JP4724926B2 - Film forming jig, magnet used therefor, film forming apparatus and film forming method - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention provides a film forming jig for holding a work in a film forming process for masking the surface of a work with a mask and forming a film in a predetermined pattern on the surface. In addition, the present invention relates to a magnet for holding in a film forming jig, a film forming apparatus including these, and a film forming method.
[0002]
[Prior art]
In a film forming step of forming an electrode film by sputtering on the surface of a work to be an electronic component such as a piezoelectric element, the work surface is masked using a mask while leaving the electrode forming portion. The mask is provided with a mask hole for allowing a sputtering component to selectively pass toward the work surface in accordance with a film formation pattern formed on the work surface.
[0003]
The film forming jig is used to hold a workpiece during the sputtering. On the other hand, the mask needs to be fixed to the film forming jig in order to accurately position the mask hole with respect to the electrode forming portion of the workpiece.
[0004]
In the case of a conventional film-forming jig, the mask is a magnetic mask formed of a magnetic material to fix the position of the mask, and a magnet is embedded in the film-forming jig and the magnet is attracted by the magnetic force. The mask is fixed to a film forming jig.
[0005]
Since such masks and film-forming jigs are contaminated with an unnecessary thin film formed on the surface by sputtering, the masks and film-forming jigs are regularly cleaned with a cleaning solution such as nitric acid. The aforementioned thin film is removed.
[0006]
In this case, since the magnet is dissolved in the cleaning liquid as described above, the magnet is detached from the film forming jig before and after the cleaning.
[0007]
[Problems to be solved by the invention]
In the case described above, every time the film forming jig is cleaned, an operation for removing the magnet from the film forming jig is required, which is one factor that reduces the manufacturing yield of electronic components.
[0008]
In addition, since the magnet is made thin and relatively fragile, it is easy to break during the detaching operation, and a portion of the defect enters between the mask and the film-forming jig, and the mask floats from the film-forming jig. There is a possibility that the film forming accuracy on the workpiece may be reduced due to sputtering performed in the above state.
[0009]
Furthermore, it is expensive to purchase a missing magnet to replace it with a new magnet. Therefore, the present invention has a common problem to be solved that it is not necessary to remove and attach a magnet when cleaning a film forming jig.
[0010]
The present invention also provides a film-forming jig capable of improving workability, reducing work costs, etc., and improving film-forming accuracy by eliminating the need to remove and attach magnets for cleaning in such a common problem. Providing related magnets, film forming apparatuses, and film forming methods is an issue to be solved.
[0011]
[Means for Solving the Problems]
(1) The film-forming jig of the present invention is a film-forming jig provided with a magnet that directly or indirectly attracts a mask for masking a workpiece and holds it in a predetermined position, and the surface of the magnet is It is characterized by being coated with a protective film that is insoluble or hardly soluble in the cleaning solution of the jig.
[0012]
The direct or indirect means that when the mask itself is made of a magnetic material, the mask is attracted, and even if the mask is non-magnetic, a magnetic material is provided on the mask, and the mask is indirectly directed through the magnetic material. In short, all of them are included as long as the mask is held by using the attraction of a magnet.
[0013]
In this case, the cleaning liquid may be anything such as acidic, alkaline or organic, and includes all of the protective film that is insoluble or hardly soluble corresponding to each cleaning liquid.
[0014]
Further, “insoluble or hardly soluble” refers to the degree to which it becomes difficult to dissolve from what does not dissolve at all, and all of that degree is included.
[0015]
According to the film-forming jig of the present invention, a protective film that is insoluble or hardly soluble in the cleaning liquid is formed on the surface of the magnet included in the film-forming jig. The work of detaching the magnet from the jig becomes unnecessary, and accordingly, the work can be formed into a film to contribute to the shortening of the manufacturing time of the electronic component, and the manufacturing yield can be improved.
[0016]
As a preferred embodiment of the present invention, a magnet storage portion for storing a magnet is provided, and the magnet storage portion has a storage depth at which the magnet surface does not protrude outside.
[0017]
When such a concave portion is provided, when the mask is fixed to the jig, the mask does not contact the magnet, thereby preventing the magnet from being damaged.
[0018]
As a further preferred embodiment of the present invention, a plurality of work storage portions for storing a work are provided, and the magnet storage portion is provided along a peripheral region of the work storage portion.
[0019]
As a further preferred embodiment of the present invention, the workpiece storage portion is provided in a bottomed shape opened to one side with respect to the jig. This is preferable because the magnet storage space can be easily formed when the jig is created.
[0020]
As a further preferred embodiment of the present invention, the workpiece storage portion is provided so as to penetrate the jig up and down, and the magnet storage portion extends along the periphery of the workpiece storage portion on both surfaces of the jig. Is provided. In such a case, it is preferable because the magnetic mask can be fixed to both surfaces of the film forming jig and can be sputtered to both surfaces of the workpiece.
[0021]
As a further preferred embodiment of the present invention, the protective layer of the magnet surface, tantalum, tungsten, is formed by using these oxides and this nitride or a material selected from gold,.
[0022]
In the case of such materials and processing forms, it becomes easy to form a protective film on the magnet surface.
[0023]
(2) The magnet of the present invention is a magnet that is provided in a film-forming jig that holds a workpiece in a film-forming position and that attracts a magnetic mask to the film-forming jig by attracting magnetic force. The coating film is coated with a protective film that is insoluble or hardly soluble in the cleaning solution for the film forming jig.
[0024]
According to the magnet of the present invention, since the magnet is prevented from being dissolved in the cleaning liquid, it is not necessary to remove the magnet from the film forming jig when cleaning the film forming jig, thereby reducing the manufacturing cost of the electronic component. Can contribute.
[0025]
(3) A film forming apparatus according to the present invention includes a magnetic mask having a film forming hole and a magnet that magnetically attracts and holds a magnetic mask for masking a workpiece held at a film forming position. The surface of the magnet is coated with a protective film that is insoluble or hardly soluble in the cleaning solution of the jig.
[0026]
According to the film forming apparatus of the present invention, it is not necessary to remove the magnet from the jig when cleaning the jig by using a magnet that is insoluble or hardly soluble in the cleaning liquid as a magnet that magnetically attracts the magnetic mask to the jig. Manufacturing costs can be reduced.
[0027]
(4) The film forming method of the present invention is a film forming method including a first step of holding a work with respect to a film forming jig and a second step of masking the work with a mask. The film-forming jig used in the step includes a magnet that attracts the magnetic mask and holds it on the film-forming jig, and the surface of the magnet is against the cleaning liquid of the jig. It is characterized by being coated with an insoluble or hardly soluble protective film.
[0028]
According to the film forming method of the present invention, it is possible to reduce the manufacturing cost of the electronic component produced by this method.
[0029]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, details of the present invention will be described based on embodiments shown in the drawings.
[0030]
1 to 4 relate to the first embodiment of the present invention, FIG. 1 is a perspective view of a film forming jig and a magnetic mask attached thereto, and FIG. 2 is a partial cross-sectional view of the film forming jig. FIG. 3 is a perspective view of a magnet, and FIG. 4 is a process diagram of workpiece film formation.
[0031]
1 and 2, reference numeral 1 denotes a film forming apparatus. The film forming apparatus 1 includes a film forming jig 2 and a magnetic mask 3.
[0032]
The film forming jig 2 is made of a plate material having a uniform thickness.
[0033]
The film-forming jig 2 also includes a work storage unit 4 and a magnet storage unit 5 on the surface side.
[0034]
The workpiece storage unit 4 stores the workpiece 6, and a plurality of workpiece storage units 4 are arranged in the vertical and horizontal directions within a required rectangular area on the surface side of the film forming jig 2.
[0035]
The magnet storage units 5 are arranged in a row along the outer peripheral region surrounding the rectangular region in the work storage unit 4 at appropriate intervals, and the magnets 7 are fixedly stored in the respective units.
[0036]
The magnet housing part 5 preferably has a depth at which the magnet 7 does not protrude outside from the magnet housing part 5, preferably a depth of 0.1 mm or more.
[0037]
The magnet storage portion 5 is set to such a depth to prevent contact between the surface of the magnet 7 stored in the magnet storage portion 5 and the magnetic mask 3 or to prevent foreign matter from entering the magnet 7 when the magnet 7 is stored. It is possible to prevent contamination.
[0038]
The magnetic mask 3 is made of a material capable of attracting magnetic force to the film formation jig 2 and has a plurality of mask holes 8 corresponding to the film formation pattern formed on the surface of the workpiece 6.
[0039]
Next, features of the first embodiment will be described.
[0040]
That is, in the first embodiment, a protective film that is insoluble or hardly soluble in the etching cleaning liquid performed after sputtering on the entire surface of each magnet 7 accommodated in each magnet accommodating portion 5 in the film forming apparatus 1. 10 is coated.
[0041]
Thus, in the case of Embodiment 1, the protective film 10 is formed on the surface of the magnet 7. Therefore, the work of detaching the magnet 7 from the film-forming jig 2 is not necessary when performing the etching cleaning of the deposit accompanying the sputtering attached to the surface of the film-forming jig 2 or the magnetic mask 3. As a result, the magnet detaching process and the detaching equipment are not required. This makes it possible to reduce the number of manufacturing steps and manufacturing equipment, improve the manufacturing yield, and significantly reduce the cost.
[0042]
As one specific example, the protective film 10 is formed of an electroless nickel plating film as shown in FIG. 3B on the surface of a rectangular magnet 7 as shown in FIG. An electrolytic gold plating film 12 is formed on the base film 11.
[0043]
The protective film 10 can be referred to as a protective film, whether it is the base film 11 alone or the electrolytic gold plating film 12 alone.
[0044]
Further, as the electrolytic gold plating film 12 as the protective film 10, a soft gold plating film is preferable because there is little possibility of pinholes being generated and there is no fear of peeling off the plating film.
[0045]
The gold plating film constituting the protective film 10 is extremely effective as a protective film because it is insoluble in the cleaning liquid regardless of whether the cleaning liquid is acidic, alkaline or organic.
[0046]
Next, the film forming process will be described with reference to FIG.
[0047]
In step n1, the workpiece 6 is stored in the workpiece storage portion 4 of the film forming jig 2.
[0048]
In step n2, the magnetic mask 3 is attached to the film-forming jig 2.
[0049]
In step n3, sputtering is performed.
[0050]
In step n4, the magnetic mask 3 is removed from the film-forming jig 2.
[0051]
In step n5, the workpiece 6 is taken out from the workpiece storage portion 4 of the film forming jig 2.
[0052]
Film formation on the workpiece 6 is completed in the above steps n1 to n5.
[0053]
Then, every time this process is repeated several times, etching cleaning is performed on the magnetic mask 3 and the film-forming jig 2 in step n6.
[0054]
In the above case, conventionally, at the stage of transition from step n5 to step n6, the step of removing the magnet 7 from the film-forming jig 2 and the step of attaching the magnet 7 to the film-forming jig 2 after step n6. And will be reduced.
[0055]
Thereby, the desorption process and desorption equipment of the magnet 7 when performing the etching cleaning of the film forming jig 2 become unnecessary. As a result, the manufacturing yield is improved by reducing the number of man-hours and the equipment, and the cost can be greatly reduced.
[0056]
In this case, the possibility that the magnet 7 may be lost during the detaching operation due to the thin and fragile magnet 7 is solved. In addition, the number of times of replacement with a new magnet is reduced, and the cost of newly purchasing the magnet 7 can be reduced, which is preferable.
[0057]
Furthermore, a part of the defect of the magnet 7 does not enter between the magnetic mask 3 and the film forming jig 2. As a result, the magnetic mask 3 is not sputtered in a state where it floats from the film-forming jig 2 due to a part of this defect, and as a result, sputtering with higher accuracy is possible.
[0058]
The present invention is not limited to the first embodiment described above, and can be applied to the following.
(1) The film forming apparatus according to the first embodiment may be the film forming apparatus according to the second embodiment having the form shown in FIGS. FIG. 5 is a perspective view of the film-forming jig of Embodiment 2 and a magnetic mask mounted thereon, and FIG. 6 is a partial cross-sectional view of the film-forming jig, corresponding to FIG. 1 and FIG. Are given the same reference numerals.
[0059]
A film forming apparatus 1 according to Embodiment 2 includes a film forming jig 2 and a pair of magnetic masks 3 that are magnetically attracted to the upper and lower surfaces of the film forming jig 2.
[0060]
The film-forming jig 2 is formed by laminating and bonding three rectangular plates 13 to 15. Of these three plate members, the plate members 13 and 15 disposed on both sides of the intermediate plate member 14 serving as the magnet holding plate are thicker than the magnet 7.
[0061]
In such a film-forming jig 2, the work storage unit 4 is configured to vertically penetrate the three plate members constituting the jig, and is arranged in a plurality of vertical and horizontal directions within a required rectangular area. Has been.
[0062]
In addition, the magnet storage unit 5 is arranged and formed on both surfaces of the jig 2 in the outer peripheral region of the work storage unit 4.
[0063]
In this case, the magnet storage unit 5 is divided into an upper magnet storage unit and a lower magnet storage unit with the intermediate plate 14 as a bottom wall, and the magnets 7 are respectively the same as those in the first embodiment. The magnets are housed in the two magnet housing parts set to a depth of 1 mm.
[0064]
The magnets 7 are stored by being bonded to the bottom surfaces of the respective magnet storage portions 5.
[0065]
In the case of the second embodiment, it is suitable for forming a pattern by sputtering on both surfaces of the work 6, the work 6 is stored in each work storage section 4, and the work storage section is formed by a pair of magnetic masks 3. Sputtering is performed covering both sides of 4.
[0066]
In this case, both the magnetic masks 3 are attracted to the magnets 7 accommodated in the magnet accommodating portions 5 on both sides during the sputtering.
[0067]
Also in the case of the second embodiment, the protective film 10 is formed on the surface of the magnet 7 housed in the magnet housing portion 5 as in the first embodiment. Therefore, even in the cleaning process in sputtering described with reference to FIG. 4, cleaning of the magnet 7 is not necessary. Therefore, it is not necessary to attach / detach the magnet 7 to / from the magnet housing portion 5, and the attaching / detaching process of the magnet 7 and the attaching / detaching equipment become unnecessary. It is possible.
(2) The protective film 10 on the surface of the magnet 7 in the above is not limited to the protective film 10 by the gold plating in the first and second embodiments, but is a protective film made of tantalum, tungsten, or other metal material. Also good.
(3) the protective film 10 on the surface of the magnet 7 in the above is, tantalum, tungsten, and other titanium, chromium, nickel, or may be a protective layer made of oxide or nitride of a metal material such as copper.
(4) The protective film 10 on the surface of the magnet 7 in the above is not limited to a metal material, but may be a protective film made of ceramic.
[0068]
When the protective film 10 is made of ceramic, it is preferable in terms of corrosion resistance.
(5) The protective film 10 on the surface of the magnet 7 in the above may be a protective film made of resin.
(6) In the above case, when the cleaning liquid has acidity, alkalinity, or other properties, the protective film 10 formed on the surface of the magnet 7 may be made of a material corresponding to each property. it can.
[0069]
For example, when the material constituting the protective film 10 is gold, it is most preferable because it is insoluble or hardly soluble in a cleaning liquid of any nature.
[0070]
Moreover, when the material which comprises the protective film 10 is a ceramic, since it is insoluble or hardly soluble with respect to the washing | cleaning liquid of the property of oiliness, it is preferable.
[0071]
Further, when the material constituting the protective film 10 is a resin, an acrylate system is preferable when the cleaning liquid is acidic such as nitric acid, an epoxy system is preferable when the cleaning liquid is alkaline such as sodium carbonate, and an organic cleaning liquid such as monoethanolamine is used. In this case, a polyester type is preferable.
(7) In the above-described embodiment, the film formation on the workpiece surface is sputtering. However, the present invention is not limited to this, and can be similarly applied to other film formation methods such as vapor deposition. it can.
(8) In the above-described embodiment, the protective film 10 on the surface of the magnet 7 is formed by plating. However, the present invention is not limited to this, and it is possible to form a film by sputtering, vapor deposition, or other methods. Can be applied similarly.
[0072]
【The invention's effect】
As described above, according to the present invention, it is not necessary to remove the magnet from the film-forming jig every time the film-forming jig is cleaned, thereby improving the manufacturing yield and significantly reducing the manufacturing cost. It becomes.
[Brief description of the drawings]
FIG. 1 is an exploded perspective view of a film forming apparatus according to Embodiment 1 of the present invention. FIG. 2 is a cross-sectional view of a main part of the film forming jig shown in FIG. FIG. 4A is a perspective view of the outer appearance of the magnet to be mounted, and FIG. 4B is a sectional view thereof. FIG. 4 is a process diagram for explaining a film formation process. FIG. 6 is a cross-sectional view of the main part of the film-forming jig shown in FIG.
DESCRIPTION OF SYMBOLS 1 Film-forming apparatus 2 Film-forming jig 3 Magnetic mask 4 Work storage part 5 Work storage part 6 Work 7 Magnet 8 Mask hole 10 Protective film

Claims (9)

  A film forming jig provided with a magnet for directly or indirectly attracting a mask for masking a work and holding it in a predetermined position, wherein the surface of the magnet is insoluble or hardly soluble in the cleaning liquid of the jig. A film-forming jig which is coated with a protective film.   2. The film-forming jig according to claim 1, further comprising a magnet storage portion for storing a magnet, wherein the magnet storage portion has a storage depth at which the magnet surface does not protrude outside. jig.   The film-forming jig according to claim 2, further comprising a plurality of workpiece storage portions that store workpieces, wherein the magnet storage portion is provided along a peripheral region of the workpiece storage portion. Jig.   4. The film forming jig according to claim 3, wherein the work storage portion is provided in a bottomed shape opened to one side with respect to the jig.   The film forming jig according to claim 3, wherein the work storage unit is provided so as to penetrate the jig up and down, and the magnet storage unit is disposed around the work storage unit on both surfaces of the jig. A film-forming jig, characterized by being provided along the line. In claims 1 to 5 either deposition jig, a protective film of the magnet surface, tantalum, tungsten, is composed of these oxides and this nitride, or a material selected from among gold A film-forming jig characterized by that.   A magnet that is provided in a film-forming jig for holding a workpiece at a film-forming position and is used to attract the magnetic mask to the film-forming jig by magnetically attracting the magnetic mask. A magnet that is coated with a protective film that is insoluble or hardly soluble in a cleaning solution for a jig.   A magnetic mask having a film-forming mask hole, and a film-forming jig provided with a magnet that attracts the magnetic mask to a film-forming position and holds the magnetic mask in a predetermined position. A film forming apparatus characterized in that it is coated with a protective film that is insoluble or hardly soluble in the cleaning liquid of the tool.   A film forming method including a first step of holding a work with respect to a film forming jig and a second step of masking the work with a mask, wherein the film forming jig used in the first step includes: And a magnet that magnetically attracts and holds the magnetic mask at a predetermined position with respect to the film-forming jig, and the surface of the magnet is insoluble or hardly soluble in the cleaning liquid of the jig. A film forming method characterized by being coated with a protective film.

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