JP4810173B2 - ストライエーションが減少した研磨パッドを形成する方法 - Google Patents
ストライエーションが減少した研磨パッドを形成する方法 Download PDFInfo
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- JP4810173B2 JP4810173B2 JP2005285785A JP2005285785A JP4810173B2 JP 4810173 B2 JP4810173 B2 JP 4810173B2 JP 2005285785 A JP2005285785 A JP 2005285785A JP 2005285785 A JP2005285785 A JP 2005285785A JP 4810173 B2 JP4810173 B2 JP 4810173B2
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- microspheres
- bulk density
- polishing pad
- hollow polymer
- polymer microspheres
- Prior art date
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Images
Classifications
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- B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
- B29C39/003—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor characterised by the choice of material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
- B29B7/00—Mixing; Kneading
- B29B7/30—Mixing; Kneading continuous, with mechanical mixing or kneading devices
- B29B7/58—Component parts, details or accessories; Auxiliary operations
- B29B7/72—Measuring, controlling or regulating
- B29B7/726—Measuring properties of mixture, e.g. temperature or density
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
- B29B7/00—Mixing; Kneading
- B29B7/74—Mixing; Kneading using other mixers or combinations of mixers, e.g. of dissimilar mixers ; Plant
- B29B7/7476—Systems, i.e. flow charts or diagrams; Plants
- B29B7/748—Plants
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
Claims (6)
- ケミカルメカニカル研磨パッドを形成する方法であって、
ポリマー材料をタンクに供給するステップ、
初期かさ密度を有する中空ポリマー微小球を、プレナムの上方に設けられたヘリカル撹拌機及び多孔質膜をさらに含む貯蔵ホッパに供給するステップ、
前記中空ポリマー微小球を再循環するための、通過する前記中空ポリマー微小球のかさ密度を連続的に計測するマスフローメータを有する再循環ループを設けて、前記中空ポリマー微小球の前記かさ密度を制御するステップ、
ガス導入ラインを介して流動化ガス供給源を前記プレナムに接続するステップ、
流動化ガスを、前記流動化ガス供給源から前記プレナムに、前記多孔質膜を介して前記貯蔵ホッパに送り込むことによって、前記中空ポリマー微小球を流動化させ、それにより、前記中空ポリマー微小球の前記かさ密度を前記初期かさ密度よりも小さく下げるステップ、
送り出しシステムを設けて前記ポリマー材料及び前記初期かさ密度よりも小さい前記かさ密度を有する前記中空ポリマー微小球を混合機に送り出すステップ、
前記ポリマー材料と前記中空ポリマー微小球との混合物を形成するステップ、
前記混合物を型に注入して成形物を形成するステップ、及び
前記成形物を研磨パッドに切り出すステップ
を含む方法。 - 前記中空ポリマー微小球を流動化するステップが、前記中空ポリマー微小球の前記かさ密度を少なくとも20%下げる、請求項1記載の方法。
- 前記多孔質膜が、0.152m/secの標準ガス速度で0.498〜13.780kPaの圧力降下の透過率を達成する、請求項1記載の方法。
- 前記混合物を注入する前に前記混合機をガス抜きするステップをさらに含む、請求項1記載の方法。
- 前記ポリマー材料が、ポリウレタン、ポリカーボネート、ポリエステル、シリコーン、ポリイミド、ポリスルホン、ポリ塩化ビニル、ポリアクリロニトリル、ポリメチルメタクリレート、ポリフッ化ビニリデン、ポリエチレンテレフタレート、ポリエーテルエーテルケトン、ポリエーテルケトン、ポリエーテルイミド、エチルビニルアセテート、ポリ酪酸ビニル、ポリ酢酸ビニル、アクリロニトリルブタジエンスチレン、フッ素化エチレンプロピレン及びペルフルオロアルコキシポリマーならびにこれらの組み合わせを含む、請求項1記載の方法。
- 前記中空ポリマー微小球がアクリロニトリル及び塩化ビニリデンのコポリマーを含む、請求項1記載の方法。
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US10/956,847 | 2004-09-30 | ||
US10/956,847 US7396497B2 (en) | 2004-09-30 | 2004-09-30 | Method of forming a polishing pad having reduced striations |
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JP2006104467A5 JP2006104467A5 (ja) | 2008-10-16 |
JP4810173B2 true JP4810173B2 (ja) | 2011-11-09 |
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Country Status (4)
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US (1) | US7396497B2 (ja) |
JP (1) | JP4810173B2 (ja) |
CN (1) | CN1754657B (ja) |
TW (1) | TWI352643B (ja) |
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US20060066001A1 (en) | 2006-03-30 |
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