JP2003151366A - Transparent conductive film, its manufacturing method and touch panel - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a transparent conductive film with a transparent conductive thin film formed on a high polymer film, not having problems of damages and peeling of the transparent conductive thin film and capable of providing a touch panel with high reliability and durability, and the touch panel provided with the transparent conductive film. SOLUTION: The transparent conductive film is comprised by forming the transparent conducting thin film 5 and a cover layer 9 on the high polymer film 4. The cover layer 9 on the transparent conducting thin film 5 is a layer comprising metal, or it is comprised by oxidizing, nitriding or oxynitriding a metal layer. The touch panel is provided with the transparent conductive film used as an upper electrode 6A or a lower electrode.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a transparent conductive film in which a transparent conductive thin film is formed on a polymer film, and the transparent conductive thin film has excellent resistance to peeling and dropping, and excellent electrical characteristics and durability. The present invention also relates to a transparent conductive film, a method for manufacturing the same, and a touch panel including the transparent conductive film.

[0002]

[Prior Art] When pressed with a finger or drawn with a special pen,
Resistive film type touch panels, whose parts come into contact with facing electrodes and are energized to input signals, are widely used as input devices for various home appliances and mobile terminals because they are advantageous in making them smaller, lighter and thinner. .

As shown in FIG. 4, a resistive film type touch panel has a transparent conductive thin film 5 formed on a polymer film 4 on a lower electrode 3 formed by forming a transparent conductive thin film 2 on a glass plate 1. The upper electrode 6 is laminated with a spacer (microdot spacer) 7 so that the transparent conductive thin films 2 and 5 face each other. When the display surface of the upper electrode 6 is pressed with a finger or a pen, the upper electrode 6 And the lower electrode 3 are brought into contact with each other to be energized and a signal is inputted. A hard coat layer 8 is provided on the surface of the upper electrode 6 to protect the polymer film 4. That is, in such a touch panel, since the touch surface on the upper electrode 6 is rubbed with a finger or a pen, scratch resistance at that time is a very important characteristic. In the conventional touch panel, the hard coat layer 8 is provided on the touch surface side in order to improve the scratch resistance of the upper electrode 6.

For the purpose of improving the durability of the transparent conductive film for touch panel use, JP-A-2-19494 is used.
Japanese Patent Publication No. 3 describes that an ITO (tin indium oxide) transparent conductive thin film is formed and then heat treated to crystallize ITO. However, the base material of the transparent conductive film is a polymer film. Therefore, there is a limit to the heat treatment temperature, and heat treatment at a relatively low temperature for a long time such as 150 ° C. for 24 hours is required, which causes a problem in productivity and cost.

[0005]

In such a touch panel, the transparent conductive thin film 5 of the upper electrode 6 and the transparent conductive thin film 2 of the lower electrode 3 repeatedly make contact and non-contact with the input by a finger or a pen. As a matter of fact, the transparent conductive thin films 5, 2
Since the transparent conductive material such as ITO, which is a material for forming the same, has a low scratch resistance, the transparent conductive thin film 5 of the upper electrode 6, which is repeatedly deformed at the time of input on the touch panel, among the transparent conductive thin films 2 and 5, is particularly preferable. It is easy for cracks to occur, and the transparent conductive thin films 5 made of the same material can be contacted or not contacted with each other.
However, there is a problem in that it is easily peeled off from the polymer film 4 which is the base material and comes off.

When the transparent conductive thin film 5 of the upper electrode 6 is damaged or peeled off, the electric resistance value of the surface of the transparent conductive thin film 5 is changed, and its uniformity is lost and the electrical characteristics are impaired. , It is not possible to make accurate input, which impairs the reliability of the touch panel, damage,
It was a cause of defects and reduced durability.

The present invention solves the above conventional problems and is a transparent conductive film in which a transparent conductive thin film is formed on a polymer film, which is free from problems such as damage and peeling of the transparent conductive thin film, and has reliability and durability. It is an object of the present invention to provide a transparent conductive film capable of providing a touch panel having high properties and a touch panel including the transparent conductive film.

[0008]

The transparent conductive film of the present invention (Claim 1) is a transparent conductive film in which a transparent conductive thin film is formed on a polymer film, and the transparent conductive thin film is made of metal. A coating layer is formed.

The transparent conductive film of the present invention (Claim 4) is a transparent conductive film comprising a polymer film, a transparent conductive thin film formed on the polymer film, and a covering layer covering the thin film. The coating layer is formed by oxidizing, nitriding, or oxynitriding a metal layer formed on the thin film.

According to the present invention, by providing a very thin metal coating layer on the surface of the transparent conductive thin film, the sliding durability of the transparent conductive film can be remarkably improved. That is,
By covering the surface of the transparent conductive thin film with the coating layer, physical or chemical stress at the time of input on the touch panel does not directly affect the transparent conductive thin film, and damage or peeling of the transparent conductive thin film is prevented. In addition, scratch resistance can be enhanced by improving the strength of the transparent conductive film by forming the coating layer.

The metal thin film is usually colored and has a low light transmittance, but even if the metal layer has an extremely small thickness, it has a sufficient effect of improving durability. It is possible to improve sliding durability while suppressing a decrease in transmittance.

Further, the transparency can be improved by oxidizing, nitriding or oxynitriding the metal layer formed on the transparent conductive thin film by heat treatment in an oxygen atmosphere or surface treatment such as oxygen plasma or nitrogen plasma. Therefore, it is possible to improve the sliding durability while preventing the light transmittance from being lowered by forming the coating layer.

The coating layer made of a metal layer does not hinder the conduction of the transparent conductive thin film, and even if it is a coating layer obtained by oxidizing, nitriding or oxynitriding the metal layer, the coating layer is very thin and therefore transparent. It does not impair the conductivity in the direction perpendicular to the film surface of the conductive thin film.

In the present invention, the coating layer is provided to improve the durability of the transparent conductive thin film,
By appropriately designing the refractive index and film thickness of the material of the coating layer, the laminated structure, etc., it is also possible to improve or adjust the total light transmittance of the transparent conductive film, control the color tone, etc. The characteristics or functionality can be further enhanced.

The method for producing the transparent conductive film of the present invention comprises:
A method for producing a transparent conductive film by forming a transparent conductive thin film on a polymer film, forming a protective layer on the transparent conductive thin film, after forming a metal layer on the transparent conductive thin film,
The coating layer is formed by oxidizing, nitriding or oxynitriding the metal layer, and the coating layer having increased transparency by oxidizing, nitriding or oxynitriding the metal layer,
The sliding durability of the transparent conductive film can be improved without lowering the light transmittance.

Examples of the oxidation, nitridation or oxynitridation treatment method for the metal layer include heat treatment of the metal layer in an oxygen atmosphere or surface treatment of the metal layer with oxygen plasma and / or nitrogen plasma.

In the present invention, the coating layer made of metal is
Ti, Si, Nb, In, Zn, Sn, Au, Ag, C
u, Al, Co, Cr, Ni, Pb, Pd, Pt, W,
One or two selected from the group consisting of Zr, Ta and Hf
It is preferable to be composed of one or more kinds of metals, or to have them as a main component. The metal layer of the coating layer formed by oxidizing, nitriding or oxynitriding the metal layer is made of Ti, Si, Nb, In, Z.
n, Sn, Ag, Cu, Al, Co, Cr, Ni, P
1 selected from the group consisting of b, W, Zr, Ta and Hf
It is preferable to be composed of one kind or two or more kinds of metals, or to have it as a main component.

The thickness of such a coating layer is 0.5 to 100.
It is preferably nm.

The coating layer or metal layer according to the present invention is preferably a physical vapor deposition method such as vacuum vapor deposition, sputtering, ion plating or laser ablation, or C.
It is formed by a chemical vapor deposition method such as VD.

In particular, the metal layer can be formed by sputtering uniformly and at a very high film forming rate. Then, the metal layer thus formed can be easily made transparent by oxidizing, nitriding or oxynitriding after the film formation.

The transparent conductive film of the present invention preferably has a surface resistance value on the coating layer side of 300 to 2000 Ω / Sq and a linearity value of 1.5% or less.

The linearity value is an index showing the uniformity of the resistance value of the transparent conductive film, and the linearity value can be obtained as follows.

Electrodes are provided on the opposite two sides of the transparent conductive film with silver paste or the like, and a DC voltage is applied between both electrodes.
At this time, the distance between both electrodes is L, and the applied voltage is V.
Next, at an arbitrary point on the transparent conductive film, the distance l from the negative electrode and the potential difference v between the negative electrode and that point are measured.

The linearity value is calculated by the following equation. The smaller the linearity value is, the better the uniformity of the resistance value is. If it is 0%, the resistance value is completely uniform. Generally, in a resistance film type analog touch panel, the linearity value is preferably 1.5% or less. Linearity (%) = | l / Lv / V | × 100

The transparent conductive thin film according to the present invention preferably contains at least one of indium oxide, zinc oxide and tin oxide as a main component.

The touch panel of the present invention is characterized by including such a transparent conductive film of the present invention or a transparent conductive film manufactured by the method of manufacturing a transparent conductive film of the present invention.

[0027]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below with reference to the drawings.

1 and 2 are sectional views showing an embodiment of a touch panel using the transparent conductive film of the present invention as an upper electrode, and FIG. 3 uses the transparent conductive film of the present invention as an upper electrode and a lower electrode. It is sectional drawing which shows embodiment of a touch panel. In FIGS. 1 to 3, members having the same functions as those shown in FIG. 4 are designated by the same reference numerals.

The transparent conductive film of the present invention comprises the transparent conductive thin films 5 and 5A formed on the polymer films 4 and 4A, and the coating layers (protective layers) 9 and 9A formed on the transparent conductive thin films 5 and 5A.

In the transparent conductive film of the present invention, as the resin material for the polymer film as a base material, polyester, polyethylene terephthalate (PET), polybutylene terephthalate, polymethyl methacrylate (PM) is used.
MA), acrylic, polycarbonate (PC), polystyrene, triacetate (TAC), polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyethylene, ethylene-vinyl acetate copolymer, polyvinyl butyral, metal ion crosslinked ethylene-methacrylic acid copolymer Examples include coalesce, polyurethane, and cellophane, but PET, PC, PMMA, TAC, especially P in terms of strength.
ET and TAC are preferred.

The thickness of such a polymer film varies depending on the use of the transparent conductive film, etc., but for use as the upper electrode of a touch panel, it is usually 13 μm to
It is about 0.5 mm. If the thickness of this polymer film is less than 13 μm, sufficient durability as the upper electrode cannot be obtained, and if it exceeds 0.5 mm, the resulting touch panel becomes thicker, and the flexibility as the upper electrode is increased. It is also not preferable because the property is impaired.

When the transparent conductive film is used as the lower electrode of the touch panel, the thickness of the polymer film is
The thickness may be thicker than the above range and may be about 0.5 to 2 mm, but as described later, it may be attached to a substrate such as a plastic plate to adopt the same thickness as when used as the upper electrode. .

As the transparent conductive thin films 5 and 5A formed on the polymer films 4 and 4A, ITO (tin indium oxide), ATO (tin antimony oxide), ZnO and A are used.
Examples of the transparent conductive thin film include oxide-based transparent conductive thin films such as ZnO and SnO ₂ doped with l, indium oxide (including doping), a mixture of indium oxide and tin oxide (IT).
O) or a mixture of indium oxide and zinc oxide (IZ
O) is preferred. The film thickness of the transparent conductive thin film 5 is appropriately changed according to the target surface resistance value, and the film thickness is 1 to 50.
It is preferably 0 nm, particularly preferably 5 to 100 nm.

In the present invention, the coating layers 9 and 9A formed on the transparent conductive thin films 5 and 5A are metal layers or layers formed by oxidizing, nitriding or oxynitriding the metal layers.

As the metal layer forming the coating layer, Ti,
Si, Nb, In, Zn, Sn, Au, Ag, Cu, A
l, Co, Cr, Ni, Pb, Pd, Pt, W, Zr,
One or two or more metals selected from the group consisting of Ta and Hf, or one containing two or more metals as a main component, particularly one or two of Ti, Sn, Si, Nb, Al, Ni, Ta. Those having the above as the main components are preferable. This metal layer is B, C, H, N, F, G for these main component metals.
It may be doped with a or the like.

With the protective layers 9 and 9A made of this metal layer, the sliding durability can be improved without impairing the conductivity of the transparent conductive thin film. Further, although the metal thin film has a low light transmittance, in the present invention, the coating layer made of a metal can obtain a sufficient sliding durability improving effect with a very thin film thickness without impairing the light transmittance. Therefore, the decrease in light transmittance due to the formation of the coating layer made of metal does not pose a problem.

Further, the coating layers 9 and 9A according to the present invention enhance transparency by oxidizing, nitriding or oxynitriding the metal layer formed on the transparent conductive thin film, and the light transmission by forming the coating layer. It is possible to prevent a decrease in the rate. In this case, examples of the oxidation, nitriding, or oxynitriding treatment include heat treatment of the metal layer in an oxygen atmosphere, or surface treatment of the metal layer with oxygen plasma and / or nitrogen plasma.

These oxidizing, nitriding or oxynitriding conditions vary depending on the type and thickness of the metal layer, the desired degree of transparency, etc., but generally 150 if the heat treatment is carried out in an oxygen atmosphere. At about 180 ° C. for about 2 to 8 hours, the surface treatment by oxygen plasma and / or nitrogen plasma is 100 to
About 1000 W and about 1 to 30 minutes are preferable.

The film thickness of the coating layers 9 and 9A is appropriately determined according to the material used, the light transmittance required for the transparent conductive film, the required durability, etc. If it is too thin, the protective effect of the transparent conductive thin film due to the formation of the coating layer cannot be sufficiently obtained, and if it is too thick, the transparency is reduced, and especially the metal layer is oxidized, nitrided or oxynitrided. In such a coating layer, the conductivity of the transparent conductive thin film is lowered, and the thickness of the transparent conductive film itself is increased, which is not preferable. Therefore, the film thickness of the coating layers 9 and 9A is 0.5 to
The thickness is preferably 100 nm, particularly 0.5 to 50 nm.

Regarding the light transmittance of the transparent conductive film, it is usually desired that the light transmittance of the transparent conductive film used for PDP or liquid crystal with weak emission is 80% or more. The film thickness of the coating layer is determined within a range in which a high light transmittance can be maintained. However, the brightness adjustment may be necessary in some applications such as a cathode ray tube that emits strong light. In such a case, the light transmittance of the transparent conductive film may be 80% or less.

Regarding the conductivity, when the transparent conductive film is used as a touch panel, the surface resistance value of the coating layers 9 and 9A after forming the coating layers 9 and 9A is 300 to 300.
It is desired to be 2000 Ω / Sq, particularly 400 to 1000 Ω / Sq.

In the present invention, the coating layers 9, 9A
It is desired to increase the durability of the transparent conductive thin film by forming the above, and to obtain high durability such that the linearity value is maintained at 1.5% or less even after long-term use.

Therefore, in the present invention, the material, film thickness and layer structure of the coating layer are appropriately designed so that the surface resistance value, linearity value and light transmittance can be obtained.

The metal layer of such a coating layer is formed by vacuum deposition,
Physical vapor deposition methods such as sputtering, ion plating and laser ablation, or chemical vapor deposition methods such as CVD, and particularly preferably sputtering methods, are used to form a film.
The obtained coating layer has excellent denseness and adhesion to the transparent conductive thin film, there is little contamination during film formation, and high-speed film formation is possible, and after the transparent conductive thin film is formed, it can be continuously formed in the same device. This is desirable in that the coating layer can be formed on the film and the film forming efficiency is excellent.

There are no particular restrictions on the sputtering conditions for forming the coating layer, which can be carried out at a vacuum degree of 0.05 to 1 Pa and an input power density of about ² to 500 kW / m ^2. By adjusting the film time, a coating layer having a desired film thickness can be formed.

The transparent conductive thin film can be formed by a conventional method, but it is generally preferable to form the transparent conductive thin film by a sputtering method like the coating layer. In this case,
By changing only the target, the transparent conductive thin film and the coating layer can be successively formed by sputtering in the same sputtering apparatus.

In the transparent conductive film of the present invention, as shown in FIGS. 1 to 3, a hard coat layer 8 may be formed on the surface of the polymer film 4 opposite to the surface on which the transparent conductive thin film 5 is formed. . Examples of the hard coat layer 8 include an acrylic layer, an epoxy layer, a urethane layer, and a silicon layer, and the thickness thereof is usually about 1 to 50 μm.

The transparent conductive thin film may be directly formed on the polymer film, but as shown in FIGS. 2 and 3, the underlayer 1 is provided between the polymer films 4, 4A and the transparent conductive thin films 5, 5A.
0,10A may be interposed, and such an underlayer 1
By forming 0,10A, the polymer film 4,
Adhesion of the transparent conductive thin films 5 and 5A to 4A can be improved, and peeling of the transparent conductive thin films 5 and 5A due to repeated deformation can be prevented. That is, by forming the underlayers 10 and 10A on the polymer films 4 and 4A, it is possible to prevent gas from being generated from the polymer films 4 and 4A during film formation,
Transparent conductive thin film 5,5A for polymer film 4,4A
Can be formed with good adhesion. Also,
The underlayers 10 and 10A serve as an intermediate layer between the polymer films 4 and 4A and the transparent conductive thin films 5 and 5A to enhance the adhesion between them. Further, the scratch resistance can be enhanced by improving the strength of the transparent conductive film by forming the base layers 10 and 10A.

In this case, examples of the material for forming the base layers 10 and 10A include acrylic, urethane, and epoxy resin layers, and hydrolysates of organic silicon compounds.

Further, the underlayer 1 is formed on the polymer films 4 and 4A.
In order to increase the adhesive strength of the thin film to be formed, a plasma treatment is performed on the surface of the polymer film 4, 4A according to a conventional method before forming the 0, 10A and the transparent conductive thin films 5, 5A,
Treatments such as corona treatment and solvent cleaning may be performed.

Further, for the purpose of improving the optical characteristics of the transparent conductive film, the underlayer 10 of the transparent conductive thin film 5 may be a two-layer film of a low refractive index film and a high refractive index film, or an alternate laminated film thereof, or a hard film. The surface of the coat layer 8 may be antiglare processed or AR processed.

The touch panel shown in FIG. 1 has an upper electrode 6A.
As a transparent conductive thin film 5 on one surface of the polymer film 4,
The transparent conductive film of the present invention in which the hard coat layer 8 is formed on the other surface of the transparent conductive thin film 5 is laminated, and the transparent conductive thin film 5 of the upper electrode 6A is prevented from being damaged or peeled off by signal input. It has excellent durability and reliability in electrical characteristics.

The touch panel shown in FIG. 2 has an upper electrode 6B.
As the above, the transparent conductive film of the present invention in which the underlayer 10, the transparent conductive thin film 5 and the coating layer 9 are laminated on one surface of the polymer film 4 and the hard coat layer 8 is formed on the other surface is used. As compared with the touch panel shown in FIG. 1, the adhesiveness of the transparent conductive thin film 5 is better, and the durability and reliability are even better.

The touch panel shown in FIG. 3 uses the transparent conductive film of the present invention as the lower electrode in FIG. Lower electrode 3A of this touch panel
Is a transparent conductive thin film 5A formed on a polymer film 4A via an underlayer 10A, and a coating layer 9A is formed on the transparent conductive thin film 5A. , The microdot spacers 7 are formed, and the microdot spacers 7 are bonded to the plastic plate 12 such as an acrylic resin or a polycarbonate resin by the adhesive 11, and in this touch panel, the upper electrode 6B and the lower electrode 3
The transparent conductive thin films 5 and 5A of A are both protected by the coating layers 9 and 9A, and the adhesion is enhanced by the base layers 10 and 10A.
The durability and reliability are extremely high.

The transparent conductive film of the present invention can be effectively used not only as an upper electrode or a lower electrode of a touch panel, but also as a transparent switching device and other various optical transparent conductive film applications.

[0056]

EXAMPLES The present invention will be described more specifically with reference to Examples and Comparative Examples below.

Example 1 A PET film having a thickness of 188 μm was used as a base material, and a JSR acrylic photocurable hard coating agent (Z7501: solid content concentration 35% by weight, solvent MEK) was first applied by wet coating on one side. A hard coat layer having a thickness of 5 μm was formed.

This film was placed in a vacuum chamber of a magnetron DC sputtering apparatus, in which 10% by weight of tin oxide was used as a target of the transparent conductive thin film, and the purity was 99.99%.
Of the ITO target and a Ti target having a purity of 99.99%.

First, the chamber was evacuated to 5 × 10 ⁻⁴ Pa with a turbo molecular pump, and then Ar gas was added for 196 s.
Ccm and O ₂ gas were introduced as a mixed gas at a flow rate of 4 sccm, and the atmosphere pressure was adjusted to 0.5 Pa. Then, a voltage of 4 kW was applied to the ITO target, and the surface of the PET film opposite to the hard coat layer-formed surface was adjusted to about 2 Ω / Sq so that the surface resistance value was about 500 Ω / Sq.
An ITO thin film having a thickness of 0 nm was formed. Then, after replacing the inside of the chamber with Ar gas, the atmospheric pressure was adjusted to 0.5 Pa, and a voltage of 2 kW was applied to the Ti target to obtain I
A Ti thin film with a thickness of about 3 nm was formed as a coating layer on the TO thin film.

With respect to the obtained transparent conductive film, the surface resistance value on the coating layer side was measured by a surface resistance measuring device (“Loresta AP” manufactured by Mitsubishi Chemical Corporation), and a sliding writing test was conducted by the following method. The results are shown in Table 1.

<Sliding writing test> The transparent conductive thin film (covering layer) side of the transparent conductive film is made to face an ITO glass substrate with a microdot spacer, and these are bonded together, and the surface of the transparent conductive film on which the hard coat layer is formed is polyacetal. Use a resin input pen (0.8R tip) to set 250
A reciprocal sliding writing test was conducted by applying a load of gf. After the test, the linearity value was measured, and a linearity value of 1.5% or less was evaluated as good, and a linearity value of more than 1.5% was evaluated as poor. In addition, the appearance was observed.

Further, a hard coat layer, a PET film,
The total light transmittance (JIS K7105) of the laminated film of the ITO thin film and the Ti thin film was measured, and the results are shown in Table 1.
Also described in.

Example 2 In Example 1, the purity of 99.
Approximately 3 nm as a coating layer using 99% Sn target
A transparent conductive film was produced in the same manner except that a Sn thin film having a thickness was formed.

About this transparent conductive film, Example 1
The surface resistance value and the total light transmittance were measured in the same manner as described above, and a sliding writing test was performed, and the results are shown in Table 1.

Example 3 In Example 2, the transparent conductive film having the Ti thin film formed thereon was set in a vacuum chamber, and the inside of the chamber was set to 5
Except that the Ti coating layer was clarified by performing surface treatment of the Ti thin film for about 1 min with oxygen plasma with RF power of 300 W under a pressure of 50 Pa by introducing O ₂ gas after the gas was exhausted to × 10 ⁻⁴ Pa. A transparent conductive film was produced in the same manner.

About this transparent conductive film, Example 1
The surface resistance value and the total light transmittance were measured in the same manner as described above, and a sliding writing test was performed, and the results are shown in Table 1.

Example 4 In Example 2, the transparent conductive film on which the Sn thin film was formed was set in a hot air oven, and it was heated to 150 ° C. in an oxygen atmosphere.
A transparent conductive film was produced in the same manner except that the Sn coating layer was made transparent by performing a heat treatment for 3 hours.

About this transparent conductive film, Example 1
The surface resistance value and the total light transmittance were measured in the same manner as described above, and a sliding writing test was performed, and the results are shown in Table 1.

Comparative Example 1 A transparent conductive film was prepared in the same manner as in Example 1 except that the coating layer was not formed.

About this transparent conductive film, Example 1
The surface resistance value and the total light transmittance were measured in the same manner as described above, and a sliding writing test was performed, and the results are shown in Table 1.

[0071]

[Table 1]

From Table 1, it can be seen that the present invention provides a transparent conductive film which is free from the problem of deterioration of electric characteristics and has excellent durability. Further, even when a coating layer made of a metal layer is provided, the transparency is not impaired,
Further, it can be seen that the light transmittance can be increased if the coating layer is made by making the metal layer transparent by oxidation or the like.

[0073]

As described in detail above, according to the present invention, the transparent conductive thin film of the transparent conductive film is effectively prevented from being damaged or peeled off by the coating layer on the transparent conductive thin film. By using the touch panel, there is no problem of deterioration of electric characteristics due to damage or peeling of the transparent conductive thin film, and a touch panel excellent in durability and reliability is provided.

[Brief description of drawings]

FIG. 1 is a sectional view showing an embodiment of a touch panel provided with a transparent conductive film of the present invention.

FIG. 2 is a cross-sectional view showing another embodiment of a touch panel including the transparent conductive film of the present invention.

FIG. 3 is a cross-sectional view showing another embodiment of a touch panel including the transparent conductive film of the present invention.

FIG. 4 is a cross-sectional view showing a conventional touch panel.

[Explanation of symbols]

1 glass plate 2 Transparent conductive thin film 3,3A lower electrode 4,4A polymer film 5,5A transparent conductive thin film 6,6A, 6B Upper electrode 7 Spacer 8 Hard coat layer 9,9A coating layer 10,10A Underlayer 11 Adhesive 12 plastic plates

─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. ⁷ Identification code FI theme code (reference) H01B 13/00 503 H01B 13/00 503B (72) Inventor Shingo 3-1-Ogawa Higashimachi, Kodaira-shi, Tokyo 1 Incorporated Bridgestone Technology Center (72) Inventor Yukihiro Kusano 3-1-1 Ogawahigashicho, Kodaira-shi, Tokyo Incorporated Bridgestone Technology Center (72) Inventor Masato Yoshikawa 3-1-Ogawahigashi, Kodaira-shi, Tokyo 1 Stock Company F-term in Bridgestone Technology Center (Reference) 4F100 AA17C AA25C AA28C AA33B AB01C AB10C AB11C AB12C AB13C AB15C AB16C AB17C AB18C AB19C AB21C AB23C AB24C JN24JJOJC06J61JJ04JJ04J4JJ04J4JJ04J4JJ04JJ04JJ04JJ04JJ04JJ04JJ04JJ04JJ04JC04JE0466JE0466JE0466JE0466JE0466JE0466JE0466JE0466JE0466JE0466JE0466JE04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04CJH04C AA25 BA02 BA03 BA04 BA05 BA06 BA07 BA08 BA10 BA12 BA13 BA15 BA1 6 BA17 BA18 BA35 BA41 BA43 BD00 CA01 CA03 CA05 DB20 4K030 BA01 BA02 BA05 BA06 BA10 BA11 BA13 BA14 BA16 BA17 BA18 BA20 BA21 BA22 BA29 BA35 BA42 CA01 CA07 CA12 5G307 FA02 FB01 FC02 5G323 BA02 BC03

Claims (20)

[Claims] 1. A transparent conductive film comprising a polymer film and a transparent conductive thin film formed on the polymer film, wherein a coating layer made of metal is formed on the transparent conductive thin film. 2. The metal according to claim 1, wherein the metal is Ti or S.
i, Nb, In, Zn, Sn, Au, Ag, Cu, A
l, Co, Cr, Ni, Pb, Pd, Pt, W, Zr,
A transparent conductive film comprising one or two or more metals selected from the group consisting of Ta and Hf, or containing it as a main component. 3. The coating layer according to claim 1 or 2,
A transparent conductive film formed by a physical vapor deposition method such as vacuum vapor deposition, sputtering, ion plating, or laser ablation, or a chemical vapor deposition method such as CVD. 4. A transparent conductive film comprising a polymer film, on which a transparent conductive thin film and a coating layer covering the same are formed, wherein the coating layer oxidizes a metal layer formed on the transparent conductive thin film. A transparent conductive film, which is a coating layer formed by nitriding or oxynitriding. 5. The metal according to claim 4, wherein the metal is Ti or S.
i, Nb, In, Zn, Sn, Ag, Cu, Al, C
o, Cr, Ni, Pb, W, Zr, Ta and Hf, or one or more metals selected from the group consisting of
Alternatively, a transparent conductive film containing it as a main component. 6. The coating layer according to claim 4 or 5,
A transparent conductive film, which is obtained by heat-treating a metal layer formed on the transparent conductive thin film in an oxygen atmosphere. 7. The coating layer according to claim 4 or 5,
A transparent conductive film, characterized in that the metal layer formed on the transparent conductive thin film is surface-treated with oxygen plasma and / or nitrogen plasma. 8. The metal layer according to claim 4, wherein the metal layer is formed by a physical vapor deposition method such as vacuum vapor deposition, sputtering, ion plating or laser ablation, or a chemical vapor deposition method such as CVD. A transparent conductive film characterized by the above. 9. The transparent conductive film according to any one of claims 1 to 8, wherein the coating layer has a thickness of 0.5 to 100 nm. 10. The surface resistance value on the coating layer side according to claim 1, wherein the surface resistance value is 300 to 2000 Ω /.
A transparent conductive film having Sq and a linearity value of 1.5% or less. 11. The transparent conductive thin film according to claim 1, wherein the transparent conductive thin film contains at least one selected from the group consisting of indium oxide, zinc oxide and tin oxide as a main component. Characteristic transparent conductive film. 12. A method for producing a transparent conductive film by forming a transparent conductive thin film on a polymer film and forming a coating layer on the transparent conductive thin film, comprising forming a metal layer on the transparent conductive thin film. Then, the coating layer is formed by oxidizing, nitriding or oxynitriding the metal layer. 13. The metal layer according to claim 12, wherein the metal layer is T.
i, Si, Nb, In, Zn, Sn, Ag, Cu, A
1, Co, Cr, Ni, Pb, W, Zr, Ta and Hf
1. A method for producing a transparent conductive film, which is composed of one or more metals selected from the group consisting of, or has as a main component. 14. The method for producing a transparent conductive film according to claim 12, wherein the metal layer is oxidized by heat treatment in an oxygen atmosphere. 15. The method for producing a transparent conductive film according to claim 12, wherein the metal layer is surface-treated with oxygen plasma and / or nitrogen plasma to perform oxidation, nitridation or oxynitridation. 16. The metal layer according to claim 12, wherein the metal layer is formed by a physical vapor deposition method such as vacuum vapor deposition, sputtering, ion plating or laser ablation, or a chemical vapor deposition method such as CVD. A method for producing a transparent conductive film, comprising: 17. The method for producing a transparent conductive film according to claim 12, wherein the coating layer has a thickness of 0.5 to 100 nm. 18. The surface resistance value on the coating layer side according to claim 12, wherein the surface resistance value is 300 to 2000.
Ω / Sq and a linearity value of 1.5% or less, a method for producing a transparent conductive film. 19. The transparent conductive thin film according to claim 12, wherein the transparent conductive thin film contains, as a main component, one or more selected from the group consisting of indium oxide, zinc oxide and tin oxide. A method for producing a transparent conductive film, which is characterized. 20. A touch panel comprising the transparent conductive film according to any one of claims 1 to 11.