JP4812453B2 - 感光性組成物除去液 - Google Patents

感光性組成物除去液 Download PDF

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Publication number
JP4812453B2
JP4812453B2 JP2006032161A JP2006032161A JP4812453B2 JP 4812453 B2 JP4812453 B2 JP 4812453B2 JP 2006032161 A JP2006032161 A JP 2006032161A JP 2006032161 A JP2006032161 A JP 2006032161A JP 4812453 B2 JP4812453 B2 JP 4812453B2
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JP
Japan
Prior art keywords
photosensitive composition
mass
acetate
pigment
glycol monoalkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2006032161A
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English (en)
Japanese (ja)
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JP2006251786A (ja
JP2006251786A5 (https=
Inventor
昌人 金田
泰広 三河
浩一 寺尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP2006032161A priority Critical patent/JP4812453B2/ja
Publication of JP2006251786A publication Critical patent/JP2006251786A/ja
Publication of JP2006251786A5 publication Critical patent/JP2006251786A5/ja
Application granted granted Critical
Publication of JP4812453B2 publication Critical patent/JP4812453B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2006032161A 2005-02-09 2006-02-09 感光性組成物除去液 Expired - Lifetime JP4812453B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006032161A JP4812453B2 (ja) 2005-02-09 2006-02-09 感光性組成物除去液

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005032879 2005-02-09
JP2005032879 2005-02-09
JP2006032161A JP4812453B2 (ja) 2005-02-09 2006-02-09 感光性組成物除去液

Publications (3)

Publication Number Publication Date
JP2006251786A JP2006251786A (ja) 2006-09-21
JP2006251786A5 JP2006251786A5 (https=) 2009-02-19
JP4812453B2 true JP4812453B2 (ja) 2011-11-09

Family

ID=37092285

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006032161A Expired - Lifetime JP4812453B2 (ja) 2005-02-09 2006-02-09 感光性組成物除去液

Country Status (1)

Country Link
JP (1) JP4812453B2 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6100669B2 (ja) * 2013-10-11 2017-03-22 Ｊｘエネルギー株式会社 洗浄液組成物
JP2015096590A (ja) * 2013-10-11 2015-05-21 Ｊｘ日鉱日石エネルギー株式会社 硬化性樹脂用洗浄液組成物
KR102832650B1 (ko) * 2021-01-29 2025-07-11 에스케이하이닉스 주식회사 신너 조성물 및 이를 이용한 반도체 기판의 표면 처리 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003327999A (ja) * 2002-03-06 2003-11-19 Asahi Glass Co Ltd 溶剤組成物
JP4005092B2 (ja) * 2004-08-20 2007-11-07 東京応化工業株式会社 洗浄除去用溶剤

Also Published As

Publication number Publication date
JP2006251786A (ja) 2006-09-21

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