JP5005592B2 - 積層体の製造方法、積層体およびビニリデンフルオライド系オリゴマー膜 - Google Patents
積層体の製造方法、積層体およびビニリデンフルオライド系オリゴマー膜 Download PDFInfo
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- JP5005592B2 JP5005592B2 JP2008078274A JP2008078274A JP5005592B2 JP 5005592 B2 JP5005592 B2 JP 5005592B2 JP 2008078274 A JP2008078274 A JP 2008078274A JP 2008078274 A JP2008078274 A JP 2008078274A JP 5005592 B2 JP5005592 B2 JP 5005592B2
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- vinylidene fluoride
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Description
またこの発明は、基板と、該基板表面に摩擦転写された重合度が4〜70のビニリデンフルオライド系オリゴマー層とを備えた積層体とすることができる。
この発明の態様として、前記ビニリデンフルオライド系オリゴマー層が強誘電性を備えている構成にすることができる。
またこの発明は、基板表面に重合度が4〜70のビニリデンフルオライド系オリゴマーを摩擦転写することで形成したビニリデンフルオライド系オリゴマー膜とすることができる。
摩擦転写装置1は、押圧掃引アーム2と加熱部3と台部4とで構成されており、加熱部3上に基板12が載置され、押圧掃引アーム2にブロック11が保持される。
台部4は、上面に加熱部3が固定され、押圧掃引アーム2がスライド移動可能に取り付けられている。従って、押圧掃引アーム2で保持したブロック11と、加熱部3上に載置された基板12とを、基板12表面と平行に一直線に相対移動させることができる。なお、この相対移動は、加熱部3を固定して押圧掃引アーム2を移動させても、逆に加熱部3を移動させて押圧掃引アーム2を固定してもよい。
この摩擦転写は、加熱部3により設定温度まで基板12を加熱し、基板12から離間させていたブロック11を押圧掃引アーム2で基板12に設定圧力で押圧し、この押圧を維持したまま押圧掃引アーム2でブロック11を設定掃引速度(一定速度)で掃引して行われる。
この製造方法を用いると分子量分布が狭い重合体や分岐の比率の少ない重合体を合成でき、I型結晶構造の含有比率が高いフッ化ビニリデン単独重合体を得ることができる。
基板温度:60℃
掃印速度:150mm/min
圧力:16.1kgf/cm2
摩擦転写装置:株式会社井本製作所製のIMC−115A型
このようにして摩擦転写を行った結果、シリコン基板上にVDFオリゴマー膜(ビニリデンフルオライド系オリゴマー膜13の一例)を形成することができた。
Claims (4)
- 基板表面に重合度が4〜70のビニリデンフルオライド系オリゴマーを摩擦転写することによって、ビニリデンフルオライド系オリゴマー層を前記基板表面に積層させる
積層体の製造方法。 - 基板と、
該基板表面に摩擦転写された重合度が4〜70のビニリデンフルオライド系オリゴマー層とを備えた
積層体。 - 前記ビニリデンフルオライド系オリゴマー層が強誘電性を備えている
請求項2記載の積層体。 - 基板表面に重合度が4〜70のビニリデンフルオライド系オリゴマーを摩擦転写することで形成した
ビニリデンフルオライド系オリゴマー膜。
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JP2008078274A JP5005592B2 (ja) | 2008-03-25 | 2008-03-25 | 積層体の製造方法、積層体およびビニリデンフルオライド系オリゴマー膜 |
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JP5005592B2 true JP5005592B2 (ja) | 2012-08-22 |
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JP2004037291A (ja) * | 2002-07-04 | 2004-02-05 | Kansai Tlo Kk | 焦電型赤外線センサ |
JP3867709B2 (ja) * | 2003-03-26 | 2007-01-10 | ダイキン工業株式会社 | 薄膜の形成方法 |
JP2005283902A (ja) * | 2004-03-29 | 2005-10-13 | Kuraray Co Ltd | 一軸配向高分子薄膜およびその製造方法 |
JP2007258282A (ja) * | 2006-03-20 | 2007-10-04 | Seiko Epson Corp | 半導体装置、半導体装置の製造方法および記憶装置 |
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