JP2008096239A5 - - Google Patents

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Publication number
JP2008096239A5
JP2008096239A5 JP2006277247A JP2006277247A JP2008096239A5 JP 2008096239 A5 JP2008096239 A5 JP 2008096239A5 JP 2006277247 A JP2006277247 A JP 2006277247A JP 2006277247 A JP2006277247 A JP 2006277247A JP 2008096239 A5 JP2008096239 A5 JP 2008096239A5
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JP
Japan
Prior art keywords
particles
deflectors
electric field
ion
neutral
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JP2006277247A
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English (en)
Japanese (ja)
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JP4987416B2 (ja
JP2008096239A (ja
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Priority to JP2006277247A priority Critical patent/JP4987416B2/ja
Priority claimed from JP2006277247A external-priority patent/JP4987416B2/ja
Publication of JP2008096239A publication Critical patent/JP2008096239A/ja
Publication of JP2008096239A5 publication Critical patent/JP2008096239A5/ja
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Publication of JP4987416B2 publication Critical patent/JP4987416B2/ja
Expired - Fee Related legal-status Critical Current
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JP2006277247A 2006-10-11 2006-10-11 中性粒子ビーム発生装置 Expired - Fee Related JP4987416B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006277247A JP4987416B2 (ja) 2006-10-11 2006-10-11 中性粒子ビーム発生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006277247A JP4987416B2 (ja) 2006-10-11 2006-10-11 中性粒子ビーム発生装置

Publications (3)

Publication Number Publication Date
JP2008096239A JP2008096239A (ja) 2008-04-24
JP2008096239A5 true JP2008096239A5 (https=) 2009-11-26
JP4987416B2 JP4987416B2 (ja) 2012-07-25

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ID=39379235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006277247A Expired - Fee Related JP4987416B2 (ja) 2006-10-11 2006-10-11 中性粒子ビーム発生装置

Country Status (1)

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JP (1) JP4987416B2 (https=)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63318058A (ja) * 1987-06-22 1988-12-26 Hitachi Ltd 中性ビ−ム形成方法
JPH0637564Y2 (ja) * 1989-03-07 1994-09-28 株式会社島津製作所 中性粒子散乱分析装置
JP3124353B2 (ja) * 1992-01-10 2001-01-15 沖電気工業株式会社 中性粒子の発生方法及びその装置
JP4647272B2 (ja) * 2004-09-21 2011-03-09 富士通株式会社 電子ビーム描画装置

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