JP4608218B2 - 研磨装置及びこれを使用する研磨方法 - Google Patents
研磨装置及びこれを使用する研磨方法 Download PDFInfo
- Publication number
- JP4608218B2 JP4608218B2 JP2004002089A JP2004002089A JP4608218B2 JP 4608218 B2 JP4608218 B2 JP 4608218B2 JP 2004002089 A JP2004002089 A JP 2004002089A JP 2004002089 A JP2004002089 A JP 2004002089A JP 4608218 B2 JP4608218 B2 JP 4608218B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- magnetic
- magnetic generator
- electromagnet
- permanent magnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title claims description 85
- 238000000034 method Methods 0.000 title description 8
- 239000004744 fabric Substances 0.000 claims description 13
- 230000005389 magnetism Effects 0.000 claims description 8
- 235000012431 wafers Nutrition 0.000 description 25
- 239000000126 substance Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 238000001514 detection method Methods 0.000 description 5
- 238000007517 polishing process Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
次に、二つ目の問題点は、エアー供給口(16a、16b、16c)の位置がバレル部15の空間部15a、15b、15cの一側に偏る構造を有することによってエアー供給口16a、16b、16c側に供給されたエアーは図3に示されたように矢印方法(時計、反時計方向)に沿って流動されて分布するようになるが、前記エアー供給口16a、16b、16c側及びその反対側(A、B、C表示部)に位置する部分との圧力差が発生してウエハー9を均一に加圧できなくなる。
102 被研磨物
103 ターンテーブル
105 キャリアーヘッド
110 磁気加圧力調整手段
111 第1磁気発生体
111a センター永久磁石
111b ミドル永久磁石
111c エッジ永久磁石
115 第2磁気発生体
115a センター電磁石
115b ミドル電磁石
115c エッジ電磁石
121 研磨膜厚さ検出手段
123 磁力調整手段
125 電源
Claims (6)
- その上面に研磨布が具備され所定の方向に回転するターンテーブルと、
前記ターンテーブル上の研磨布に被研磨物を加圧すると同時に所定の方向に回転して前記被研磨物を回転する前記研磨布と相対運動させて研磨を実施するキャリアーヘッドと、
前記キャリアーヘッドの内部に設けられて第1磁気力を発生させる複数の第1磁気発生体と、前記キャリアーヘッドの内部で、前記第1磁気発生体に対応する位置に設けられて、前記第1磁気発生体の前記第1磁気力に対応する斥力または引力を発生させる複数の第2磁気発生体とを備え、前記第1磁気発生体と前記第2磁気発生体とは、互いに所定距離分離隔されて互いに対向するように積層構造を成す、磁気加圧力調整手段と、を有し、
前記磁気加圧力調整手段は、
前記相対運動によって研磨された前記被研磨物の研磨膜厚さを検出する研磨膜厚さ検出手段と、
前記研磨膜厚さ検出手段によって検出された研磨膜の厚さと基準厚さを比較した結果により前記第2磁気発生体の極性及び磁力を調整する磁力調整手段と、を有することを特徴とする研磨装置。 - 前記第1磁気発生体は永久磁石であり、
前記第2磁気発生体は電磁石でなっていることを特徴とする請求項1記載の研磨装置。 - 前記第1磁気発生体は、前記キャリアーヘッドの下部に設けられ、
前記第2磁気発生体は、前記第1磁気発生体の上部側に設けられることを特徴とする請求項1または2記載の研磨装置。 - 前記第2磁気発生体は、前記キャリアーヘッドの下部に設けられ、
前記第1磁気発生体は、前記第2磁気発生体の上部に設けられることを特徴とする請求項1または2記載の研磨装置。 - 前記第1磁気発生体は、円形を成すセンター永久磁石と、
前記センター永久磁石の外側に環形に配置されるミドル永久磁石と、
前記ミドル永久磁石の外側に環形に配置されるエッジ永久磁石と、
を含み、
前記第2磁気発生体は、円形を成すセンター電磁石と、
前記センター電磁石の外側に環形に配置されるミドル電磁石と、
前記ミドル電磁石の外側に環形に配置されるエッジ電磁石と、
を含むことを特徴とする請求項1〜4のいずれか一つに記載の研磨装置。 - 前記センター永久磁石、ミドル永久磁石、エッジ永久磁石のそれぞれの間、及び前記センター電磁石、ミドル電磁石、エッジ電磁石のそれぞれの間には絶縁膜が介在されることを特徴とする請求項5記載の研磨装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2003-0001690A KR100506934B1 (ko) | 2003-01-10 | 2003-01-10 | 연마장치 및 이를 사용하는 연마방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004216548A JP2004216548A (ja) | 2004-08-05 |
JP4608218B2 true JP4608218B2 (ja) | 2011-01-12 |
Family
ID=36648346
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004002089A Expired - Fee Related JP4608218B2 (ja) | 2003-01-10 | 2004-01-07 | 研磨装置及びこれを使用する研磨方法 |
Country Status (3)
Country | Link |
---|---|
US (2) | US7066785B2 (ja) |
JP (1) | JP4608218B2 (ja) |
KR (1) | KR100506934B1 (ja) |
Families Citing this family (111)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7108591B1 (en) * | 2004-03-31 | 2006-09-19 | Lam Research Corporation | Compliant wafer chuck |
US20060189257A1 (en) * | 2005-02-22 | 2006-08-24 | Lsi Logic Corporation | Systems and methods for wafer polishing |
US7201633B2 (en) * | 2005-02-22 | 2007-04-10 | Lsi Logic Corporation | Systems and methods for wafer polishing |
US20060286906A1 (en) * | 2005-06-21 | 2006-12-21 | Cabot Microelectronics Corporation | Polishing pad comprising magnetically sensitive particles and method for the use thereof |
JP4814677B2 (ja) * | 2006-03-31 | 2011-11-16 | 株式会社荏原製作所 | 基板保持装置および研磨装置 |
US20080271384A1 (en) * | 2006-09-22 | 2008-11-06 | Saint-Gobain Ceramics & Plastics, Inc. | Conditioning tools and techniques for chemical mechanical planarization |
JP5141068B2 (ja) * | 2007-03-28 | 2013-02-13 | 富士通セミコンダクター株式会社 | 研磨方法、研磨装置及び半導体装置の製造方法 |
US7868721B2 (en) * | 2008-04-04 | 2011-01-11 | Cedar Ridge Research, Llc | Field emission system and method |
US8115581B2 (en) * | 2008-04-04 | 2012-02-14 | Correlated Magnetics Research, Llc | Techniques for producing an electrical pulse |
US7750781B2 (en) * | 2008-04-04 | 2010-07-06 | Cedar Ridge Research Llc | Coded linear magnet arrays in two dimensions |
US8816805B2 (en) | 2008-04-04 | 2014-08-26 | Correlated Magnetics Research, Llc. | Magnetic structure production |
US9105380B2 (en) | 2008-04-04 | 2015-08-11 | Correlated Magnetics Research, Llc. | Magnetic attachment system |
US7755462B2 (en) * | 2008-04-04 | 2010-07-13 | Cedar Ridge Research Llc | Ring magnet structure having a coded magnet pattern |
US8760250B2 (en) * | 2009-06-02 | 2014-06-24 | Correlated Magnetics Rsearch, LLC. | System and method for energy generation |
US8760251B2 (en) | 2010-09-27 | 2014-06-24 | Correlated Magnetics Research, Llc | System and method for producing stacked field emission structures |
US8035260B2 (en) * | 2008-04-04 | 2011-10-11 | Cedar Ridge Research Llc | Stepping motor with a coded pole pattern |
US7843296B2 (en) * | 2008-04-04 | 2010-11-30 | Cedar Ridge Research Llc | Magnetically attachable and detachable panel method |
WO2009123718A1 (en) * | 2008-04-04 | 2009-10-08 | Cedar Ridge Research, Llc | Techniques for producing an electrical pulse |
US8368495B2 (en) | 2008-04-04 | 2013-02-05 | Correlated Magnetics Research LLC | System and method for defining magnetic structures |
US7843295B2 (en) * | 2008-04-04 | 2010-11-30 | Cedar Ridge Research Llc | Magnetically attachable and detachable panel system |
US9371923B2 (en) | 2008-04-04 | 2016-06-21 | Correlated Magnetics Research, Llc | Magnetic valve assembly |
US7817005B2 (en) * | 2008-04-04 | 2010-10-19 | Cedar Ridge Research, Llc. | Correlated magnetic container and method for using the correlated magnetic container |
US8648681B2 (en) | 2009-06-02 | 2014-02-11 | Correlated Magnetics Research, Llc. | Magnetic structure production |
US9202616B2 (en) | 2009-06-02 | 2015-12-01 | Correlated Magnetics Research, Llc | Intelligent magnetic system |
US8576036B2 (en) | 2010-12-10 | 2013-11-05 | Correlated Magnetics Research, Llc | System and method for affecting flux of multi-pole magnetic structures |
US7800471B2 (en) * | 2008-04-04 | 2010-09-21 | Cedar Ridge Research, Llc | Field emission system and method |
US7843297B2 (en) * | 2008-04-04 | 2010-11-30 | Cedar Ridge Research Llc | Coded magnet structures for selective association of articles |
US7839247B2 (en) * | 2008-04-04 | 2010-11-23 | Cedar Ridge Research | Magnetic force profile system using coded magnet structures |
US8279032B1 (en) | 2011-03-24 | 2012-10-02 | Correlated Magnetics Research, Llc. | System for detachment of correlated magnetic structures |
US8174347B2 (en) | 2010-07-12 | 2012-05-08 | Correlated Magnetics Research, Llc | Multilevel correlated magnetic system and method for using the same |
US8179219B2 (en) | 2008-04-04 | 2012-05-15 | Correlated Magnetics Research, Llc | Field emission system and method |
US8779879B2 (en) | 2008-04-04 | 2014-07-15 | Correlated Magnetics Research LLC | System and method for positioning a multi-pole magnetic structure |
US8373527B2 (en) | 2008-04-04 | 2013-02-12 | Correlated Magnetics Research, Llc | Magnetic attachment system |
US7817003B2 (en) * | 2008-05-20 | 2010-10-19 | Cedar Ridge Research, Llc. | Device and method for enabling a cover to be attached to and removed from a compartment within the device |
US8015752B2 (en) | 2008-05-20 | 2011-09-13 | Correlated Magnetics Research, Llc | Child safety gate apparatus, systems, and methods |
US7681256B2 (en) * | 2008-05-20 | 2010-03-23 | Cedar Ridge Research, Llc. | Correlated magnetic mask and method for using the correlated magnetic mask |
US7817004B2 (en) * | 2008-05-20 | 2010-10-19 | Cedar Ridge Research, Llc. | Correlated magnetic prosthetic device and method for using the correlated magnetic prosthetic device |
US7893803B2 (en) * | 2008-05-20 | 2011-02-22 | Cedar Ridge Research | Correlated magnetic coupling device and method for using the correlated coupling device |
US7958575B2 (en) * | 2008-05-20 | 2011-06-14 | Cedar Ridge Research, Llc | Toilet safety apparatus, systems, and methods |
US7834729B2 (en) * | 2008-05-20 | 2010-11-16 | Cedar Redge Research, LLC | Correlated magnetic connector and method for using the correlated magnetic connector |
US7963818B2 (en) * | 2008-05-20 | 2011-06-21 | Cedar Ridge Research, Llc. | Correlated magnetic toy parts and method for using the correlated magnetic toy parts |
US7812698B2 (en) * | 2008-05-20 | 2010-10-12 | Cedar Ridge Research, Llc. | Correlated magnetic suit and method for using the correlated magnetic suit |
US7823300B2 (en) * | 2008-05-20 | 2010-11-02 | Cedar Ridge Research, Llc | Correlated magnetic footwear and method for using the correlated magnetic footwear |
US7961068B2 (en) | 2008-05-20 | 2011-06-14 | Cedar Ridge Research, Llc. | Correlated magnetic breakaway device and method |
US7956711B2 (en) * | 2008-05-20 | 2011-06-07 | Cedar Ridge Research, Llc. | Apparatuses and methods relating to tool attachments that may be removably connected to an extension handle |
US7824083B2 (en) * | 2008-05-20 | 2010-11-02 | Cedar Ridge Research. LLC. | Correlated magnetic light and method for using the correlated magnetic light |
US8016330B2 (en) * | 2008-05-20 | 2011-09-13 | Correalated Magnetics Research, LLC | Appliance safety apparatus, systems, and methods |
US7817002B2 (en) * | 2008-05-20 | 2010-10-19 | Cedar Ridge Research, Llc. | Correlated magnetic belt and method for using the correlated magnetic belt |
US7956712B2 (en) * | 2008-05-20 | 2011-06-07 | Cedar Ridge Research, Llc. | Correlated magnetic assemblies for securing objects in a vehicle |
US7817006B2 (en) | 2008-05-20 | 2010-10-19 | Cedar Ridge Research, Llc. | Apparatuses and methods relating to precision attachments between first and second components |
US7821367B2 (en) * | 2008-05-20 | 2010-10-26 | Cedar Ridge Research, Llc. | Correlated magnetic harness and method for using the correlated magnetic harness |
JP4833355B2 (ja) * | 2008-08-29 | 2011-12-07 | 信越半導体株式会社 | 研磨ヘッド及び研磨装置 |
US8937521B2 (en) | 2012-12-10 | 2015-01-20 | Correlated Magnetics Research, Llc. | System for concentrating magnetic flux of a multi-pole magnetic structure |
US8917154B2 (en) | 2012-12-10 | 2014-12-23 | Correlated Magnetics Research, Llc. | System for concentrating magnetic flux |
KR101293517B1 (ko) | 2009-03-24 | 2013-08-07 | 생-고벵 아브라시프 | 화학적 기계적 평탄화 패드 컨디셔너로 사용되는 연마 공구 |
US9404776B2 (en) | 2009-06-02 | 2016-08-02 | Correlated Magnetics Research, Llc. | System and method for tailoring polarity transitions of magnetic structures |
US8704626B2 (en) | 2010-05-10 | 2014-04-22 | Correlated Magnetics Research, Llc | System and method for moving an object |
US9275783B2 (en) | 2012-10-15 | 2016-03-01 | Correlated Magnetics Research, Llc. | System and method for demagnetization of a magnetic structure region |
MY155563A (en) | 2009-06-02 | 2015-10-30 | Saint Gobain Abrasives Inc | Corrosion-resistant cmp conditioning tools and methods for making and using same |
US9257219B2 (en) | 2012-08-06 | 2016-02-09 | Correlated Magnetics Research, Llc. | System and method for magnetization |
CN102612734A (zh) * | 2009-09-01 | 2012-07-25 | 圣戈班磨料磨具有限公司 | 化学机械抛光修整器 |
US9711268B2 (en) | 2009-09-22 | 2017-07-18 | Correlated Magnetics Research, Llc | System and method for tailoring magnetic forces |
EP2481062A2 (en) * | 2009-09-22 | 2012-08-01 | Correlated Magnetics Research, LLC | Multilevel correlated magnetic system and method for using same |
JP5674084B2 (ja) * | 2009-10-15 | 2015-02-25 | 株式会社ニコン | 研磨装置及び研磨方法 |
US8576034B2 (en) | 2010-07-21 | 2013-11-05 | Apple Inc. | Alignment and connection for devices |
US8638016B2 (en) | 2010-09-17 | 2014-01-28 | Correlated Magnetics Research, Llc | Electromagnetic structure having a core element that extends magnetic coupling around opposing surfaces of a circular magnetic structure |
US20120122373A1 (en) * | 2010-11-15 | 2012-05-17 | Stmicroelectronics, Inc. | Precise real time and position low pressure control of chemical mechanical polish (cmp) head |
US8279031B2 (en) | 2011-01-20 | 2012-10-02 | Correlated Magnetics Research, Llc | Multi-level magnetic system for isolation of vibration |
US8702437B2 (en) | 2011-03-24 | 2014-04-22 | Correlated Magnetics Research, Llc | Electrical adapter system |
WO2012142306A2 (en) | 2011-04-12 | 2012-10-18 | Sarai Mohammad | Magnetic configurations |
US8963380B2 (en) | 2011-07-11 | 2015-02-24 | Correlated Magnetics Research LLC. | System and method for power generation system |
US9219403B2 (en) | 2011-09-06 | 2015-12-22 | Correlated Magnetics Research, Llc | Magnetic shear force transfer device |
US8848973B2 (en) | 2011-09-22 | 2014-09-30 | Correlated Magnetics Research LLC | System and method for authenticating an optical pattern |
US9418904B2 (en) | 2011-11-14 | 2016-08-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | Localized CMP to improve wafer planarization |
US10065288B2 (en) * | 2012-02-14 | 2018-09-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Chemical mechanical polishing (CMP) platform for local profile control |
US20130210173A1 (en) * | 2012-02-14 | 2013-08-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multiple Zone Temperature Control for CMP |
EP2820659A4 (en) | 2012-02-28 | 2016-04-13 | Correlated Magnetics Res Llc | SYSTEM FOR DETACHING MAGNETIC STRUCTURE OF FERROMAGNETIC MATERIAL |
US9706605B2 (en) * | 2012-03-30 | 2017-07-11 | Applied Materials, Inc. | Substrate support with feedthrough structure |
TW201350267A (zh) * | 2012-05-04 | 2013-12-16 | Saint Gobain Abrasives Inc | 用於同雙側化學機械平坦化墊修整器一起使用之工具 |
US9245677B2 (en) | 2012-08-06 | 2016-01-26 | Correlated Magnetics Research, Llc. | System for concentrating and controlling magnetic flux of a multi-pole magnetic structure |
US9233452B2 (en) | 2012-10-29 | 2016-01-12 | Wayne O. Duescher | Vacuum-grooved membrane abrasive polishing wafer workholder |
US8998677B2 (en) | 2012-10-29 | 2015-04-07 | Wayne O. Duescher | Bellows driven floatation-type abrading workholder |
US8845394B2 (en) | 2012-10-29 | 2014-09-30 | Wayne O. Duescher | Bellows driven air floatation abrading workholder |
US9199354B2 (en) | 2012-10-29 | 2015-12-01 | Wayne O. Duescher | Flexible diaphragm post-type floating and rigid abrading workholder |
US9039488B2 (en) | 2012-10-29 | 2015-05-26 | Wayne O. Duescher | Pin driven flexible chamber abrading workholder |
US9604339B2 (en) | 2012-10-29 | 2017-03-28 | Wayne O. Duescher | Vacuum-grooved membrane wafer polishing workholder |
US9011207B2 (en) | 2012-10-29 | 2015-04-21 | Wayne O. Duescher | Flexible diaphragm combination floating and rigid abrading workholder |
US8998678B2 (en) | 2012-10-29 | 2015-04-07 | Wayne O. Duescher | Spider arm driven flexible chamber abrading workholder |
US9298281B2 (en) | 2012-12-27 | 2016-03-29 | Correlated Magnetics Research, Llc. | Magnetic vector sensor positioning and communications system |
US9620953B2 (en) | 2013-03-25 | 2017-04-11 | Wen Technology, Inc. | Methods providing control for electro-permanent magnetic devices and related electro-permanent magnetic devices and controllers |
CN103252712B (zh) * | 2013-05-08 | 2015-07-08 | 浙江工业大学 | 晶片研磨磁加载夹持装置 |
CN103252713B (zh) * | 2013-05-08 | 2015-12-02 | 浙江工业大学 | 一种磁加载晶片研磨方法及装置 |
JP2014223684A (ja) * | 2013-05-15 | 2014-12-04 | 株式会社東芝 | 研磨装置および研磨方法 |
WO2015050642A1 (en) * | 2013-10-03 | 2015-04-09 | Applied Materials, Inc. | Cmp equipment using magnet responsive composites |
US9272386B2 (en) * | 2013-10-18 | 2016-03-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Polishing head, and chemical-mechanical polishing system for polishing substrate |
JP6266493B2 (ja) * | 2014-03-20 | 2018-01-24 | 株式会社荏原製作所 | 研磨装置及び研磨方法 |
KR101721597B1 (ko) * | 2015-03-24 | 2017-03-30 | (주)플러스비젼 | 전자석을 이용한 씨엠피 장비용 연마 헤드 |
US10293454B2 (en) | 2015-06-11 | 2019-05-21 | Toshiba Memory Corporation | Polishing head, polishing apparatus and polishing method |
US10734149B2 (en) * | 2016-03-23 | 2020-08-04 | Wen Technology Inc. | Electro-permanent magnetic devices including unbalanced switching and permanent magnets and related methods and controllers |
US10074469B2 (en) | 2016-06-06 | 2018-09-11 | Apple Inc. | Magnetic materials polarized at an oblique angle |
CN106141899A (zh) * | 2016-08-03 | 2016-11-23 | 浙江工业大学 | 一种晶片研磨加工装置 |
CN106141898A (zh) * | 2016-08-03 | 2016-11-23 | 浙江工业大学 | 晶片研磨装置 |
KR102642988B1 (ko) * | 2016-11-09 | 2024-03-06 | 삼성디스플레이 주식회사 | 기판 연마 장치 및 방법 |
US10926378B2 (en) | 2017-07-08 | 2021-02-23 | Wayne O. Duescher | Abrasive coated disk islands using magnetic font sheet |
EP3785849B1 (en) * | 2018-04-24 | 2023-07-05 | YAMAZAKI, Tsugio | Magnetic polishing machine |
US11691241B1 (en) * | 2019-08-05 | 2023-07-04 | Keltech Engineering, Inc. | Abrasive lapping head with floating and rigid workpiece carrier |
US10953514B1 (en) | 2019-09-17 | 2021-03-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Chemical mechanical polishing apparatus and method |
US11693435B2 (en) * | 2020-06-25 | 2023-07-04 | Applied Materials, Inc. | Ethercat liquid flow controller communication for substrate processing systems |
DE102020125246A1 (de) * | 2020-09-28 | 2022-03-31 | Lapmaster Wolters Gmbh | Doppel- oder Einseiten-Bearbeitungsmaschine |
CN113263438A (zh) * | 2021-05-20 | 2021-08-17 | 湘潭大学 | 一种用于控制抛光压力的承载头及其使用方法 |
CN114055258B (zh) * | 2021-11-19 | 2023-04-18 | 浙江师范大学 | 一种磁性抛光装置及磁性抛光控制方法 |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04155831A (ja) * | 1990-10-19 | 1992-05-28 | Nec Corp | 窒化燐絶縁膜の形成方法 |
JPH08155831A (ja) * | 1994-12-06 | 1996-06-18 | Nippondenso Co Ltd | 研磨装置及び研磨方法 |
JPH11198026A (ja) * | 1998-01-16 | 1999-07-27 | Ebara Corp | ポリッシング装置 |
JP2000190202A (ja) * | 1998-12-21 | 2000-07-11 | Toshiba Mach Co Ltd | ポリッシング装置 |
JP2000317825A (ja) * | 1999-03-11 | 2000-11-21 | Ebara Corp | 基板保持装置の姿勢制御装置を備えたポリッシング装置 |
JP2001252862A (ja) * | 2000-03-08 | 2001-09-18 | Nec Kyushu Ltd | 研摩方法及び研摩装置 |
JP2002018701A (ja) * | 2000-07-12 | 2002-01-22 | Canon Inc | 基板研磨方法および基板研磨装置 |
JP2002198334A (ja) * | 2000-10-16 | 2002-07-12 | Ulvac Japan Ltd | 基板研磨装置 |
JP2002200553A (ja) * | 2000-11-06 | 2002-07-16 | Nikon Engineering Co Ltd | 研磨装置 |
JP2002203772A (ja) * | 2000-12-28 | 2002-07-19 | Nec Corp | 電子線露光用マスクの製造方法及び薄膜化方法 |
JP2002217153A (ja) * | 2001-01-16 | 2002-08-02 | Nikon Corp | 研磨装置、半導体デバイス製造方法及び半導体デバイス |
JP2002222784A (ja) * | 2001-01-24 | 2002-08-09 | Toshiba Mach Co Ltd | 平面研磨方法及び平面研磨装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2822243A (en) * | 1954-05-14 | 1958-02-04 | Brix Aage Emil | Process for producing manganese dioxide |
JPS6294257A (ja) * | 1985-10-21 | 1987-04-30 | Fujitsu Ltd | 研磨装置 |
US5951368A (en) * | 1996-05-29 | 1999-09-14 | Ebara Corporation | Polishing apparatus |
KR100200727B1 (ko) | 1996-09-10 | 1999-06-15 | 윤종용 | 반도체 제조 장치 및 이를 이용한 웨이퍼 연마 방법 |
KR19990002187U (ko) | 1997-06-26 | 1999-01-25 | 김영환 | 웨이퍼 연마 장치 |
US5822243A (en) * | 1997-09-09 | 1998-10-13 | Macronix International Co., Ltd. | Dual mode memory with embedded ROM |
US5989103A (en) * | 1997-09-19 | 1999-11-23 | Applied Materials, Inc. | Magnetic carrier head for chemical mechanical polishing |
US5888120A (en) * | 1997-09-29 | 1999-03-30 | Lsi Logic Corporation | Method and apparatus for chemical mechanical polishing |
US6719615B1 (en) * | 2000-10-10 | 2004-04-13 | Beaver Creek Concepts Inc | Versatile wafer refining |
KR20000061764A (ko) | 1999-03-30 | 2000-10-25 | 윤종용 | 웨이퍼 폴리싱 장치 및 방법 |
US6050882A (en) * | 1999-06-10 | 2000-04-18 | Applied Materials, Inc. | Carrier head to apply pressure to and retain a substrate |
US6213855B1 (en) * | 1999-07-26 | 2001-04-10 | Speedfam-Ipec Corporation | Self-powered carrier for polishing or planarizing wafers |
US6325696B1 (en) * | 1999-09-13 | 2001-12-04 | International Business Machines Corporation | Piezo-actuated CMP carrier |
US6354928B1 (en) * | 2000-04-21 | 2002-03-12 | Agere Systems Guardian Corp. | Polishing apparatus with carrier ring and carrier head employing like polarities |
US6436828B1 (en) * | 2000-05-04 | 2002-08-20 | Applied Materials, Inc. | Chemical mechanical polishing using magnetic force |
US6592434B1 (en) * | 2000-11-16 | 2003-07-15 | Motorola, Inc. | Wafer carrier and method of material removal from a semiconductor wafer |
US6863771B2 (en) * | 2001-07-25 | 2005-03-08 | Micron Technology, Inc. | Differential pressure application apparatus for use in polishing layers of semiconductor device structures and methods |
-
2003
- 2003-01-10 KR KR10-2003-0001690A patent/KR100506934B1/ko not_active IP Right Cessation
- 2003-11-17 US US10/715,314 patent/US7066785B2/en not_active Expired - Fee Related
-
2004
- 2004-01-07 JP JP2004002089A patent/JP4608218B2/ja not_active Expired - Fee Related
-
2006
- 2006-05-03 US US11/381,415 patent/US7488235B2/en not_active Expired - Fee Related
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04155831A (ja) * | 1990-10-19 | 1992-05-28 | Nec Corp | 窒化燐絶縁膜の形成方法 |
JPH08155831A (ja) * | 1994-12-06 | 1996-06-18 | Nippondenso Co Ltd | 研磨装置及び研磨方法 |
JPH11198026A (ja) * | 1998-01-16 | 1999-07-27 | Ebara Corp | ポリッシング装置 |
JP2000190202A (ja) * | 1998-12-21 | 2000-07-11 | Toshiba Mach Co Ltd | ポリッシング装置 |
JP2000317825A (ja) * | 1999-03-11 | 2000-11-21 | Ebara Corp | 基板保持装置の姿勢制御装置を備えたポリッシング装置 |
JP2001252862A (ja) * | 2000-03-08 | 2001-09-18 | Nec Kyushu Ltd | 研摩方法及び研摩装置 |
JP2002018701A (ja) * | 2000-07-12 | 2002-01-22 | Canon Inc | 基板研磨方法および基板研磨装置 |
JP2002198334A (ja) * | 2000-10-16 | 2002-07-12 | Ulvac Japan Ltd | 基板研磨装置 |
JP2002200553A (ja) * | 2000-11-06 | 2002-07-16 | Nikon Engineering Co Ltd | 研磨装置 |
JP2002203772A (ja) * | 2000-12-28 | 2002-07-19 | Nec Corp | 電子線露光用マスクの製造方法及び薄膜化方法 |
JP2002217153A (ja) * | 2001-01-16 | 2002-08-02 | Nikon Corp | 研磨装置、半導体デバイス製造方法及び半導体デバイス |
JP2002222784A (ja) * | 2001-01-24 | 2002-08-09 | Toshiba Mach Co Ltd | 平面研磨方法及び平面研磨装置 |
Also Published As
Publication number | Publication date |
---|---|
US7066785B2 (en) | 2006-06-27 |
US20040137829A1 (en) | 2004-07-15 |
US20060189259A1 (en) | 2006-08-24 |
KR20040064827A (ko) | 2004-07-21 |
KR100506934B1 (ko) | 2005-08-05 |
US7488235B2 (en) | 2009-02-10 |
JP2004216548A (ja) | 2004-08-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4608218B2 (ja) | 研磨装置及びこれを使用する研磨方法 | |
USRE39194E1 (en) | Method and apparatus for controlling planarizing characteristics in mechanical and chemical-mechanical planarization of microelectronic substrates | |
KR101090951B1 (ko) | 기판폴리싱장치 및 기판폴리싱방법 | |
US7033251B2 (en) | Carrier assemblies, polishing machines including carrier assemblies, and methods for polishing micro-device workpieces | |
US7670466B2 (en) | Methods and apparatuses for electrochemical-mechanical polishing | |
JPH08197417A (ja) | ポリッシングの終点検知方法 | |
US5882243A (en) | Method for polishing a semiconductor wafer using dynamic control | |
KR20000006293A (ko) | 일정한연마압력을갖는연마장치및방법 | |
JP2007276110A (ja) | 基板キャリアシステムおよび基板を研磨する方法 | |
US20040214514A1 (en) | Polishing machines including under-pads and methods for mechanical and/or chemical-mechanical polishing of microfeature workpieces | |
US6270397B1 (en) | Chemical mechanical polishing device with a pressure mechanism | |
US6576552B2 (en) | Method for polishing semiconductor device | |
US20130316623A1 (en) | Multi-spindle chemical mechanical planarization tool | |
US6827633B2 (en) | Polishing method | |
US20240131652A1 (en) | Planarized membrane and methods for substrate processing systems | |
US7422982B2 (en) | Method and apparatus for electroprocessing a substrate with edge profile control | |
JP2019107729A (ja) | 保持テーブル及び保持テーブルを備える研磨装置 | |
JP2002217153A (ja) | 研磨装置、半導体デバイス製造方法及び半導体デバイス | |
JP2002118084A (ja) | 基板研磨方法 | |
KR20050008231A (ko) | 화학적 기계적 연마장치의 헤드압력조절장치 및헤드압력조절방법 | |
KR20110099432A (ko) | 양면 연마 장치 | |
US20150099432A1 (en) | Cmp equipment using magnet responsive composites | |
JP2001252862A (ja) | 研摩方法及び研摩装置 | |
JPH11291166A (ja) | 研磨装置及び研磨方法 | |
KR100591160B1 (ko) | 반도체 웨이퍼 평탄화 장치 및 평탄화 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060303 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20081202 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20090302 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20090305 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090402 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20091013 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100113 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20100323 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100721 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20100730 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100914 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101008 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131015 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |