JP5005372B2 - 両面研磨装置 - Google Patents
両面研磨装置 Download PDFInfo
- Publication number
- JP5005372B2 JP5005372B2 JP2007022417A JP2007022417A JP5005372B2 JP 5005372 B2 JP5005372 B2 JP 5005372B2 JP 2007022417 A JP2007022417 A JP 2007022417A JP 2007022417 A JP2007022417 A JP 2007022417A JP 5005372 B2 JP5005372 B2 JP 5005372B2
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- double
- surface plate
- side polishing
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
2 中心ギア
3 インターナルギア
4 下定盤
5 上定盤
6 キャリア
7 孔
8 加工対象物
9 研磨材
10 キャリア表裏面
11 上定盤5の加工対象物側表面
12 下定盤4の加工対象物側表面
13 撥水性メッキ層
41 従来の両面研磨装置
42 中心ギア
43 インターナルギア
44 下定盤
45 上定盤
46 キャリア
47 キャリア46の孔
Claims (1)
- 両面研磨装置の中心ギアとインターナルギアの双方にかみ合わせられ、該両面研磨装置の下定盤上で上定盤により押し付けられながら回転するキャリアの孔内に収容された加工対象物に対し、上下から上定盤と下定盤を押し付けながら研磨材を含むスラリーが供給され研磨加工がされる両面研磨装置であって、
該キャリア表裏面、及び/または、該上定盤の該加工対象物側表面及び該下定盤の該加工対象物側表面に撥水性メッキ層が形成された構造であることを特徴とする両面研磨装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007022417A JP5005372B2 (ja) | 2007-01-31 | 2007-01-31 | 両面研磨装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007022417A JP5005372B2 (ja) | 2007-01-31 | 2007-01-31 | 両面研磨装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008188678A JP2008188678A (ja) | 2008-08-21 |
JP5005372B2 true JP5005372B2 (ja) | 2012-08-22 |
Family
ID=39749278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007022417A Expired - Fee Related JP5005372B2 (ja) | 2007-01-31 | 2007-01-31 | 両面研磨装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5005372B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105945664A (zh) * | 2016-06-24 | 2016-09-21 | 无锡欧诺锁业有限公司 | 一种高效打磨机 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101209271B1 (ko) * | 2009-08-21 | 2012-12-06 | 주식회사 엘지실트론 | 양면 연마 장치와 양면 연마 장치용 캐리어 |
JP5861451B2 (ja) * | 2011-12-27 | 2016-02-16 | 旭硝子株式会社 | 磁気記録媒体用ガラス基板の研磨方法、および、磁気記録媒体用ガラス基板の製造方法 |
JP5861452B2 (ja) * | 2011-12-27 | 2016-02-16 | 旭硝子株式会社 | 研磨キャリア、磁気記録媒体用ガラス基板の研磨方法、および、磁気記録媒体用ガラス基板の製造方法 |
DE112017005728T5 (de) * | 2016-12-09 | 2019-08-29 | Shin-Etsu Handotai Co., Ltd. | Träger für doppelseitige Poliervorrichtung, doppelseitige Poliervorrichtung und doppelseitiges Polierverfahren |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001334457A (ja) * | 2000-05-25 | 2001-12-04 | Shin Etsu Handotai Co Ltd | ラッププレート及びそれを用いた加工装置 |
JP3963083B2 (ja) * | 2001-06-27 | 2007-08-22 | 信越半導体株式会社 | ワークの研磨方法及び研磨装置 |
JP2003179021A (ja) * | 2001-12-11 | 2003-06-27 | Sony Corp | 化学機械研磨装置 |
JP4110801B2 (ja) * | 2002-03-04 | 2008-07-02 | 株式会社Sumco | 半導体ウェーハの研磨方法 |
-
2007
- 2007-01-31 JP JP2007022417A patent/JP5005372B2/ja not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105945664A (zh) * | 2016-06-24 | 2016-09-21 | 无锡欧诺锁业有限公司 | 一种高效打磨机 |
Also Published As
Publication number | Publication date |
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JP2008188678A (ja) | 2008-08-21 |
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