JP4740892B2 - Weakly acidic chlorine water circulation device - Google Patents

Weakly acidic chlorine water circulation device Download PDF

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JP4740892B2
JP4740892B2 JP2007114223A JP2007114223A JP4740892B2 JP 4740892 B2 JP4740892 B2 JP 4740892B2 JP 2007114223 A JP2007114223 A JP 2007114223A JP 2007114223 A JP2007114223 A JP 2007114223A JP 4740892 B2 JP4740892 B2 JP 4740892B2
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元 川崎
香織 星野
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Tacmina Corp
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Description

本発明は、例えば、食品等の殺菌に用いられる弱酸性塩素水循環装置に関する。   The present invention relates to a weakly acidic chlorinated water circulation device used for sterilization of foods, for example.

例えば、食品等の殺菌対象物を殺菌する殺菌剤としては、次亜塩素酸ナトリウムといった次亜塩素酸塩水溶液が一般的に使用されている。この次亜塩素酸塩水溶液は、水素イオン指数(以下「pH」という)が比較的高く(例えばpH8以上)、その状態で使用される場合が多いが、pHが高いと遊離塩素として次亜塩素酸イオンの存在率が高くなり(図9参照)、この場合の殺菌力は、比較的弱い。   For example, a hypochlorite aqueous solution such as sodium hypochlorite is generally used as a disinfectant for sterilizing an object to be sterilized such as food. This aqueous hypochlorite aqueous solution has a relatively high hydrogen ion index (hereinafter referred to as “pH”) (for example, pH 8 or more) and is often used in this state. The abundance of acid ions is increased (see FIG. 9), and the bactericidal power in this case is relatively weak.

そのため、次亜塩素酸塩水溶液に、より強い殺菌力を発揮させるには、pHを低くして次亜塩素酸の存在率を高めることが望ましい(図9参照)が、このpHが低過ぎると(例えばpH4以下)、有毒な塩素ガスが多量に発生するため、好ましくない。   Therefore, in order to exert a stronger sterilizing power in the hypochlorite aqueous solution, it is desirable to lower the pH and increase the abundance of hypochlorous acid (see FIG. 9), but if this pH is too low (For example, pH 4 or less), a large amount of toxic chlorine gas is generated, which is not preferable.

したがって、塩素ガスの発生を抑制しながらも、高い殺菌力を発揮させるには、次亜塩素酸塩水溶液のpHを6程度の弱酸性の状態になるように調節するのが望ましい。例えば、この次亜塩素酸塩水溶液のpHの調節には、塩酸水溶液が用いられる。次亜塩素酸塩水溶液に塩酸水溶液を混合して希釈水で希釈することによって、殺菌効果の高い弱酸性塩素水が生成される。   Therefore, it is desirable to adjust the pH of the hypochlorite aqueous solution to be in a slightly acidic state of about 6 in order to exert high sterilizing power while suppressing generation of chlorine gas. For example, a hydrochloric acid aqueous solution is used for adjusting the pH of the hypochlorite aqueous solution. By mixing a hypochlorite aqueous solution with a hydrochloric acid aqueous solution and diluting with diluted water, weakly acidic chlorinated water having a high bactericidal effect is produced.

このようにして生成された弱酸性塩素水を用いて食品等の殺菌対象物を殺菌するには、殺菌タンクに所定の弱酸性塩素水を貯留し、この殺菌タンクに殺菌対象物を投入して殺菌するのが一般的である。   In order to sterilize an object to be sterilized such as food using the weakly acidic chlorinated water generated in this way, a predetermined weakly acidic chlorinated water is stored in a sterilization tank, and the sterilized object is put into the sterilized tank. It is common to sterilize.

上記のようにして殺菌対象物を殺菌する場合、殺菌タンクに殺菌対象物が投入されることによって、殺菌タンク内の弱酸性塩素水のpHや濃度が変化して殺菌力が低下することが考えられる。これを防止するには、殺菌タンク内の弱酸性塩素水を排出し、この弱酸性塩素水にさらに次亜塩素酸塩水溶液、塩酸水溶液を混合して、所望のpHの弱酸性塩素水として再生し、これを再び殺菌タンクに投入して循環させるのが望ましい。   When sterilizing an object to be sterilized as described above, it is considered that the pH and concentration of the weakly acidic chlorinated water in the sterilization tank is changed and the sterilization power is reduced by putting the sterilization object into the sterilization tank. It is done. In order to prevent this, the weakly acidic chlorine water in the sterilization tank is discharged, and a hypochlorite aqueous solution and hydrochloric acid aqueous solution are further mixed with this weakly acidic chlorine water to regenerate it as weakly acidic chlorine water having a desired pH. However, it is desirable to put this in the sterilization tank again and circulate it.

しかしながら、殺菌タンクから排出された弱酸性塩素水に塩酸水溶液と次亜塩素酸塩水溶液を一度に混合してしまうと、次亜塩素酸塩水溶液と塩酸水溶液が均一に混合されず、局部的に濃度の高い次亜塩素酸塩水溶液と濃度の高い塩酸水溶液とが接触し、これによって、有毒な塩素ガスが多量に発生するおそれがある。   However, if the aqueous hydrochloric acid solution and the hypochlorite aqueous solution are mixed at once with the weakly acidic chlorinated water discharged from the sterilization tank, the hypochlorite aqueous solution and the aqueous hydrochloric acid solution are not uniformly mixed, and locally. A high concentration hypochlorite aqueous solution and a high concentration hydrochloric acid aqueous solution come into contact with each other, which may generate a large amount of toxic chlorine gas.

本発明は、上記の事情に鑑みてなされたものであり、次亜塩素酸塩水溶液と塩酸水溶液を段階的に希釈して塩素ガスの発生を抑制した弱酸性塩素水を製造し、この弱酸性塩素水を殺菌タンクに供給して、常に殺菌対象物を殺菌できるようにした弱酸性塩素水循環装置を提供することを課題とする。   The present invention has been made in view of the above circumstances, and produced weakly acidic chlorinated water in which hypochlorite aqueous solution and hydrochloric acid aqueous solution are diluted stepwise to suppress generation of chlorine gas. It is an object of the present invention to provide a weakly acidic chlorinated water circulation device that supplies chlorinated water to a sterilization tank so that an object to be sterilized can always be sterilized.

本発明は上記の課題を解決するためのものであり、所定の水素イオン指数の弱酸性塩素水を製造する弱酸性塩素水製造装置と、この弱酸性塩素水製造装置によって製造された弱酸性塩素水を貯留するとともに、所定の殺菌対象物を殺菌する殺菌タンクと、弱酸性塩素水製造装置によって製造された弱酸性塩素水を殺菌タンクに供給する第1供給ラインと、殺菌タンクから排出された弱酸性塩素水を弱酸性塩素水製造装置に供給する第2供給ラインとによって弱酸性塩素水を循環させる循環ラインが構成され、この循環ラインに弱酸性塩素水を循環させる循環ポンプが設けられた弱酸性塩素水循環装置であって、殺菌タンクから排出された弱酸性塩素水は、弱酸性塩素水製造装置に供給されるとともにこの弱酸性塩素水製造装置で使用される塩酸水溶液および次亜塩素酸塩水溶液を希釈する希釈水として利用可能とされており、弱酸性塩素水製造装置は、塩酸水溶液を希釈する希釈水が供給される第1供給経路と、第1供給経路に塩酸水溶液を供給する供給装置と、次亜塩素酸塩水溶液を希釈する希釈水が供給される第2供給経路と、第2供給経路に次亜塩素酸塩水溶液を供給する供給装置と、第1供給経路と第2供給経路を合流させるとともに、第1供給経路で希釈された塩酸水溶液と第2供給経路で希釈された次亜塩素酸塩水溶液とを混合させて希釈することにより、所定の水素イオン指数の弱酸性塩素水を供給する第3供給経路とを備えており、第1供給経路には、塩酸水溶液の供給装置から供給される塩酸水溶液を注入する第1注入口と、第1注入口の下流側に位置するとともに、流量抵抗を生じさせて第1注入口から注入された塩酸水溶液を希釈水と混合して希釈する第1混合希釈部とが設けられており、第2供給経路には、次亜塩素酸塩水溶液の供給装置から供給される次亜塩素酸塩水溶液を注入する第2注入口と、第2注入口の下流側に位置するとともに、流量抵抗を生じさせて第2注入口から注入された次亜塩素酸塩水溶液を希釈水と混合して希釈する第2混合希釈部とが設けられており、第3供給経路には、流量抵抗を生じさせて、第1混合希釈部で希釈された塩酸水溶液と第2混合希釈部で希釈された次亜塩素酸塩水溶液とを混合して希釈することにより、所定の水素イオン指数の弱酸性塩素水を生成する第3混合希釈部が設けられていることを特徴とする。   The present invention is for solving the above-mentioned problems, and a weakly acidic chlorine water production apparatus for producing weakly acidic chlorine water having a predetermined hydrogen ion index, and a weakly acidic chlorine water produced by this weakly acidic chlorine water production apparatus. A sterilization tank for storing water and sterilizing a predetermined object to be sterilized, a first supply line for supplying weak acid chlorine water produced by a weak acid chlorine water production apparatus to the sterilization tank, and discharged from the sterilization tank A circulation line that circulates the weakly acidic chlorinated water is constituted by the second supply line that supplies the weakly acidic chlorinated water to the weakly acidic chlorinated water production apparatus, and a circulation pump that circulates the weakly acidic chlorinated water is provided in this circulation line. A weakly acidic chlorinated water circulation device, wherein the weakly acidic chlorinated water discharged from the sterilization tank is supplied to the weakly acidic chlorinated water production device and used in the weakly acidic chlorinated water production device. The weakly acidic chlorinated water production apparatus can be used as a diluting water for diluting an aqueous solution and a hypochlorite aqueous solution. A supply device for supplying an aqueous hydrochloric acid solution, a second supply path for supplying dilution water for diluting the hypochlorite aqueous solution, a supply apparatus for supplying a hypochlorite aqueous solution to the second supply path, The first supply path and the second supply path are merged, and the hydrochloric acid aqueous solution diluted in the first supply path and the hypochlorite aqueous solution diluted in the second supply path are mixed and diluted to obtain a predetermined amount. A third supply path for supplying weakly acidic chlorine water having a hydrogen ion index, and a first inlet for injecting a hydrochloric acid aqueous solution supplied from a hydrochloric acid aqueous solution supply device; When located downstream of the inlet And a first mixing / dilution unit for diluting the aqueous hydrochloric acid solution injected from the first injection port with the dilution water by causing flow resistance, and hypochlorous acid is provided in the second supply path. A second inlet for injecting a hypochlorite aqueous solution supplied from the salt water supply device and a downstream side of the second inlet and injecting from the second inlet with a flow resistance. A second mixed dilution section for mixing and diluting the hypochlorite aqueous solution with dilution water is provided, and the third supply path is diluted with the first mixed dilution section by generating a flow resistance. A third mixed dilution unit is provided that generates weakly acidic chlorine water having a predetermined hydrogen ion index by mixing and diluting the aqueous hydrochloric acid solution and the hypochlorite aqueous solution diluted in the second mixed dilution unit. It is characterized by being.

殺菌タンクに食品等の殺菌対象物が投入されて殺菌されると、殺菌対象物等から出る水分等の影響により、殺菌タンク中の弱酸性塩素水は、pHが高くなり、濃度も低くなる。このようになった弱酸性塩素水は、弱酸性塩素水製造装置に供給されて、この弱酸性塩素水製造装置で使用される塩酸水溶液や、次亜塩素酸塩水溶液を希釈する希釈水として利用される。   When an object to be sterilized such as food is put into the sterilization tank and sterilized, the weakly acidic chlorinated water in the sterilization tank has a high pH and a low concentration due to the influence of moisture etc. from the object to be sterilized. The weakly acidic chlorinated water thus supplied is supplied to the weakly acidic chlorinated water production device and used as dilution water for diluting the hydrochloric acid aqueous solution and hypochlorite aqueous solution used in this weakly acidic chlorinated water producing device. Is done.

弱酸性塩素水循環装置は、弱酸性塩素水製造装置の第1供給経路の第1混合希釈部で流量抵抗を生じさせることによって、第2供給ラインから供給された希釈水としての弱酸性塩素水(以下、単に「希釈水」という)と、第1供給装置から注入された塩酸水溶液とを混合して均一に希釈することができる。また、第2供給経路の第2混合希釈部に流量抵抗を生じさせることによって、第2供給ラインから供給された希釈水と、次亜塩素酸塩水溶液とを混合して均一に希釈することができる。   The weakly acidic chlorinated water circulation device generates weak flow rate resistance in the first mixing and dilution part of the first supply path of the weakly acidic chlorinated water production device, so that weakly acidic chlorinated water (diluted water supplied from the second supply line ( Hereinafter, it is simply referred to as “diluted water”) and an aqueous hydrochloric acid solution injected from the first supply device can be mixed and diluted uniformly. In addition, the flow rate resistance is generated in the second mixing and dilution part of the second supply path, so that the dilution water supplied from the second supply line and the hypochlorite aqueous solution can be mixed and diluted uniformly. it can.

そして、第3供給経路の第3混合希釈部で流量抵抗を生じさせて、第1供給経路で希釈された塩酸水溶液と、第2供給経路で希釈された次亜塩素酸塩水溶液とを混合して均一に希釈することにより、塩素ガスの発生を抑制可能な所定のpHの弱酸性塩素水を生成(再生)できる。このように生成された弱酸性塩素水を、第1供給ラインを通じて殺菌タンクに注入させることにより、弱酸性塩素水循環装置は、常に高い殺菌力をもって殺菌対象物を殺菌できるようになる。   Then, a flow resistance is generated in the third mixing and dilution part of the third supply path, and the hydrochloric acid aqueous solution diluted in the first supply path and the hypochlorite aqueous solution diluted in the second supply path are mixed. By diluting evenly, it is possible to generate (regenerate) weakly acidic chlorine water having a predetermined pH that can suppress generation of chlorine gas. By injecting the weakly acidic chlorine water generated in this way into the sterilization tank through the first supply line, the weakly acidic chlorine water circulation device can always sterilize the sterilization target with high sterilization power.

また、第1供給経路は、第1注入口よりも上流側位置に設けられて第1供給経路内の圧力を測定する第1圧力計と、第1供給経路を流れる希釈水の流量を調整する第1流量調整弁とを備え、しかも、第2供給経路は、第2注入口よりも上流側位置に設けられて第2供給経路内の圧力を測定する第2圧力計と、第1供給経路を流れる希釈水の流量を調整する第2流量調整弁とを備えている構成を採用できる。   The first supply path is provided at a position upstream of the first inlet, and adjusts the flow rate of dilution water flowing through the first supply path, and a first pressure gauge that measures the pressure in the first supply path. A second pressure gauge provided at a position upstream of the second inlet and measuring the pressure in the second supply path; and a first supply path. The structure provided with the 2nd flow volume adjustment valve which adjusts the flow volume of the dilution water which flows through can be employ | adopted.

かかる構成によれば、第1供給経路に第1圧力計を設け、第2供給経路に第2圧力計を設けることによって、第1供給経路と第2供給経路を流れる希釈水の圧力差を読み取ることができるようになる。第1供給経路と第2供給経路に圧力差がある場合には、第1流量調整弁と第2流量調整弁を操作することにより、その差をなくし、例えば、第1供給経路と第2供給経路を流れる希釈水の量を均等にすることができる。   According to this configuration, the first pressure gauge is provided in the first supply path, and the second pressure gauge is provided in the second supply path, thereby reading the pressure difference of the dilution water flowing through the first supply path and the second supply path. Will be able to. When there is a pressure difference between the first supply path and the second supply path, the difference is eliminated by operating the first flow rate adjustment valve and the second flow rate adjustment valve, for example, the first supply path and the second supply path. The amount of dilution water flowing through the path can be made equal.

また、本発明に係る弱酸性塩素水循環装置は、第1混合希釈部が、複数の貫通孔が形成された板部材を内部に備えるとともに、板部材の上流側で流量抵抗を生じさせて塩酸水溶液と希釈水を混合し、塩酸水溶液を希釈水とともに板部材の貫通孔を通過させることにより、この塩酸水溶液を所定の濃度に希釈できるように構成されており、第1供給経路が、第1混合希釈部の下流側に第1流量調整弁を備えている構成を採用できる。   Further, in the weakly acidic chlorinated water circulation device according to the present invention, the first mixing and diluting unit includes a plate member in which a plurality of through holes are formed inside, and generates a flow resistance on the upstream side of the plate member to generate a hydrochloric acid aqueous solution. And the diluting water are mixed, and the hydrochloric acid aqueous solution is passed through the through-hole of the plate member together with the diluting water, so that the hydrochloric acid aqueous solution can be diluted to a predetermined concentration. A configuration in which the first flow rate adjustment valve is provided on the downstream side of the dilution unit can be employed.

かかる構成によれば、第1混合希釈部に板部材を設けることで、第1混合希釈部の板部材の上流側の部分に流量抵抗が生じ、この部分で塩酸水溶液と希釈水とを混合させ、そして塩酸水溶液と希釈水が板部材の貫通孔を通過して拡散することにより、塩酸水溶液を均一に希釈することができるようになる。さらに、第1混合希釈部の下流側に第1流量調整弁を設けることによって、板部材の流量抵抗を調節できるようになり、これによって、希釈水の流量、注入された塩酸水溶液の量の変化に応じて、所望の濃度に塩酸水溶液を希釈できるようになる。   According to this configuration, by providing the plate member in the first mixing / dilution unit, flow resistance is generated in the upstream portion of the plate member of the first mixing / dilution unit, and the hydrochloric acid aqueous solution and the dilution water are mixed in this portion. Then, the aqueous hydrochloric acid solution and the diluted water diffuse through the through holes of the plate member, so that the aqueous hydrochloric acid solution can be diluted uniformly. Furthermore, by providing the first flow rate adjusting valve on the downstream side of the first mixing and diluting section, the flow resistance of the plate member can be adjusted, thereby changing the flow rate of the dilution water and the amount of the injected hydrochloric acid aqueous solution. Accordingly, the aqueous hydrochloric acid solution can be diluted to a desired concentration.

また、本発明に係る弱酸性塩素水循環装置は、第2混合希釈部が、複数の貫通孔が形成された板部材を内部に備えるとともに、板部材の上流側で流量抵抗を生じさせて次亜塩素酸塩水溶液と希釈水を混合し、次亜塩素酸塩水溶液を希釈水とともに板部材の貫通孔を通過させることにより、次亜塩素酸塩水溶液を所定の濃度に希釈できるように構成されており、第2供給経路が、第2混合希釈部の下流側に第2流量調整弁を備えている構成を採用できる。   Further, in the weakly acidic chlorinated water circulation device according to the present invention, the second mixing and diluting unit includes a plate member in which a plurality of through holes are formed inside, and generates a flow resistance on the upstream side of the plate member, thereby reducing the hypothesis. The chlorite aqueous solution and the dilution water are mixed, and the hypochlorite aqueous solution is passed through the through hole of the plate member together with the dilution water, so that the hypochlorite aqueous solution can be diluted to a predetermined concentration. And the 2nd supply path can employ | adopt the structure provided with the 2nd flow volume adjustment valve in the downstream of the 2nd mixing dilution part.

かかる構成によれば、第2混合希釈部に板部材を設けることで、第2混合希釈部の板部材の上流側の部分に流量抵抗が生じ、この部分で次亜塩素酸塩水溶液と希釈水とを混合させ、そして次亜塩素酸塩水溶液と希釈水が板部材の貫通孔を通過して拡散することにより、次亜塩素酸塩水溶液を均一に希釈することができるようになる。さらに、第2混合希釈部の下流側に第2流量調整弁を設けることによって、板部材の流量抵抗を調節できるようになり、これによって、希釈水の流量、注入された次亜塩素酸塩水溶液の量の変化に応じて、所望の濃度に次亜塩素酸塩水溶液を希釈できるようになる。   According to such a configuration, by providing the plate member in the second mixed dilution section, flow resistance is generated in the upstream portion of the plate member of the second mixed dilution section, and in this portion, the hypochlorite aqueous solution and the dilution water are generated. And the hypochlorite aqueous solution and the dilution water diffuse through the through-holes of the plate member, whereby the hypochlorite aqueous solution can be diluted uniformly. Further, by providing a second flow rate adjusting valve downstream of the second mixing and diluting section, the flow resistance of the plate member can be adjusted, whereby the flow rate of diluted water and the injected hypochlorite aqueous solution can be adjusted. The hypochlorite aqueous solution can be diluted to a desired concentration according to the change in the amount of.

また、本発明に係る弱酸性塩素水循環装置は、第3混合希釈部に複数の貫通孔が形成された板部材が設けられ、第3混合希釈部が、第1混合希釈部で希釈された塩酸水溶液と第2混合希釈部で希釈された次亜塩素酸塩水溶液とを前記板部材の上流側で流量抵抗を生じさせて混合するとともに、混合された次亜塩素酸塩水溶液塩酸水溶液と板部材の貫通孔を通過させることにより、所定の水素イオン指数の弱酸性塩素水を生成するように構成されており、第3供給経路が、第3混合希釈部の下流側に第3流量調整弁を備えている構成を採用できる。 Further, the weakly acidic chlorinated water circulation device according to the present invention is provided with a plate member in which a plurality of through holes are formed in the third mixed dilution section, and the third mixed dilution section is diluted with the first mixed dilution section. solution and with mixing caused the flow resistance and a hypochlorite solution diluted in the second mixing dilution unit upstream of the plate member, mixed and hypochlorite solution and hydrochloric acid solution By passing through the through-hole of the plate member, it is configured to generate weakly acidic chlorinated water having a predetermined hydrogen ion index, and the third supply path is arranged on the downstream side of the third mixing and diluting unit to adjust the third flow rate. A configuration including a valve can be employed.

かかる構成によれば、第3混合希釈部に板部材を設けることで、第3混合希釈部の板部材の上流側の部分に流量抵抗が生じ、希釈された次亜塩素酸塩水溶液と塩酸水溶液とをこの部分で混合させ、そして次亜塩素酸塩水溶液と塩酸水溶液が板部材の貫通孔を通過して拡散することにより、均一に希釈されたムラのない弱酸性塩素水を生成できる。そして、第3混合希釈部の下流側に設けられた第3流量調整弁を操作することによって、第3混合希釈部で生成された弱酸性塩素水の流量を調節することができるとともに、第3混合希釈部内の圧力を調整することができるようになり、これによって、第3混合希釈部内を所望の圧力環境に設定できるようになる。   According to such a configuration, by providing a plate member in the third mixed dilution section, flow resistance is generated in the upstream portion of the plate member of the third mixed dilution section, and the diluted hypochlorite aqueous solution and hydrochloric acid aqueous solution are diluted. Are mixed in this portion, and the hypochlorite aqueous solution and the hydrochloric acid aqueous solution diffuse through the through-holes of the plate member, so that uniformly diluted weakly acidic chlorinated water can be generated. And by operating the 3rd flow regulating valve provided in the lower stream side of the 3rd mixing dilution part, while being able to adjust the flow volume of the weak acidic chlorine water produced | generated in the 3rd mixing dilution part, 3rd It becomes possible to adjust the pressure in the mixed dilution part, and thereby, the inside of the third mixed dilution part can be set to a desired pressure environment.

また、本発明に係る弱酸性塩素水循環装置は、次亜塩素酸塩水溶液の供給装置が、第2供給ラインから供給される希釈水である弱酸性塩素水の塩素濃度に応じた量の次亜塩素酸塩水溶液を第2供給経路に供給するように制御され、塩酸水溶液の供給装置が、次亜塩素酸塩水溶液の供給装置から供給される次亜塩素酸塩水溶液の量に応じた量の塩酸水溶液を第1供給経路に供給するように制御される構成を採用できる。   Further, the weakly acidic chlorinated water circulation device according to the present invention is a hypochlorite aqueous solution supplying device in which hypochlorite aqueous solution is supplied in an amount corresponding to the chlorine concentration of weakly acidic chlorinated water that is dilution water supplied from the second supply line. The chlorate aqueous solution is controlled to be supplied to the second supply path, and the hydrochloric acid aqueous solution supply device has an amount corresponding to the amount of the hypochlorite aqueous solution supplied from the hypochlorite aqueous solution supply device. A configuration in which the hydrochloric acid aqueous solution is controlled to be supplied to the first supply path can be employed.

かかる構成によれば、いわゆる濃度比例制御によって、第2供給ラインから供給される希釈水としての弱酸性塩素水における塩素濃度に応じて所定量の次亜塩素酸塩水溶液を第2供給経路に供給し、この次亜塩素酸塩水溶液の量に応じた量の塩酸水溶液を第1供給経路に供給することによって、所望のpHの弱酸性塩素水を生成できる。   According to this configuration, a predetermined amount of hypochlorite aqueous solution is supplied to the second supply path according to the chlorine concentration in the weakly acidic chlorinated water as dilution water supplied from the second supply line by so-called concentration proportional control. Then, by supplying an aqueous hydrochloric acid solution in an amount corresponding to the amount of the hypochlorite aqueous solution to the first supply path, weakly acidic chlorinated water having a desired pH can be generated.

本発明によれば、次亜塩素酸塩水溶液と塩酸水溶液を段階的に希釈して塩素ガスの発生を抑制した弱酸性塩素水を製造し、この弱酸性塩素水を殺菌タンクに供給して、常に高い殺菌力で殺菌対象物を殺菌できる。   According to the present invention, a weakly acidic chlorine water that suppresses generation of chlorine gas by diluting a hypochlorite aqueous solution and a hydrochloric acid aqueous solution in stages is produced, and this weakly acidic chlorine water is supplied to a sterilization tank, The object to be sterilized can be sterilized with high sterilization power at all times.

以下、本発明の実施の形態を、図面に基づき説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

図1に示すように、弱酸性塩素水循環装置1は、所定の水素イオン指数の弱酸性塩素水を製造する弱酸性塩素水製造装置2と、この弱酸性塩素水製造装置2によって製造された弱酸性塩素水を貯留するとともに、所定の殺菌対象物を殺菌する殺菌タンク3と、弱酸性塩素水製造装置によって製造された弱酸性塩素水を殺菌タンク3に供給する第1供給ライン4と、殺菌タンク3から排出された弱酸性塩素水を弱酸性塩素水製造装置2に供給する第2供給ライン5とによって構成された弱酸性塩素水の循環ライン6を備えており、この循環ライン6には、弱酸性塩素水を循環させる循環ポンプ7が設けられている。   As shown in FIG. 1, the weakly acidic chlorinated water circulation device 1 includes a weakly acidic chlorinated water production device 2 that produces weakly acidic chlorinated water having a predetermined hydrogen ion index, and a weak acid chlorinated water produced by the weakly acidic chlorinated water producing device 2. A sterilization tank 3 for storing acidic chlorinated water and sterilizing a predetermined sterilization target, a first supply line 4 for supplying weakly acidic chlorinated water produced by a weakly acidic chlorinated water production apparatus to the sterilizing tank 3, and sterilization A weak acid chlorine water discharged from the tank 3 is provided with a second acid supply line 5 for supplying the weak acid chlorine water to the weak acid chlorine water production apparatus 2. A circulation pump 7 for circulating the weakly acidic chlorinated water is provided.

弱酸性塩素水循環装置1は、殺菌タンク3に所定量の弱酸性塩素水が貯留されると、殺菌対象物を殺菌タンク3に投入して殺菌を行い、殺菌によってpHが高くなった殺菌タンク3内の弱酸性塩素水を、循環ライン6中の弱酸性塩素水製造装置2で再生して、第1供給ライン4を通じて殺菌タンク3に供給するようになっている。   When a predetermined amount of weakly acidic chlorinated water is stored in the sterilization tank 3, the weakly acidic chlorinated water circulation device 1 performs sterilization by putting an object to be sterilized into the sterilization tank 3, and the sterilization tank 3 whose pH is increased by sterilization. The weakly acidic chlorine water is regenerated by the weakly acidic chlorine water production apparatus 2 in the circulation line 6 and supplied to the sterilization tank 3 through the first supply line 4.

殺菌タンク3に種々の食品(野菜等)等の殺菌対象物が投入されると、この殺菌対象物から出る有機物やその他の成分等により、殺菌タンク3内の弱酸性塩素水の塩素濃度が低下し、pH値が変化して、その殺菌力は次第に低下していく。このように殺菌力が低下した弱酸性塩素水は、殺菌タンク3から排出され、第2供給ライン5を通じて弱酸性塩素水製造装置2に送られ、塩酸水溶液、次亜塩素酸塩水溶液が注入されることになるが、このときに、塩酸水溶液および次亜塩素酸塩水溶液を希釈する希釈水として利用される。以下、殺菌タンク3から排出された弱酸性塩素水を、単に「希釈水」という場合がある。   When an object to be sterilized such as various foods (vegetables, etc.) is put into the sterilization tank 3, the chlorine concentration of the weakly acidic chlorinated water in the sterilization tank 3 decreases due to organic substances and other components emitted from the object to be sterilized. However, the sterilizing power gradually decreases as the pH value changes. The weakly acidic chlorinated water having reduced sterilizing power is discharged from the sterilizing tank 3 and sent to the weakly acidic chlorinated water production apparatus 2 through the second supply line 5, and an aqueous hydrochloric acid solution and an aqueous hypochlorite solution are injected. At this time, it is used as dilution water for diluting the aqueous hydrochloric acid solution and the aqueous hypochlorite solution. Hereinafter, the weakly acidic chlorine water discharged from the sterilization tank 3 may be simply referred to as “dilution water”.

図1に示すように、弱酸性塩素水循環装置1の第1供給ライン4は、一端部が第3供給経路15の下流側に接続されるとともに、他端部が殺菌タンク3の上部側に接続され、第3供給経路15で生成された弱酸性塩素水を殺菌タンク3に注入可能になっている。また、第2供給ライン5は、殺菌タンク3の下部側に接続されており、循環ポンプ7は、この第2供給ライン5の中途部に設けられている。第2供給ライン5の下流側には、弱酸性塩素水製造装置2が設けられている。   As shown in FIG. 1, the first supply line 4 of the weakly acidic chlorinated water circulation device 1 has one end connected to the downstream side of the third supply path 15 and the other end connected to the upper side of the sterilization tank 3. Then, the weakly acidic chlorine water generated in the third supply path 15 can be injected into the sterilization tank 3. The second supply line 5 is connected to the lower side of the sterilization tank 3, and the circulation pump 7 is provided in the middle of the second supply line 5. On the downstream side of the second supply line 5, a weakly acidic chlorine water production apparatus 2 is provided.

図1、図2に示すように、この弱酸性塩素水製造装置2は、次亜塩素酸塩水溶液、塩酸水溶液を希釈水で希釈し、希釈された次亜塩素酸塩水溶液と塩酸水溶液を混合させてさらに希釈し、所定のpHの弱酸性塩素水を製造するものである。本実施形態では、次亜塩素酸塩水溶液の例として所定濃度の次亜塩素酸ナトリウム水溶液が用いられる。次亜塩素酸塩水溶液のpH調整剤として用いられる塩酸水溶液の原液には、所定の重量パーセント濃度のものが用いられる。この塩酸水溶液は、有機物の影響を受けない点で特に有用である。なお、本実施形態において、「弱酸性」とはpH5〜7の範囲をいう(pH7は、厳密に言えば中性だが、ここでは「弱酸性」として取り扱うこととする)。   As shown in FIGS. 1 and 2, this weakly acidic chlorinated water production apparatus 2 dilutes a hypochlorite aqueous solution and a hydrochloric acid aqueous solution with a dilution water, and mixes the diluted hypochlorite aqueous solution and the hydrochloric acid aqueous solution. And further diluted to produce weakly acidic chlorinated water having a predetermined pH. In this embodiment, a sodium hypochlorite aqueous solution having a predetermined concentration is used as an example of the hypochlorite aqueous solution. As a stock solution of a hydrochloric acid aqueous solution used as a pH adjuster for a hypochlorite aqueous solution, a solution having a predetermined weight percent concentration is used. This aqueous hydrochloric acid solution is particularly useful in that it is not affected by organic substances. In the present embodiment, “weakly acidic” means a range of pH 5 to 7 (pH 7 is strictly speaking neutral, but is treated as “weakly acidic” here).

弱酸性塩素水製造装置2は、第2供給ライン5に接続されていて希釈水を供給する主供給経路10と、塩酸水溶液を希釈する希釈水が供給される第1供給経路11と、第1供給経路11に塩酸水溶液を供給する供給装置(以下「第1供給装置」という)12と、第1供給経路11に塩酸水溶液を供給する次亜塩素酸塩水溶液を希釈する希釈水が供給される第2供給経路13と、第2供給経路13に次亜塩素酸塩水溶液を供給する供給装置(以下「第2供給装置」という)14と、第1供給経路11と第2供給経路13を合流させるとともに、第1供給経路11で希釈された塩酸水溶液と第2供給経路13で希釈された次亜塩素酸塩水溶液とを混合させて希釈することにより、所定の水素イオン指数の弱酸性塩素水を生成する第3供給経路15と、第2供給ライン5から供給される希釈水のpHを調整するpH調整剤を、第1供給経路11に供給する供給装置(以下「第3供給装置」という)16と、第1供給装置12、第2供給装置14、および第3供給装置16を制御する制御装置18等を備えている。   The weakly acidic chlorinated water production apparatus 2 is connected to the second supply line 5 and supplies a main supply path 10 for supplying dilution water, a first supply path 11 for supplying dilution water for diluting an aqueous hydrochloric acid solution, A supply device (hereinafter referred to as “first supply device”) 12 for supplying a hydrochloric acid aqueous solution to the supply path 11 and a dilution water for diluting the hypochlorite aqueous solution for supplying the hydrochloric acid aqueous solution to the first supply path 11 are supplied. The second supply path 13, the supply apparatus (hereinafter referred to as “second supply apparatus”) 14 for supplying a hypochlorite aqueous solution to the second supply path 13, the first supply path 11 and the second supply path 13 are merged. In addition, the aqueous hydrochloric acid diluted in the first supply path 11 and the hypochlorite aqueous solution diluted in the second supply path 13 are mixed and diluted, so that weakly acidic chlorine water having a predetermined hydrogen ion index is obtained. The third supply path 15 for generating , A supply device (hereinafter referred to as “third supply device”) 16 for supplying a pH adjusting agent for adjusting the pH of the dilution water supplied from the second supply line 5 to the first supply path 11, and the first supply device 12. , A second supply device 14, a control device 18 for controlling the third supply device 16, and the like.

主供給経路10には、流量調整弁(例えばニードル弁)22、流量計23、圧力計24が設けられており、希釈水の流量、圧力を、流量計23、圧力計24で測定できるようになっている。主供給経路10の下流側には、第1供給経路11と第2供給経路13が分岐して設けられている。   The main supply path 10 is provided with a flow rate adjusting valve (for example, a needle valve) 22, a flow meter 23, and a pressure gauge 24 so that the flow rate and pressure of the dilution water can be measured with the flow meter 23 and the pressure gauge 24. It has become. A first supply path 11 and a second supply path 13 are branched from the main supply path 10.

第1供給経路11には、第1供給装置12から供給される塩酸水溶液を注入するための第1注入口31と、第1供給装置12から供給された塩酸水溶液と希釈水とを混合して希釈する第1混合希釈部(リアクションタンク)32と、第1供給経路11を流れる塩酸水溶液(希釈水を含む)の圧力を調整する第1流量調整弁(例えばニードル弁)33が設けられている。   In the first supply path 11, the first inlet 31 for injecting the hydrochloric acid aqueous solution supplied from the first supply device 12, the hydrochloric acid aqueous solution supplied from the first supply device 12 and the dilution water are mixed. A first mixing dilution section (reaction tank) 32 for dilution and a first flow rate adjustment valve (for example, a needle valve) 33 for adjusting the pressure of an aqueous hydrochloric acid solution (including dilution water) flowing through the first supply path 11 are provided. .

第1混合希釈部32は、その内径が第1供給経路11の内径よりも大きくなっており、その中途部に複数の貫通孔34aを有する板部材(邪魔板)34が設けられている。これにより、第1混合希釈部32の板部材34よりも上流側の部分には、第1混合希釈部32内に流入した塩酸水溶液と希釈水に対する流量抵抗を生じさせて、塩酸水溶液と希釈水とを混合させる領域(以下「第1反応領域」という)35が形成される。   The first mixed dilution section 32 has an inner diameter larger than the inner diameter of the first supply path 11, and a plate member (baffle plate) 34 having a plurality of through holes 34 a is provided in the middle. As a result, a flow resistance against the aqueous hydrochloric acid solution and the diluting water that has flowed into the first mixed diluting unit 32 is generated at a portion upstream of the plate member 34 of the first mixed diluting unit 32, so A region 35 (hereinafter referred to as “first reaction region”) is formed.

また、第1混合希釈部32には、板部材34より下流側の部分に、板部材34の貫通孔34aを通過して拡散した塩酸水溶液と希釈水をさらに均一に希釈させる領域(以下「第1安定領域」という)36が形成されている。第1供給経路11に供給された希釈水と塩酸水溶液は、板部材34による流量抵抗によって第1反応領域35で所定時間混合され、板部材34の貫通孔34aを通過することによって、第1安定領域36内に拡散し、この第1安定領域36を通過することによって均一に希釈され、所定濃度に希釈された塩酸水溶液となる。   Further, in the first mixing dilution section 32, a region (hereinafter referred to as “first”) for further uniformly diluting the hydrochloric acid aqueous solution and the diluted water diffused through the through hole 34 a of the plate member 34 in a portion downstream of the plate member 34. 36 ”is formed. The dilution water and the hydrochloric acid aqueous solution supplied to the first supply path 11 are mixed for a predetermined time in the first reaction region 35 by the flow resistance of the plate member 34, and pass through the through hole 34 a of the plate member 34. By diffusing into the region 36 and passing through the first stable region 36, the solution is uniformly diluted to form a hydrochloric acid aqueous solution diluted to a predetermined concentration.

第1流量調整弁33は、第1混合希釈部32の下流側に設けられており、この第1流量調整弁33を操作することにより、第1混合希釈部32内の圧力を調整するとともに、第1混合希釈部32によって希釈された塩酸水溶液、または、第1混合希釈部32に流入する前の希釈水の流量を調節できるようになっている。   The first flow rate adjustment valve 33 is provided on the downstream side of the first mixing / dilution unit 32. By operating the first flow rate adjustment valve 33, the pressure in the first mixing / dilution unit 32 is adjusted, The flow rate of the aqueous hydrochloric acid diluted by the first mixing / dilution unit 32 or the dilution water before flowing into the first mixing / dilution unit 32 can be adjusted.

第2供給経路13には、第2供給装置14から供給される次亜塩素酸塩水溶液を注入する第2注入口41と、第2供給装置14から供給された次亜塩素酸塩水溶液と希釈水とを混合して希釈する第2混合希釈部(リアクションタンク)42と、第2供給経路13を流れる次亜塩素酸塩水溶液(希釈水を含む)の流量を調整する第2流量調整弁(例えばニードル弁)43が設けられている。   A second inlet 41 for injecting a hypochlorite aqueous solution supplied from the second supply device 14 into the second supply path 13, and a hypochlorite aqueous solution and dilution supplied from the second supply device 14 A second flow dilution valve (reaction tank) 42 that mixes and dilutes water, and a second flow rate adjustment valve that adjusts the flow rate of a hypochlorite aqueous solution (including diluted water) flowing through the second supply path 13 ( For example, a needle valve) 43 is provided.

第2混合希釈部42は、第1混合希釈部32と同様に、その内径が第2供給経路13の内径よりも大きくなっており、その中途部に複数の貫通孔44aを有する板部材(邪魔板)44が設けられている。これにより、第2混合希釈部42の板部材44よりも上流側の部分には、第2混合希釈部42内に流入した次亜塩素酸塩水溶液と希釈水に対する流量抵抗を生じさせて、塩酸水溶液と希釈水とを混合させる領域(以下「第2反応領域」という)45が形成される。   Similar to the first mixing / dilution unit 32, the second mixing / dilution unit 42 has an inner diameter larger than the inner diameter of the second supply path 13, and has a plate member (baffle) having a plurality of through holes 44 a in the middle thereof. Plate) 44 is provided. As a result, a flow resistance against the hypochlorite aqueous solution and dilution water that has flowed into the second mixed dilution section 42 is generated in a portion upstream of the plate member 44 of the second mixed dilution section 42, and hydrochloric acid is generated. A region (hereinafter referred to as “second reaction region”) 45 in which the aqueous solution and the dilution water are mixed is formed.

また、第2混合希釈部42は、板部材44より下流側の部分に、板部材44の貫通孔44aを通過して拡散した塩酸水溶液と希釈水をさらに均一に希釈させる領域(以下「第2安定領域」という)46が形成されている。第2供給経路13に供給された希釈水と塩酸水溶液は、板部材44による流量抵抗によって第2反応領域45で所定時間混合され、板部材44の貫通孔44aを通過することによって、第2安定領域46内に拡散し、この第2安定領域46を通過することによって、均一に希釈された所定濃度の次亜塩素酸塩水溶液となる。   In addition, the second mixing and dilution unit 42 is a region in which the aqueous hydrochloric acid solution and the diluted water diffused through the through hole 44a of the plate member 44 are further uniformly diluted in the downstream portion of the plate member 44 (hereinafter referred to as “second”). 46) (referred to as “stable region”). The diluting water and the hydrochloric acid aqueous solution supplied to the second supply path 13 are mixed for a predetermined time in the second reaction region 45 by the flow resistance of the plate member 44, and pass through the through hole 44a of the plate member 44. By diffusing into the region 46 and passing through the second stable region 46, a hypochlorite aqueous solution having a predetermined concentration is diluted uniformly.

第2流量調整弁43は、第2混合希釈部42の下流側に設けられており、この第2流量調整弁43を操作することにより、第2混合希釈部42の内部圧力を調節するとともに、第2混合希釈部42によって希釈された次亜塩素酸塩水溶液、または、第2混合希釈部42に流入する前の稀釈水の流量を調節できるようになっている。   The second flow rate adjustment valve 43 is provided on the downstream side of the second mixing dilution unit 42, and by operating the second flow rate adjustment valve 43, the internal pressure of the second mixing dilution unit 42 is adjusted, The flow rate of the hypochlorite aqueous solution diluted by the second mixing / dilution unit 42 or the flow rate of the diluted water before flowing into the second mixing / dilution unit 42 can be adjusted.

第1供給経路11の第1注入口31よりも上流側位置に、圧力計(以下「第1圧力計」という)51が設けられており、第2供給経路13の第2注入口41よりも上流側位置に、圧力計(以下「第2圧力計」という)52が設けられている。弱酸性塩素水製造装置2は、第1供給経路11内の圧力を第1圧力計51で測定し、第2供給経路13内の圧力を第2圧力計52で測定することにより、第1供給経路11と第2供給経路13の圧力差が判るようになっている。   A pressure gauge (hereinafter referred to as “first pressure gauge”) 51 is provided at a position upstream of the first inlet 31 of the first supply path 11, and more than the second inlet 41 of the second supply path 13. A pressure gauge (hereinafter referred to as “second pressure gauge”) 52 is provided at the upstream position. The weakly acidic chlorine water production apparatus 2 measures the pressure in the first supply path 11 with the first pressure gauge 51 and measures the pressure in the second supply path 13 with the second pressure gauge 52, thereby providing the first supply. The pressure difference between the path 11 and the second supply path 13 can be seen.

第1供給装置12は、塩酸水溶液を貯留する第1貯留タンク53と、この第1貯留タンク53に貯留された塩酸水溶液を第1供給経路11に送る第1注入ポンプ54を備える。また、第2供給装置14は、次亜塩素酸塩水溶液を貯留する第2貯留タンク55と、この第2貯留タンク55に貯留された次亜塩素酸塩水溶液を第2供給経路13に送る第2注入ポンプ56を備える。また、第3供給装置16は、pH調整剤を貯留する第3貯留タンク57と、この第3貯留タンク57に貯留されたpH調整剤を 第1供給経路11に送る第3注入ポンプ58を備える。第3貯留タンク57に貯留されるpH調整剤としては、塩酸水溶液、苛性ソーダ等の種々のものが用いられるが、本実施形態では、pH調整剤として塩酸水溶液を用いた例を説明する。   The first supply device 12 includes a first storage tank 53 that stores an aqueous hydrochloric acid solution, and a first injection pump 54 that sends the aqueous hydrochloric acid solution stored in the first storage tank 53 to the first supply path 11. The second supply device 14 also sends a second storage tank 55 for storing a hypochlorite aqueous solution and a hypochlorite aqueous solution stored in the second storage tank 55 to the second supply path 13. Two infusion pumps 56 are provided. The third supply device 16 includes a third storage tank 57 that stores the pH adjusting agent, and a third injection pump 58 that sends the pH adjusting agent stored in the third storage tank 57 to the first supply path 11. . As the pH adjusting agent stored in the third storage tank 57, various types such as a hydrochloric acid aqueous solution and caustic soda are used. In this embodiment, an example in which a hydrochloric acid aqueous solution is used as the pH adjusting agent will be described.

第3供給経路15には、流量抵抗を生じさせて、第1混合希釈部32で希釈された塩酸水溶液と第2混合希釈部42で希釈された次亜塩素酸塩水溶液とを混合してさらに希釈することにより、所定のpHの弱酸性塩素水を生成する第3混合希釈部61と、第3混合希釈部61によって生成された弱酸性塩素水の流量を調整する第3流量調整弁(例えばニードル弁)62が設けられている。   In the third supply path 15, a flow resistance is generated, and the hydrochloric acid aqueous solution diluted by the first mixing / dilution unit 32 and the hypochlorite aqueous solution diluted by the second mixing / dilution unit 42 are further mixed. A third mixed dilution unit 61 that generates weakly acidic chlorinated water having a predetermined pH by dilution, and a third flow rate adjustment valve that adjusts the flow rate of weakly acidic chlorinated water generated by the third mixed diluted unit 61 (for example, Needle valve) 62 is provided.

第3混合希釈部61は、その内径が第3供給経路15の内径よりも大きくなっており、その中途部に複数の貫通孔63aが形成された板部材63が設けられている。これにより、第3混合希釈部61の板部材63よりも上流側の部分には、第3混合希釈部61内に流入した次亜塩素酸塩水溶液と希釈水に対する流量抵抗を生じさせて、塩酸水溶液と希釈水とを混合させる領域(以下「第3反応領域」という)64が形成される。   The third mixing dilution section 61 has an inner diameter larger than the inner diameter of the third supply path 15, and a plate member 63 having a plurality of through holes 63 a formed in the middle thereof. As a result, a flow resistance against the hypochlorite aqueous solution and the diluted water that has flowed into the third mixed dilution section 61 is generated in a portion upstream of the plate member 63 of the third mixed dilution section 61, and hydrochloric acid is generated. A region (hereinafter referred to as “third reaction region”) 64 in which the aqueous solution and the dilution water are mixed is formed.

また、第3混合希釈部61は、板部材63より下流側の部分に、板部材63の貫通孔63aを通過して拡散した塩酸水溶液と希釈水をさらに均一に希釈させる領域(以下「第3安定領域」という)65が形成されている。所定濃度に希釈されて第3供給経路15に供給された塩酸水溶液と次亜塩素酸塩水溶液は、板部材63による流量抵抗によって第3反応領域64で所定時間混合され、板部材63の貫通孔63aを通過することによって、第3安定領域65内に拡散し、この第3安定領域65を通過することによって、均一に希釈されて所定のpHに調整された弱酸性塩素水となる。   The third mixing / dilution unit 61 further uniformly dilutes the aqueous hydrochloric acid solution and the diluting water diffused through the through hole 63a of the plate member 63 in the downstream portion of the plate member 63 (hereinafter referred to as “third”). 65) (referred to as “stable region”). The hydrochloric acid aqueous solution and the hypochlorite aqueous solution diluted to a predetermined concentration and supplied to the third supply path 15 are mixed in the third reaction region 64 for a predetermined time by the flow resistance of the plate member 63, and the through holes of the plate member 63 are mixed. By passing through 63a, it diffuses into the third stable region 65, and by passing through the third stable region 65, it becomes weakly acidic chlorinated water that is uniformly diluted and adjusted to a predetermined pH.

第3流量調整弁62は、第3混合希釈部61の下流側に設けられており、この第3流量調整弁62を操作することにより、第3混合希釈部61の圧力を調整するとともに、第3混合希釈部61で生成された弱酸性塩素水の流量を調整できるようになっている。   The third flow rate adjustment valve 62 is provided on the downstream side of the third mixing / dilution unit 61. By operating the third flow rate adjustment valve 62, the pressure of the third mixing / dilution unit 61 is adjusted, It is possible to adjust the flow rate of the weakly acidic chlorinated water generated by the three-mixing / dilution unit 61.

なお、第1混合希釈部32、第2混合希釈部42、第3混合希釈部61の内部圧力は、第1流量調整弁(圧力調整弁)33、第2流量調整弁(圧力調整弁)43、第3流量調整弁(圧力調整弁)62を操作することにより、いずれも0.2Mpa以上に保たれている。   The internal pressures of the first mixing dilution unit 32, the second mixing dilution unit 42, and the third mixing dilution unit 61 are the first flow rate adjustment valve (pressure adjustment valve) 33 and the second flow rate adjustment valve (pressure adjustment valve) 43. By operating the third flow rate regulating valve (pressure regulating valve) 62, both are maintained at 0.2 Mpa or more.

制御装置18は、第1供給装置12の第1注入ポンプ54を制御するコントローラ(以下「第1コントローラ」という)71、第2供給装置14の第2注入ポンプ56を制御するコントローラ(以下「第2コントローラ」という)72、第1供給装置12の第3注入ポンプ58を制御するコントローラ(以下「第3コントローラ」という)73、第2供給ライン5から主供給経路10に供給される弱酸性塩素水の塩素濃度を指示する塩素濃度指示計74、第2供給ライン5から主供給経路10に供給される弱酸性塩素水のpHを表示するpH指示計75、第2供給ライン5から主供給経路10に供給される弱酸性塩素水の温度を指示する温度指示計76、および記録計77等を備えている。   The control device 18 includes a controller (hereinafter referred to as “first controller”) 71 for controlling the first infusion pump 54 of the first supply device 12 and a controller (hereinafter referred to as “first” for controlling the second infusion pump 56 of the second supply device 14. 72), a controller (hereinafter referred to as “third controller”) 73 for controlling the third infusion pump 58 of the first supply device 12, and weakly acidic chlorine supplied from the second supply line 5 to the main supply path 10. A chlorine concentration indicator 74 that indicates the chlorine concentration of water, a pH indicator 75 that indicates the pH of weakly acidic chlorine water supplied from the second supply line 5 to the main supply path 10, and a main supply path from the second supply line 5 10 is provided with a temperature indicator 76 for indicating the temperature of the weakly acidic chlorinated water supplied to 10, a recorder 77, and the like.

また、主供給経路10から分岐された配管経路に、塩素濃度センサ80、塩素濃度計、pHセンサ81、pH指示調節計、温度センサ82等が設けられており、制御装置18は、これらのセンサおよび塩素濃度計、pH指示調節計によって、第2供給ライン5から主供給経路10に供給される弱酸性塩素水の塩素濃度、pH、温度を測定できるようになっている。   Further, a chlorine concentration sensor 80, a chlorine concentration meter, a pH sensor 81, a pH indicating controller, a temperature sensor 82, and the like are provided in a piping route branched from the main supply route 10, and the control device 18 uses these sensors. In addition, the chlorine concentration, pH, and temperature of weakly acidic chlorinated water supplied from the second supply line 5 to the main supply path 10 can be measured by a chlorine concentration meter and a pH indicating controller.

制御装置18は、塩素濃度センサ80によって測定され、塩素濃度計によって送信された塩素濃度のデータを塩素濃度指示計74で指示し、pHセンサ81で測定され、pH指示調節計によって送信された弱酸性塩素水のpHのデータをpH指示計75で指示し、温度センサ82によって測定された温度データを温度指示計76で指示するようになっており、それぞれのデータを記録計77に記録するようになっている。   The control device 18 indicates the chlorine concentration data measured by the chlorine concentration sensor 80 and transmitted by the chlorine concentration meter with the chlorine concentration indicator 74, measured by the pH sensor 81, and transmitted by the pH indicating controller. The pH data of the acidic chlorine water is indicated by the pH indicator 75, the temperature data measured by the temperature sensor 82 is indicated by the temperature indicator 76, and each data is recorded in the recorder 77. It has become.

上記構成の制御装置18は、殺菌タンク3から排出され、第2供給ライン5から供給される弱酸性塩素水が、所定のpHの弱酸性塩素水に再生されるように、弱酸性塩素水製造装置2を制御する。すなわち、制御装置18は、第2供給ライン5から供給される弱酸性塩素水における塩素濃度を塩素濃度センサ80および塩素濃度計で測定し、その濃度に応じた(比例した)量の次亜塩素酸塩水溶液を第2供給経路13に供給すべく、第2供給装置14を制御する(濃度比例制御)。   The control device 18 configured as described above produces weakly acidic chlorine water so that the weakly acidic chlorine water discharged from the sterilization tank 3 and supplied from the second supply line 5 is regenerated into weakly acidic chlorine water having a predetermined pH. The apparatus 2 is controlled. That is, the control device 18 measures the chlorine concentration in the weakly acidic chlorine water supplied from the second supply line 5 with the chlorine concentration sensor 80 and the chlorine concentration meter, and an amount of hypochlorous acid according to the concentration (proportional). In order to supply the aqueous acid salt solution to the second supply path 13, the second supply device 14 is controlled (concentration proportional control).

そして、 制御装置18は、第2供給装置12から供給される次亜塩素酸塩水溶液の量に応じた(比例した)量の塩酸水溶液を 第1供給経路11に供給すべく、第1供給装置12を制御する。さらに、制御装置18は、殺菌タンク3から排出された弱酸性塩素水のpHをpHセンサ81で測定し、pHが変化していた場合に、弱酸性塩素水が所定のpHとなるように調節すべく、第3供給装置16を制御する。   Then, the control device 18 supplies the first supply device 11 with a hydrochloric acid solution in an amount (proportional) corresponding to the amount of the hypochlorite solution supplied from the second supply device 12. 12 is controlled. Furthermore, the control device 18 measures the pH of the weakly acidic chlorinated water discharged from the sterilization tank 3 with the pH sensor 81 and adjusts the weakly acidic chlorinated water to a predetermined pH when the pH has changed. Therefore, the third supply device 16 is controlled.

より具体的には、制御装置18は、主供給経路10側に設けられた塩素濃度センサ80によって測定された弱酸性塩素水中の塩素濃度データを、濃度指示計で受信し、この濃度データに基づいて、第2コントローラ72が第2供給経路13に供給すべき次亜塩素酸塩水溶液の量を決定するようになっている。また、第2コントローラ72は、第2供給装置14の第2注入ポンプ56を駆動して、決定した所定量の次亜塩素酸塩水溶液を第2供給経路13に供給させる。   More specifically, the control device 18 receives chlorine concentration data in weakly acidic chlorine water measured by a chlorine concentration sensor 80 provided on the main supply path 10 side with a concentration indicator, and based on this concentration data. Thus, the second controller 72 determines the amount of hypochlorite aqueous solution to be supplied to the second supply path 13. Further, the second controller 72 drives the second infusion pump 56 of the second supply device 14 to supply the determined predetermined amount of the hypochlorite aqueous solution to the second supply path 13.

一方、第1コントローラ71は、決定された次亜塩素酸塩水溶液の量に関するデータを第2コントローラ72から受信し、このデータに基づいて、 第1供給経路11に供給すべき、塩酸水溶液の量を決定する。第1コントローラ71は、第1供給装置12の第1注入ポンプ54を駆動して、決定した所定量の塩酸水溶液を 第1供給経路11に供給させる。   On the other hand, the first controller 71 receives data on the determined amount of the hypochlorite aqueous solution from the second controller 72, and based on this data, the amount of the aqueous hydrochloric acid solution to be supplied to the first supply path 11 To decide. The first controller 71 drives the first injection pump 54 of the first supply device 12 to supply the determined predetermined amount of aqueous hydrochloric acid solution to the first supply path 11.

また、制御装置18の第3コントローラ73は、pHセンサで測定した弱酸性塩素水のpH値を、pH指示計75を介して第3コントローラ73で読み取り、例えばpH値が高くなっている場合には、弱酸性塩素水を所定のpHに調節するために必要なpH調整剤の量を決定する。第3コントローラ73は、第3供給装置16の第3注入ポンプ58を駆動し、決定された所定量のpH調整剤を 第1供給経路11に供給する。第3ポンプ58によって送られる塩酸水溶液は、第1注入口31を通じて第1供給経路11に供給される。   The third controller 73 of the control device 18 reads the pH value of the weakly acidic chlorinated water measured by the pH sensor with the third controller 73 via the pH indicator 75. For example, when the pH value is high. Determines the amount of pH adjuster required to adjust the weakly acidic chlorinated water to a predetermined pH. The third controller 73 drives the third infusion pump 58 of the third supply device 16 and supplies the determined predetermined amount of the pH adjusting agent to the first supply path 11. The aqueous hydrochloric acid solution sent by the third pump 58 is supplied to the first supply path 11 through the first inlet 31.

以上により、第2供給装置12は、第2供給ライン5から供給される希釈水である弱酸性塩素水における次亜塩素酸塩水溶液の濃度に応じた量の次亜塩素酸塩水溶液を第2供給経路13に供給するように制御され、第1供給装置12は、第2供給装置14から供給される次亜塩素酸塩水溶液の量に応じた量の塩酸水溶液を第1供給経路11に供給するように制御される。   As described above, the second supply device 12 supplies the second hypochlorite aqueous solution in an amount corresponding to the concentration of the hypochlorite aqueous solution in the weakly acidic chlorine water that is the dilution water supplied from the second supply line 5. The first supply device 12 is controlled to supply to the supply path 13, and supplies the hydrochloric acid aqueous solution in an amount corresponding to the amount of the hypochlorite aqueous solution supplied from the second supply device 14 to the first supply path 11. To be controlled.

以下、弱酸性塩素水循環装置1を使用して殺菌対象物を殺菌する方法を説明する。   Hereinafter, a method for sterilizing an object to be sterilized using the weakly acidic chlorinated water circulation device 1 will be described.

まず、弱酸性塩素水循環装置1の殺菌タンク3に、予め所定のpHとされた弱酸性塩素水を貯留しておき、この弱酸性塩素水に殺菌対象物(例えば野菜等の食品)を順次浸漬させ、殺菌を行う。殺菌対象物が順次弱酸性塩素水に浸漬されていくと、殺菌対象物から出る有機物その他の成分等により、殺菌タンク3の弱酸性塩素水の塩素濃度が低下し、pH値の変化が変化して、その殺菌力が次第に低下していく。   First, weakly acidic chlorinated water having a predetermined pH is stored in the sterilization tank 3 of the weakly acidic chlorinated water circulation device 1 and sterilized objects (for example, foods such as vegetables) are sequentially immersed in the weakly acidic chlorinated water. And sterilize. When the object to be sterilized is sequentially immersed in the weakly acidic chlorine water, the chlorine concentration of the weakly acidic chlorine water in the sterilization tank 3 decreases due to the organic matter and other components emitted from the object to be sterilized, and the pH value changes. Thus, the sterilizing power gradually decreases.

このとき、循環ポンプ7を作動させて殺菌タンク3から弱酸性塩素水を排出し、この弱酸性塩素水を、第2供給ライン5を通じて弱酸性塩素水製造装置2に供給する。弱酸性塩素水製造装置2に供給された弱酸性塩素水は、 塩酸水溶液、次亜塩素酸塩水溶液の希釈水として 第1供給経路11と第2供給経路13に分かれて流れる。   At this time, the circulation pump 7 is operated to discharge weakly acidic chlorine water from the sterilization tank 3, and this weakly acidic chlorine water is supplied to the weakly acidic chlorine water production apparatus 2 through the second supply line 5. The weakly acidic chlorinated water supplied to the weakly acidic chlorinated water production apparatus 2 flows separately into the first supply path 11 and the second supply path 13 as diluted water of a hydrochloric acid aqueous solution and a hypochlorite aqueous solution.

制御装置18は、弱酸性塩素水製造装置2に供給された塩素濃度センサ80、pHセンサ81を介して、弱酸性塩素水の塩素濃度(次亜塩素酸塩水溶液の濃度)とpH値を測定し、濃度比例制御により、所定量の次亜塩素酸塩水溶液を、第2供給装置14から第2供給経路13に供給させる。そして制御装置18は、次亜塩素酸塩水溶液の量に応じた塩酸水溶液を、第1供給装置12から 第1供給経路11に供給させる。さらに、制御装置18は、測定したpH値に基づいて、弱酸性塩素水製造装置2で製造される弱酸性塩素水が所定のpHになるように、適量のpH調整剤(塩酸水溶液)を、第3供給装置16から 第1供給経路11に供給させる。   The control device 18 measures the chlorine concentration (the concentration of the hypochlorite aqueous solution) and the pH value of the weakly acidic chlorinated water through the chlorine concentration sensor 80 and the pH sensor 81 supplied to the weakly acidic chlorinated water production device 2. Then, a predetermined amount of hypochlorite aqueous solution is supplied from the second supply device 14 to the second supply path 13 by concentration proportional control. Then, the control device 18 supplies a hydrochloric acid aqueous solution corresponding to the amount of the hypochlorite aqueous solution from the first supply device 12 to the first supply path 11. Furthermore, the control device 18 adds an appropriate amount of pH adjuster (hydrochloric acid aqueous solution) based on the measured pH value so that the weakly acidic chlorine water produced by the weakly acidic chlorine water production device 2 has a predetermined pH. The third supply device 16 is supplied to the first supply path 11.

第1供給経路11に供給された塩酸水溶液は、希釈水である弱酸性塩素水とともに第1混合希釈部32に流入する。そして、第1混合希釈部32で塩酸水溶液と希釈水とが混合され、均一に希釈化された所定濃度の塩酸水溶液が生成される。   The aqueous hydrochloric acid solution supplied to the first supply path 11 flows into the first mixing / dilution unit 32 together with the weakly acidic chlorine water that is the dilution water. Then, the hydrochloric acid aqueous solution and the dilution water are mixed in the first mixing / dilution unit 32 to generate a hydrochloric acid aqueous solution having a predetermined concentration that is uniformly diluted.

第2供給経路13に供給された次亜塩素酸塩水溶液は、希釈水である弱酸性塩素水とともに第2混合希釈部42に流入する。そして第2混合希釈部42で次亜塩素酸塩水溶液と希釈水が混合され、均一に希釈化された所定濃度の次亜塩素酸塩水溶液が生成される。   The hypochlorite aqueous solution supplied to the second supply path 13 flows into the second mixed dilution section 42 together with the weakly acidic chlorine water that is the dilution water. Then, the hypochlorite aqueous solution and the diluting water are mixed in the second mixing / dilution unit 42 to produce a hypochlorite aqueous solution having a predetermined concentration that is uniformly diluted.

第1供給経路11で希釈された塩酸水溶液と、第2供給経路13で希釈された次亜塩素酸塩水溶液は、第3供給経路15で合流するとともに第3混合希釈部61に流入する。次亜塩素酸塩水溶液と塩酸水溶液は、第3混合希釈部61で混合されて均一に希釈され、所定のpHの弱酸性塩素水となる。この弱酸性塩素水は、第3供給経路15から、第1供給ライン4を通じて弱酸性塩素水循環装置1の殺菌タンク3に供給される。   The aqueous hydrochloric acid solution diluted in the first supply path 11 and the hypochlorite aqueous solution diluted in the second supply path 13 merge in the third supply path 15 and flow into the third mixing and dilution unit 61. The hypochlorite aqueous solution and the hydrochloric acid aqueous solution are mixed and uniformly diluted by the third mixing / dilution unit 61 to become weakly acidic chlorine water having a predetermined pH. This weakly acidic chlorinated water is supplied from the third supply path 15 to the sterilization tank 3 of the weakly acidic chlorinated water circulation device 1 through the first supply line 4.

以上により、弱酸性塩素水循環装置1は、弱酸性塩素水を循環ライン6に循環させることにより、殺菌タンク3に常に所定のpHに調整された殺菌力の高い弱酸性塩素水を供給できるようになっており、これによって、殺菌対象物を確実かつ迅速に殺菌できるようになっている。   As described above, the weakly acidic chlorinated water circulating apparatus 1 can supply the weakly sterilized chlorine water having a high sterilizing power that is always adjusted to a predetermined pH to the sterilizing tank 3 by circulating the weakly acidic chlorinated water through the circulation line 6. Thus, the object to be sterilized can be sterilized reliably and quickly.

上記構成の弱酸性塩素水循環装置1によれば、殺菌タンク3から殺菌力の低下した弱酸性塩素水が第2供給ライン5を通じて弱酸性塩素水製造装置2に供給されたとき、弱酸性塩素水製造装置2は、第1供給経路11の第1混合希釈部32で塩酸水溶液と(弱酸性塩素水)を混合して均一に希釈するとともに、第2供給経路13の第2混合希釈部42で次亜塩素酸塩水溶液と弱酸性塩素水(希釈水)を混合して均一に希釈して、希釈された塩酸水溶液と次亜塩素酸塩水溶液を第3供給経路15の第3混合希釈部61で混合して希釈することによって、塩酸水溶液と次亜塩素酸塩水溶液は、段階的に希釈されてムラのない弱酸性塩素水となる。   According to the weakly acidic chlorinated water circulation device 1 having the above configuration, when weakly acidic chlorinated water having reduced sterilizing power is supplied from the sterilizing tank 3 to the weakly acidic chlorinated water production device 2 through the second supply line 5, The manufacturing apparatus 2 mixes the aqueous hydrochloric acid solution (weakly acidic chlorinated water) with the first mixing / dilution unit 32 of the first supply path 11 to uniformly dilute it, and the second mixing / dilution unit 42 of the second supply path 13 The hypochlorite aqueous solution and the weakly acidic chlorinated water (diluted water) are mixed and diluted uniformly, and the diluted hydrochloric acid aqueous solution and the hypochlorite aqueous solution are mixed into the third mixing / dilution unit 61 of the third supply path 15. The aqueous hydrochloric acid solution and the hypochlorite aqueous solution are diluted stepwise to become weakly acidic chlorinated water without unevenness.

したがって、殺菌タンク3に注入された弱酸性塩素水は、局部的に濃度の高い次亜塩素酸塩水溶液と濃度の高い塩酸水溶液とが接触することがなく、塩素ガスの発生を抑制できるものになっている。これにより、弱酸性塩素水循環装置1は、常に殺菌力の高い弱酸性塩素水によって殺菌対象物を殺菌できる。   Therefore, the weakly acidic chlorinated water injected into the sterilization tank 3 is capable of suppressing generation of chlorine gas without causing the locally concentrated hypochlorite aqueous solution and the concentrated hydrochloric acid aqueous solution to contact each other. It has become. Thereby, the weakly acidic chlorinated water circulation apparatus 1 can always sterilize the sterilization target with the weakly acidic chlorinated water having a high sterilizing power.

また、 弱酸性塩素水製造装置2は、第1供給経路11には、第1注入口31よりも上流側に第1圧力計51が設けられ、第1混合希釈部32よりも下流側に第1流量調整弁33が設けられており、さらに第2供給経路13の第2注入口41よりも上流側に第2圧力計52が設けられ、第2混合希釈部42の下流側に第2流量調整弁43が設けられていることから、第1流量調整弁33、第2流量調整弁43を操作することによって、第1供給経路11内、および第2供給経路13内の圧力を調整して所望の圧力環境に設定できるようになり、特に、第1供給経路11と第2供給経路13の圧力を均等にして希釈水を第1供給経路11と第2供給経路13に均等に供給する場合に有用である。   Further, in the weakly acidic chlorinated water production apparatus 2, a first pressure gauge 51 is provided in the first supply path 11 on the upstream side of the first inlet 31, and the first pressure gauge 51 is provided on the downstream side of the first mixing and dilution unit 32. 1, a second flow rate adjustment valve 33 is provided, a second pressure gauge 52 is provided upstream of the second inlet 41 of the second supply path 13, and a second flow rate is provided downstream of the second mixing and dilution unit 42. Since the adjustment valve 43 is provided, the pressure in the first supply path 11 and the second supply path 13 is adjusted by operating the first flow rate adjustment valve 33 and the second flow rate adjustment valve 43. It becomes possible to set a desired pressure environment. In particular, when the pressures of the first supply path 11 and the second supply path 13 are equalized and dilution water is evenly supplied to the first supply path 11 and the second supply path 13. Useful for.

また、第1混合希釈部32の中途部に板部材(邪魔板)34が設けられることによって、この板部材34の上流側の第1反応領域35に流量抵抗(圧力抵抗)を生じさせ、第1反応領域35に流入した塩酸水溶液と希釈水とを一定時間混合させ、さらに、これらを板部材34の貫通孔34aを通過させて第1安定領域36に拡散させることによって、塩酸水溶液は、ムラなく均一に希釈されることになる。   In addition, by providing a plate member (baffle plate) 34 in the middle of the first mixing / dilution unit 32, a flow resistance (pressure resistance) is generated in the first reaction region 35 on the upstream side of the plate member 34. The aqueous hydrochloric acid solution and the diluting water that have flowed into the reaction region 35 are mixed for a certain period of time, and further, these are passed through the through-holes 34a of the plate member 34 and diffused into the first stable region 36. Will be diluted evenly.

同様に、第2混合希釈部42の中途部に板部材(邪魔板)44が設けられることによって、この板部材44の上流側の第2反応領域45に流量抵抗(圧力抵抗)を生じさせ、第2反応領域45に流入した次亜塩素酸塩水溶液と希釈水とを一定時間混合させ、さらに、これらを板部材44の貫通孔44aを通過させて第2安定領域46に拡散させることによって、次亜塩素酸塩水溶液は、ムラなく均一に希釈されることになる。   Similarly, by providing a plate member (baffle plate) 44 in the middle of the second mixing and dilution unit 42, a flow resistance (pressure resistance) is generated in the second reaction region 45 on the upstream side of the plate member 44, By mixing the hypochlorite aqueous solution and dilution water that have flowed into the second reaction region 45 for a certain period of time, and further passing these through the through holes 44a of the plate member 44 and diffusing them into the second stable region 46, The hypochlorite aqueous solution is diluted uniformly without unevenness.

同様に、第3混合希釈部61の中途部に板部材(邪魔板)63が設けられることによって、この板部材63の上流側の第3反応領域64に流量抵抗を生じさせ、第3反応領域64に流入した塩酸水溶液と次亜塩素酸塩水溶液とを一定時間混合させ、さらに、これらを板部材63の貫通孔63aを通過させて第3安定領域65に拡散させることによって、塩酸水溶液と次亜塩素酸塩水溶液はムラなく均一に希釈され、塩素ガスの発生しにくい弱酸性塩素水が生成される。   Similarly, by providing a plate member (baffle plate) 63 in the middle of the third mixing and dilution unit 61, a flow resistance is generated in the third reaction region 64 on the upstream side of the plate member 63, and the third reaction region The aqueous hydrochloric acid solution and the hypochlorite aqueous solution flowing into 64 are mixed for a certain period of time, and further, these are passed through the through-hole 63a of the plate member 63 and diffused into the third stable region 65, so The aqueous chlorite solution is evenly diluted without unevenness, and weakly acidic chlorinated water that hardly generates chlorine gas is generated.

さらに、弱酸性塩素水循環装置1は、弱酸性塩素水製造装置2の第2供給装置14が、第2供給ライン5から供給される希釈水である弱酸性塩素水における次亜塩素酸塩水溶液の濃度に応じた量の次亜塩素酸塩水溶液を第2供給経路13に供給するように制御され、第1供給装置12が、第2供給装置14から供給される次亜塩素酸塩水溶液の量に応じた量の塩酸水溶液を第1供給経路11に供給するように制御されることから、これによって製造された弱酸性塩素水は、所望の濃度で、かつ所望のpH値を常に維持できるようになる。   Further, the weakly acidic chlorinated water circulation device 1 is configured such that the second supply device 14 of the weakly acidic chlorinated water production device 2 is a solution of hypochlorite aqueous solution in weakly acidic chlorinated water that is dilution water supplied from the second supply line 5. The amount of the hypochlorite aqueous solution that is controlled so as to supply the hypochlorite aqueous solution in an amount corresponding to the concentration to the second supply path 13 and the first supply device 12 is supplied from the second supply device 14. Therefore, the weakly acidic chlorinated water produced thereby can be maintained at a desired concentration and always at a desired pH value. become.

また、殺菌タンク3から排出され、第2供給ライン5から弱酸性塩素水製造装置2に供給される弱酸性塩素水のpHを測定するとともに、このpH値に応じて、第3供給装置16によってpH調整剤を供給することによって、弱酸性塩素水製造装置2によって製造された弱酸性塩素水は、所望の濃度で、かつ所望のpHのものとなる。   Moreover, while measuring the pH of the weak acidic chlorine water discharged | emitted from the sterilization tank 3 and supplied to the weak acidic chlorine water manufacturing apparatus 2 from the 2nd supply line 5, according to this pH value, the 3rd supply apparatus 16 By supplying the pH adjuster, the weak acid chlorine water produced by the weak acid chlorine water production apparatus 2 has a desired concentration and a desired pH.

弱酸性塩素水製造装置2を用いて製造したpH6および7の弱酸性塩素水(以下「実施例」という)と、弱酸性塩素水製造装置2を用いずに、塩酸水溶液と次亜塩素酸塩水溶液を希釈水に混入して生成した弱酸性塩素水(以下「比較例」という)の発生塩素濃度の比較試験を行った。この試験は、実施例、比較例について、それぞれ100ccの弱酸性塩素水をビーカーに入れて気密性を有する密封容器(袋)内に封入し、1分間放置した後に密封容器内の塩素ガス濃度を塩素検知管によって測定した。なお、弱酸性塩素水の生成には、塩素濃度150ppmの水道水を希釈水として使用した。   A weakly acidic chlorinated water of pH 6 and 7 (hereinafter referred to as “Example”) produced using the weakly acidic chlorinated water production apparatus 2 and an aqueous hydrochloric acid solution and hypochlorite without using the weakly acidic chlorinated water producing apparatus 2 A comparative test of the generated chlorine concentration of weakly acidic chlorinated water (hereinafter referred to as “Comparative Example”) generated by mixing an aqueous solution with diluted water was conducted. In this test, 100 cc of weakly acidic chlorinated water was placed in a beaker and sealed in an airtight sealed container (bag), and the chlorine gas concentration in the sealed container was measured after standing for 1 minute. Measured with a chlorine detector tube. For the production of weakly acidic chlorinated water, tap water having a chlorine concentration of 150 ppm was used as dilution water.

試験結果を図3に示す。図3に示すように、pH6および7の場合において、実施例の方が比較例よりも発生する塩素ガスの濃度が低く、したがって、弱酸性塩素水製造装置2で製造された弱酸性塩素水は、塩素ガスの発生を抑制できるものであることが判る。なお、図3には、塩酸水溶液を使用せずに生成したpH9の塩素水についても参考例として表示している。   The test results are shown in FIG. As shown in FIG. 3, in the case of pH 6 and 7, the concentration of the chlorine gas generated in the example is lower than that in the comparative example. Therefore, the weak acid chlorine water produced by the weak acid chlorine water production apparatus 2 is It can be seen that the generation of chlorine gas can be suppressed. In FIG. 3, pH 9 chlorine water produced without using a hydrochloric acid aqueous solution is also shown as a reference example.

弱酸性塩素水製造装置2の第3混合希釈部61の内部圧力を変化させて弱酸性塩素水を製造し、それぞれの圧力における弱酸性塩素水の発生塩素濃度を測定した。測定結果を図4に示す。図4は、pH6、7の弱酸性塩素水を製造した場合の第3混合希釈部61の内圧と発生塩素ガスの濃度の関係を示している。なお、弱酸性塩素水製造には、150ppmの水道水を希釈水として使用した。図4に示すように、pH6、7いずれの場合においても、第3混合希釈部61の内部圧力が0.2MPa以上の場合に、発生する塩素ガスの濃度を低く抑制できることが判る。   Weakly acidic chlorinated water was produced by changing the internal pressure of the third mixing and dilution unit 61 of the weakly acidic chlorinated water production apparatus 2, and the generated chlorine concentration of the weakly acidic chlorinated water at each pressure was measured. The measurement results are shown in FIG. FIG. 4 shows the relationship between the internal pressure of the third mixed dilution section 61 and the concentration of the generated chlorine gas when weakly acidic chlorine water having pH 6 and 7 is produced. In addition, 150 ppm tap water was used as dilution water for weak acidic chlorine water manufacture. As shown in FIG. 4, it can be seen that, in both cases of pH 6 and 7, when the internal pressure of the third mixing dilution section 61 is 0.2 MPa or more, the concentration of generated chlorine gas can be suppressed low.

弱酸性塩素水製造装置2を用いて製造した弱酸性塩素水(実施例)と、弱酸性塩素水製造装置2を用いることなく塩酸水溶液と次亜塩素酸塩水溶液とを希釈水で希釈して生成した弱酸性塩素水(比較例)とをバブリング試験を行って比較した。本試験では、希釈水として塩素濃度150ppmの水道水を使用した。バブリング試験は、実施例を、比較例を別個の容器に入れ、容器内に空気を一定時間注入してときに、実施例、比較例から発生する塩素ガスの濃度を測定した。試験結果を図5に示す。図5は、弱酸性塩素水のpHが6.0、6.5、7.0の場合において、実施例、比較例から発生する塩素ガスの濃度(ppm)を比較したものである。なお、図5には、塩酸水溶液を使用せずに生成したpH9の塩素水についても参考例として表示している。   A weakly acidic chlorinated water (Example) manufactured using the weakly acidic chlorinated water manufacturing apparatus 2 and a hydrochloric acid aqueous solution and a hypochlorite aqueous solution diluted with dilution water without using the weakly acidic chlorinated water manufacturing apparatus 2 The generated weakly acidic chlorinated water (comparative example) was compared by performing a bubbling test. In this test, tap water having a chlorine concentration of 150 ppm was used as dilution water. In the bubbling test, the concentration of chlorine gas generated from the example and the comparative example was measured when the comparative example was placed in a separate container and air was injected into the container for a certain period of time. The test results are shown in FIG. FIG. 5 compares the concentration (ppm) of chlorine gas generated from the examples and comparative examples when the pH of the weakly acidic chlorinated water is 6.0, 6.5, and 7.0. In FIG. 5, pH 9 chlorine water produced without using a hydrochloric acid aqueous solution is also shown as a reference example.

図5に示すように、pH6〜7の範囲において、実施例は、比較例よりも塩素ガス濃度が低くなっており、これにより、弱酸性塩素水製造装置2によって製造された弱酸性塩素水は、塩素ガスの発生を抑制できることが判る。   As shown in FIG. 5, in the range of pH 6 to 7, the example has a lower chlorine gas concentration than the comparative example, and thus the weak acid chlorine water produced by the weak acid chlorine water production apparatus 2 is It can be seen that generation of chlorine gas can be suppressed.

弱酸性塩素水製造装置2を用いてpHの異なる弱酸性塩素水を製造し、それぞれのpHの弱酸性塩素水の大腸菌(JM109)に対する殺菌効果を確認する試験を行った。試験結果を図6に示す。図6は、弱酸性塩素水製造装置2によって、pHの値が6、6.5、7、9の弱酸性塩素水を製造し、約1×107cfu/mlの大腸菌の培養液に注入したときの菌数を示したものである。なお、図6には、塩酸水溶液を使用せずに生成されたpH9の塩素水についても参考例として表示している。図6では、大腸菌の菌数が少なくなればなる程、弱酸性塩素水の殺菌効果が高いことを意味する。 A weak acidic chlorinated water having a different pH was produced using the weak acidic chlorinated water production apparatus 2, and a test was conducted to confirm the bactericidal effect on the weakly acidic chlorinated water of each pH against Escherichia coli (JM109). The test results are shown in FIG. FIG. 6 shows the production of weakly acidic chlorine water having a pH value of 6, 6.5, 7, and 9 by the weakly acidic chlorine water production apparatus 2 and injecting it into a culture solution of about 1 × 10 7 cfu / ml of E. coli. The number of bacteria is shown. In FIG. 6, pH 9 chlorine water produced without using a hydrochloric acid aqueous solution is also shown as a reference example. In FIG. 6, it means that the germicidal effect of weakly acidic chlorinated water is higher as the number of E. coli bacteria decreases.

図6に示すように、pH6〜7の範囲で弱酸性塩素水はその殺菌作用により、大腸菌の数を減少できることが判る。pH6〜6.5の範囲の弱酸性塩素水がさらに殺菌効果が高く、pH6の弱酸性塩素水が、最も殺菌効果が高いことが判る。   As shown in FIG. 6, it can be seen that weakly acidic chlorinated water can reduce the number of Escherichia coli by its bactericidal action in the range of pH 6-7. It can be seen that the weakly acidic chlorinated water in the range of pH 6 to 6.5 has a higher sterilizing effect, and the weakly acidic chlorinated water of pH 6 has the highest sterilizing effect.

弱酸性塩素水製造装置2を用いてpHの異なる弱酸性塩素水を製造し、それぞれのpHの弱酸性塩素水の表皮ブドウ球菌に対する殺菌効果を確認する試験を行った。試験結果を図7に示す。図7は、pH値が6、6.5、7の弱酸性塩素水を製造し、約1×106cfu/mlの表皮ブドウ球菌の培養液に注入したときの菌数を示したものである。なお、図7には、塩酸水溶液を使用せずに生成した塩素水についても参考例として示している。図7では、表皮ブドウ球菌の菌数が少なくなればなる程、弱酸性塩素水の殺菌効果が高いことを意味する。図7に示すように、pH値が6〜7の範囲の弱酸性塩素水が表皮ブドウ球菌に対する殺菌効果が高いことが判る。 The weak acidic chlorinated water production apparatus 2 was used to produce weak acidic chlorinated water having different pHs, and a test was conducted to confirm the bactericidal effect against Staphylococcus epidermidis at each pH. The test results are shown in FIG. FIG. 7 shows the number of cells when weakly acidic chlorinated water having pH values of 6, 6.5, and 7 is produced and injected into a culture solution of Staphylococcus epidermidis at about 1 × 10 6 cfu / ml. is there. In FIG. 7, chlorine water produced without using a hydrochloric acid aqueous solution is also shown as a reference example. In FIG. 7, the smaller the number of Staphylococcus epidermidis, the higher the bactericidal effect of weakly acidic chlorinated water. As shown in FIG. 7, it can be seen that weakly acidic chlorinated water having a pH value in the range of 6 to 7 has a high bactericidal effect against Staphylococcus epidermidis.

弱酸性塩素水製造装置2を用いてpHの異なる弱酸性塩素水を製造し、それぞれのpHの弱酸性塩素水のセレウス菌(芽胞菌)に対する殺菌効果を確認する試験を行った。試験結果を図8に示す。図8は、弱酸性塩素水製造装置2によってpH値が6.0、6.5、7.0の弱酸性塩素水を製造し、約1×106.1cfu/mlのセレウス菌の培養液に注入し、1分経過時(1分処理)、3分経過時(3分処理)、5分経過時(5分処理)の菌数を示したものである。なお、図8には、塩酸水溶液を使用せずに生成したpH8.1、9.0の塩素水についても参考例として示している。図8では、セレウス菌の菌数が少なくなればなる程、弱酸性塩素水の殺菌効果が高いことを意味する。 A weak acidic chlorinated water having different pHs was produced using the weak acidic chlorinated water production apparatus 2, and a test was conducted to confirm the bactericidal effect on the Bacillus cereus (spore fungus) at each pH. The test results are shown in FIG. FIG. 8 shows the production of weakly acidic chlorinated water having pH values of 6.0, 6.5, and 7.0 by the weakly acidic chlorinated water production apparatus 2, and the resulting culture solution of Bacillus cereus is about 1 × 10 6.1 cfu / ml. The number of bacteria is shown when 1 minute has passed (1 minute treatment), 3 minutes have passed (3 minutes treatment), and 5 minutes have passed (5 minutes treatment). In FIG. 8, pH 8.1 and 9.0 chlorine water produced without using an aqueous hydrochloric acid solution is also shown as a reference example. In FIG. 8, the smaller the number of Bacillus cereus bacteria, the higher the bactericidal effect of weakly acidic chlorinated water.

図8に示すように、pH6.0〜7.0の範囲で、弱酸性塩素水は、1分以上の処理時間をかけた場合に、セレウス菌を殺菌できることが判る。また、弱酸性塩素水は、pH6.0〜6.5の範囲で、殺菌効果がより高く、pH6.0〜6.5の範囲でさらに殺菌効果が高く、pH6.0の場合が最も殺菌効果が高いことが判る。   As shown in FIG. 8, it can be seen that weakly acidic chlorinated water can sterilize Bacillus cereus when a treatment time of 1 minute or longer is applied in the range of pH 6.0 to 7.0. Further, the weakly acidic chlorinated water has a higher bactericidal effect in the range of pH 6.0 to 6.5, and further has a higher bactericidal effect in the range of pH 6.0 to 6.5. Is high.

なお、本発明は上記の実施形態に限らず、種々の変更・変形が可能である。   In addition, this invention is not restricted to said embodiment, A various change and deformation | transformation are possible.

例えば、上記の実施形態で例示した弱酸性塩素水製造装置2では、第1供給経路11に第1圧力計51が設けられ、第2供給経路13に第2圧力計52が設けられていたが、これに限らず、第1供給経路11の第1注入口31よりも上流側の位置と第2供給経路13の第2注入口41よりも上流側の位置との間に差圧計を設け、この差圧計で測定した圧力差に基づいて第1流量調整弁33、第2流量調整弁43を操作するようにしてもよい。   For example, in the weakly acidic chlorinated water production apparatus 2 illustrated in the above embodiment, the first pressure gauge 51 is provided in the first supply path 11 and the second pressure gauge 52 is provided in the second supply path 13. However, not limited to this, a differential pressure gauge is provided between a position upstream of the first inlet 31 of the first supply path 11 and a position upstream of the second inlet 41 of the second supply path 13, You may make it operate the 1st flow regulating valve 33 and the 2nd flow regulating valve 43 based on the pressure difference measured with this differential pressure gauge.

上記の実施形態では、弱酸性塩素水製造装置2で製造した弱酸性塩素水を殺菌タンク3に供給する場合の例を説明したが、これに限らず、予め殺菌タンク3内に所定量の希釈水(例えば水道水)を注入しておき、この希釈水を弱酸性塩素水製造装置2に送って所定のpHの弱酸性塩素水を製造し、循環ライン6を循環させるようにしてもよい。   In the above embodiment, an example in which the weakly acidic chlorinated water produced by the weakly acidic chlorinated water production apparatus 2 is supplied to the sterilization tank 3 has been described. Water (for example, tap water) may be injected, and this diluted water may be sent to the weakly acidic chlorinated water production apparatus 2 to produce weakly acidic chlorinated water having a predetermined pH, and the circulation line 6 may be circulated.

上記の実施形態では、第1混合希釈部32の下流側に第1流量調整弁33が設けられ、第2混合希釈部42の下流側に第2流量調整弁43が設けられた弱酸性塩素水製造装置2を例示したが、これに限らず、第1混合希釈部32の上流側に第1流量調整弁33を設け、第2混合希釈部42の上流側に第2流量調整弁43を設けて、希釈水の流量を調節するようにしてもよい。   In the above embodiment, the weakly acidic chlorine water in which the first flow rate adjustment valve 33 is provided on the downstream side of the first mixing dilution unit 32 and the second flow rate adjustment valve 43 is provided on the downstream side of the second mixing dilution unit 42. Although the manufacturing apparatus 2 has been illustrated, the present invention is not limited thereto, and the first flow rate adjustment valve 33 is provided on the upstream side of the first mixing / dilution unit 32, and the second flow rate adjustment valve 43 is provided on the upstream side of the second mixing / dilution unit 42. Then, the flow rate of the dilution water may be adjusted.

本発明に係る弱酸性塩素水循環装置の一実施形態を示すフロー図である。It is a flow figure showing one embodiment of the weak acid chlorine water circulation device concerning the present invention. 弱酸性塩素水製造装置の要部拡大図である。It is a principal part enlarged view of the weak acidic chlorine water manufacturing apparatus. 弱酸性塩素水製造装置によって製造した弱酸性塩素水と、弱酸性塩素水製造装置を用いることなく生成した弱酸性塩素水とから発生した塩素ガスの濃度を示すグラフである。It is a graph which shows the density | concentration of the chlorine gas which generate | occur | produced from the weak acidic chlorine water manufactured with the weak acidic chlorine water manufacturing apparatus, and the weak acidic chlorine water produced | generated without using a weak acidic chlorine water manufacturing apparatus. 弱酸性塩素水製造装置の第3混合希釈部の内圧を変化させて弱酸性塩素水を製造したときに、各弱酸性塩素水から発生した塩素ガスの濃度を示すグラフである。It is a graph which shows the density | concentration of the chlorine gas generate | occur | produced from each weakly acidic chlorine water when changing the internal pressure of the 3rd mixing dilution part of a weakly acidic chlorine water manufacturing apparatus and manufacturing weakly acidic chlorine water. バブリング試験の結果を示すグラフである。It is a graph which shows the result of a bubbling test. 弱酸性塩素水製造装置によって製造された弱酸性塩素水の大腸菌に対する殺菌作用を示すグラフである。It is a graph which shows the bactericidal action with respect to colon_bacillus | E._coli of the weak acid chlorine water manufactured with the weak acid chlorine water manufacturing apparatus. 弱酸性塩素水製造装置によって製造された弱酸性塩素水の表皮ブドウ球菌に対する殺菌作用を示すグラフである。It is a graph which shows the bactericidal action with respect to Staphylococcus epidermidis produced with the weak acid chlorine water manufacturing apparatus. 弱酸性塩素水製造装置によって製造された弱酸性塩素水の芽胞菌に対する殺菌作用を示すグラフである。It is a graph which shows the bactericidal action with respect to the spore bacteria of the weak acid chlorine water manufactured with the weak acid chlorine water manufacturing apparatus. 水素イオン指数に対する弱酸性塩素水の遊離塩素の存在率(存在比)を示すグラフである。It is a graph which shows the abundance ratio (abundance ratio) of weakly acidic chlorine water free chlorine with respect to the hydrogen ion index.

符号の説明Explanation of symbols

1…弱酸性塩素水循環装置、2…弱酸性塩素水製造装置、3…殺菌タンク、4…第1供給ライン、5…第2供給ライン、6…循環ライン、7…循環ポンプ、10…主供給経路、11…第1供給経路、12…第1供給装置、13…第2供給経路、14…第2供給装置、15…第3供給経路、16…第3供給装置、31…第1注入口、32…第1混合希釈部、33…第1流量調整弁、34…板部材、41…第2注入口、42…第2混合希釈部、43…第2流量調整弁、44…板部材、51…第1圧力計、52…第2圧力計、61…第3混合希釈部、62…第3流量調整弁、63…板部材   DESCRIPTION OF SYMBOLS 1 ... Weakly acidic chlorine water circulation apparatus, 2 ... Weakly acidic chlorine water manufacturing apparatus, 3 ... Sterilization tank, 4 ... 1st supply line, 5 ... 2nd supply line, 6 ... Circulation line, 7 ... Circulation pump, 10 ... Main supply Path, 11 ... first supply path, 12 ... first supply apparatus, 13 ... second supply path, 14 ... second supply apparatus, 15 ... third supply path, 16 ... third supply apparatus, 31 ... first inlet 32 ... 1st mixing dilution part, 33 ... 1st flow adjustment valve, 34 ... Plate member, 41 ... 2nd inlet, 42 ... 2nd mixing dilution part, 43 ... 2nd flow adjustment valve, 44 ... Plate member, DESCRIPTION OF SYMBOLS 51 ... 1st pressure gauge, 52 ... 2nd pressure gauge, 61 ... 3rd mixing dilution part, 62 ... 3rd flow regulating valve, 63 ... Plate member

Claims (5)

所定の水素イオン指数の弱酸性塩素水を製造する弱酸性塩素水製造装置と、この弱酸性塩素水製造装置によって製造された弱酸性塩素水を貯留するとともに、所定の殺菌対象物を殺菌する殺菌タンクと、弱酸性塩素水製造装置によって製造された弱酸性塩素水を殺菌タンクに供給する第1供給ラインと、殺菌タンクから排出された弱酸性塩素水を弱酸性塩素水製造装置に供給する第2供給ラインとによって弱酸性塩素水を循環させる循環ラインが構成され、この循環ラインに弱酸性塩素水を循環させる循環ポンプが設けられた弱酸性塩素水循環装置であって、
殺菌タンクから排出された弱酸性塩素水は、弱酸性塩素水製造装置に供給されるとともにこの弱酸性塩素水製造装置で使用される塩酸水溶液および次亜塩素酸塩水溶液を希釈する希釈水として利用可能とされており、
弱酸性塩素水製造装置は、塩酸水溶液を希釈する希釈水が供給される第1供給経路と、第1供給経路に塩酸水溶液を供給する供給装置と、次亜塩素酸塩水溶液を希釈する希釈水が供給される第2供給経路と、第2供給経路に次亜塩素酸塩水溶液を供給する供給装置と、第1供給経路と第2供給経路を合流させるとともに、第1供給経路で希釈された塩酸水溶液と第2供給経路で希釈された次亜塩素酸塩水溶液とを混合させて希釈することにより、所定の水素イオン指数の弱酸性塩素水を供給する第3供給経路とを備えており、
第1供給経路には、塩酸水溶液の供給装置から供給される塩酸水溶液を注入する第1注入口と、第1注入口の下流側に位置するとともに、流量抵抗を生じさせて第1注入口から注入された塩酸水溶液を希釈水と混合して希釈する第1混合希釈部とが設けられており、
第1混合希釈部は、複数の貫通孔が形成された板部材を内部に備えるとともに、板部材の上流側で流量抵抗を生じさせて塩酸水溶液と希釈水を混合し、塩酸水溶液を希釈水とともに板部材の貫通孔を通過させることにより、この塩酸水溶液を所定の濃度に希釈できるように構成されており、
第2供給経路には、次亜塩素酸塩水溶液の供給装置から供給される次亜塩素酸塩水溶液を注入する第2注入口と、第2注入口の下流側に位置するとともに、流量抵抗を生じさせて第2注入口から注入された次亜塩素酸塩水溶液を希釈水と混合して希釈する第2混合希釈部とが設けられており、
第2混合希釈部は、複数の貫通孔が形成された板部材を内部に備えるとともに、板部材の上流側で流量抵抗を生じさせて次亜塩素酸塩水溶液と希釈水を混合し、次亜塩素酸塩水溶液を希釈水とともに板部材の貫通孔を通過させることにより、次亜塩素酸塩水溶液を所定の濃度に希釈できるように構成されており、
第3供給経路には、流量抵抗を生じさせて、第1混合希釈部で希釈された塩酸水溶液と第2混合希釈部で希釈された次亜塩素酸塩水溶液とを混合して希釈することにより、所定の水素イオン指数の弱酸性塩素水を生成する第3混合希釈部が設けられており、
第3混合希釈部は、複数の貫通孔が形成された板部材を内部に備えるとともに、第1混合希釈部で希釈された塩酸水溶液と第2混合希釈部で希釈された次亜塩素酸塩水溶液とを前記板部材の上流側で流量抵抗を生じさせて混合するとともに、混合された次亜塩素酸塩水溶液と塩酸水溶液とを板部材の貫通孔を通過させることにより、所定の水素イオン指数の弱酸性塩素水を生成するように構成されており、
さらに、第1供給経路は、第1注入口よりも上流側位置に設けられて第1供給経路内の圧力を測定する第1圧力計と、第1供給経路を流れる希釈水の流量を調整する第1流量調整弁とを備え、しかも、第2供給経路は、第2注入口よりも上流側位置に設けられて第2供給経路内の圧力を測定する第2圧力計と、第1供給経路を流れる希釈水の流量を調整する第2流量調整弁とを備えることを特徴とする弱酸性塩素水循環装置。
A weakly acidic chlorinated water production device that produces weakly acidic chlorinated water having a predetermined hydrogen ion index, and a sterilizer that stores weakly acidic chlorinated water produced by this weakly acidic chlorinated water producing device and sterilizes a predetermined sterilization target A tank, a first supply line that supplies weakly acidic chlorine water produced by the weakly acidic chlorine water production apparatus to the sterilization tank, and a first supply line that supplies weakly acidic chlorine water discharged from the sterilization tank to the weakly acidic chlorine water production apparatus. A circulation line for circulating weakly acidic chlorinated water by two supply lines, and a weakly acidic chlorinated water circulation device provided with a circulation pump for circulating the weakly acidic chlorinated water in the circulating line,
The weakly acidic chlorinated water discharged from the sterilization tank is supplied to the weakly acidic chlorinated water production device and used as dilution water to dilute the hydrochloric acid aqueous solution and hypochlorite aqueous solution used in this weakly acidic chlorinated water production device. Is possible,
The weakly acidic chlorinated water production apparatus includes a first supply path for supplying a dilution water for diluting a hydrochloric acid aqueous solution, a supply apparatus for supplying the hydrochloric acid aqueous solution to the first supply path, and a dilution water for diluting the hypochlorite aqueous solution. The first supply path is diluted with the second supply path, the supply device supplying the hypochlorite aqueous solution to the second supply path, and the first supply path and the second supply path are merged. A third supply path for supplying weakly acidic chlorine water having a predetermined hydrogen ion index by mixing and diluting the aqueous hydrochloric acid solution and the hypochlorite aqueous solution diluted in the second supply path,
The first supply path has a first inlet for injecting a hydrochloric acid aqueous solution supplied from a hydrochloric acid aqueous solution supply device and a downstream side of the first inlet, and generates a flow resistance from the first inlet. A first mixed dilution section for mixing and diluting the injected hydrochloric acid aqueous solution with dilution water,
The first mixing / dilution unit includes a plate member having a plurality of through holes formed therein, and creates a flow resistance on the upstream side of the plate member to mix the hydrochloric acid aqueous solution and the dilution water, and the hydrochloric acid aqueous solution together with the dilution water. By passing through the through hole of the plate member, this aqueous hydrochloric acid solution is configured to be diluted to a predetermined concentration,
The second supply path has a second inlet for injecting a hypochlorite aqueous solution supplied from a hypochlorite aqueous solution supply device, a downstream side of the second inlet, and a flow resistance. A second mixed dilution section for mixing and diluting the hypochlorite aqueous solution generated and injected from the second inlet with dilution water is provided,
The second mixing / dilution unit includes a plate member having a plurality of through holes formed therein, and generates a flow resistance on the upstream side of the plate member to mix the hypochlorite aqueous solution and the dilution water. By passing the chlorate aqueous solution together with the dilution water through the through hole of the plate member, the hypochlorite aqueous solution can be diluted to a predetermined concentration,
In the third supply path, a flow resistance is generated, and the aqueous hydrochloric acid solution diluted in the first mixed dilution unit and the hypochlorite aqueous solution diluted in the second mixed dilution unit are mixed and diluted. , A third mixed dilution unit for generating weakly acidic chlorinated water having a predetermined hydrogen ion index is provided ,
The third mixing dilution section includes a plate member having a plurality of through holes formed therein, and a hydrochloric acid aqueous solution diluted in the first mixing dilution section and a hypochlorite aqueous solution diluted in the second mixing dilution section. And a mixture of hypochlorite aqueous solution and hydrochloric acid aqueous solution passing through the through-hole of the plate member, thereby generating a flow resistance at the upstream side of the plate member. It is configured to produce weakly acidic chlorinated water,
Further, the first supply path is provided at a position upstream of the first inlet, and adjusts the flow rate of the dilution water flowing through the first supply path, and a first pressure gauge that measures the pressure in the first supply path. A second pressure gauge provided at a position upstream of the second inlet and measuring the pressure in the second supply path; and a first supply path. weakly acidic chlorine water circulation apparatus according to claim Rukoto and a second flow regulating valve for regulating the flow rate of the dilution water flowing.
第1供給経路は、第1混合希釈部の下流側に第1流量調整弁を備えている請求項に記載の弱酸性塩素水循環装置。 First supply path, weakly acidic chlorine water circulation apparatus according to claim 1, downstream of the first mixing dilution portion and a first flow rate regulation valve. 第2供給経路は、第2混合希釈部の下流側に第2流量調整弁を備えている請求項又はに記載の弱酸性塩素水循環装置。 The weakly acidic chlorinated water circulation device according to claim 1 or 2 , wherein the second supply path includes a second flow rate adjusting valve on the downstream side of the second mixing and dilution unit. 第3供給経路は、第3混合希釈部の下流側に第3流量調整弁を備えている請求項1からのいずれか1項に記載の弱酸性塩素水循環装置。 The weakly acidic chlorinated water circulation device according to any one of claims 1 to 3 , wherein the third supply path includes a third flow rate adjusting valve on the downstream side of the third mixing and dilution unit. 次亜塩素酸塩水溶液の供給装置は、第2供給ラインから供給される希釈水である弱酸性塩素水における塩素濃度に応じた量の次亜塩素酸塩水溶液を第2供給経路に供給するように制御され、塩酸水溶液の供給装置は、次亜塩素酸塩水溶液の供給装置から供給される次亜塩素酸塩水溶液の量に応じた量の塩酸水溶液を第1供給経路に供給するように制御される請求項1からのいずれか1項に記載の弱酸性塩素水循環装置。 The apparatus for supplying a hypochlorite aqueous solution is configured to supply a hypochlorite aqueous solution in an amount corresponding to the chlorine concentration in the weakly acidic chlorinated water that is dilution water supplied from the second supply line to the second supply path. The aqueous hydrochloric acid solution supply device is controlled to supply an aqueous hydrochloric acid solution in an amount corresponding to the amount of the hypochlorite aqueous solution supplied from the hypochlorite aqueous solution supply device to the first supply path. The weakly acidic chlorinated water circulation device according to any one of claims 1 to 4 .
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