JP4741218B2 - 液晶表示装置及びその作製方法、並びに液晶テレビ受像機 - Google Patents

液晶表示装置及びその作製方法、並びに液晶テレビ受像機 Download PDF

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Publication number
JP4741218B2
JP4741218B2 JP2004312394A JP2004312394A JP4741218B2 JP 4741218 B2 JP4741218 B2 JP 4741218B2 JP 2004312394 A JP2004312394 A JP 2004312394A JP 2004312394 A JP2004312394 A JP 2004312394A JP 4741218 B2 JP4741218 B2 JP 4741218B2
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Prior art keywords
liquid crystal
layer
crystal display
substrate
gate electrode
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Expired - Fee Related
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JP2004312394A
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Japanese (ja)
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JP2005159331A (ja
JP2005159331A5 (enExample
Inventor
舜平 山崎
慎志 前川
誠 古野
理 中村
馨太郎 今井
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2004312394A priority Critical patent/JP4741218B2/ja
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Publication of JP2005159331A5 publication Critical patent/JP2005159331A5/ja
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  • Liquid Crystal (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)
JP2004312394A 2003-10-28 2004-10-27 液晶表示装置及びその作製方法、並びに液晶テレビ受像機 Expired - Fee Related JP4741218B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004312394A JP4741218B2 (ja) 2003-10-28 2004-10-27 液晶表示装置及びその作製方法、並びに液晶テレビ受像機

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003368166 2003-10-28
JP2003368166 2003-10-28
JP2004312394A JP4741218B2 (ja) 2003-10-28 2004-10-27 液晶表示装置及びその作製方法、並びに液晶テレビ受像機

Publications (3)

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JP2005159331A JP2005159331A (ja) 2005-06-16
JP2005159331A5 JP2005159331A5 (enExample) 2007-11-15
JP4741218B2 true JP4741218B2 (ja) 2011-08-03

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8168980B2 (en) 2006-02-24 2012-05-01 Sharp Kabushiki Kaisha Active matrix substrate, display device, television receiver, manufacturing method of active matrix substrate, forming method of gate insulating film
JP2008065012A (ja) * 2006-09-07 2008-03-21 Future Vision:Kk 液晶表示パネル
US8786793B2 (en) * 2007-07-27 2014-07-22 Semiconductor Energy Laboratory Co., Ltd. Display device and manufacturing method thereof
WO2010050419A1 (en) * 2008-10-31 2010-05-06 Semiconductor Energy Laboratory Co., Ltd. Driver circuit and display device
FR2958075B1 (fr) * 2010-03-24 2012-03-23 Univ Paris Curie Procede de realisation d'une electrode metallique a la surface d'un materiau hydrophobe

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003080694A (ja) * 2001-06-26 2003-03-19 Seiko Epson Corp 膜パターンの形成方法、膜パターン形成装置、導電膜配線、電気光学装置、電子機器、並びに非接触型カード媒体
JP3980312B2 (ja) * 2001-09-26 2007-09-26 株式会社日立製作所 液晶表示装置およびその製造方法

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JP2005159331A (ja) 2005-06-16

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