JP4885438B2 - 基板処理装置並びに基板処理装置用電気ヒーター及びこれを備えた基板処理装置並びに基板処理装置用電気ヒーターにおける発熱体の保持構造及び基板処理装置を用いた半導体装置の製造方法 - Google Patents

基板処理装置並びに基板処理装置用電気ヒーター及びこれを備えた基板処理装置並びに基板処理装置用電気ヒーターにおける発熱体の保持構造及び基板処理装置を用いた半導体装置の製造方法 Download PDF

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JP4885438B2
JP4885438B2 JP2004305544A JP2004305544A JP4885438B2 JP 4885438 B2 JP4885438 B2 JP 4885438B2 JP 2004305544 A JP2004305544 A JP 2004305544A JP 2004305544 A JP2004305544 A JP 2004305544A JP 4885438 B2 JP4885438 B2 JP 4885438B2
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Japan
Prior art keywords
heating element
processing apparatus
substrate processing
heating
electric heater
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JP2004305544A
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Japanese (ja)
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JP2006100755A (ja
JP2006100755A5 (enrdf_load_stackoverflow
Inventor
敏光 宮田
明 諸橋
公男 北村
健司 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teitokusha Co Ltd
Kokusai Denki Electric Inc
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Hitachi Kokusai Electric Inc
Teitokusha Co Ltd
Kokusai Denki Electric Inc
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Priority to JP2004305544A priority Critical patent/JP4885438B2/ja
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Publication of JP2006100755A5 publication Critical patent/JP2006100755A5/ja
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JP2004305544A 2003-10-21 2004-10-20 基板処理装置並びに基板処理装置用電気ヒーター及びこれを備えた基板処理装置並びに基板処理装置用電気ヒーターにおける発熱体の保持構造及び基板処理装置を用いた半導体装置の製造方法 Expired - Lifetime JP4885438B2 (ja)

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JP2004305544A JP4885438B2 (ja) 2003-10-21 2004-10-20 基板処理装置並びに基板処理装置用電気ヒーター及びこれを備えた基板処理装置並びに基板処理装置用電気ヒーターにおける発熱体の保持構造及び基板処理装置を用いた半導体装置の製造方法

Applications Claiming Priority (5)

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JP2003361292 2003-10-21
JP2003361292 2003-10-21
JP2004256651 2004-09-03
JP2004256651 2004-09-03
JP2004305544A JP4885438B2 (ja) 2003-10-21 2004-10-20 基板処理装置並びに基板処理装置用電気ヒーター及びこれを備えた基板処理装置並びに基板処理装置用電気ヒーターにおける発熱体の保持構造及び基板処理装置を用いた半導体装置の製造方法

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JP2006100755A JP2006100755A (ja) 2006-04-13
JP2006100755A5 JP2006100755A5 (enrdf_load_stackoverflow) 2007-11-29
JP4885438B2 true JP4885438B2 (ja) 2012-02-29

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JP2004305544A Expired - Lifetime JP4885438B2 (ja) 2003-10-21 2004-10-20 基板処理装置並びに基板処理装置用電気ヒーター及びこれを備えた基板処理装置並びに基板処理装置用電気ヒーターにおける発熱体の保持構造及び基板処理装置を用いた半導体装置の製造方法

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4646592B2 (ja) * 2003-10-21 2011-03-09 貞徳舎株式会社 電気ヒーター及びこれを備えた炉
JP5139734B2 (ja) * 2007-06-25 2013-02-06 株式会社日立国際電気 基板処理装置及びこれに用いられる加熱装置
US8395096B2 (en) 2009-02-05 2013-03-12 Sandvik Thermal Process, Inc. Precision strip heating element
US9064912B2 (en) 2009-07-21 2015-06-23 Hitachi Kokusai Electric, Inc. Heating device, substrate processing apparatus, and method of manufacturing semiconductor device
JP5544121B2 (ja) 2009-07-21 2014-07-09 株式会社日立国際電気 加熱装置、基板処理装置、及び半導体装置の製造方法
KR101096602B1 (ko) * 2009-07-21 2011-12-20 가부시키가이샤 히다치 고쿠사이 덴키 가열 장치, 기판 처리 장치 및 반도체 장치의 제조 방법
JP5525248B2 (ja) * 2009-12-03 2014-06-18 貞徳舎株式会社 電気ヒーター及び電気ヒーターの製造方法並びに加熱装置
CN109616434B (zh) 2015-02-25 2025-03-11 株式会社国际电气 衬底处理装置及方法、半导体器件的制造方法以及加热部
JP6630146B2 (ja) * 2015-02-25 2020-01-15 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、半導体装置の製造方法および加熱部
JP6887659B2 (ja) * 2015-09-15 2021-06-16 貞徳舎株式会社 熱風生成装置
CN117295419A (zh) * 2021-06-16 2023-12-26 日本烟草产业株式会社 气溶胶生成系统

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6231997Y2 (enrdf_load_stackoverflow) * 1980-03-27 1987-08-15
US4403329A (en) * 1981-07-06 1983-09-06 General Signal Corporation Support system for electrical resistance element
JP3307924B2 (ja) * 1990-10-18 2002-07-29 東京エレクトロン株式会社 熱処理装置
JP3484387B2 (ja) * 2000-01-13 2004-01-06 株式会社第一機電 電気炉

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