JP4641586B2 - 半導体装置の作製方法 - Google Patents

半導体装置の作製方法 Download PDF

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Publication number
JP4641586B2
JP4641586B2 JP2000066074A JP2000066074A JP4641586B2 JP 4641586 B2 JP4641586 B2 JP 4641586B2 JP 2000066074 A JP2000066074 A JP 2000066074A JP 2000066074 A JP2000066074 A JP 2000066074A JP 4641586 B2 JP4641586 B2 JP 4641586B2
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Japan
Prior art keywords
region
film
type impurity
semiconductor film
forming
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Expired - Fee Related
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JP2000066074A
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English (en)
Japanese (ja)
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JP2000332257A5 (fr
JP2000332257A (ja
Inventor
舜平 山崎
潤 小山
英人 北角
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2000066074A priority Critical patent/JP4641586B2/ja
Publication of JP2000332257A publication Critical patent/JP2000332257A/ja
Publication of JP2000332257A5 publication Critical patent/JP2000332257A5/ja
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  • Transforming Electric Information Into Light Information (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Thin Film Transistor (AREA)
JP2000066074A 1999-03-12 2000-03-10 半導体装置の作製方法 Expired - Fee Related JP4641586B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000066074A JP4641586B2 (ja) 1999-03-12 2000-03-10 半導体装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP6573799 1999-03-12
JP11-65737 1999-03-12
JP2000066074A JP4641586B2 (ja) 1999-03-12 2000-03-10 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2000332257A JP2000332257A (ja) 2000-11-30
JP2000332257A5 JP2000332257A5 (fr) 2007-05-24
JP4641586B2 true JP4641586B2 (ja) 2011-03-02

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Family Applications (1)

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JP2000066074A Expired - Fee Related JP4641586B2 (ja) 1999-03-12 2000-03-10 半導体装置の作製方法

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JP (1) JP4641586B2 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI288443B (en) * 2002-05-17 2007-10-11 Semiconductor Energy Lab SiN film, semiconductor device, and the manufacturing method thereof
JP2005333107A (ja) * 2004-04-21 2005-12-02 Mitsubishi Electric Corp 半導体装置、画像表示装置および半導体装置の製造方法
JP2005311037A (ja) * 2004-04-21 2005-11-04 Mitsubishi Electric Corp 半導体装置およびその製造方法
JP4641741B2 (ja) * 2004-05-28 2011-03-02 三菱電機株式会社 半導体装置
JP5414712B2 (ja) * 2011-02-21 2014-02-12 三菱電機株式会社 半導体装置

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Publication number Publication date
JP2000332257A (ja) 2000-11-30

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