JP4698515B2 - 感光性組成物除去液 - Google Patents

感光性組成物除去液 Download PDF

Info

Publication number
JP4698515B2
JP4698515B2 JP2006195425A JP2006195425A JP4698515B2 JP 4698515 B2 JP4698515 B2 JP 4698515B2 JP 2006195425 A JP2006195425 A JP 2006195425A JP 2006195425 A JP2006195425 A JP 2006195425A JP 4698515 B2 JP4698515 B2 JP 4698515B2
Authority
JP
Japan
Prior art keywords
photosensitive composition
mass
pigment
liquid
acetate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006195425A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007052405A (ja
JP2007052405A5 (https=
Inventor
昌人 金田
浩一 寺尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP2006195425A priority Critical patent/JP4698515B2/ja
Publication of JP2007052405A publication Critical patent/JP2007052405A/ja
Publication of JP2007052405A5 publication Critical patent/JP2007052405A5/ja
Application granted granted Critical
Publication of JP4698515B2 publication Critical patent/JP4698515B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2006195425A 2005-07-19 2006-07-18 感光性組成物除去液 Expired - Fee Related JP4698515B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006195425A JP4698515B2 (ja) 2005-07-19 2006-07-18 感光性組成物除去液

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005208478 2005-07-19
JP2005208478 2005-07-19
JP2006195425A JP4698515B2 (ja) 2005-07-19 2006-07-18 感光性組成物除去液

Publications (3)

Publication Number Publication Date
JP2007052405A JP2007052405A (ja) 2007-03-01
JP2007052405A5 JP2007052405A5 (https=) 2009-05-21
JP4698515B2 true JP4698515B2 (ja) 2011-06-08

Family

ID=37916874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006195425A Expired - Fee Related JP4698515B2 (ja) 2005-07-19 2006-07-18 感光性組成物除去液

Country Status (1)

Country Link
JP (1) JP4698515B2 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5452037B2 (ja) * 2009-03-04 2014-03-26 日立造船株式会社 光電変換素子用電極の製造方法
JP5437541B1 (ja) * 2012-06-26 2014-03-12 野村マイクロ・サイエンス株式会社 レジスト剥離剤
KR102832650B1 (ko) * 2021-01-29 2025-07-11 에스케이하이닉스 주식회사 신너 조성물 및 이를 이용한 반도체 기판의 표면 처리 방법

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000273370A (ja) * 1999-03-25 2000-10-03 Fuji Photo Film Co Ltd 着色組成物用洗浄液
KR100951364B1 (ko) * 2003-06-03 2010-04-08 주식회사 동진쎄미켐 포토레지스트 제거용 씬너 조성물
TWI276929B (en) * 2003-12-16 2007-03-21 Showa Denko Kk Photosensitive composition remover

Also Published As

Publication number Publication date
JP2007052405A (ja) 2007-03-01

Similar Documents

Publication Publication Date Title
JP4776731B2 (ja) 感光性組成物除去液
JP2004346218A (ja) 着色組成物、カラーフィルタの製造方法およびブラックマトリックス基板の製造方法
JP6421197B2 (ja) 除去液、これを用いた除去方法および半導体基板製品の製造方法
KR100944401B1 (ko) 감광성 조성물 제거액
JP6556834B2 (ja) レジスト除去液、レジスト除去方法、再生半導体基板の製造方法
JP4698435B2 (ja) 感光性組成物除去液
JP4698515B2 (ja) 感光性組成物除去液
JP4596894B2 (ja) 感光性組成物除去液
CN101223483B (zh) 用于光敏性组合物的清除溶液
JP4812453B2 (ja) 感光性組成物除去液
JP2010070724A (ja) 硬化性組成物除去液
JP4674048B2 (ja) カラーフィルタ形成用着色組成物およびカラーフィルタ
JP4762162B2 (ja) 感光性組成物除去液
US20090208887A1 (en) Removing solution for photosensitive composition

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090406

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090406

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20101015

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101026

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101215

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110201

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110301

R150 Certificate of patent or registration of utility model

Ref document number: 4698515

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

LAPS Cancellation because of no payment of annual fees