JP4612847B2 - 容器、及びそれを用いた露光装置 - Google Patents

容器、及びそれを用いた露光装置 Download PDF

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Publication number
JP4612847B2
JP4612847B2 JP2005034404A JP2005034404A JP4612847B2 JP 4612847 B2 JP4612847 B2 JP 4612847B2 JP 2005034404 A JP2005034404 A JP 2005034404A JP 2005034404 A JP2005034404 A JP 2005034404A JP 4612847 B2 JP4612847 B2 JP 4612847B2
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JP
Japan
Prior art keywords
container
space
welding
lid
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005034404A
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English (en)
Japanese (ja)
Other versions
JP2006222274A (ja
JP2006222274A5 (enExample
Inventor
宏文 藤井
光夫 西村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005034404A priority Critical patent/JP4612847B2/ja
Priority to US11/275,769 priority patent/US7525644B2/en
Publication of JP2006222274A publication Critical patent/JP2006222274A/ja
Publication of JP2006222274A5 publication Critical patent/JP2006222274A5/ja
Priority to US12/357,498 priority patent/US8115907B2/en
Application granted granted Critical
Publication of JP4612847B2 publication Critical patent/JP4612847B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005034404A 2005-02-10 2005-02-10 容器、及びそれを用いた露光装置 Expired - Fee Related JP4612847B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005034404A JP4612847B2 (ja) 2005-02-10 2005-02-10 容器、及びそれを用いた露光装置
US11/275,769 US7525644B2 (en) 2005-02-10 2006-01-27 Container and exposure apparatus having the same
US12/357,498 US8115907B2 (en) 2005-02-10 2009-01-22 Container and exposure apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005034404A JP4612847B2 (ja) 2005-02-10 2005-02-10 容器、及びそれを用いた露光装置

Publications (3)

Publication Number Publication Date
JP2006222274A JP2006222274A (ja) 2006-08-24
JP2006222274A5 JP2006222274A5 (enExample) 2008-03-27
JP4612847B2 true JP4612847B2 (ja) 2011-01-12

Family

ID=36778635

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005034404A Expired - Fee Related JP4612847B2 (ja) 2005-02-10 2005-02-10 容器、及びそれを用いた露光装置

Country Status (2)

Country Link
US (2) US7525644B2 (enExample)
JP (1) JP4612847B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4612847B2 (ja) * 2005-02-10 2011-01-12 キヤノン株式会社 容器、及びそれを用いた露光装置
DE102010041468A1 (de) * 2010-09-27 2012-03-29 Carl Zeiss Smt Gmbh Baugruppe einer Projektionsbelichtungsanlage für die EUV-Lithographie
CN101966635A (zh) * 2010-10-18 2011-02-09 卓盈微电子（昆山）有限公司 一种用于芯片焊接的改良石英台
EP2888178B1 (en) 2012-08-22 2017-12-27 PTM Packaging Tools Machinery PTE. Ltd. Paper-based container lids
JP5941016B2 (ja) * 2013-05-27 2016-06-29 株式会社神戸製鋼所 成膜装置およびそれを用いた成膜方法
WO2020156334A1 (zh) * 2019-01-31 2020-08-06 武汉科技大学 金属材料保温装置及保温方法
DE102021112269A1 (de) * 2021-05-11 2022-11-17 Beckhoff Automation Gmbh Läufer für ein Planarantriebssystem und Planarantriebssystem

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05248593A (ja) * 1992-03-05 1993-09-24 Kubota Corp 真空断熱体の溶接部構造
JP2838961B2 (ja) * 1993-08-06 1998-12-16 株式会社クボタ 真空断熱容器の開口部閉塞方法
JPH07172478A (ja) * 1993-12-22 1995-07-11 Kubota Corp 断熱容器
JP2000031007A (ja) * 1998-07-08 2000-01-28 Nikon Corp ステージ装置及びそれを用いた光学装置
JP2001315774A (ja) * 2000-05-02 2001-11-13 Kyoto Kasei Kogyo Kk 合成樹脂製凸状蓋付き密封容器
JP4689058B2 (ja) * 2001-02-16 2011-05-25 キヤノン株式会社 リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法
US6570644B2 (en) * 2001-06-05 2003-05-27 Nikon Corporation Connection assembly of wafer stage chamber
JP2004039986A (ja) * 2002-07-05 2004-02-05 Tokyo Seimitsu Co Ltd 露光マスク収容器、露光マスク入出力機構及び収容器内気圧調整装置
JP2005086029A (ja) * 2003-09-09 2005-03-31 Canon Inc 位置決めステージ装置及び露光装置並びに半導体デバイスの製造方法
JP4612847B2 (ja) * 2005-02-10 2011-01-12 キヤノン株式会社 容器、及びそれを用いた露光装置

Also Published As

Publication number Publication date
US7525644B2 (en) 2009-04-28
JP2006222274A (ja) 2006-08-24
US20090179066A1 (en) 2009-07-16
US20060174837A1 (en) 2006-08-10
US8115907B2 (en) 2012-02-14

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