JP5000426B2 - 垂直型バイポーラ接合トランジスタ及びその製造方法 - Google Patents
垂直型バイポーラ接合トランジスタ及びその製造方法 Download PDFInfo
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- JP5000426B2 JP5000426B2 JP2007214931A JP2007214931A JP5000426B2 JP 5000426 B2 JP5000426 B2 JP 5000426B2 JP 2007214931 A JP2007214931 A JP 2007214931A JP 2007214931 A JP2007214931 A JP 2007214931A JP 5000426 B2 JP5000426 B2 JP 5000426B2
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- 238000004519 manufacturing process Methods 0.000 title description 25
- 150000002500 ions Chemical class 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 description 22
- 229920002120 photoresistant polymer Polymers 0.000 description 14
- 239000002019 doping agent Substances 0.000 description 6
- 238000002955 isolation Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0821—Collector regions of bipolar transistors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0641—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region without components of the field effect type
- H01L27/0647—Bipolar transistors in combination with diodes, or capacitors, or resistors, e.g. vertical bipolar transistor and bipolar lateral transistor and resistor
- H01L27/0652—Vertical bipolar transistor in combination with diodes, or capacitors, or resistors
- H01L27/0664—Vertical bipolar transistor in combination with diodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66234—Bipolar junction transistors [BJT]
- H01L29/66272—Silicon vertical transistors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/732—Vertical transistors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
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- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Light Receiving Elements (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
Description
第6感光膜パターン286を除去する。
202 第1コレクタ領域
210 第2エピ層
212 第1コレクタ連結領域
214 エミッタ領域
220 第3エピ層
222 第2コレクタ連結領域
225 第2コレクタ領域
226 エミッタコンタクト領域
228 ベースコンタクト領域
252 赤色フォトダイオード領域
254 第1プラグ
256 緑色フォトダイオード領域
258 第2プラグ
259 青色フォトダイオード領域
260 STI(shallow trench isolation)
Claims (5)
- 第1エピ層に形成された第1コレクタ領域と、
第3エピ層に形成された第2コレクタ領域と、
第2エピ層に形成され、前記第1コレクタ領域と第2コレクタ領域との間に位置するエミッタ領域と、
前記第1コレクタ領域と前記エミッタ領域との間、および前記第2コレクタ領域と前記エミッタ領域との間に形成されたベース領域と、
前記エミッタ領域に接続された第1導電型のエミッタコンタクト領域と、
前記第1コレクタ領域および前記第2コレクタ領域に接続された第1導電型のコレクタコンタクト領域と、
前記ベース領域に接続された第2導電型のベースコンタクト領域と、
を備え、
前記第1導電型のエミッタコンタクト領域、前記第1導電型のコレクタコンタクト領域および前記第2導電型のベースコンタクト領域がそれぞれ前記第3エピ層に形成され、
前記エミッタ領域と前記第1導電型のエミッタコンタクト領域とが前記第3エピ層に形成されたエミッタ連結領域によって接続され、
前記第1コレクタ領域と前記第1導電型のコレクタコンタクト領域とが前記第2エピ層に形成された第1コレクタ連結領域及び前記第3エピ層に形成され、前記第1コレクタ連結領域に連結された第2コレクタ領域連結領域によって接続されており、前記第2コレクタ領域と前記第1導電型のコレクタコンタクト領域とが、前記第3エピ層に形成された第2コレクタ領域連結領域によって接続されており、
前記ベース領域と前記第2導電型のベースコンタクト領域とが、前記第3エピ層を介して接続されている垂直型バイポーラ接合トランジスタ。 - 前記第1コレクタ領域、エミッタ領域、及び第2コレクタ領域は第1導電型からなり、前記ベース領域は第2導電型からなることを特徴とする請求項1記載の垂直型バイポーラ接合トランジスタ。
- 前記第1導電型はN型イオンが注入され、前記第2導電型はP型イオンが注入されたことを特徴とする請求項2記載の垂直型バイポーラ接合トランジスタ。
- 前記第1コレクタ領域と第2コレクタ領域は、第1導電型のコレクタ連結領域に連結されたことを特徴とする請求項1記載の垂直型バイポーラ接合トランジスタ。
- 前記第1コレクタ領域、エミッタ領域、及び第2コレクタ領域は、基板に対して垂直な方向に重畳して形成されたことを特徴とする請求項1記載の垂直型バイポーラ接合トランジスタ。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2006-0079322 | 2006-08-22 | ||
KR1020060079322A KR100812079B1 (ko) | 2006-08-22 | 2006-08-22 | 수직형 바이폴라 접합 트랜지스터 및 그 제조 방법, 이를갖는 씨모스 이미지 센서 및 그 제조 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008053721A JP2008053721A (ja) | 2008-03-06 |
JP5000426B2 true JP5000426B2 (ja) | 2012-08-15 |
Family
ID=39078985
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007214931A Expired - Fee Related JP5000426B2 (ja) | 2006-08-22 | 2007-08-21 | 垂直型バイポーラ接合トランジスタ及びその製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7728408B2 (ja) |
JP (1) | JP5000426B2 (ja) |
KR (1) | KR100812079B1 (ja) |
CN (1) | CN101132021B (ja) |
DE (1) | DE102007038152B4 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5428479B2 (ja) * | 2009-04-13 | 2014-02-26 | ソニー株式会社 | 固体撮像装置の製造方法、固体撮像装置、および電子機器 |
DE102010005715B4 (de) * | 2010-01-26 | 2016-10-20 | Austriamicrosystems Ag | Transistoranordnung als ESD-Schutzmaßnahme |
US9236458B2 (en) * | 2013-07-11 | 2016-01-12 | Infineon Technologies Ag | Bipolar transistor and a method for manufacturing a bipolar transistor |
US10020386B1 (en) * | 2017-03-09 | 2018-07-10 | Globalfoundries Inc. | High-voltage and analog bipolar devices |
CN110137196B (zh) * | 2019-05-22 | 2021-03-23 | 德淮半导体有限公司 | 图像传感器及其形成方法 |
US20230098450A1 (en) * | 2021-09-29 | 2023-03-30 | Owl Autonomous Imaging, Inc. | Methods and systems for a photon detecting structure and device using colloidal quantum dots |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3104910B2 (ja) * | 1989-12-14 | 2000-10-30 | ソニー株式会社 | バイポーラトランジスタ |
US5243207A (en) * | 1991-03-15 | 1993-09-07 | Texas Instruments Incorporated | Method to integrate HBTs and FETs |
TW260816B (ja) * | 1991-12-16 | 1995-10-21 | Philips Nv | |
US5252849A (en) * | 1992-03-02 | 1993-10-12 | Motorola, Inc. | Transistor useful for further vertical integration and method of formation |
JPH08153800A (ja) * | 1994-11-29 | 1996-06-11 | Rohm Co Ltd | 半導体集積回路装置 |
JPH10163108A (ja) | 1996-11-29 | 1998-06-19 | Sony Corp | 共存集積回路および製造方法 |
JP3075204B2 (ja) * | 1997-02-28 | 2000-08-14 | 日本電気株式会社 | 半導体装置の製造方法 |
KR100618789B1 (ko) * | 1999-07-30 | 2006-09-06 | 삼성전자주식회사 | 소이 구조의 씨모스와 수직형 바이폴라 트랜지스터를 갖는 바이씨모스 |
JP2003258216A (ja) | 2002-02-27 | 2003-09-12 | Sanyo Electric Co Ltd | 光半導体集積回路装置の製造方法 |
JP4489366B2 (ja) * | 2003-03-17 | 2010-06-23 | 株式会社日立製作所 | 半導体装置 |
US7247926B2 (en) * | 2003-12-09 | 2007-07-24 | Infineon Technologies Ag | High-frequency switching transistor |
KR20060010665A (ko) | 2004-07-28 | 2006-02-02 | 주식회사 케이이씨 | 종방향 트랜지스터 |
JP2006210494A (ja) * | 2005-01-26 | 2006-08-10 | Matsushita Electric Ind Co Ltd | 光半導体装置 |
DE102005009725A1 (de) * | 2005-03-03 | 2006-09-07 | Atmel Germany Gmbh | Verfahren zur Integration von zwei Bipolartransistoren in einen Halbleiterkörper, Halbleiteranordnung in einem Halbleiterkörper und Kaskodenschaltung |
US7285469B2 (en) * | 2005-09-02 | 2007-10-23 | Intersil Americas | Bipolar method and structure having improved BVCEO/RCS trade-off made with depletable collector columns |
-
2006
- 2006-08-22 KR KR1020060079322A patent/KR100812079B1/ko active IP Right Grant
-
2007
- 2007-08-13 DE DE102007038152A patent/DE102007038152B4/de not_active Expired - Fee Related
- 2007-08-20 US US11/841,032 patent/US7728408B2/en active Active
- 2007-08-21 JP JP2007214931A patent/JP5000426B2/ja not_active Expired - Fee Related
- 2007-08-22 CN CN2007101424025A patent/CN101132021B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE102007038152B4 (de) | 2013-07-04 |
KR20080017743A (ko) | 2008-02-27 |
CN101132021A (zh) | 2008-02-27 |
US20080048296A1 (en) | 2008-02-28 |
US7728408B2 (en) | 2010-06-01 |
CN101132021B (zh) | 2010-06-02 |
DE102007038152A1 (de) | 2008-03-20 |
JP2008053721A (ja) | 2008-03-06 |
KR100812079B1 (ko) | 2008-03-07 |
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