JP4860343B2 - 表示装置の作製方法 - Google Patents
表示装置の作製方法 Download PDFInfo
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- JP4860343B2 JP4860343B2 JP2006132109A JP2006132109A JP4860343B2 JP 4860343 B2 JP4860343 B2 JP 4860343B2 JP 2006132109 A JP2006132109 A JP 2006132109A JP 2006132109 A JP2006132109 A JP 2006132109A JP 4860343 B2 JP4860343 B2 JP 4860343B2
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- electrode layer
- layer
- film
- oxide
- light
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| JP5352878B2 (ja) * | 2008-03-31 | 2013-11-27 | 公立大学法人高知工科大学 | 表示用基板及びその製造方法並びに表示装置 |
| WO2010035627A1 (en) * | 2008-09-25 | 2010-04-01 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| US8735874B2 (en) * | 2011-02-14 | 2014-05-27 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting device, display device, and method for manufacturing the same |
| KR102304724B1 (ko) * | 2014-12-19 | 2021-09-27 | 삼성디스플레이 주식회사 | 박막트랜지스터 기판, 이를 포함하는 디스플레이 장치, 박막트랜지스터 기판 제조방법 및 이를 이용한 디스플레이 장치 제조방법 |
| KR102367250B1 (ko) * | 2015-09-17 | 2022-02-25 | 삼성디스플레이 주식회사 | 유기 발광 소자 |
| KR102505880B1 (ko) * | 2017-09-06 | 2023-03-06 | 삼성디스플레이 주식회사 | 박막 트랜지스터 및 그 제조방법, 이를 포함하는 표시 장치 |
| CN111886932A (zh) | 2018-03-19 | 2020-11-03 | 株式会社理光 | 无机el元件、显示元件、图像显示装置和系统 |
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| JP4187315B2 (ja) * | 1998-08-07 | 2008-11-26 | 帝人株式会社 | 液晶表示用透明導電積層体の製造方法 |
| JP2003016858A (ja) * | 2001-06-29 | 2003-01-17 | Sanyo Electric Co Ltd | インジウムスズ酸化膜の製造方法 |
| JP4917725B2 (ja) * | 2001-09-26 | 2012-04-18 | 東ソー株式会社 | 透明導電膜およびその製造方法並びにその用途 |
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| JP2005258115A (ja) * | 2004-03-12 | 2005-09-22 | Idemitsu Kosan Co Ltd | 薄膜トランジスタ型基板及び薄膜トランジスタ型液晶表示装置及び薄膜トランジスタ型基板の製造方法 |
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