JP4942385B2 - Soaking equipment - Google Patents

Soaking equipment Download PDF

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JP4942385B2
JP4942385B2 JP2006121014A JP2006121014A JP4942385B2 JP 4942385 B2 JP4942385 B2 JP 4942385B2 JP 2006121014 A JP2006121014 A JP 2006121014A JP 2006121014 A JP2006121014 A JP 2006121014A JP 4942385 B2 JP4942385 B2 JP 4942385B2
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pipe
plate
shaped
heat
serpentine
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JP2007294688A (en
JP2007294688A5 (en
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久明 山蔭
猛 舩引
淳一 宇野
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Toshiba Mitsubishi Electric Industrial Systems Corp
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Priority to KR1020060130391A priority patent/KR100841830B1/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Resistance Heating (AREA)

Description

この発明は、例えば半導体ウェハや液晶ガラス基板等の熱処理対象物を熱処理する均熱処理装置に関する。   The present invention relates to a soaking apparatus for heat-treating an object to be heat-treated such as a semiconductor wafer or a liquid crystal glass substrate.

半導体装置あるいは液晶表示装置等の製造工程の中には、半導体ウェハや液晶ガラス基板の水分を除去するための乾燥工程、フォトレジストを塗布した後に行われるフォトレジスト膜の乾燥工程、フォトレジスト膜に対して露光処理を施した後に行われる加熱工程、現像処理を施した後に行われる乾燥工程などの種々の熱処理工程があるが、何れの熱処理工程でも、基板等を所定の温度に保持するために熱処理装置が用いられている。   In the manufacturing process of a semiconductor device or a liquid crystal display device, a drying process for removing moisture from a semiconductor wafer or a liquid crystal glass substrate, a photoresist film drying process performed after applying a photoresist, a photoresist film There are various heat treatment processes such as a heating process performed after the exposure process and a drying process performed after the development process. In any of the heat treatment processes, in order to maintain the substrate at a predetermined temperature. A heat treatment apparatus is used.

従来、このような熱処理装置としては、幾つかの構成のものが提案されている。
その1つの熱処理装置としては、図6に示すよう熱処理プレートを用いた例である。なお、図6(a)は熱処理プレートの平面図、同図(b)は同図(a)に示すA−A矢視断面図である。この熱処理プレートは、長方形状のベースプレート51上に面状ヒータ52、熱処理プレート53の順序で積層したメイン部54と、このメイン部54の上面に着脱可能に設定された分割プレート55A,55Bからなるサブプレート55とが設けられ、各分割プレート55A,55B上にはスペーサの役割を果す複数のプロキシミティ・ボール56,…が配列されている。複数のプロキシミティ・ボール56,…上には熱処理対象物となる基板等57が載置されている(特許文献1)。
Conventionally, several heat treatment apparatuses have been proposed as such a heat treatment apparatus.
As an example of the heat treatment apparatus, a heat treatment plate as shown in FIG. 6 is used. 6A is a plan view of the heat treatment plate, and FIG. 6B is a cross-sectional view taken along the line AA shown in FIG. This heat treatment plate is composed of a main portion 54 laminated in the order of a planar heater 52 and a heat treatment plate 53 on a rectangular base plate 51, and divided plates 55A and 55B set to be detachable on the upper surface of the main portion 54. A sub-plate 55 is provided, and a plurality of proximity balls 56,... That serve as spacers are arranged on the respective divided plates 55A and 55B. On the plurality of proximity balls 56,..., A substrate or the like 57 to be heat treated is placed (Patent Document 1).

また、他の熱処理プレートとしては、特許文献1に図7に示すような構成のメイン部54が記載されている。メイン部54は、長方形状の中央分割部分54Aと、この中央分割部分54Aを取り囲むように配置されたコ字状の周縁分割部分54B,54Cとで構成される。各分割部分54A〜54Cの構成は省略しているが、図6と同様に上下方向にベースプレート、面状ヒータ及び熱処理プレートが積層される。   Further, as another heat treatment plate, Patent Document 1 describes a main portion 54 having a configuration as shown in FIG. The main portion 54 includes a rectangular central divided portion 54A and U-shaped peripheral divided portions 54B and 54C arranged so as to surround the central divided portion 54A. Although the configuration of each of the divided portions 54A to 54C is omitted, a base plate, a planar heater, and a heat treatment plate are stacked in the vertical direction as in FIG.

また、別の熱処理プレートとしては、図8に示すよう構成のものがある。
この熱処理プレートは、図8(a)に示す周辺面状ヒータ61と図8(b)に示す全域面状ヒータ62とを同図(c)に示すように積層すると共に、この積層体の下側に断熱材63を介して支持板64と加熱板65とによって挟み込んだ構成である。つまり、この熱処理プレートは、少なくとも2つの面状ヒータを積層した構成である。同図において、66,67は合成マイカ粉を加圧成形した面状体、68,69は蛇行形箔ヒータ、70,71はリード引出し部である(特許文献2)。
As another heat treatment plate, there is constituted as shown in FIG.
In this heat treatment plate, a peripheral sheet heater 61 shown in FIG. 8A and a whole area sheet heater 62 shown in FIG. 8B are laminated as shown in FIG. In this configuration, the support plate 64 and the heating plate 65 are sandwiched between the insulating plates 63 on the side. That is, this heat treatment plate has a structure in which at least two planar heaters are laminated. In the figure, reference numerals 66 and 67 denote planar bodies obtained by press-molding synthetic mica powder, 68 and 69 are meandering foil heaters, and 70 and 71 are lead lead portions (Patent Document 2).

ところで、微細加工を必要とする基板の熱処理工程においては、基板が面内で均一な温度で熱処理されることが求められているが、熱処理プレートの外周部に相当するプレート端面からの放熱量が大きくなるのが一般的である。その結果、熱処理プレートは、放熱の影響等を受けて温度低下傾向を示すことが多く、プレート端面部分の温度低下の対策が必要となる。   By the way, in the heat treatment process of a substrate that requires microfabrication, it is required that the substrate be heat-treated at a uniform temperature within the surface, but the amount of heat radiation from the plate end surface corresponding to the outer peripheral portion of the heat treatment plate is small. It is common to increase. As a result, the heat-treated plate often exhibits a temperature decrease tendency due to the influence of heat radiation or the like, and it is necessary to take measures against the temperature decrease of the plate end surface portion.

この方策としては、特許文献1に記載の熱処理プレートにおいては、略長方形状の中央分割部分54Aを取り囲むように分割された2つのコ字状の周縁分割部分54B,54Cを配置し、各分割部分54A,54B,54Cの温度を検出し、各プレート内部に積層された面状ヒータ(図6の符号52に相当する)の発熱量を制御し、熱処理プレートの表面を均熱化するなどの方策がとられている。   As this measure, in the heat treatment plate described in Patent Document 1, two U-shaped peripheral divided portions 54B and 54C divided so as to surround the substantially rectangular central divided portion 54A are arranged, and each divided portion is arranged. Measures such as detecting the temperatures of 54A, 54B and 54C, controlling the amount of heat generated by the planar heaters (corresponding to reference numeral 52 in FIG. 6) stacked inside each plate, and soaking the surface of the heat treatment plate Has been taken.

しかしながら、以上のような分割プレート54A〜54Cで構成した場合、各分割プレート54A〜54Cの結合部分で段差や隙間が生じ易くなり、結果として、熱伝導効率が悪くなり、返って全体の均一温度化に悪影響を及ぼすと共に、コスト及び信頼性の点で実用性に欠ける問題がある。   However, when the divided plates 54A to 54C are configured as described above, steps and gaps are likely to occur at the joint portions of the divided plates 54A to 54C. As a result, the heat conduction efficiency deteriorates and the entire uniform temperature is returned. In addition to adversely affecting the process, there are problems of lack of practicality in terms of cost and reliability.

また、特許文献2に記載の熱処理プレートは、プレート全面を均等に加熱する全域面状ヒータ62と、プレート周辺の温度を調整する周辺面状ヒータ61とを積層し、温度調整する構成である。   Further, the heat treatment plate described in Patent Document 2 has a configuration in which the entire surface planar heater 62 that uniformly heats the entire surface of the plate and the peripheral planar heater 61 that adjusts the temperature around the plate are stacked to adjust the temperature.

このような構成の熱処理プレートでは、プレート表面を均一化するヒータのパターンを得るには、特定の基板サイズに対して試作と温度分布の実測とを繰り返しながら最適化しなければならない問題がある。   In the heat treatment plate having such a configuration, in order to obtain a heater pattern that makes the plate surface uniform, there is a problem that optimization must be performed while repeating trial manufacture and measurement of temperature distribution for a specific substrate size.

また、このような面状ヒータを用いた熱処理プレートでは、通常,特定の基板サイズに対して均熱性を有するように調整されており、熱処理を行う基板のサイズが変更されたとき、変更された基板を均一に加熱できなくなるという問題点がある。   In addition, the heat treatment plate using such a planar heater is usually adjusted so as to have a thermal uniformity with respect to a specific substrate size, and is changed when the size of the substrate to be heat-treated is changed. There is a problem that the substrate cannot be heated uniformly.

さらに、面状ヒータを用いた熱処理プレートは、熱処理部分となるプレートとベース部分となるプレートとで面状ヒータを挟み込んで密着固定する必要がある。その結果、プレート全体の厚みが大きくなり、加熱板が大形化するため、所定時間内に所定の温度に昇温させるための面状ヒータの投入熱量が大きくなり、電力を無駄に消費する問題がある。   Furthermore, a heat treatment plate using a planar heater needs to be tightly fixed by sandwiching the planar heater between a plate serving as a heat treatment portion and a plate serving as a base portion. As a result, the thickness of the entire plate increases and the heating plate becomes larger, so that the amount of heat input to the planar heater for raising the temperature to a predetermined temperature within a predetermined time increases, and power is wasted. There is.

本発明は上記事情に鑑みてなされたもので、熱処理対象物を均一な温度分布を保ちつつ加熱可能とし、薄形で熱応答性が高く、熱処理対象物のサイズによって均熱特性が変化しないようにする均熱処理装置を提供することを目的とする。   The present invention has been made in view of the above circumstances, makes it possible to heat an object to be heat treated while maintaining a uniform temperature distribution, is thin and has high thermal responsiveness, and does not change soaking characteristics depending on the size of the object to be heat treated. An object of the present invention is to provide a soaking apparatus.

(1) 上記課題を解決するために、本発明は、内部に略等間隔で複数の並行孔または中空パイプが配列され、熱処理対象物を熱処理するプレートと、隣接する前記並行孔または前記中空パイプの端部がU字状またはU字管で結合されて水平な状態の蛇行状管路を形成する結合手段と、前記プレートの外部下方に設置され、前記蛇行状管路の一端となる入り口管下部方向に折り曲げられて上部に、当該蛇行状管路の他端となる出口管下部方向に折り曲げられて下部にそれぞれ接続され、前記蛇行状管路との間で単一の連通回路を形成する蒸発容器と、連通回路の内部を真空排気後に充填された所定量の作動液と、この蒸発容器内の作動液を加熱する加熱手段とを備え、加熱手段で加熱された作動液が蒸発した蒸気は、入り口管を経由して蛇行状管路に流入し、蒸気が蛇行状管路で凝縮された凝縮液は、出口管を経由して蒸発容器へ還流する均熱処理装置である。 (1) In order to solve the above-mentioned problem, the present invention includes a plate in which a plurality of parallel holes or hollow pipes are arranged at substantially equal intervals inside, a plate for heat-treating a heat treatment object, and the adjacent parallel holes or hollow pipes adjacent to each other. Coupling means for forming a meandering pipe line in a horizontal state by joining the ends of the pipe with a U-shape or a U-shaped pipe, and an inlet pipe that is installed outside the plate and serves as one end of the serpentine pipe line Is bent in the lower direction and the outlet pipe serving as the other end of the serpentine pipe is bent in the lower direction and connected to the lower part, and a single communication circuit is connected to the serpentine pipe. An evaporation container to be formed, a predetermined amount of hydraulic fluid filled after evacuating the inside of the communication circuit, and a heating means for heating the hydraulic fluid in the evaporation container, and the hydraulic fluid heated by the heating means evaporates Steam snakes through the inlet pipe The condensate in which the steam flows into the duct and the vapor is condensed in the meandering duct is a soaking apparatus that returns to the evaporation vessel via the outlet pipe .

なお、この(1)項に記載する構成は、前記各並行孔または前記各中空パイプの隣接する端部の接合部分となるU字状部またはU字管をプレート内部に収納する構成であってもよい。 In addition, the structure described in the item (1) is a structure in which a U-shaped part or a U-shaped tube serving as a joint portion between adjacent ends of the parallel holes or the hollow pipes is accommodated in the plate. Also good.

(2) 内部に略等間隔で複数の並行孔または中空パイプが配置され、熱処理対象物を熱処理するプレートと、隣接する2つの前記並行孔または前記中空パイプを組とし、各組の並行孔または前記中空パイプの一端部がU字状またはU字管で結合されて水平な状態のU字状管路を形成する結合手段と、前記プレートの外部下方に設置され、前記各組のU字状管路の一端となる入り口管下部方向に折り曲げられてそれぞれ上部に、前記各組のU字状管路の他端となる出口管下部方向に折り曲げられてそれぞれ下部に接続され、各組のU字状管路との間で連通回路を形成する蒸発容器と、連通回路の内部を真空排気後に充填された所定量の作動液と、この蒸発容器内の作動液を加熱する加熱手段とを備え、加熱手段で加熱された作動液が蒸発した蒸気は、入り口管を経由して蛇行状管路に流入し、蒸気が蛇行状管路で凝縮された凝縮液は、出口管を経由して蒸発容器へ還流する均熱処理装置である。 (2) A plurality of parallel holes or hollow pipes are arranged at approximately equal intervals inside, and a plate for heat-treating a heat treatment object and two adjacent parallel holes or hollow pipes as a set, each set of parallel holes or One end of the hollow pipe is connected by a U-shape or a U-shaped tube to form a horizontal U-shaped conduit, and installed in the lower part of the outside of the plate. An inlet pipe that is one end of the pipe is bent in the lower direction and is connected to the upper part, and an outlet pipe that is the other end of each set of U-shaped pipes is bent in the lower direction and connected to the lower part. An evaporation container that forms a communication circuit with the U-shaped pipe line, a predetermined amount of working fluid that is filled after the inside of the communication circuit is evacuated, and heating means that heats the working fluid in the evaporation container; The hydraulic fluid heated by the heating means evaporates The steam flows into the meandering pipe line via the inlet pipe , and the condensate obtained by condensing the vapor in the meandering pipe line is a soaking apparatus that returns to the evaporation vessel via the outlet pipe .

なお、この(2)項に記載する構成において、前記各組となる2つの並行孔または前記各中空パイプの一端部を接合したU字状部またはU字管をプレート内部に収納する構成であってもよい。   In the configuration described in the item (2), the U-shaped portion or the U-shaped tube obtained by joining the two parallel holes or the one end of each hollow pipe in each set is housed in the plate. May be.

(3) なお、前述した構成において、前記プレートの略投影面積内に入るように当該プレートの下部に前記蒸発容器を配置し、前記蛇行状管路または各組のU字状管路の一端となる入り口が前記蒸発容器の上部に、当該蛇行状管路または各組のU字状管路の他端となる出口が前記蒸発容器の下部にそれぞれ接続される構成であってもよい。 (3) In the configuration described above, the evaporation container is disposed below the plate so as to fall within the approximate projected area of the plate, and one end of the serpentine conduit or each set of U-shaped conduits becomes the entrance at the top of the evaporation vessel may be configured to exit the other end of the meandering line or each set of U-shaped conduit is Ru is connected to the lower part of the evaporating vessel.

本発明によれば、熱処理対象物を均一な温度分布を保ちつつ加熱でき、薄形で熱応答性が高く、熱処理対象物のサイズによって均熱特性が変化しない均熱処理装置を提供できる。   According to the present invention, it is possible to provide a soaking apparatus that can heat an object to be heat-treated while maintaining a uniform temperature distribution, is thin and has high heat responsiveness, and does not change the soaking characteristics depending on the size of the object to be heat-treated.

以下、本発明の実施形態について図面を参照して説明する。
(実施の形態1)
図1は本発明に係る均熱処理装置の実施の形態1を示す構成図である。同図(a)は平面図、同図(b)は側面図である。
同図において、1は熱処理対象物としての基板(例えば半導体ウェハ、液晶ガラス基板等)、2は熱伝導性の良好な材料,例えばアルミ材,銅材等で形成される熱処理用のプレートである。基板1は、プレート2の上部にわずかなギャップを介して載置されるが、図ではギャップを確保するためのスペーサは省略している。
Embodiments of the present invention will be described below with reference to the drawings.
(Embodiment 1)
FIG. 1 is a block diagram showing Embodiment 1 of a soaking apparatus according to the present invention. The figure (a) is a top view, The figure (b) is a side view.
In the figure, reference numeral 1 denotes a substrate as a heat treatment object (for example, a semiconductor wafer, a liquid crystal glass substrate, etc.), and 2 denotes a heat treatment plate formed of a material having good thermal conductivity, such as an aluminum material or a copper material . The substrate 1 is placed on the upper part of the plate 2 through a slight gap, but a spacer for securing the gap is omitted in the figure.

プレート2の内部には略等間隔で同一方向に整列するように複数の中空パイプ3,…が配列され、かつ、各中空パイプ3の両端部がプレート2両側面から適宜な長さ分だけ露出されている。プレート2は、中空パイプ3の外周部を十分に包囲する厚さを有し、全体的には四角形状の平面板体を構成する。   A plurality of hollow pipes 3,... Are arranged inside the plate 2 so as to be aligned in the same direction at substantially equal intervals, and both ends of each hollow pipe 3 are exposed by an appropriate length from both sides of the plate 2. Has been. The plate 2 has a thickness that sufficiently surrounds the outer peripheral portion of the hollow pipe 3, and constitutes a rectangular planar plate as a whole.

プレート2の図示右側端部においては、互いに隣接する中空パイプ3の両端部がU字管4aで接続されている。プレート2の図示左側端部においても、プレート2の図示右側端部とは中空パイプ一本分ずらして互いに隣接する中空パイプ3の両端部がU字管4bで接続されている。よって、複数の中空パイプ3,…はU字管4a,…及び4b,…を介して蛇行状管路を形成するとともに、当該蛇行状管路の両端部はプレート2の同じ側面,例えば図示左側端面から露出させている。   At the right end of the plate 2 in the figure, both ends of the hollow pipes 3 adjacent to each other are connected by a U-shaped tube 4a. Also at the left end of the plate 2 shown in the drawing, the both ends of the hollow pipes 3 adjacent to each other are shifted by one hollow pipe from the right end of the plate 2 shown in the drawing and are connected by U-shaped tubes 4b. Accordingly, the plurality of hollow pipes 3,... Form serpentine conduits via the U-shaped tubes 4a,... And 4b, and the both ends of the serpentine conduits are on the same side of the plate 2, for example, the left side in the figure. It is exposed from the end face.

これら中空パイプ3、…及びU字管4a,4bからなる蛇行状管路の一端部には入り口管5が接続され、当該蛇行状管路の他端部には出口管6が接続される。そして、蛇行状管路入り口管5及び出口管6はプレート2の外部に配置される蒸発容器7と接続される。すなわち、蛇行状管路の一端部から導出される入り口管5は、下部方向に折り曲げられて蒸発容器7の一端部側の真上に接続され、また蛇行状管路の他端部から導出される出口管6は、同じく下部方向に折り曲げられて蒸発容器7の蛇行状管路と向き合う面の下部側に接続され、蛇行状管路との間で単一の連通回路を形成している。 An inlet pipe 5 is connected to one end portion of the meandering pipe line composed of the hollow pipes 3,... And the U-shaped pipes 4a and 4b, and an outlet pipe 6 is connected to the other end part of the meandering pipe line. Then, the inlet pipe 5 and the outlet pipe 6 of the meandering pipe line are connected to an evaporation container 7 disposed outside the plate 2. That is, the inlet pipe 5 led out from one end of the serpentine pipe is bent downward and connected to the top of one end side of the evaporation container 7 and led out from the other end of the serpentine pipe. Similarly, the outlet pipe 6 is bent in the lower direction and connected to the lower side of the surface of the evaporation vessel 7 facing the serpentine pipe line to form a single communication circuit with the serpentine pipe line.

すなわち、均熱処理装置は、蒸発容器7の一端部−入り口管5−中空パイプ3−U字管4a−中空パイプ3−U字管4b−……−中空パイプ3−出口管6−蒸発容器7の他端部−蒸発容器7本体からなる単一の連通回路を形成している。   That is, the soaking apparatus is composed of one end of the evaporation vessel 7-an inlet tube 5-a hollow pipe 3-a U-shaped tube 4a-a hollow pipe 3-a U-shaped tube 4b-...-a hollow pipe 3-an outlet tube 6-an evaporation vessel 7 A single communication circuit comprising the other end portion of the-evaporating container 7 main body is formed.

蒸発容器7は、所定長さ,例えばプレート2の一側部の距離に相当する長さを有し、筒状体に形成されている。蒸発容器7は、プレート2の外部であって、プレート2下面部から多少下位となる位置にプレート2と並行に配置されている。   The evaporation container 7 has a predetermined length, for example, a length corresponding to the distance of one side of the plate 2 and is formed in a cylindrical body. The evaporation container 7 is arranged outside the plate 2 and in parallel with the plate 2 at a position slightly lower than the lower surface of the plate 2.

蒸発容器7は両端が気密に封止され、蒸発容器7内部には、長手方向に沿って加熱手段としてのヒータ8が内装され、真空排気後に所定量の作動液が充填されている。この実施の形態では、ヒータ8は作動液9の内部に浸漬された状態となっている。 Both ends of the evaporation container 7 are hermetically sealed, and a heater 8 serving as a heating unit is provided along the longitudinal direction inside the evaporation container 7 and is filled with a predetermined amount of working fluid 9 after evacuation. In this embodiment, the heater 8 is immersed in the working fluid 9.

次に、以上のように構成された均熱処理装置の動作について説明する。
蒸発容器7内部のヒータ8による発熱によって作動液9が蒸発し、その蒸気10は破線矢印に示すように蒸発容器7の上部と接続される入り口管5を経由してプレート2内部に設置される中空パイプ3に流入する。このとき、プレート2の温度は蒸発容器7の温度よりも低くなっているので、中空パイプ3内の蒸気10は中空パイプ3の内面で凝縮するが、中空パイプ3が単一の連通回路を形成しているので、蒸気10の圧力は連通回路の全体にわたってほぼ一様となる。その結果、中空パイプ3の内面各部において、等温で凝縮し、凝縮潜熱をプレート2に放出してプレート2の全面を一様に加熱する。
Next, the operation of the soaking apparatus configured as described above will be described.
The working fluid 9 evaporates due to the heat generated by the heater 8 inside the evaporation container 7, and the vapor 10 is installed inside the plate 2 via the inlet pipe 5 connected to the upper part of the evaporation container 7 as indicated by the broken line arrow. It flows into the hollow pipe 3. At this time, since the temperature of the plate 2 is lower than the temperature of the evaporation container 7, the vapor 10 in the hollow pipe 3 condenses on the inner surface of the hollow pipe 3, but the hollow pipe 3 forms a single communication circuit. As a result, the pressure of the steam 10 is substantially uniform throughout the communication circuit. As a result, each part of the inner surface of the hollow pipe 3 is condensed at an isothermal temperature, and the latent heat of condensation is discharged to the plate 2 to uniformly heat the entire surface of the plate 2.

すなわち、蒸気10は、中空パイプ3の内部で順次凝縮しながら、破線矢印10a〜10gの方向に順次流量を減少させながら移動する。それに伴って凝縮液11は中空パイプ3内部で実線矢印11a〜11dに示すように順次流量を増しながら連通回路内を移動する。   That is, the vapor 10 moves while decreasing the flow rate sequentially in the directions of the dashed arrows 10a to 10g while condensing sequentially inside the hollow pipe 3. Along with this, the condensate 11 moves in the communication circuit while increasing the flow rate sequentially inside the hollow pipe 3 as indicated by solid line arrows 11a to 11d.

このとき、プレート2の上部にはギャップを確保するためのスペーサを介して熱処理対象物である基板1が載置されている。ここでは、ギャップを確保するためのスペーサは省略している。なお、図中において、プレート2と基板1の間の矢印はプレート2から基板1への熱流を表している。 At this time, the substrate 1 which is a heat treatment object is placed on the upper part of the plate 2 through a spacer for securing a gap. Here, a spacer for securing the gap is omitted. In the figure, an arrow between the plate 2 and the substrate 1 represents a heat flow from the plate 2 to the substrate 1.

よって、中空パイプ3内を移動する凝縮された凝縮液11は、流量を増やしつつ、出口管6を経由して蒸発容器7の下部から蒸発容器7内部に自然に還流していく。   Therefore, the condensed condensate 11 moving in the hollow pipe 3 naturally recirculates from the lower part of the evaporation container 7 to the inside of the evaporation container 7 via the outlet pipe 6 while increasing the flow rate.

従って、以上のような実施の形態によれば、プレート2の内部の中空パイプ3,…で形成される蛇行状管路と蒸発容器7とを接続することによって単一の連通回路を形成し、かつ、蛇行状管路内を移動する蒸気10が、プレート2の全面に一様にゆきわたるようになり、蒸気10が蛇行状管路内で凝縮することによりプレート2全面を均一に加熱するように作用するので、プレート2上の基板1を均熱に加熱することができる。 Therefore, according to the embodiment as described above, a single communication circuit is formed by connecting the meandering conduit formed by the hollow pipes 3. In addition, the steam 10 moving in the serpentine pipe is uniformly distributed over the entire surface of the plate 2, and the steam 10 is condensed in the serpentine pipe so that the entire surface of the plate 2 is uniformly heated. Since it acts, the board | substrate 1 on the plate 2 can be heated to soaking | uniform-heating.

また、この均熱処理装置によれば、作動液9から蒸発された蒸気10の流れと凝縮液11の流れとが同一方向を向いているので、プレート2内の蛇行状管路が水平な状態にあっても、凝縮液11の蒸発容器7への還流がスムーズに行われる。その結果、蒸気10と凝縮液11とが対向して流れる単管状のヒートパイプのように、蒸気流により液戻りが阻害されるといった現象がなくなり、中空パイプ3を傾斜させる必要がなくなる。これにより、中空パイプ3が収納されるプレート2の肉厚を傾斜相当分だけ厚くする必要がなくなり、薄形化実現できる。よって、プレート2の薄形化に伴い、プレート2自体の良好な熱伝導性に加え、熱応答の良い均熱処理装置を実現できる。 Further, according to this soaking apparatus, the flow of the vapor 10 evaporated from the working fluid 9 and the flow of the condensate 11 are directed in the same direction, so that the meandering pipeline in the plate 2 is in a horizontal state. Even if it exists, recirculation | reflux of the condensate 11 to the evaporation container 7 is performed smoothly. As a result, unlike the single tubular heat pipe in which the steam 10 and the condensate 11 flow in opposition, the phenomenon that the liquid return is inhibited by the steam flow is eliminated, and the hollow pipe 3 need not be inclined. As a result, it is not necessary to increase the thickness of the plate 2 in which the hollow pipe 3 is accommodated by an amount corresponding to the inclination, and a reduction in thickness can be realized. Therefore, with the thinning of the plate 2, it is possible to realize a soaking process with good thermal response in addition to good thermal conductivity of the plate 2 itself.

さらに、プレート2の薄形化に伴い、プレート2の熱容量を低減でき、昇温時の加熱エネルギーを最小とすることができ、加熱源となる電力の節減を図ることができ、省エネ化を図ることができる。   Further, as the plate 2 is made thinner, the heat capacity of the plate 2 can be reduced, the heating energy at the time of temperature rise can be minimized, the power used as a heating source can be reduced, and the energy can be saved. be able to.

さらに、プレート2上に積載される基板1のサイズが変更されても、基板1の負荷状態に応じて、蛇行状管路内を移動する作動液9の蒸気が凝縮放熱するので、異なったサイズの基板1に対しても当該基板1を均熱状態で加熱することができる。   Further, even if the size of the substrate 1 loaded on the plate 2 is changed, the vapor of the working fluid 9 moving in the meandering conduit condenses and dissipates depending on the load state of the substrate 1, so that different sizes are available. The substrate 1 can also be heated in a soaking state.

(実施の形態2)
図2は本発明に係る均熱処理装置の実施の形態2を示す構成図である。同図(a)は平面図、同図(b)は側面図である。なお、同図において、図1と同一部分には同一符号を付してその説明を省略し、以下、特に異なる部分について説明する。
(Embodiment 2)
FIG. 2 is a block diagram showing Embodiment 2 of the soaking apparatus according to the present invention. The figure (a) is a top view, The figure (b) is a side view. In the figure, the same parts as those in FIG. 1 are denoted by the same reference numerals, and the description thereof is omitted. In the following, particularly different parts will be described.

実施の形態1では、プレート2内に収納した中空パイプ3の両端部をプレート2の外部に露出させ、隣接する中空パイプ3の端部である露出部分に互い違いに位置をずらしてU字管4a,4bを接続して蛇行状管路を形成した構成である。   In the first embodiment, both ends of the hollow pipe 3 housed in the plate 2 are exposed to the outside of the plate 2, and the U-tube 4a is alternately shifted to the exposed portion which is the end of the adjacent hollow pipe 3. , 4b are connected to form a meandering pipeline.

本実施の形態2では、隣接する中空パイプ3の端部である露出部分に互い違いに位置をずらしてU字管4a,4bを接続するが、各中空パイプ3の端部及びU字管4a,4bを含めて蛇行状管路の曲線部分を全てプレート2の内部に収納し、蛇行状管路の両端部だけをプレート2の同一の側面部から取り出すようにした構成である。   In the second embodiment, the U-shaped tubes 4a and 4b are connected to the exposed portions that are the ends of the adjacent hollow pipes 3 by alternately shifting the positions, but the ends of the hollow pipes 3 and the U-shaped tubes 4a, 4a, The curved portion of the meandering conduit including 4b is all housed in the plate 2, and only both end portions of the meandering conduit are taken out from the same side portion of the plate 2.

このような構成は、従来周知の例えば鋳込み方法或いは摩擦攪拌接合方法などによって、プレートの中に中空パイプ3及びU字管4a,4bからなる蛇行状管路を埋め込むことが可能である。 With such a configuration, it is possible to embed a meandering pipe line composed of the hollow pipe 3 and the U-shaped tubes 4a and 4b in the plate 2 by, for example, a conventionally known casting method or friction stir welding method.

なお、プレート2の同一側面部から引き出した蛇行状管路の両端部が入り口管5,出口管6を介して蒸発容器7と接続される点及び蒸発容器7自体の構成は実施の形態1と同様であるので、その説明を省略する。   Note that both ends of the meandering pipe drawn from the same side surface of the plate 2 are connected to the evaporation container 7 via the inlet pipe 5 and the outlet pipe 6 and the structure of the evaporation container 7 itself is the same as that of the first embodiment. Since it is the same, the description is abbreviate | omitted.

従って、以上のような実施の形態によれば、実施の形態1と同様の効果を奏する他、プレート2の内部に蛇行状管路のU字管4a,4bを収めることにより、プレート2外部への無駄な放熱が無くなり、プレート2の均熱性を高めると共に、基板1を有効に加熱でき、さらに省エネ化を図ることができる。   Therefore, according to the embodiment as described above, the same effects as those of the first embodiment can be obtained, and the U-shaped pipes 4a and 4b of the meandering pipes are accommodated inside the plate 2 so that the outside of the plate 2 is brought out. Thus, the heat dissipation of the plate 2 can be improved, the substrate 1 can be effectively heated, and further energy saving can be achieved.

また、プレート2の内部に蛇行状管路のU字管4a,4bを収めることにより、プレート2から外部へのはみ出し部分が無くなり、装置の小形化を図ることができる。   Further, by accommodating the U-shaped tubes 4a and 4b of the meandering pipes inside the plate 2, there is no protruding portion from the plate 2 to the outside, and the apparatus can be miniaturized.

実施の形態1,2では、隣接する中空パイプ3の端部をU字管4a,4bを用いて接続したが、隣接する中空パイプ3の各端部を互いにU字状に折り曲げて接続し一体化することにより、蛇行状管路を形成してもよい。   In the first and second embodiments, the ends of the adjacent hollow pipes 3 are connected using the U-shaped tubes 4a and 4b. However, the ends of the adjacent hollow pipes 3 are connected to each other by bending each other into a U shape. The meandering pipe line may be formed.

(実施の形態3)
図3は本発明に係る均熱処理装置の実施の形態3を示す構成図である。同図(a)は平面図、同図(b)は側面図である。なお、同図において、図1と同一部分には同一符号を付してその詳しい説明を省略し、以下、特に異なる部分について説明する。
(Embodiment 3)
FIG. 3 is a block diagram showing Embodiment 3 of the soaking apparatus according to the present invention. The figure (a) is a top view, The figure (b) is a side view. In the figure, the same parts as those in FIG. 1 are denoted by the same reference numerals, and detailed description thereof will be omitted. Hereinafter, particularly different parts will be described.

実施の形態1,2では、プレート2の内部に配列した全中空パイプ3,…が単一の蛇行状管路となるように形成したが、本実施の形態3では、プレート2の内部に等間隔で配列される中空パイプ3,…のうち、隣接する2本の中空パイプ3a−3a,3b−3b,3c−3c,3d−3dどうしを一組とし、各組ごとにプレート2の図示右側端部の外部露出部分にU字管4aを接続し、U字状管路を形成する。つまり、中空パイプ3a−3aとU字管4a、中空パイプ3b−3bとU字管4a、中空パイプ3c−3cとU字管4a、中空パイプ3d−3dとU字管4aとでそれぞれU字状管路を形成するものである。   In the first and second embodiments, all the hollow pipes 3,... Arranged inside the plate 2 are formed so as to form a single meandering pipe. However, in the third embodiment, the inside of the plate 2 is Among the hollow pipes 3,... Arranged at intervals, two adjacent hollow pipes 3a-3a, 3b-3b, 3c-3c, 3d-3d are set as a set, and the right side of the plate 2 is shown for each set. The U-shaped tube 4a is connected to the externally exposed portion of the end portion to form a U-shaped conduit. That is, the hollow pipe 3a-3a and the U-shaped tube 4a, the hollow pipe 3b-3b and the U-shaped tube 4a, the hollow pipe 3c-3c and the U-shaped tube 4a, and the hollow pipe 3d-3d and the U-shaped tube 4a are respectively U-shaped. Forming a pipe line.

さらに、各組のU字状管路の両端部となるプレート2の図示左側端部の外部露出部分にはそれぞれ入り口管5と出口管6が接続され、入り口管5は、実施の形態1と同様に下部方向に折り曲げて蒸発容器7の真上に接続し、出口管6は、実施の形態1と同様に下部方向に折り曲げて蒸発容器7のU字状管路と向き合う面の下部側面部に接続し、各U字状管路との間で連通回路を形成する。これにより、蒸発容器7とプレート2内の中空パイプ3,…との間では、複数組の連通回路が形成される。   Further, an inlet pipe 5 and an outlet pipe 6 are respectively connected to the externally exposed portions of the left end portion of the plate 2 as both ends of each set of U-shaped conduits, and the inlet pipe 5 is the same as that of the first embodiment. Similarly, it is bent in the lower direction and connected directly above the evaporation container 7, and the outlet pipe 6 is bent in the lower direction in the same manner as in the first embodiment, and the lower side surface portion of the surface facing the U-shaped pipe line of the evaporation container 7. And a communication circuit is formed between each U-shaped pipe line. Thereby, a plurality of sets of communication circuits are formed between the evaporation container 7 and the hollow pipes 3 in the plate 2.

従って、以上のような実施の形態によれば、実施の形態1と同様の効果の他、次のような効果を奏する。
実施の形態1では、蒸発容器7内部のヒータ8により発生する蒸気10が蛇行状管路の一端部に接続される入り口管5からプレート2内部に入っていくが、ヒータ8の加熱量が大きくなると、入り口管5での蒸気流速が速くなり、それに伴って蒸気圧損が大きくなって蒸発容器7内部の液面をヒータ8よりも押し下げ、ヒータ8を過熱させてしまうことがある。
Therefore, according to the above embodiment, in addition to the same effects as in the first embodiment, the following effects can be obtained.
In the first embodiment, the vapor 10 generated by the heater 8 inside the evaporation vessel 7 enters the inside of the plate 2 from the inlet pipe 5 connected to one end of the meandering pipe, but the heating amount of the heater 8 is large. As a result, the steam flow velocity in the inlet pipe 5 becomes faster, and accordingly, the steam pressure loss increases, and the liquid level inside the evaporation container 7 is pushed down below the heater 8 and the heater 8 may be overheated.

その点、本実施の形態3では、蒸発容器7内部のヒータ8により発生する蒸気10が全組のU字状管路の入り口管5,…から均等に分散して単一のプレート2内部に入っていくので、各入り口管5,…での蒸気流速を低減することが可能となる。その結果、ヒータ8の加熱量が増加したとしても、蒸気圧損の増大を抑えることができ、蒸発容器7の内部に充填された作動液9の液面を安定に保つことができる。よって、ヒータ8の投入熱量を増大させることが可能となり、プレート2の昇温速度を早めて所定の温度に設定することができる。   In this respect, in the third embodiment, the vapor 10 generated by the heater 8 inside the evaporation container 7 is evenly dispersed from the inlet pipes 5 of the U-shaped pipes of the entire set, and enters the single plate 2. Since it enters, it becomes possible to reduce the vapor | steam flow velocity in each inlet pipe 5, .... As a result, even if the heating amount of the heater 8 increases, an increase in vapor pressure loss can be suppressed, and the liquid level of the working fluid 9 filled in the evaporation container 7 can be kept stable. Therefore, it is possible to increase the amount of heat input to the heater 8, and the temperature increase rate of the plate 2 can be increased and set to a predetermined temperature.

(実施の形態4)
図4は本発明に係る均熱処理装置の実施の形態4を示す構成図である。同図(a)は平面図、同図(b)は側面図である。なお、同図において、図1,図3と同一部分には同一符号を付してその詳しい説明を省略し、以下、特に異なる部分について説明する。
(Embodiment 4)
FIG. 4 is a block diagram showing Embodiment 4 of the soaking apparatus according to the present invention. The figure (a) is a top view, The figure (b) is a side view. In the figure, the same parts as those in FIGS. 1 and 3 are denoted by the same reference numerals, and detailed description thereof is omitted. Hereinafter, particularly different parts will be described.

上記実施の形態3においては、隣接する各組の中空パイプ3a−3a、3b−3b,…をプレート内部に埋め込むと共に、各組の中空パイプ3a−3a、3b−3b,…の一方端部をそれぞれプレート2の外側に露出させ、この露出部分にU字管4aで接続することにより、U字状管路を形成したものである。 In the third embodiment, each set of adjacent hollow pipes 3a-3a, 3b-3b,... Is embedded in the plate 2 , and one end of each set of hollow pipes 3a-3a, 3b-3b,. Are exposed to the outside of the plate 2 and connected to the exposed portion with a U-shaped tube 4a to form a U-shaped conduit.

この実施の形態4では、実施の形態2と同様に、全てプレート2の内部に各組の中空パイプ3a−3a、3b−3b,…の一方端部及び当該一方端部に接続するU字管4aを収めると共に、これら中空パイプ3a−3a、3b−3b,…の他方端部だけをプレート2の外側に引き出す構成としてもよい。   In the fourth embodiment, as in the second embodiment, all ends of the hollow pipes 3a-3a, 3b-3b,. It is good also as a structure which accommodates 4a and pulls out only the other edge part of these hollow pipes 3a-3a, 3b-3b, ... to the outer side of the plate 2. FIG.

このような構成とすることにより、プレート2の外部へのパイプはみ出し部分が無くなるので、プレート2外部への無駄な放熱が無くなり、プレート2の均熱性を高めると共に、基板1を有効に加熱でき、さらに省エネ化を図ることができる。また、装置の占有スペースを少なくでき、装置の小形化を貢献する。   By adopting such a configuration, there is no projecting portion of the pipe to the outside of the plate 2, so there is no wasteful heat radiation to the outside of the plate 2, the heat uniformity of the plate 2 is improved, and the substrate 1 can be effectively heated, Furthermore, energy saving can be achieved. In addition, the space occupied by the device can be reduced, contributing to the downsizing of the device.

さらに、ヒータ8の発熱によって発生する蒸気10が全組のU字状管路の入り口管5,…から均等に分散してプレート2内部へ入り、循環移動するので、蒸気圧損の増大を抑えると共に、蒸発容器7の内部に充填された作動液9の液面を安定化に寄与し、ヒータ8の投入熱量を増大させることができ、プレート2の昇温速度を高めることができる。   Further, since the steam 10 generated by the heat generated by the heater 8 is uniformly dispersed from the inlet pipes 5,... Of the entire set of U-shaped pipes and enters the inside of the plate 2 and circulates, the increase in the steam pressure loss is suppressed. The liquid level of the working fluid 9 filled in the evaporation container 7 contributes to stabilization, the input heat amount of the heater 8 can be increased, and the temperature increase rate of the plate 2 can be increased.

なお、実施の形態3,4では、隣接する中空パイプ3の端部をU字管4aを用いて接続したが、隣接する中空パイプ3の各端部を互いにU字状に折り曲げて接続し一体化することにより、U字状管路を形成してもよい。   In the third and fourth embodiments, the end portions of the adjacent hollow pipes 3 are connected using the U-shaped tube 4a. However, the end portions of the adjacent hollow pipes 3 are connected to each other by bending each other into a U shape. By forming, a U-shaped pipe line may be formed.

(実施の形態5)
図5は本発明に係る均熱処理装置の実施の形態5を示す構成図である。同図(a)は平面図、同図(b)は側面図である。なお、同図において、図1〜図4と同一部分には同一符号を付し、その詳しい説明を省略する。
(Embodiment 5)
FIG. 5 is a block diagram showing Embodiment 5 of the soaking apparatus according to the present invention. The figure (a) is a top view, The figure (b) is a side view. In the figure, the same parts as those in FIGS. 1 to 4 are denoted by the same reference numerals, and detailed description thereof is omitted.

実施の形態1〜4は、蒸発容器7がプレート2の投影面積の外側に配置するように構成したが、例えば図5(b)に示すように蒸発容器7の略全部がプレート2の投影面積内で、かつ、プレート2の下部に位置するように配置した構成であってもよい。   The first to fourth embodiments are configured such that the evaporation container 7 is arranged outside the projected area of the plate 2. For example, as shown in FIG. It may be arranged so as to be located in the lower part of the plate 2.

この構成においても、複数の中空パイプ3とU字管4a,4bとからなる蛇行状管路の両端部又は隣接する組となる2本の中空パイプ3a−3a,3b−3b,…とU字管4aとからなるU字状管路の両端部を折り曲げ、プレート2の例えば図示左側端部近傍の下部面から露出するように取り出す。そして、蛇行状管路またはU字状管路の一端部を直接または入り口管5を介して蒸発容器7の真上に接続し、また蛇行状管路またはU字状管路の一端部に出口管6を介して蒸発容器7の下部に接続する。 Also in this configuration, two hollow pipes 3a-3a, 3b-3b,..., And a U-shape, which constitute a pair of adjacent ends of a meandering pipe line composed of a plurality of hollow pipes 3 and U-shaped pipes 4a, 4b. Both ends of the U-shaped pipe line composed of the pipe 4a are bent and taken out so as to be exposed from, for example, the lower surface of the plate 2 near the left end in the figure. Then, one end of the serpentine pipe or U-shaped pipe is connected directly or directly above the evaporation vessel 7 via the inlet pipe 5, and the outlet is connected to one end of the serpentine pipe or U-shaped pipe. It connects to the lower part of the evaporation container 7 through the pipe 6.

このような構成の実施の形態によれば、各実施の形態1〜4の何れかと同様の効果を奏する他、プレート2から外側へのパイプのはみ出しをさらに少なくでき、さらに装置の設置スペースを低減化できる。   According to the embodiment having such a configuration, the same effects as in any of the first to fourth embodiments can be obtained, and the protrusion of the pipe from the plate 2 to the outside can be further reduced, further reducing the installation space of the apparatus. Can be

また、蛇行状管路またはU字状管路の両端部に接続される入り口管5及び出口管6のプレート2からのはみ出し長さが短くなり、入り口管5及び出口管6から外部への放熱を抑えることができ、プレート2を効率的に加熱することができる。   Further, the length of protrusion of the inlet pipe 5 and outlet pipe 6 connected to both ends of the serpentine pipe or the U-shaped pipe from the plate 2 is shortened, and heat is radiated from the inlet pipe 5 and outlet pipe 6 to the outside. And the plate 2 can be efficiently heated.

なお、本発明は、上記実施の形態に限定されるものでなく、その要旨を逸脱しない範囲で種々変形して実施できる。   In addition, this invention is not limited to the said embodiment, In the range which does not deviate from the summary, various deformation | transformation can be implemented.

上記各実施の形態では、プレート2の内部に8本の中空パイプ3(3a,3b,3c,3dを含む)を収めたが、これらのパイプ本数は偶数本数であればよく、8本に限定するものではない。 In each of the above embodiments, eight hollow pipes 3 (including 3a, 3b, 3c, 3d) are housed in the plate 2, but the number of these pipes may be an even number, and is limited to eight. Not what you want.

また、実施の形態1及び3では、プレート2の内部に中空パイプ3(3a,3b,3c,3dを含む)を埋め込むような構成としたが、例えばプレート2の内部に中空パイプ3に相当する中空部を形成すると共に、中空部の端部に接続中継金具を埋め込み、各接続中継金具にU字管4a,4b、入り口管5及び出口管6等を接続してもよい。 In the first and third embodiments, the hollow pipe 3 (including 3a, 3b, 3c, and 3d) is embedded in the plate 2, but corresponds to the hollow pipe 3 in the plate 2, for example. While forming a hollow part, you may embed a connection relay metal fitting in the end of a hollow part, and connect U-shaped pipe 4a, 4b, entrance pipe 5, outlet pipe 6, etc. to each connection relay metal fitting.

また、蛇行状管路の一端部または各組のU字状管路の一端部に接続された入り口管5は蒸発容器7の真上に接続し、一方、蛇行状管路の他端部または各組のU字状管路の他端部に接続された出口管6は蛇行状管路またはU字状管路に向かい合う面の下部面に接続したが、入り口管5は蒸発容器7の上部であればよく、出口管6は蒸発容器7の下部であればよい。   The inlet pipe 5 connected to one end of the serpentine pipe or one end of each set of U-shaped pipes is connected directly above the evaporation vessel 7, while the other end of the serpentine pipe or The outlet pipe 6 connected to the other end of each pair of U-shaped pipes is connected to the lower surface of the surface facing the serpentine pipe or the U-shaped pipe, but the inlet pipe 5 is the upper part of the evaporation vessel 7. The outlet pipe 6 may be a lower part of the evaporation container 7.

上記実施の形態では、プレート2の内部に蛇行状管路またはU字状管路を収めたが、例えばプレート2の下面に蛇行状管路またはU字状管路を直接溶接付けまたはロウ付けなどによって接合するとか、或いはプレート2の下面に半円深さの蛇行状溝またはU字状溝を形成し、この半円深さの蛇行状溝またはU字状溝に蛇行状管路またはU字状管路を埋め込んで固定する方法などにより、単一の連通回路を構成するものでもよい。   In the above embodiment, the meandering pipe or U-shaped pipe is housed in the plate 2. For example, the meandering pipe or U-shaped pipe is directly welded or brazed to the lower surface of the plate 2. Or a serpentine groove or U-shaped groove having a semicircular depth is formed on the lower surface of the plate 2, and the serpentine duct or U-shaped groove is formed in the serpentine groove or U-shaped groove having a semicircular depth. A single communication circuit may be configured by a method of embedding and fixing the pipe line.

さらに、上記実施の形態では、蒸発容器7の内部にヒータ8等の加熱手段を配置し、作動液9を直接加熱するようにしたが、ヒータ8等の加熱手段を蒸発容器7の外部に接触させることにより、作動液9を加熱する構成であってもよく、この場合の加熱手段の種別としては、電熱式、温水加熱式、蒸気加熱式の何れであっても構わない。   Further, in the above embodiment, the heating means such as the heater 8 is disposed inside the evaporation container 7 and the working fluid 9 is directly heated. However, the heating means such as the heater 8 is in contact with the outside of the evaporation container 7. In this case, the type of the heating means may be any of an electric heating type, a hot water heating type, and a steam heating type.

さらに、上記実施の形態では、蛇行状管路で構成される単一の連通回路で構成したが、プレートサイズが大きくなってくるに伴い、1枚のプレート2の中に蛇行状管路で構成される複数の連通回路で構成される均熱処理装置としてもよい。   Furthermore, in the said embodiment, although comprised with the single communication circuit comprised by the serpentine pipe line, it comprised by the serpentine pipe line in one plate 2 as plate size became large. It is good also as a soaking | uniform-heating apparatus comprised with the some communication circuit made.

本発明に係る均熱処理装置の一実施の形態を示す構成図であって、同図(a)は平面図、同図(b)は側面図。It is a block diagram which shows one Embodiment of the soaking | uniform-heating apparatus based on this invention, Comprising: The figure (a) is a top view, The figure (b) is a side view. 本発明に係る均熱処理装置の他の実施の形態を示す構成図であって、同図(a)は平面図、同図(b)は側面図。It is a block diagram which shows other embodiment of the soaking | uniform-heating apparatus based on this invention, Comprising: The figure (a) is a top view, The figure (b) is a side view. 本発明に係る均熱処理装置のさらに他の実施の形態を示す構成図であって、同図(a)は平面図、同図(b)は側面図。It is a block diagram which shows further another embodiment of the soaking | uniform-heating apparatus based on this invention, Comprising: The figure (a) is a top view, The figure (b) is a side view. 本発明に係る均熱処理装置のさらに別の実施の形態を示す構成図であって、同図(a)は平面図、同図(b)は側面図。It is a block diagram which shows another embodiment of the soaking | uniform-heat-treatment apparatus which concerns on this invention, Comprising: The figure (a) is a top view, The figure (b) is a side view. 本発明に係る均熱処理装置のさらに別の実施の形態を示す構成図であって、同図(a)は平面図、同図(b)は側面図。It is a block diagram which shows another embodiment of the soaking | uniform-heat-treatment apparatus which concerns on this invention, Comprising: The figure (a) is a top view, The figure (b) is a side view. 従来の熱処理装置を説明する構成図であって、同図(a)は平面図、同図(b)は側面図。It is a block diagram explaining the conventional heat processing apparatus, Comprising: The figure (a) is a top view, The figure (b) is a side view. 従来のもう1つの熱処理装置を説明する平面図。The top view explaining another conventional heat processing apparatus. 従来のもう1つの熱処理装置を説明する構成図であって、同図(a),(b)はそれぞれ面状ヒータの平面図、同図(c)は同図(a),(b)に示す面状ヒータを含む熱処理装置の側面図。It is the block diagram explaining another conventional heat processing apparatus, The figure (a), (b) is a top view of a planar heater, respectively, The figure (c) is the figure (a), (b). The side view of the heat processing apparatus containing the planar heater to show.

符号の説明Explanation of symbols

1…基板(被加熱対象物)、2…プレート、3,3a,3b,3c,3d…中空パイプ、4a,4b…U字管、5…入り口管、6…出口管、7…蒸発容器、8…ヒータ(加熱手段)、9…作動液、10…蒸気。   DESCRIPTION OF SYMBOLS 1 ... Board | substrate (object to be heated), 2 ... Plate, 3, 3a, 3b, 3c, 3d ... Hollow pipe, 4a, 4b ... U-shaped pipe, 5 ... Inlet pipe, 6 ... Outlet pipe, 7 ... Evaporating container, 8 ... heater (heating means), 9 ... hydraulic fluid, 10 ... steam.

Claims (5)

内部に略等間隔で複数の並行孔または中空パイプが配列され、熱処理対象物を熱処理するプレートと、
隣接する前記並行孔または前記中空パイプの端部がU字状またはU字管で結合されて水平な状態の蛇行状管路を形成する結合手段と、
前記プレートの外部下方に設置され、前記蛇行状管路の一端となる入り口管下部方向に折り曲げられて上部に、当該蛇行状管路の他端となる出口管下部方向に折り曲げられて下部にそれぞれ接続され、前記蛇行状管路との間で単一の連通回路を形成する蒸発容器と、
前記連通回路の内部を真空排気後に充填された所定量の作動液と、
前記蒸発容器内の前記作動液を加熱する加熱手段と、を備え、
前記加熱手段で加熱された前記作動液が蒸発した蒸気は、前記入り口管を経由して前記蛇行状管路に流入し、前記蒸気が前記蛇行状管路で凝縮された凝縮液は、前記出口管を経由して前記蒸発容器へ還流することを特徴とする均熱処理装置。
A plate in which a plurality of parallel holes or hollow pipes are arranged at substantially equal intervals inside, and heat-treats the object to be heat-treated,
Coupling means for forming a meandering pipe line in a horizontal state by connecting the end portions of the adjacent parallel holes or the hollow pipes with a U-shaped or U-shaped pipe;
An inlet pipe which is installed outside the plate and serves as one end of the serpentine pipe is bent downward, and an outlet pipe which is the other end of the serpentine pipe is bent downward. An evaporation vessel connected to each other to form a single communication circuit with the serpentine conduit,
A predetermined amount of hydraulic fluid filled after evacuating the interior of the communication circuit;
Heating means for heating the working fluid in the evaporation container,
The vapor obtained by evaporating the working fluid heated by the heating means flows into the serpentine pipeline via the inlet pipe , and the condensate obtained by condensing the vapor in the serpentine pipeline is the outlet. A soaking apparatus characterized by recirculating to the evaporation vessel via a tube .
隣接する前記並行孔または前記中空パイプの端部の接合部分となる前記U字状部または前記U字管をプレート内部に収納したことを特徴とする請求項1に記載の均熱処理装置。   2. The soaking apparatus according to claim 1, wherein the U-shaped part or the U-shaped pipe, which is a joint portion between the adjacent parallel holes or the ends of the hollow pipes, is housed in a plate. 内部に略等間隔で複数の並行孔または中空パイプが配置され、熱処理対象物を熱処理するプレートと、
隣接する2つの前記並行孔または前記中空パイプを組とし、各組の並行孔または前記中空パイプの一端部がU字状またはU字管で結合されて水平な状態のU字状管路を形成する結合手段と、
前記プレートの外部下方に設置され、前記各組のU字状管路の一端となる入り口管下部方向に折り曲げられてそれぞれ上部に、前記各組のU字状管路の他端となる出口管下部方向に折り曲げられてそれぞれ下部に接続され、各組のU字状管路との間で連通回路を形成する蒸発容器と、
前記連通回路の内部を真空排気後に充填された所定量の作動液と、
前記蒸発容器内の前記作動液を加熱する加熱手段と、を備え、
前記加熱手段で加熱された前記作動液が蒸発した蒸気は、前記入り口管を経由して前記U字状管路に流入し、前記蒸気が前記U字状管路で凝縮された凝縮液は、前記出口管を経由して前記蒸発容器へ還流することを特徴とする均熱処理装置。
A plate in which a plurality of parallel holes or hollow pipes are arranged at substantially equal intervals inside, and heat-treats the object to be heat-treated,
Two adjacent parallel holes or hollow pipes are grouped together, and one end of each parallel hole or hollow pipe is joined by a U-shaped or U-shaped tube to form a horizontal U-shaped channel. A coupling means to
Located outside below the plate, outlet inlet tube to be the end of each set of U-shaped pipe at the top respectively bent downwardly, as the other end of each set of U-shaped conduit An evaporation vessel in which the pipe is bent in the lower direction and connected to the lower part to form a communication circuit with each set of U-shaped pipes;
A predetermined amount of hydraulic fluid filled after evacuating the interior of the communication circuit;
Heating means for heating the working fluid in the evaporation container,
The vapor obtained by evaporating the hydraulic fluid heated by the heating means flows into the U-shaped pipeline via the inlet pipe , and the condensate obtained by condensing the vapor in the U-shaped pipeline is: A soaking apparatus characterized by recirculating to the evaporation vessel via the outlet pipe .
前記各組となる2つの並行孔または前記各中空パイプの一端部を接合したU字状部またはU字管をプレート内部に収納したことを特徴とする請求項3に記載の均熱処理装置。   The soaking apparatus according to claim 3, wherein a U-shaped part or a U-shaped tube obtained by joining two parallel holes forming each set or one end of each hollow pipe is accommodated in the plate. 前記プレートの略投影面積内に入るように当該プレートの下部に前記蒸発容器が配置され、前記蛇行状管路または各組のU字状管路の一端となる入り口が前記蒸発容器の上部に、当該蛇行状管路または各組のU字状管路の他端となる出口が前記蒸発容器の下部にそれぞれ接続されたことを特徴とする請求項1ないし4の何れか一項に記載の均熱処理装置。   The evaporation container is arranged at the lower part of the plate so as to fall within the approximate projection area of the plate, and the entrance serving as one end of the serpentine conduit or each set of U-shaped conduits is at the upper part of the evaporation container. 5. The leveler according to claim 1, wherein an outlet serving as the other end of the serpentine pipe or each set of U-shaped pipes is connected to a lower portion of the evaporation container. Heat treatment equipment.
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JP2007294688A (en) 2007-11-08

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