JP4757778B2 - 窒化珪素粉末、その製造方法及び用途 - Google Patents
窒化珪素粉末、その製造方法及び用途 Download PDFInfo
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- JP4757778B2 JP4757778B2 JP2006305022A JP2006305022A JP4757778B2 JP 4757778 B2 JP4757778 B2 JP 4757778B2 JP 2006305022 A JP2006305022 A JP 2006305022A JP 2006305022 A JP2006305022 A JP 2006305022A JP 4757778 B2 JP4757778 B2 JP 4757778B2
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- silicon nitride
- nitride powder
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- 229910052581 Si3N4 Inorganic materials 0.000 title claims description 41
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title claims description 41
- 239000000843 powder Substances 0.000 title claims description 36
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000002245 particle Substances 0.000 claims description 34
- 238000007747 plating Methods 0.000 claims description 17
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 238000005121 nitriding Methods 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 230000006835 compression Effects 0.000 claims description 3
- 238000007906 compression Methods 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 239000011863 silicon-based powder Substances 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 description 8
- 239000011651 chromium Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 230000013011 mating Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 239000011362 coarse particle Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 235000019982 sodium hexametaphosphate Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Pistons, Piston Rings, And Cylinders (AREA)
- Ceramic Products (AREA)
Description
特開平2−44017号公報の実施例1に従い、金属シリコンを窒化して窒化珪素インゴットを製造した。これをジョークラッシャーにて粗砕、チューブミルにて中砕する際、被粉砕物の供給量と粉砕時間を変えて比表面積の異なる種々の分級用窒化珪素粉末を製造した。これを高速ローター式の強制渦式分級機を用い、そのローター回転数と分級風量を種々変更して表1に示される窒化珪素粉末を製造した。得られた窒化珪素粉末について、上記方法に従い、平均粒子径、最大粒子径、1μm以下の粒子の含有率及び圧縮度を測定した。それらの結果を表1に示す。
Claims (3)
- 平均粒子径が2〜5μm、最大粒子径が25μm以下、1μm以下の粒子の含有率が30質量%以下であり、(d1−d2)/d1で定義される圧縮度が0.55〜0.57である窒化珪素粉末。(ここで、d1:JIS R 1628−1997に準拠したタップかさ密度、d2:JIS R 1628−1997に準拠した初期かさ密度、である。)
- 金属シリコンを窒化して製造された窒化珪素インゴットを、比表面積が2.5〜3.5m2/gに粉砕した後、その粉砕物を分級することを特徴とする請求項1に記載の窒化珪素粉末の製造方法。
- 請求項1に記載の窒化珪素粉末を含有してなる、摺動部材に塗布されるクロムメッキ。
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JP2006305022A JP4757778B2 (ja) | 2006-11-10 | 2006-11-10 | 窒化珪素粉末、その製造方法及び用途 |
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JP2006305022A JP4757778B2 (ja) | 2006-11-10 | 2006-11-10 | 窒化珪素粉末、その製造方法及び用途 |
Publications (2)
Publication Number | Publication Date |
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JP2008120624A JP2008120624A (ja) | 2008-05-29 |
JP4757778B2 true JP4757778B2 (ja) | 2011-08-24 |
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JP2006305022A Active JP4757778B2 (ja) | 2006-11-10 | 2006-11-10 | 窒化珪素粉末、その製造方法及び用途 |
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Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3531410A1 (de) * | 1985-09-03 | 1987-03-05 | Goetze Ag | Galvanische hartchromschicht |
JP2583261B2 (ja) * | 1988-01-14 | 1997-02-19 | 電気化学工業株式会社 | 充填剤 |
JP3382666B2 (ja) * | 1992-08-07 | 2003-03-04 | 電気化学工業株式会社 | 窒化けい素粉末の製造方法 |
JP3827360B2 (ja) * | 1996-03-05 | 2006-09-27 | 電気化学工業株式会社 | 窒化けい素の製造法 |
JP3148655B2 (ja) * | 1996-09-05 | 2001-03-19 | 帝国ピストンリング株式会社 | 摺動部材 |
JP3986154B2 (ja) * | 1998-03-24 | 2007-10-03 | 電気化学工業株式会社 | 窒化珪素質充填材及び半導体封止用樹脂組成物 |
JPH11278812A (ja) * | 1998-03-30 | 1999-10-12 | Shin Etsu Chem Co Ltd | 窒化ケイ素粉末の製造方法 |
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- 2006-11-10 JP JP2006305022A patent/JP4757778B2/ja active Active
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