JP4878082B2 - 露光装置およびデバイス製造方法 - Google Patents

露光装置およびデバイス製造方法 Download PDF

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Publication number
JP4878082B2
JP4878082B2 JP2001053384A JP2001053384A JP4878082B2 JP 4878082 B2 JP4878082 B2 JP 4878082B2 JP 2001053384 A JP2001053384 A JP 2001053384A JP 2001053384 A JP2001053384 A JP 2001053384A JP 4878082 B2 JP4878082 B2 JP 4878082B2
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Japan
Prior art keywords
valve
closing
opening
inlet
gas
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Expired - Fee Related
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JP2001053384A
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Japanese (ja)
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JP2002260980A5 (enExample
JP2002260980A (ja
Inventor
貴吉 荒川
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2001053384A priority Critical patent/JP4878082B2/ja
Publication of JP2002260980A publication Critical patent/JP2002260980A/ja
Publication of JP2002260980A5 publication Critical patent/JP2002260980A5/ja
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Publication of JP4878082B2 publication Critical patent/JP4878082B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001053384A 2001-02-28 2001-02-28 露光装置およびデバイス製造方法 Expired - Fee Related JP4878082B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001053384A JP4878082B2 (ja) 2001-02-28 2001-02-28 露光装置およびデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001053384A JP4878082B2 (ja) 2001-02-28 2001-02-28 露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2002260980A JP2002260980A (ja) 2002-09-13
JP2002260980A5 JP2002260980A5 (enExample) 2008-04-17
JP4878082B2 true JP4878082B2 (ja) 2012-02-15

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ID=18913854

Family Applications (1)

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JP2001053384A Expired - Fee Related JP4878082B2 (ja) 2001-02-28 2001-02-28 露光装置およびデバイス製造方法

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JP (1) JP4878082B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2009899A (en) * 2011-12-20 2013-06-24 Asml Netherlands Bv A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method.

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0712012B2 (ja) * 1985-12-11 1995-02-08 株式会社ニコン 投影露光装置
JPH11154644A (ja) * 1997-08-26 1999-06-08 Nikon Corp 投影露光装置
JPH11154636A (ja) * 1997-11-20 1999-06-08 Nikon Corp 投影露光装置
WO2001008204A1 (en) * 1999-07-23 2001-02-01 Nikon Corporation Exposing method and apparatus

Also Published As

Publication number Publication date
JP2002260980A (ja) 2002-09-13

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