JP4695283B2 - Edge mask device in electroplating tank - Google Patents
Edge mask device in electroplating tank Download PDFInfo
- Publication number
- JP4695283B2 JP4695283B2 JP2001109293A JP2001109293A JP4695283B2 JP 4695283 B2 JP4695283 B2 JP 4695283B2 JP 2001109293 A JP2001109293 A JP 2001109293A JP 2001109293 A JP2001109293 A JP 2001109293A JP 4695283 B2 JP4695283 B2 JP 4695283B2
- Authority
- JP
- Japan
- Prior art keywords
- edge
- strip
- electroplating tank
- edge mask
- mask device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Electroplating Methods And Accessories (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、ストリップ表面に連続的に電気メッキを施す電気メッキタンク内に配置するエッジマスク装置に関する。
【0002】
【従来の技術】
ストリップを連続式電気メッキ装置の電極間を搬送して電気メッキを行う際、ストリップの側端部に過剰にメッキされるエッジ・オバーコートを防止し、電流の裏廻りを防止するために、ストリップの両側端部にエッジマスクを配置することが知られており、例えば、特公昭60−31093号公報では、ストリップの幅に応じて移動可能なエッジマスクを配置し、エッジマスクの移動に伴って巻き取り式のカーテンをタンクの側壁とエッジマスクとの間に接続した連続式電気メッキ装置が記載されている。
【0003】
【発明が解決しようとする課題】
前記公報記載のエッジマスクでは、操業中にメッキ液中のスラッジがカーテン上に堆積するため、カーテンの巻き取り不良あるいは破断などにより、エッジマスクの作動が停止して生産性を悪化させるなどの問題がある。
【0004】
そこで、本発明は、故障の多いカーテンをなくしエッジマスクの作動を円滑化し、安定化させることで生産性の向上を図ることのできる電気メッキ装置内に配置するエッジマスク装置を提供するものである。
【0005】
【課題を解決するための手段】
本発明の電気メッキタンクにおけるエッジマスク装置は、電気メッキタンク内に走行するストリップを取り囲むように対向して一対の電極・エッジマスクが配置され、電極・エッジマスクは、それぞれの電極の一方の側端部に対向してエッジマスクが一体に設けられ且つストリップの幅に応じて移動可能に設けられていることを特徴とする。
【0006】
【発明の実施の形態】
本発明のエッジマスク装置は、縦型電気メッキタンクあるいは横型電気メッキタンクのいずれにも適用できる。
【0007】
【実施例】
実施例1
図1は本発明の一実施例を示し、縦型のメッキタンクの場合の斜視図である。
縦型のメッキタンク1内には上方に走行するストリップ2a、及び下方に走行するストリップ2bのそれぞれを取り囲む電極・エッジマスク3a,3bが配置されている。
【0008】
それぞれの電極・エッジマスク3a,3bは、それぞれの電極4a,4bの一方の側端部に対向して凹条のエッジマスク5a,5bが一体になっており、それぞれのエッジマスク5a,5bが対向するそれぞれの電極4a,4bの表面を摺動するように構成されている。
【0009】
それぞれの電極・エッジマスク3a,3bにはシフトベース6a,6bが固定され、シフトベース6a,6bにはシリンダー7a,7bに接続されている。
【0010】
シリンダー7a,7bは、シフトベース6a,6bが固定された電極・エッジマスク3a,3bをストリップ2a,2bの幅に応じてガイドロッド8a,8bに沿って前進後退させる。
【0011】
次に、電極・エッジマスクの動作について説明する。
【0012】
図2(a)は広幅のストリップの場合の状態、(b)は狭幅のストリップの場合の状態を示す横断面図である。
【0013】
図2(a)において、広幅のストリップの場合、電極・エッジマスク3a,3bが後退して開いて、エッジマスク5a,5bがストリップ2a(2b)の両側に位置するようにする。
【0014】
ストリップ2a(2b)が狭幅のストリップに変わると、図2(b)に示すように、電極・エッジマスク3a,3bが前進してして、幅が狭くなり、エッジマスク5a,5bがストリップ2a(2b)の両側に位置するようにする。
【0015】
実施例2
図3は本発明の別実施例を示し、横型のメッキタンクの場合の斜視図である。
【0016】
本実施例は、実施例1のエッジマスク装置を水平に配置したものであり、実施例1と同一部材には同一符号を付して、その説明は省略する。
【0017】
本実施例では、水平に走行するストリップ2cに対して電極・エッジマスク3a,3bがストリップ2cの幅に応じて前進あるいは後退してエッジマスク5a,5bがストリップ2cの両側に位置するようにする。
【0018】
【発明の効果】
本発明は、カーテンをなくしたことで、カーテンの巻き取り不良、破断などによる作動停止がなくなり、生産性の向上を図ることが可能となる。
【0019】
また、エッジマスクと電極の一体構造化により、従来に比べ構造が単純となり、保全性も向上する。
【図面の簡単な説明】
【図1】 本発明の一実施例を示し、縦型のメッキタンクの場合の斜視図である。
【図2】 (a)は広幅のストリップの場合の状態、(b)は狭幅のストリップの場合の状態を示す横断面図である。
【図3】 本発明の別実施例を示し、横型のメッキタンクの場合の斜視図である。
【符号の説明】
1:タンク
2a,2b,2c:ストリップ
3a,3b:電極・エッジマスク
4a,4b:電極
5a,5b:エッジマスク
6a,6b:シフトベース
7a,7b:シリンダー
8a,8b:ガイドロッド[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an edge mask device disposed in an electroplating tank for continuously electroplating a strip surface.
[0002]
[Prior art]
When performing electroplating by transporting the strip between the electrodes of a continuous electroplating machine, the strip is prevented from being over-plated on the side edges of the strip, and the back of the current is prevented. For example, in Japanese Patent Publication No. 60-31093, an edge mask that can be moved according to the width of a strip is arranged. A continuous electroplating apparatus is described in which a roll-up curtain is connected between a tank sidewall and an edge mask.
[0003]
[Problems to be solved by the invention]
In the edge mask described in the above publication, since sludge in the plating solution accumulates on the curtain during operation, problems such as deterioration of productivity by stopping the operation of the edge mask due to defective winding or breakage of the curtain, etc. There is.
[0004]
Accordingly, the present invention provides an edge mask device that is disposed in an electroplating apparatus that can improve productivity by eliminating the curtain with many failures and smoothing and stabilizing the operation of the edge mask. .
[0005]
[Means for Solving the Problems]
The edge mask device in the electroplating tank of the present invention has a pair of electrodes and edge masks arranged so as to surround the strip running in the electroplating tank, and the electrodes and edge mask are arranged on one side of each electrode. An edge mask is provided integrally with the end portion so as to be movable in accordance with the width of the strip.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
The edge mask device of the present invention can be applied to either a vertical electroplating tank or a horizontal electroplating tank.
[0007]
【Example】
Example 1
FIG. 1 shows an embodiment of the present invention and is a perspective view of a vertical type plating tank.
In the vertical plating tank 1, there are disposed electrode /
[0008]
Respective electrode /
[0009]
[0010]
The
[0011]
Next, the operation of the electrode / edge mask will be described.
[0012]
2A is a cross-sectional view showing a state in the case of a wide strip, and FIG. 2B is a cross-sectional view showing a state in the case of a narrow strip.
[0013]
2A, in the case of a wide strip, the electrode /
[0014]
When the
[0015]
Example 2
FIG. 3 shows another embodiment of the present invention and is a perspective view in the case of a horizontal type plating tank.
[0016]
In the present embodiment, the edge mask device of the first embodiment is horizontally arranged. The same members as those of the first embodiment are denoted by the same reference numerals, and the description thereof is omitted.
[0017]
In this embodiment, the electrode /
[0018]
【The invention's effect】
According to the present invention, since the curtain is eliminated, the operation is not stopped due to defective winding or breakage of the curtain, and the productivity can be improved.
[0019]
In addition, the integrated structure of the edge mask and the electrode makes the structure simpler than in the prior art and improves the maintenance.
[Brief description of the drawings]
FIG. 1 is a perspective view of a vertical type plating tank according to an embodiment of the present invention.
2A is a cross-sectional view showing a state in the case of a wide strip, and FIG. 2B is a cross-sectional view showing a state in the case of a narrow strip.
FIG. 3 is a perspective view showing a horizontal type plating tank according to another embodiment of the present invention.
[Explanation of symbols]
1:
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001109293A JP4695283B2 (en) | 2001-04-06 | 2001-04-06 | Edge mask device in electroplating tank |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001109293A JP4695283B2 (en) | 2001-04-06 | 2001-04-06 | Edge mask device in electroplating tank |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2002302794A JP2002302794A (en) | 2002-10-18 |
JP4695283B2 true JP4695283B2 (en) | 2011-06-08 |
Family
ID=18961260
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001109293A Expired - Fee Related JP4695283B2 (en) | 2001-04-06 | 2001-04-06 | Edge mask device in electroplating tank |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4695283B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103334137A (en) * | 2013-04-02 | 2013-10-02 | 中冶南方工程技术有限公司 | Edge cover covering anode edge and edge cover group |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100805362B1 (en) | 2007-07-13 | 2008-02-20 | 박재성 | The partial plating device and thereof method |
JP5212225B2 (en) * | 2009-03-31 | 2013-06-19 | 日立電線株式会社 | Copper foil plating method and plating apparatus therefor |
KR101568481B1 (en) | 2013-11-21 | 2015-11-11 | 주식회사 포스코 | Apparatus for safe control of a horizontal plating cell |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08239796A (en) * | 1995-03-01 | 1996-09-17 | Nippon Steel Corp | Edge mask for electroplating and electroplating method |
-
2001
- 2001-04-06 JP JP2001109293A patent/JP4695283B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08239796A (en) * | 1995-03-01 | 1996-09-17 | Nippon Steel Corp | Edge mask for electroplating and electroplating method |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103334137A (en) * | 2013-04-02 | 2013-10-02 | 中冶南方工程技术有限公司 | Edge cover covering anode edge and edge cover group |
CN103334137B (en) * | 2013-04-02 | 2016-03-30 | 中冶南方工程技术有限公司 | Cover on side cover and the side cover group of anode edge |
Also Published As
Publication number | Publication date |
---|---|
JP2002302794A (en) | 2002-10-18 |
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