JP4613092B2 - 成膜装置 - Google Patents

成膜装置 Download PDF

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Publication number
JP4613092B2
JP4613092B2 JP2005134206A JP2005134206A JP4613092B2 JP 4613092 B2 JP4613092 B2 JP 4613092B2 JP 2005134206 A JP2005134206 A JP 2005134206A JP 2005134206 A JP2005134206 A JP 2005134206A JP 4613092 B2 JP4613092 B2 JP 4613092B2
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Japan
Prior art keywords
chamber
gas
sputtering
film
film forming
Prior art date
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Expired - Lifetime
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JP2005134206A
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English (en)
Japanese (ja)
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JP2006307305A5 (enExample
JP2006307305A (ja
Inventor
智保 近藤
治憲 牛川
成史 五戸
聡 豊田
久三 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
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Ulvac Inc
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Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP2005134206A priority Critical patent/JP4613092B2/ja
Publication of JP2006307305A publication Critical patent/JP2006307305A/ja
Publication of JP2006307305A5 publication Critical patent/JP2006307305A5/ja
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Publication of JP4613092B2 publication Critical patent/JP4613092B2/ja
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Expired - Lifetime legal-status Critical Current

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  • Electrodes Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP2005134206A 2005-05-02 2005-05-02 成膜装置 Expired - Lifetime JP4613092B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005134206A JP4613092B2 (ja) 2005-05-02 2005-05-02 成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005134206A JP4613092B2 (ja) 2005-05-02 2005-05-02 成膜装置

Publications (3)

Publication Number Publication Date
JP2006307305A JP2006307305A (ja) 2006-11-09
JP2006307305A5 JP2006307305A5 (enExample) 2008-06-26
JP4613092B2 true JP4613092B2 (ja) 2011-01-12

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ID=37474518

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005134206A Expired - Lifetime JP4613092B2 (ja) 2005-05-02 2005-05-02 成膜装置

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JP (1) JP4613092B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100927621B1 (ko) 2007-03-22 2009-11-20 삼성에스디아이 주식회사 보호막층을 증착시키는 장치와, 이를 이용한 증착 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000017457A (ja) * 1998-07-03 2000-01-18 Shincron:Kk 薄膜形成装置および薄膜形成方法
JP2004277799A (ja) * 2003-03-14 2004-10-07 Matsushita Electric Ind Co Ltd 成膜装置およびそのクリーニング方法
JP4664061B2 (ja) * 2004-12-22 2011-04-06 株式会社アルバック 成膜装置および成膜方法
JP2006176823A (ja) * 2004-12-22 2006-07-06 Ulvac Japan Ltd 成膜装置

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Publication number Publication date
JP2006307305A (ja) 2006-11-09

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