JP4987416B2 - 中性粒子ビーム発生装置 - Google Patents

中性粒子ビーム発生装置 Download PDF

Info

Publication number
JP4987416B2
JP4987416B2 JP2006277247A JP2006277247A JP4987416B2 JP 4987416 B2 JP4987416 B2 JP 4987416B2 JP 2006277247 A JP2006277247 A JP 2006277247A JP 2006277247 A JP2006277247 A JP 2006277247A JP 4987416 B2 JP4987416 B2 JP 4987416B2
Authority
JP
Japan
Prior art keywords
ion
particles
neutral particle
electric field
deflectors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006277247A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008096239A (ja
JP2008096239A5 (https=
Inventor
憲司 梅澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Metropolitan University
Original Assignee
Osaka Prefecture University PUC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Prefecture University PUC filed Critical Osaka Prefecture University PUC
Priority to JP2006277247A priority Critical patent/JP4987416B2/ja
Publication of JP2008096239A publication Critical patent/JP2008096239A/ja
Publication of JP2008096239A5 publication Critical patent/JP2008096239A5/ja
Application granted granted Critical
Publication of JP4987416B2 publication Critical patent/JP4987416B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Particle Accelerators (AREA)
  • Drying Of Semiconductors (AREA)
JP2006277247A 2006-10-11 2006-10-11 中性粒子ビーム発生装置 Expired - Fee Related JP4987416B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006277247A JP4987416B2 (ja) 2006-10-11 2006-10-11 中性粒子ビーム発生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006277247A JP4987416B2 (ja) 2006-10-11 2006-10-11 中性粒子ビーム発生装置

Publications (3)

Publication Number Publication Date
JP2008096239A JP2008096239A (ja) 2008-04-24
JP2008096239A5 JP2008096239A5 (https=) 2009-11-26
JP4987416B2 true JP4987416B2 (ja) 2012-07-25

Family

ID=39379235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006277247A Expired - Fee Related JP4987416B2 (ja) 2006-10-11 2006-10-11 中性粒子ビーム発生装置

Country Status (1)

Country Link
JP (1) JP4987416B2 (https=)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63318058A (ja) * 1987-06-22 1988-12-26 Hitachi Ltd 中性ビ−ム形成方法
JPH0637564Y2 (ja) * 1989-03-07 1994-09-28 株式会社島津製作所 中性粒子散乱分析装置
JP3124353B2 (ja) * 1992-01-10 2001-01-15 沖電気工業株式会社 中性粒子の発生方法及びその装置
JP4647272B2 (ja) * 2004-09-21 2011-03-09 富士通株式会社 電子ビーム描画装置

Also Published As

Publication number Publication date
JP2008096239A (ja) 2008-04-24

Similar Documents

Publication Publication Date Title
JP6563166B2 (ja) Ｆｉｂおよび／または電子顕微鏡とともに使用するデュアル・レーザ・ビーム・システム
JP5498655B2 (ja) クラスタ源を使用する荷電粒子ビーム処理
Karmakar et al. Collimated attosecond GeV electron bunches from ionization of high-Z material by radially polarized ultra-relativistic laser pulses
CN101563760B (zh) 利用气体团簇离子束的固体表面平坦化方法及固体表面平坦化设备
JP2003158099A5 (https=)
Gutser et al. Negative hydrogen ion transport in RF-driven ion sources for ITER NBI
JP7369835B2 (ja) 中性原子ビームを使用した被加工物処理のためのシステムおよび方法
WO2003030240A3 (en) Etching method and apparatus
CN101536616A (zh) 采用射频四极线性加速器引入用于半导体材料的粒子的设备和方法
Van der Velden et al. Particle-in-cell Monte Carlo simulations of an extreme ultraviolet radiation driven plasma
JP4987416B2 (ja) 中性粒子ビーム発生装置
US5708267A (en) Processing method using fast atom beam
JP2010118648A (ja) 基板処理装置およびそのクリーニング方法
JP5246474B2 (ja) ミリング装置及びミリング方法
KR20230160820A (ko) 플라즈마 공정을 위한 고속 중성자 생성
JP2002289582A (ja) 中性粒子ビーム処理装置
JP4866749B2 (ja) 表面分析装置
Alkemade et al. Deposition, milling, and etching with a focused helium ion beam
Elg Removal of tin from exterme ultraviolet collector optics by an in-situ hydrogen plasma
KR20090082825A (ko) 집속이온빔을 이용한 나노패턴 형성방법
Gerhard et al. Plasma-enhanced laser materials processing
KR20210128508A (ko) 저압 저 바이어스 중수소 (deuterium) 플라즈마를 사용한 선택적인 실리콘 이산화물 제거
JP2007207913A (ja) パターン付ガラス基板の製造方法および装置
RU2205469C1 (ru) Способ получения объемной проводящей структуры
JP2011003357A (ja) ガスクラスターイオンビーム加工装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091013

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20091013

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20110916

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120116

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120124

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120323

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120417

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120425

R150 Certificate of patent or registration of utility model

Ref document number: 4987416

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150511

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees