JP4929541B2 - Transparent conductive film and touch panel - Google Patents

Description

【００６７】
表１より、本発明によれば、電気特性の劣化の問題がなく、耐久性に優れた透明導電フィルムが提供されることがわかる。
【００６８】
【発明の効果】
以上詳述した通り、本発明によれば、透明導電フィルムの酸化スズ系透明導電薄膜の損傷、剥離が、透明導電薄膜上の被覆層により有効に防止され、このような透明導電フィルムを用いて透明導電薄膜の損傷、剥離による電気特性の劣化の問題がなく、耐久性、信頼性に優れたタッチパネルが提供される。
【図面の簡単な説明】
【図１】 本発明の透明導電フィルムを備えるタッチパネルの実施の形態を示す断面図である。
【図２】 本発明の透明導電フィルムを備えるタッチパネルの別の実施の形態を示す断面図である。
【図３】 本発明の透明導電フィルムを備えるタッチパネルの他の実施の形態を示す断面図である。
【図４】 従来のタッチパネルを示す断面図である。
【符号の説明】
１ ガラス板
２ 透明導電薄膜
３，３Ａ 下部電極
４，４Ａ 高分子フィルム
５，５Ａ 透明導電薄膜
６，６Ａ，６Ｂ 上部電極
７ スペーサ
８ ハードコート層
９，９Ａ 被覆層
１０，１０Ａ 下地層
１１ 粘着剤
１２ プラスチック板[0001]
BACKGROUND OF THE INVENTION
The present invention is a transparent conductive film in which a transparent conductive thin film is formed on a polymer film, the transparent conductive thin film has excellent resistance to peeling and detachment, and has excellent electrical properties and durability. It is related with a touch panel provided with a transparent conductive film.
[0002]
[Prior art]
Resistive touch panels that input signals when they are pressed with a finger or drawn with a dedicated pen are in contact with the facing electrodes and energized are advantageous for miniaturization, light weight, and thinning. Widely used as an input device for portable terminals.
[0003]
As shown in FIG. 4, the resistive touch panel is an upper electrode formed by forming a transparent conductive thin film 5 on a polymer film 4 on a lower electrode 3 formed by forming a transparent conductive thin film 2 on a glass plate 1. 6 is laminated via a spacer (microdot spacer) 7 so that the transparent conductive thin films 2 and 5 face each other. When the display surface of the upper electrode 6 is pressed with a finger or a pen, the upper electrode 6 and the lower electrode 3 is contacted and energized to input a signal. A hard coat layer 8 is provided on the surface of the upper electrode 6 to protect the polymer film 4. That is, in such a touch panel, since the touch surface on the upper electrode 6 is rubbed with a finger or a pen, the scratch resistance at that time is a very important characteristic. In the conventional touch panel, the hard coat layer 8 is provided on the touch surface side in order to improve the scratch resistance of the upper electrode 6.
[0004]
For the purpose of improving the durability of a transparent conductive film for use in touch panels, Japanese Patent Application Laid-Open No. 2-19494 discloses that after forming an ITO (tin indium oxide) transparent conductive thin film, heat treatment is performed to crystallize the ITO. However, since the substrate of the transparent conductive film is a polymer film, there is a limit to this heat treatment temperature, for example, at a relatively low temperature, such as 150 hours at 24 hours, for a long time. Heat treatment was required, and there were problems in terms of productivity and cost.
[0005]
[Problems to be solved by the invention]
In such a touch panel, the transparent conductive thin film 5 of the upper electrode 6 and the transparent conductive thin film 2 of the lower electrode 3 repeat contact and non-contact with input with a finger or a pen. The transparent conductive material such as ATO, which is a forming material of, 2, has low scratch resistance. Therefore, among the transparent conductive thin films 2, 5, the transparent conductive thin film 5 of the upper electrode 6 that undergoes repeated deformation, particularly during touch panel input. Has a problem that the transparent conductive thin film 5 is easily cracked, and the transparent conductive thin film 5 of the same material is in contact or non-contact with each other, and the transparent conductive thin film 5 is easily peeled off from the polymer film 4 as the base material. .
[0006]
If the transparent conductive thin film 5 of the upper electrode 6 is damaged or peeled off, the electric resistance value on the surface of the transparent conductive thin film 5 changes, the uniformity is lost, and the electrical characteristics are impaired. This makes it impossible to perform input, which impairs the reliability of the touch panel and causes damage, defects, and a decrease in durability.
[0007]
The present invention solves the above-mentioned conventional problems, and is a transparent conductive film in which a transparent conductive thin film is formed on a polymer film. The transparent conductive thin film is free from damage and peeling problems, and has high reliability and durability. It aims at providing the transparent conductive film which can provide a touch panel, and a touch panel provided with this transparent conductive film.
[0008]
[Means for Solving the Problems]
The transparent conductive film of the present invention is a transparent conductive film in which a transparent conductive thin film is formed on a polymer film, wherein the transparent conductive thin film is a tin oxide-based transparent conductive thin film, and the transparent conductive film is formed on the transparent conductive thin film. The thin film is a transparent conductive film in which a coating layer made of a different material is formed , and the coating layer is one or two selected from the group consisting of C, CN _x , BN _x , B _x C and SiC _x It is characterized by having a seed or more as a main component .
[0009]
By covering the surface of the tin oxide transparent conductive thin film with a coating layer made of a material different from that of the transparent conductive thin film, physical or chemical stress at the time of touch panel input does not directly affect the transparent conductive thin film. Damage and peeling of the conductive thin film are prevented.
[0010]
In addition, the scratch resistance can be increased by improving the strength of the transparent conductive film by forming a coating layer.
[0011]
In the present invention, the coating layer is mainly provided for improving the durability of the transparent conductive thin film, but by appropriately designing the refractive index, film thickness, laminated structure, etc. of the material of the coating layer, It is also possible to improve the total light transmittance of the transparent conductive film, control the color tone, etc., and further improve the characteristics or functionality of the transparent conductive film.
The coating layer according to the present invention is not limited to one layer, and may be formed by laminating two or more layers .
[0012]
The film thickness of the coating layer, such as this is preferably 0.5 to 100 nm.
[0013]
The coating layer according to the present invention is preferably formed by physical vapor deposition such as vacuum vapor deposition, sputtering, ion plating, laser ablation, or chemical vapor deposition such as CVD, and in particular, formed by sputtering using SiC as a target. Further, a thin film made of SiC _x , SiC _x O _y , SiC _x N _z , or SiC _x O _y N _z is preferable. In this case, a SiC target having a density of 2.9 g / cm ³ or more is preferable, and in particular, a SiC target obtained by sintering a mixture of silicon carbide powder and a nonmetallic sintering aid is used. It is preferable.
[0014]
In the present invention, the coating layer may also be formed by coating the transparent conductive thin film with the coating layer material as it is or in a liquid such as alcohol, ketone, toluene, hexane or the like.
[0015]
The transparent conductive film of the present invention preferably has a surface resistance value on the coating layer side of 300 to 2000 Ω / Sq and a linearity value of 1.5% or less.
[0016]
The linearity value is an index representing the uniformity of the resistance value of the transparent conductive film, and the linearity value can be obtained as follows.
[0017]
An electrode is provided with silver paste or the like on two opposite sides of the transparent conductive film, and a DC voltage is applied between both electrodes. At this time, the distance between the two electrodes is L, and the applied voltage is V. Next, at an arbitrary point on the transparent conductive film, the distance 1 from the negative electrode and the potential difference v between the negative electrode at that point are measured.
[0018]
The linearity value is calculated by the following formula. The smaller the value, the better the uniformity of the resistance value. When the value is 0%, the resistance value is completely uniform. Generally, in a resistive film type analog touch panel, this linearity value is preferably 1.5% or less.
Linearity (%) = | l / Lv / V | × 100
[0019]
In addition, as a tin oxide type transparent conductive film which concerns on this invention, a tin oxide or ATO (tin antimony oxide) is mentioned, for example.
[0020]
The touch panel of the present invention includes the transparent conductive film of the present invention.
[0021]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
[0022]
1 and 2 are sectional views showing an embodiment of a touch panel using the transparent conductive film of the present invention as an upper electrode, and FIG. 3 is an implementation of the touch panel using the transparent conductive film of the present invention as an upper electrode and a lower electrode. It is sectional drawing which shows this form. 1-3, the same code | symbol is attached | subjected to the member which show | plays the same function as the member shown in FIG.
[0023]
In the transparent conductive film of the present invention, coating layers (protective layers) 9 and 9A are formed on the transparent conductive thin films 5 and 5A formed on the polymer films 4 and 4A.
[0024]
In the transparent conductive film of the present invention, the resin material of the polymer film serving as the substrate is polyester, polyethylene terephthalate (PET), polybutylene terephthalate, polymethyl methacrylate (PMMA), acrylic, polycarbonate (PC), polystyrene, triacetate. (TAC), polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyethylene, ethylene-vinyl acetate copolymer, polyvinyl butyral, metal ion crosslinked ethylene-methacrylic acid copolymer, polyurethane, cellophane, etc. PET, PC, PMMA, and TAC, particularly PET and TAC are preferable in terms of surface.
[0025]
The thickness of such a polymer film varies depending on the use of the transparent conductive film and the like, but is usually about 13 μm to 0.5 mm for use as the upper electrode of the touch panel. If the thickness of the polymer film is less than 13 μm, sufficient durability as the upper electrode cannot be obtained, and if it exceeds 0.5 mm, the resulting touch panel becomes thicker and more flexible as the upper electrode. The properties are also impaired, which is not preferable.
[0026]
When the transparent conductive film is used as the lower electrode of the touch panel, the thickness of the polymer film is thicker than the above range and can be about 0.5 to 2 mm. By sticking together, it is possible to adopt the same thickness as that used for the upper electrode.
[0027]
The transparent conductive thin films 5 and 5A formed on the polymer films 4 and 4A are tin oxide based transparent conductive thin films (including doping) such as SnO ₂ and ATO (tin antimony oxide (SnO ₂ : Sb)). Is mentioned. If the transparent conductive thin film 5 is too thin, sufficient conductivity cannot be obtained. Even if the transparent conductive thin film 5 is excessively thick, there is no difference in conductivity, the film formation cost is high, and the thickness of the transparent conductive film is high. Thicken is not preferable. For this reason, the film thickness of the transparent conductive thin film 5 is preferably 1 to 500 nm, particularly preferably 5 to 200 nm.
[0028]
In the present invention, the coating layers 9 and 9A formed on the transparent conductive thin films 5 and 5A are materials that do not impair the conductivity of the transparent conductive thin films 5 and 5A and are required for the transparent conductive film. The thing which can maintain transparency is mentioned.
[0029]
Examples of the coating layer material include C (carbon), CN _x (x ≦ 1.4), BN _x (x ≦ 1.1), B _x C (x = 1 × 10 ⁶ to 2), SiC, and the like. , Those having one or more of these as a main component are used .
[0030]
Thickness of the Kutsugaeso 9,9A, the materials used, the light transmittance required for the transparent conductive film, but is appropriately determined in accordance with The required durability, thickness of the coating layer 9 is excessively If it is too thin, the protective effect of the transparent conductive thin film due to the formation of the coating layer cannot be sufficiently obtained. Conversely, if it is excessively thick, the transparency is lowered, or particularly when an insulating material is used, In addition to a decrease in the conductivity of the transparent conductive thin film, the thickness of the transparent conductive film itself is also unfavorable. Therefore, it is preferable that the coating layers 9 and 9A have a thickness of 0.5 to 100 nm, particularly 0.5 to 50 nm.
[0031]
As for the light transmittance of the transparent conductive film, it is usually desired that the light transmittance is 80% or more in the case of a transparent conductive film used for PDP or liquid crystal with weak light emission. The film thickness of the coating layer is determined within a range where the rate can be maintained. However, in applications such as a cathode ray tube with strong light emission, brightness adjustment may be necessary. In such a case, the light transmittance of the transparent conductive film may be 80% or less.
[0032]
As for conductivity, when a transparent conductive film is used as a touch panel, the surface resistance value on the side of the coating layer 9, 9A after forming the coating layer 9, 9A is 300 to 2000Ω / Sq, particularly 400 to 1000Ω / Sq. It is desirable to be.
[0033]
In addition, in this invention, durability of a transparent conductive thin film is improved by forming the coating layers 9 and 9A, and high durability which maintains a linearity value of 1.5% or less even after long-term use can be obtained. desired.
[0034]
Therefore, in the present invention, the material film thickness and layer structure of the coating layer are appropriately designed so that the surface resistance value, linearity value, and light transmittance can be obtained.
[0035]
Such a coating layer is formed by a physical vapor deposition method such as vacuum deposition, sputtering, ion plating, laser ablation or the like, or a chemical vapor deposition method such as CVD, particularly preferably a sputtering method. And excellent adhesion to the transparent conductive thin film, low contamination during film formation, high-speed film formation, and continuous deposition of coating layers in the same device after the transparent conductive thin film is formed It is desirable in that it can be performed and the film formation efficiency is excellent.
[0036]
When forming a C or CN _x coating layer by sputtering, high purity carbon (graphite) is used as the target, and the type and flow rate of the atmospheric gas or reactive gas are adjusted to form a coating layer having a desired composition. can do.
[0037]
SiC _x (x = 1 × 10 ⁻⁶ to 10), SiC _x O _y (x = 1 × 10 ⁻⁶ to) formed by adjusting the type and flow rate of the atmospheric gas or reactive gas using a SiC target 10, y = 1 × 10 ^{−6 to} 5), SiC _x N _z (x = 1 × 10 ⁻⁶ to 10, z = 1 × 10 ^{−6 to} 5), SiC _x O _y N _z (x = 1 ×) 10 ⁻⁶ to 10, y = 1 × 10 ^{−6 to} 5, z = 1 × 10 ^{−6 to} 5) are particularly suitable as the coating layer.
[0038]
The SiC target is obtained by sintering SiC powder with a non-metallic sintering aid such as coal tar pitch, phenol resin, furan resin, epoxy resin, glucose, sucrose, cellulose, starch, and the like, with a density of 2.9 g. A SiC target of / cm ³ or more is preferable. That is, when the input is increased during sputtering film formation in order to improve the film formation speed, the glow discharge becomes arc discharge, which causes damage to the transparent conductive thin film formed on the polymer film. If it is a high-density and uniform SiC target, stable discharge can be performed with high input during sputtering film formation, and the film formation rate can be increased.
[0039]
Such a SiC target can be manufactured by uniformly mixing the non-metallic sintering aid described above with SiC powder in an amount of about 3 to 30% by weight and sintering the mixture at about 1700 to 2200 ° C. The density of such a SiC target is usually 2.9 g / cm ³ or more. If the SiC target is close to the theoretical density, there is no problem of gas generation during sputtering film formation, and stable sputtering film formation can be performed. .
[0040]
There is no particular limitation on the sputtering conditions at the time of forming the coating layer, and it can be carried out at a vacuum degree of 0.05 to 1 Pa and an input power density of about ² to 500 kW / m ^2. By adjusting the film formation time, a coating layer having a desired composition and a desired film thickness can be formed.
[0041]
The transparent conductive thin film can be formed according to a conventional method, but in general, it is preferable to form a film by a sputtering method in the same manner as the coating layer. In this case, only the target is changed and the same The transparent conductive thin film and the coating layer can be successively formed by sputtering in the sputtering apparatus.
[0042]
The coating layer may also be formed by applying the coating layer material as it is or by applying a liquid material dissolved in a solvent such as alcohol, ketone, toluene, hexane or the like onto the transparent conductive thin film.
[0043]
The transparent conductive film of this invention may form the hard-coat layer 8 in the surface on the opposite side to the surface which forms the transparent conductive thin film 5 of the polymer film 4 as shown in FIGS. Examples of the hard coat layer 8 include an acrylic layer, an epoxy layer, a urethane layer, and a silicon layer, and the thickness is usually about 1 to 50 μm.
[0044]
The transparent conductive thin film may be formed directly on the polymer film, but as shown in FIGS. 2 and 3, the underlying layers 10 and 10A are provided between the polymer films 4 and 4A and the transparent conductive thin films 5 and 5A. By forming such underlying layers 10 and 10A, the adhesion of the transparent conductive thin films 5 and 5A to the polymer films 4 and 4A is enhanced, and the transparent conductive thin films 5 and 5A are peeled off by repeated deformation. Can be prevented. That is, by forming the base layers 10 and 10A on the polymer films 4 and 4A, gas is prevented from being generated from the polymer films 4 and 4A at the time of film formation and is transparent to the polymer films 4 and 4A. The conductive thin films 5 and 5A can be formed with good adhesion. Further, the underlayers 10 and 10A are used as intermediate layers between the polymer films 4 and 4A and the transparent conductive thin films 5 and 5A to enhance the adhesion between them. Further, the scratch resistance can be improved by improving the strength of the transparent conductive film by forming the underlayers 10 and 10A.
[0045]
In this case, examples of the material for forming the base layers 10 and 10A include acrylic, urethane, and epoxy resin layers, hydrolysates of organic silicon compounds, and the like.
[0046]
In addition, prior to the formation of the underlayers 10 and 10A and the transparent conductive thin films 5 and 5A on the polymer films 4 and 4A, the surface of the polymer films 4 and 4A is usually used to increase the adhesive strength of the formed thin films. In accordance with the method, plasma treatment, corona treatment, solvent cleaning, and the like may be performed.
[0047]
For the purpose of improving the optical characteristics of the transparent conductive film, the base layer 10 of the transparent conductive thin film 5 is a two-layer film of a low-refractive index film and a high-refractive index film, or an alternate laminated film thereof, or a hard coat layer 8. The surface of the film may be antiglare processed or AR processed.
[0048]
The touch panel shown in FIG. 1 has a transparent conductive film of the present invention in which a transparent conductive thin film 5 and a coating layer 9 are laminated on one surface of a polymer film 4 and a hard coat layer 8 is formed on the other surface as an upper electrode 6A. The film is used, and damage and peeling of the transparent conductive thin film 5 of the upper electrode 6A due to signal input are prevented, and the durability and reliability of electrical characteristics are excellent.
[0049]
The touch panel shown in FIG. 2 is the present invention in which the base layer 10, the transparent conductive thin film 5 and the coating layer 9 are laminated on one surface of the polymer film 4 and the hard coat layer 8 is formed on the other surface as the upper electrode 6B. In comparison with the touch panel of FIG. 1, the adhesiveness of the transparent conductive thin film 5 is further improved, and the durability and reliability are further improved.
[0050]
The touch panel shown in FIG. 3 uses the transparent conductive film of the present invention as the lower electrode in FIG. The lower electrode 3A of this touch panel is formed by forming a transparent conductive thin film 5A on a polymer film 4A through an underlayer 10A, and forming a covering layer 9A on the transparent conductive thin film 5A. The microdot spacer 7 is formed on the coating layer 9A and bonded to a plastic plate 12 such as an acrylic resin or a polycarbonate resin with an adhesive 11. If this touch panel is used, the upper electrode 6B and the lower electrode Both the 3A transparent conductive thin films 5 and 5A are protected by the covering layers 9 and 9A, and the adhesion is enhanced by the base layers 10 and 10A, so that the durability and reliability are remarkably high.
[0051]
In addition, the transparent conductive film of this invention can be effectively used for the use as a transparent switching device and other various optical system transparent conductive films besides the use as an upper electrode or a lower electrode of a touch panel.
[0052]
【Example】
Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples.
[0053]
Example 1
Using a PET film with a thickness of 188 μm as a base material, a hard coat layer with a thickness of 5 μm using a JSR acrylic photo-curing hard coat agent (Z7501: solid concentration 35 wt%, solvent MEK) on one side by wet coating. Formed.
[0054]
This film was set in a magnetron RF sputtering apparatus together with a 99.99% pure tin oxide (SnO ₂ ) sintered body target as a transparent conductive thin film target and a 99% pure graphite target.
[0055]
First, the inside of the apparatus is evacuated to 1 × 10 ⁻⁴ Pa with a turbo molecular pump, and then Ar gas is introduced as a mixed gas at a flow rate of 180 sccm and O ₂ gas at a flow rate of 20 sccm so that the atmospheric pressure is adjusted to 0.3 Pa. did. Thereafter, an RF voltage is applied to the SnO ₂ target, and a SnO ₂ thin film having a thickness of about 160 nm is formed on the surface of the PET film opposite to the hard coat layer forming surface so that the surface resistance value is about 500 Ω / Sq. did. Then, after replacing the inside of the chamber with Ar gas, the atmospheric pressure is adjusted to 0.5 Pa, a DC pulse voltage is applied to the graphite target, and a carbon thin film having a thickness of about 3 nm is formed as a coating layer on the SnO ₂ thin film. did.
[0056]
The DC input power of the sputtering apparatus was 2 kW.
[0057]
For the obtained transparent conductive film, the surface resistance value on the coating layer side was measured with a surface resistance measuring device (“Loresta AP” manufactured by Mitsubishi Chemical Corporation), and a sliding writing test was performed by the following method, and the results were shown. It was shown in 1.
[0058]
<Sliding writing test>
The transparent conductive thin film (coating layer) side of the transparent conductive film is opposed to an ATO glass substrate with a microdot spacer, and these are bonded together, and the hard coat layer forming surface of the transparent conductive film is the input pen made of polyacetal resin (tip 0 .8R), a reciprocating sliding writing test was performed with a load of 250 gf. After the test, the linearity value was measured, and those with a linearity value of 1.5% or less were judged good and those with a linearity value over 1.5% were judged as bad. Also, the appearance was observed.
[0059]
Example 2
In Example 1, a transparent conductive film was produced in the same manner except that a SiC target was used instead of the graphite target and a SiC thin film having a thickness of about 3 nm was formed as a coating layer.
[0060]
With respect to this transparent conductive film, the surface resistance value was measured in the same manner as in Example 1, and a sliding writing test was conducted. The results are shown in Table 1.
[0061]
The SiC target used has a density of 2.92 g / cm ³ obtained by sintering at 20 ° C. a uniform mixture of SiC powder and 20 wt% phenol resin as a sintering aid. .
[0062]
Example 3
In Example 2, after forming the SnO ₂ transparent conductive thin film, a mixed gas of 170 sccm of Ar gas and 30 sccm of O ₂ gas was introduced into the chamber, and the atmosphere pressure was adjusted to 0.5 Pa, and then the SiC target A transparent conductive film was formed in the same manner except that a thin film of SiC _x O _y (x = 0.05, y = 1.9) having a thickness of about 3 nm was formed as a coating layer by applying a DC pulse voltage to Produced.
[0063]
With respect to this transparent conductive film, the surface resistance value was measured in the same manner as in Example 1, and a sliding writing test was conducted. The results are shown in Table 1.
[0064]
Comparative Example 1
A transparent conductive film was produced in the same manner as in Example 1 except that no coating layer was formed.
[0065]
With respect to this transparent conductive film, the surface resistance value was measured in the same manner as in Example 1, and a sliding writing test was conducted. The results are shown in Table 1.
[0066]
[Table 1]

[0067]
From Table 1, it can be seen that according to the present invention, there is no problem of deterioration of electrical characteristics, and a transparent conductive film excellent in durability is provided.
[0068]
【Effect of the invention】
As described above in detail, according to the present invention, damage and peeling of the tin oxide-based transparent conductive thin film of the transparent conductive film are effectively prevented by the coating layer on the transparent conductive thin film, and such a transparent conductive film is used. A touch panel having excellent durability and reliability without a problem of electrical property deterioration due to damage or peeling of the transparent conductive thin film is provided.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing an embodiment of a touch panel provided with a transparent conductive film of the present invention.
FIG. 2 is a cross-sectional view showing another embodiment of a touch panel including the transparent conductive film of the present invention.
FIG. 3 is a cross-sectional view showing another embodiment of a touch panel including the transparent conductive film of the present invention.
FIG. 4 is a cross-sectional view showing a conventional touch panel.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Glass plate 2 Transparent conductive thin film 3, 3A Lower electrode 4, 4A Polymer film 5, 5A Transparent conductive thin film 6, 6A, 6B Upper electrode 7 Spacer 8 Hard coat layer 9, 9A Covering layer 10, 10A Underlayer 11 Adhesive 12 Plastic plate

Claims (10)

In a transparent conductive film in which a transparent conductive thin film is formed on a polymer film, the transparent conductive thin film is a tin oxide based transparent conductive thin film, and the transparent conductive thin film is made of a material different from the transparent conductive thin film. A transparent conductive film on which a coating layer is formed, wherein the coating layer is mainly composed of one or more selected from the group consisting of C, CN _x , BN _x , B _x C and SiC _x A transparent conductive film characterized by The transparent conductive film according to claim 1, wherein the coating layer has a thickness of 0.5 to 100 nm. 3. The transparent conductive film according to claim 1, wherein the coating layer is formed by physical vapor deposition such as vacuum vapor deposition, sputtering, ion plating, laser ablation, or chemical vapor deposition such as CVD. The coating layer according to any one of claims 1 to 3, wherein the coating layer material is formed by applying the coating layer material as it is or a liquid material dissolved in a solvent such as alcohol, ketone, toluene, hexane or the like onto the transparent conductive thin film. A transparent conductive film characterized by comprising: 4. The thin film made of SiC _x , SiC _x O _y , SiC _x N _z , or SiC _x O _y N _z formed by sputtering using SiC as a target according to claim 1. A transparent conductive film characterized by being. 6. The transparent conductive film according to claim 5, wherein the density of the SiC target is 2.9 g / cm ³ or more. The transparent conductive film according to claim 5 or 6, wherein the SiC target is obtained by sintering a mixture of silicon carbide powder and a nonmetallic sintering aid. 8. The transparent conductive film according to claim 1, wherein the coating layer side has a surface resistance value of 300 to 2000 Ω / Sq and a linearity value of 1.5% or less. 9. The transparent conductive film according to claim 1, wherein the transparent conductive thin film is tin oxide or ATO. A touch panel comprising the transparent conductive film according to claim 1.

Images