JP4962780B2 - ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置 - Google Patents

ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置 Download PDF

Info

Publication number
JP4962780B2
JP4962780B2 JP2007178864A JP2007178864A JP4962780B2 JP 4962780 B2 JP4962780 B2 JP 4962780B2 JP 2007178864 A JP2007178864 A JP 2007178864A JP 2007178864 A JP2007178864 A JP 2007178864A JP 4962780 B2 JP4962780 B2 JP 4962780B2
Authority
JP
Japan
Prior art keywords
movable
movable table
axis
base
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007178864A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009016680A5 (enExample
JP2009016680A (ja
Inventor
智 村上
政彦 龍
智弘 松尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yaskawa Electric Corp
Original Assignee
Yaskawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yaskawa Electric Corp filed Critical Yaskawa Electric Corp
Priority to JP2007178864A priority Critical patent/JP4962780B2/ja
Publication of JP2009016680A publication Critical patent/JP2009016680A/ja
Publication of JP2009016680A5 publication Critical patent/JP2009016680A5/ja
Application granted granted Critical
Publication of JP4962780B2 publication Critical patent/JP4962780B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2007178864A 2007-07-06 2007-07-06 ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置 Expired - Fee Related JP4962780B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007178864A JP4962780B2 (ja) 2007-07-06 2007-07-06 ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007178864A JP4962780B2 (ja) 2007-07-06 2007-07-06 ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置

Publications (3)

Publication Number Publication Date
JP2009016680A JP2009016680A (ja) 2009-01-22
JP2009016680A5 JP2009016680A5 (enExample) 2011-06-16
JP4962780B2 true JP4962780B2 (ja) 2012-06-27

Family

ID=40357207

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007178864A Expired - Fee Related JP4962780B2 (ja) 2007-07-06 2007-07-06 ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置

Country Status (1)

Country Link
JP (1) JP4962780B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9366975B2 (en) 2013-01-23 2016-06-14 Samsung Display Co., Ltd. Stage transferring device and position measuring method thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110631519B (zh) * 2019-09-29 2024-08-13 东莞市华盛鑫精密制造有限公司 一种太阳能晶柱的平整度垂直度检测设备及检测方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3011813B2 (ja) * 1992-02-24 2000-02-21 キヤノン株式会社 移動ステージ
JP2000232061A (ja) * 1999-02-12 2000-08-22 Nikon Corp 露光装置及び方法
JP2000286189A (ja) * 1999-03-31 2000-10-13 Nikon Corp 露光装置および露光方法ならびにデバイス製造方法
JP4078485B2 (ja) * 2002-10-31 2008-04-23 株式会社ニコン 露光装置、ステージ装置、及びステージ装置の制御方法
JP2004228473A (ja) * 2003-01-27 2004-08-12 Canon Inc 移動ステージ装置
JP4487168B2 (ja) * 2003-05-09 2010-06-23 株式会社ニコン ステージ装置及びその駆動方法、並びに露光装置
JP2005011914A (ja) * 2003-06-18 2005-01-13 Canon Inc 反射型マスクおよび露光装置
JP4393150B2 (ja) * 2003-10-01 2010-01-06 キヤノン株式会社 露光装置
JP2005150527A (ja) * 2003-11-18 2005-06-09 Canon Inc 保持装置、それを用いた露光装置およびデバイス製造方法
JP2006253572A (ja) * 2005-03-14 2006-09-21 Nikon Corp ステージ装置、露光装置、及びデバイス製造方法
JP4699071B2 (ja) * 2005-04-01 2011-06-08 株式会社安川電機 ステージ装置およびその露光装置
JP2007053244A (ja) * 2005-08-18 2007-03-01 Yaskawa Electric Corp ステージ装置およびその露光装置
JP4594841B2 (ja) * 2005-10-12 2010-12-08 住友重機械工業株式会社 ステージ装置及びその制御方法
WO2008038752A1 (en) * 2006-09-29 2008-04-03 Nikon Corporation Mobile unit system, pattern forming device, exposing device, exposing method, and device manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9366975B2 (en) 2013-01-23 2016-06-14 Samsung Display Co., Ltd. Stage transferring device and position measuring method thereof

Also Published As

Publication number Publication date
JP2009016680A (ja) 2009-01-22

Similar Documents

Publication Publication Date Title
KR100818581B1 (ko) 스테이지 장치
TWI503633B (zh) 曝光裝置及裝置製造方法
KR102163139B1 (ko) 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
US11049687B2 (en) Stage apparatus and charged particle beam apparatus
KR102676391B1 (ko) 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법
KR20120055574A (ko) 물체 이동 장치, 물체 처리 장치, 노광 장치, 물체 검사 장치 및 디바이스 제조 방법
KR20120053020A (ko) 물체 처리 장치, 노광 장치 및 노광 방법, 및 디바이스 제조 방법
KR20120091159A (ko) 노광 장치 및 디바이스 제조 방법
KR20120091158A (ko) 노광 장치, 노광 방법, 및 디바이스 제조 방법
JP4962779B2 (ja) ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置
KR102775256B1 (ko) 노광 장치 및 노광 방법, 그리고 플랫 패널 디스플레이 제조 방법
KR20120091160A (ko) 노광 장치, 노광 방법, 및 디바이스 제조 방법
TWI502284B (zh) 移動體裝置、曝光裝置及裝置製造方法
KR102022788B1 (ko) 노광 장치 및 디바이스 제조 방법
KR102320293B1 (ko) 이동체 장치, 이동 방법, 노광 장치, 노광 방법, 플랫 패널 디스플레이의 제조 방법, 그리고 디바이스 제조 방법
KR20180059864A (ko) 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법, 그리고 계측 방법
JP4962780B2 (ja) ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置
JP2001116867A (ja) Ｘｙステージ
JP2003022959A (ja) ステージ装置
JP2007053244A (ja) ステージ装置およびその露光装置
JP4699071B2 (ja) ステージ装置およびその露光装置
JP2009016679A (ja) ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置
JP6662089B2 (ja) ステージ装置
JP2010266330A (ja) 平面モータ
US20250355369A1 (en) Mark measurement method, measurement device, lithography device, calculator, and storage medium

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20091020

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110426

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20111114

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20111116

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120110

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120301

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120314

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150406

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees