JP5009550B2 - 加工観察方法及び加工観察装置 - Google Patents
加工観察方法及び加工観察装置 Download PDFInfo
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- JP5009550B2 JP5009550B2 JP2006124678A JP2006124678A JP5009550B2 JP 5009550 B2 JP5009550 B2 JP 5009550B2 JP 2006124678 A JP2006124678 A JP 2006124678A JP 2006124678 A JP2006124678 A JP 2006124678A JP 5009550 B2 JP5009550 B2 JP 5009550B2
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- Prior art keywords
- processing
- probe
- observation
- scanning
- return
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/04—Display or data processing devices
- G01Q30/06—Display or data processing devices for error compensation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/04—Fine scanning or positioning
- G01Q10/06—Circuits or algorithms therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q80/00—Applications, other than SPM, of scanning-probe techniques
Description
Y. Morikawa, H. Kokubo, M. Nishiguchi, N. Hayashi, R. White, R. Bozak, and L. Terrill, Proc. of SPIE 5130 520-527(2003)
2 カンチレバー
3 余剰欠陥
4 正常パターン
5 ガラス(石英)基板
Claims (4)
- 探針を走査させ加工領域を加工及び観察する加工観察方法において、
前記加工領域を加工するために前記探針に荷重をかけ、または前記探針の高さを固定し前記探針に行きの走査をさせる加工工程と、
前記加工領域を観察するために前記行きと戻りの走査のオフセットを補正し、前記荷重より低い荷重を前記探針にかけるか、または、接触モードで前記探針に戻りの走査をさせる観察工程と、からなる加工観察方法。 - 前記観察工程は、前記加工領域の高さ情報を取得し、加工終点を検出する請求項1に記載の加工観察方法。
- 前記加工工程と前記観察工程を繰り返し実施する場合において、
前回の観察工程で観察した観察像中の特徴的な形状の位置情報と今回の観察工程で観察した観察像中の前記特徴的な形状の位置情報とを比較し、前記加工領域のドリフト量を算出し、前記ドリフト量に基づき補正した領域を加工する請求項1または2に記載の加工観察方法。 - 探針を走査させ加工領域を加工及び観察する加工観察装置において、
前記加工領域の被加工材質よりも硬い材質の前記探針と、
前記探針を走査させるカンチレバーと、を備え、
前記カンチレバーは、前記加工領域を加工するために前記探針に荷重をかけ、または前記探針の高さを固定し前記探針に行きの走査をさせ、前記加工領域を観察するために前記行きと戻りの走査のオフセットを補正し、前記探針に前記荷重より低い荷重をかけるか、または、接触モードで前記探針に戻りの走査をさせる加工観察装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006124678A JP5009550B2 (ja) | 2006-04-28 | 2006-04-28 | 加工観察方法及び加工観察装置 |
US11/796,996 US7571639B2 (en) | 2006-04-28 | 2007-04-27 | Method of correcting opaque defect of photomask using atomic force microscope fine processing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006124678A JP5009550B2 (ja) | 2006-04-28 | 2006-04-28 | 加工観察方法及び加工観察装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007298587A JP2007298587A (ja) | 2007-11-15 |
JP5009550B2 true JP5009550B2 (ja) | 2012-08-22 |
Family
ID=38768150
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006124678A Expired - Fee Related JP5009550B2 (ja) | 2006-04-28 | 2006-04-28 | 加工観察方法及び加工観察装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7571639B2 (ja) |
JP (1) | JP5009550B2 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5039944B2 (ja) * | 2008-01-22 | 2012-10-03 | エスアイアイ・ナノテクノロジー株式会社 | 走査型プローブ顕微鏡用ピンセットシステム、走査型プローブ顕微鏡装置およびゴミの除去方法 |
KR100873154B1 (ko) * | 2008-01-30 | 2008-12-10 | 한국표준과학연구원 | 포토 마스크의 수리장치 및 이를 이용한 수리방법 |
JP2010054773A (ja) * | 2008-08-28 | 2010-03-11 | Toshiba Corp | 異物除去方法及び半導体装置の製造方法 |
CN102142384B (zh) | 2010-12-02 | 2013-01-09 | 深圳市华星光电技术有限公司 | 金属蚀刻终点侦测方法及金属蚀刻终点侦测机 |
DE102011004214A1 (de) | 2011-02-16 | 2012-08-16 | Carl Zeiss Sms Gmbh | Vorrichtung und Verfahren zum Analysieren und Verändern einer Probenoberfläche |
US9086639B2 (en) | 2013-09-12 | 2015-07-21 | International Business Machines Corporation | Fabrication of on-product aberration monitors with nanomachining |
EP3321694A1 (en) * | 2016-11-10 | 2018-05-16 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Method of modifying a surface of a sample, and a scanning probe microscopy system |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005321758A (ja) * | 2004-04-09 | 2005-11-17 | Sii Nanotechnology Inc | 走査型プローブ装置および走査型プローブ加工方法 |
EP1587113B1 (en) * | 2004-04-15 | 2012-10-03 | Fei Company | Stylus system for modifying small structures |
JP2005332888A (ja) * | 2004-05-18 | 2005-12-02 | Ebara Corp | 形状修復装置および形状修復方法 |
JP2005334986A (ja) * | 2004-05-25 | 2005-12-08 | Sii Nanotechnology Inc | 走査プローブ顕微鏡の探針を用いた加工方法 |
-
2006
- 2006-04-28 JP JP2006124678A patent/JP5009550B2/ja not_active Expired - Fee Related
-
2007
- 2007-04-27 US US11/796,996 patent/US7571639B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US7571639B2 (en) | 2009-08-11 |
US20070281222A1 (en) | 2007-12-06 |
JP2007298587A (ja) | 2007-11-15 |
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