JP4866749B2 - 表面分析装置 - Google Patents
表面分析装置 Download PDFInfo
- Publication number
- JP4866749B2 JP4866749B2 JP2007016345A JP2007016345A JP4866749B2 JP 4866749 B2 JP4866749 B2 JP 4866749B2 JP 2007016345 A JP2007016345 A JP 2007016345A JP 2007016345 A JP2007016345 A JP 2007016345A JP 4866749 B2 JP4866749 B2 JP 4866749B2
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- JP
- Japan
- Prior art keywords
- particles
- neutral
- ion
- incident
- particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002245 particle Substances 0.000 claims description 99
- 230000007935 neutral effect Effects 0.000 claims description 50
- 238000004458 analytical method Methods 0.000 claims description 27
- 238000005211 surface analysis Methods 0.000 claims description 18
- 238000001514 detection method Methods 0.000 claims description 13
- 238000010884 ion-beam technique Methods 0.000 claims description 13
- 230000003472 neutralizing effect Effects 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims 1
- 150000002500 ions Chemical class 0.000 description 49
- 239000000523 sample Substances 0.000 description 28
- 125000004429 atom Chemical group 0.000 description 24
- 238000000034 method Methods 0.000 description 14
- 230000005684 electric field Effects 0.000 description 13
- 239000007789 gas Substances 0.000 description 13
- 238000010586 diagram Methods 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 239000012212 insulator Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000003993 interaction Effects 0.000 description 3
- 239000002052 molecular layer Substances 0.000 description 3
- 229910052754 neon Inorganic materials 0.000 description 3
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000538 analytical sample Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Description
2 イオン源
3 パルス化手段
4 多価イオン除去装置
5 中性粒子生成手段
6 除去手段
7 照射手段
8 保持部
9 ガス供給源
10 分析試料
11 検出手段
12 増幅器
13 解析用コンピュータ
14 駆動装置
Claims (4)
- プラズマを生成し、イオン粒子を放出するイオン源と、
イオンビームをパルス化するパルス化手段と、
前記イオンビームから多価イオン粒子を除去する多価イオン粒子除去手段と、
イオン粒子を中性化して中性粒子を生成する中性粒子生成手段と、
前記中性粒子生成手段により生成された中性粒子に含まれる他の粒子を除去する除去手段と、
前記他の粒子が除去された中性粒子ビームを分析試料の表面に入射させる中性粒子入射手段と、
前記分析試料の表面から散乱された前記中性粒子あるいは前記分析試料から放出される原子を検出する検出手段と
を備える表面分析装置。 - 前記パルス化手段は、2組のディフレクタで構成されている、請求項1に記載の表面分析装置。
- 前記中性粒子が希ガスである請求項1または2に記載の表面分析装置。
- 前記中性ビーム粒子の入射速度が3keV以下である請求項1ないし3のいずれかに基材の表面分析装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007016345A JP4866749B2 (ja) | 2007-01-26 | 2007-01-26 | 表面分析装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007016345A JP4866749B2 (ja) | 2007-01-26 | 2007-01-26 | 表面分析装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008185336A JP2008185336A (ja) | 2008-08-14 |
JP4866749B2 true JP4866749B2 (ja) | 2012-02-01 |
Family
ID=39728498
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007016345A Active JP4866749B2 (ja) | 2007-01-26 | 2007-01-26 | 表面分析装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4866749B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5896708B2 (ja) * | 2011-12-06 | 2016-03-30 | 株式会社日立ハイテクノロジーズ | 走査イオン顕微鏡および二次粒子制御方法 |
-
2007
- 2007-01-26 JP JP2007016345A patent/JP4866749B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2008185336A (ja) | 2008-08-14 |
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