JP4654464B2 - 圧電センサ及びその製造方法 - Google Patents
圧電センサ及びその製造方法 Download PDFInfo
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- JP4654464B2 JP4654464B2 JP2005080618A JP2005080618A JP4654464B2 JP 4654464 B2 JP4654464 B2 JP 4654464B2 JP 2005080618 A JP2005080618 A JP 2005080618A JP 2005080618 A JP2005080618 A JP 2005080618A JP 4654464 B2 JP4654464 B2 JP 4654464B2
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- sensitive film
- piezoelectric element
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- acoustic wave
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- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 238000005259 measurement Methods 0.000 claims description 63
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- 238000001179 sorption measurement Methods 0.000 claims 3
- 230000003213 activating effect Effects 0.000 claims 1
- 230000010355 oscillation Effects 0.000 description 32
- 239000000758 substrate Substances 0.000 description 16
- 238000010897 surface acoustic wave method Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 5
- 230000001678 irradiating effect Effects 0.000 description 5
- 230000001747 exhibiting effect Effects 0.000 description 3
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000427 antigen Substances 0.000 description 1
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Description
Claims (3)
- 被測定物に対して吸着性を示す感応膜が形成された測定用圧電素子と、該被測定物に対して吸着性を示さない基準用圧電素子と、を有する圧電センサを製造する方法であって、
前記測定用圧電素子及び前記基準用圧電素子に、前記被測定物に対して吸着性を示す同じ種類の感応膜を形成する感応膜形成工程と、
前記基準用圧電素子に形成された感応膜が前記被測定物に対して吸着性を示さないように、該感応膜を不活性化する不活性化工程と、
を含み、
前記不活性化工程は、前記基準用圧電素子に形成された感応膜を加熱するように該基準用圧電素子に電力を入力することで、該感応膜を不活性化する工程であることを特徴とする圧電センサの製造方法。 - 被測定物に対して吸着性を示す感応膜が形成された測定用圧電素子と、該被測定物に対して吸着性を示さない基準用圧電素子と、を有する圧電センサを製造する方法であって、
前記測定用圧電素子及び前記基準用圧電素子に、前記被測定物に対して吸着性を示す同じ種類の感応膜を形成する感応膜形成工程と、
前記基準用圧電素子に形成された感応膜が前記被測定物に対して吸着性を示さないように、該感応膜を不活性化する不活性化工程と、
を含み、
前記不活性化工程は、前記基準用圧電素子に形成された感応膜に前記被測定物を吸着させて、該被測定物に対する該感応膜の吸着性を飽和させることで、該感応膜を不活性化する工程であることを特徴とする圧電センサの製造方法。 - 被測定物に対して吸着性を示す感応膜が形成された測定用圧電素子と、該被測定物に対して吸着性を示さない基準用圧電素子と、を有する圧電センサであって、
前記基準用圧電素子には、前記測定用圧電素子の感応膜と同じ種類の感応膜が形成されており、
前記基準用圧電素子に形成された感応膜は、前記被測定物に対する吸着性が飽和するように該被測定物を吸着していることで、該被測定物に対して吸着性を示さないように不活性化されていることを特徴とする圧電センサ。
Priority Applications (1)
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JP2005080618A JP4654464B2 (ja) | 2005-03-18 | 2005-03-18 | 圧電センサ及びその製造方法 |
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JP2005080618A JP4654464B2 (ja) | 2005-03-18 | 2005-03-18 | 圧電センサ及びその製造方法 |
Publications (2)
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JP2006258767A JP2006258767A (ja) | 2006-09-28 |
JP4654464B2 true JP4654464B2 (ja) | 2011-03-23 |
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JP2005080618A Expired - Fee Related JP4654464B2 (ja) | 2005-03-18 | 2005-03-18 | 圧電センサ及びその製造方法 |
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Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010146923A1 (ja) * | 2009-06-18 | 2010-12-23 | 株式会社 村田製作所 | 弾性表面波センサー |
JP2013079849A (ja) * | 2011-10-03 | 2013-05-02 | Snt Co | アミン系ガスセンサ用リファレンス膜 |
WO2014054269A1 (ja) * | 2012-10-01 | 2014-04-10 | パナソニック株式会社 | 弾性波素子とこれを用いた弾性波センサ |
WO2018180794A1 (ja) * | 2017-03-28 | 2018-10-04 | 富士フイルム株式会社 | ガス検知方法、ガス検知システム及びガス脱離方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08327587A (ja) * | 1995-05-31 | 1996-12-13 | Nec Corp | バイオセンサ素子の製造方法 |
JPH09131335A (ja) * | 1995-11-08 | 1997-05-20 | Nippon Telegr & Teleph Corp <Ntt> | 個体識別方法および個体識別装置 |
JPH10132646A (ja) * | 1996-10-29 | 1998-05-22 | Ricoh Co Ltd | 液相表面処理装置およびこれを用いた被処理体の質量変化計測方法 |
JP2003004616A (ja) * | 2001-06-20 | 2003-01-08 | Horiba Ltd | 土壌汚染ガス分析装置 |
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JPS6415636A (en) * | 1987-07-09 | 1989-01-19 | Agency Ind Science Techn | Apparatus for measuring distribution of particle of mist by heating method |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08327587A (ja) * | 1995-05-31 | 1996-12-13 | Nec Corp | バイオセンサ素子の製造方法 |
JPH09131335A (ja) * | 1995-11-08 | 1997-05-20 | Nippon Telegr & Teleph Corp <Ntt> | 個体識別方法および個体識別装置 |
JPH10132646A (ja) * | 1996-10-29 | 1998-05-22 | Ricoh Co Ltd | 液相表面処理装置およびこれを用いた被処理体の質量変化計測方法 |
JP2003004616A (ja) * | 2001-06-20 | 2003-01-08 | Horiba Ltd | 土壌汚染ガス分析装置 |
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