27 2007-10-17 東京エレクトロン株式会社 基板の処理方法および塗布処理装置

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