JP4597509B2 - パターン検査装置およびパターン検査方法 - Google Patents

パターン検査装置およびパターン検査方法 Download PDF

Info

Publication number
JP4597509B2
JP4597509B2 JP2003433783A JP2003433783A JP4597509B2 JP 4597509 B2 JP4597509 B2 JP 4597509B2 JP 2003433783 A JP2003433783 A JP 2003433783A JP 2003433783 A JP2003433783 A JP 2003433783A JP 4597509 B2 JP4597509 B2 JP 4597509B2
Authority
JP
Japan
Prior art keywords
pattern
inspection
edge
image
inspection target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2003433783A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004185019A5 (enExample
JP2004185019A (ja
Inventor
昌宏 山本
Original Assignee
株式会社ナノジオメトリ研究所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社ナノジオメトリ研究所 filed Critical 株式会社ナノジオメトリ研究所
Priority to JP2003433783A priority Critical patent/JP4597509B2/ja
Publication of JP2004185019A publication Critical patent/JP2004185019A/ja
Publication of JP2004185019A5 publication Critical patent/JP2004185019A5/ja
Application granted granted Critical
Publication of JP4597509B2 publication Critical patent/JP4597509B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
JP2003433783A 1999-08-26 2003-12-26 パターン検査装置およびパターン検査方法 Expired - Lifetime JP4597509B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003433783A JP4597509B2 (ja) 1999-08-26 2003-12-26 パターン検査装置およびパターン検査方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP23958699 1999-08-26
JP2000078847 2000-03-21
JP2003433783A JP4597509B2 (ja) 1999-08-26 2003-12-26 パターン検査装置およびパターン検査方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2000258234A Division JP3524853B2 (ja) 1999-08-26 2000-08-28 パターン検査装置、パターン検査方法および記録媒体

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010160251A Division JP2011017705A (ja) 1999-08-26 2010-07-15 パターン検査装置、パターン検査方法および記録媒体

Publications (3)

Publication Number Publication Date
JP2004185019A JP2004185019A (ja) 2004-07-02
JP2004185019A5 JP2004185019A5 (enExample) 2007-10-04
JP4597509B2 true JP4597509B2 (ja) 2010-12-15

Family

ID=32776670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003433783A Expired - Lifetime JP4597509B2 (ja) 1999-08-26 2003-12-26 パターン検査装置およびパターン検査方法

Country Status (1)

Country Link
JP (1) JP4597509B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4709639B2 (ja) 2005-12-12 2011-06-22 株式会社東芝 マスクパターン評価方法及び評価装置
JP4499058B2 (ja) * 2006-04-25 2010-07-07 シャープ株式会社 位置ずれ検出装置、位置ずれ検出方法、及び記録媒体
JP5388019B2 (ja) * 2007-12-28 2014-01-15 株式会社ブイ・テクノロジー 露光照明装置及び露光パターンの位置ずれ調整方法
JP4772815B2 (ja) * 2008-03-19 2011-09-14 株式会社東芝 補正パターン画像生成装置、パターン検査装置および補正パターン画像生成方法
JP5397103B2 (ja) * 2009-09-03 2014-01-22 アイシン精機株式会社 顔位置検出装置、顔位置検出方法及びプログラム
JP5686567B2 (ja) 2010-10-19 2015-03-18 キヤノン株式会社 露光条件及びマスクパターンを決定するプログラム及び方法
JP5771561B2 (ja) 2012-05-30 2015-09-02 株式会社日立ハイテクノロジーズ 欠陥検査方法および欠陥検査装置
JP6018802B2 (ja) 2012-05-31 2016-11-02 株式会社日立ハイテクノロジーズ 寸法測定装置、及びコンピュータープログラム
CN109283800B (zh) 2014-02-12 2021-01-01 Asml荷兰有限公司 过程窗口的优化方法
JP7409913B2 (ja) * 2020-03-10 2024-01-09 株式会社ニューフレアテクノロジー 画像内のホールパターンの探索方法、パターン検査方法、及びパターン検査装置
KR102510581B1 (ko) * 2022-09-06 2023-03-16 주식회사 포스로직 쉐이프 어레이 매칭 방법 및 이러한 방법을 수행하는 장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0240777A (ja) * 1988-07-29 1990-02-09 Dainippon Screen Mfg Co Ltd 画像輸郭データ作成方法及びその作成過程の表示方法
JPH0321808A (ja) * 1989-06-19 1991-01-30 Meidensha Corp プリント基板のフィルムパターン検査装置
JPH04172239A (ja) * 1990-11-05 1992-06-19 Toshiba Corp 欠陥検出装置

Also Published As

Publication number Publication date
JP2004185019A (ja) 2004-07-02

Similar Documents

Publication Publication Date Title
JP3524853B2 (ja) パターン検査装置、パターン検査方法および記録媒体
JP2011017705A (ja) パターン検査装置、パターン検査方法および記録媒体
JP5429869B2 (ja) パターン検査装置および方法
JP4771714B2 (ja) パターン検査装置および方法
JP4943304B2 (ja) パターン検査装置および方法
US7817844B2 (en) Pattern inspection apparatus and method
US8045785B2 (en) Pattern inspection apparatus and method
JP4472305B2 (ja) パターン検査装置および方法
US20040081350A1 (en) Pattern inspection apparatus and method
JP4787673B2 (ja) パターン検査装置および方法
CN104718428B (zh) 图案的检查、测量装置及程序
US10074036B2 (en) Critical dimension uniformity enhancement techniques and apparatus
JP2011191296A (ja) パターン検査装置および方法
JP4827269B2 (ja) パターン検査装置および方法
JP4597509B2 (ja) パターン検査装置およびパターン検査方法
CN115797249A (zh) 用于半导体样本制造的掩模检查
JP4100056B2 (ja) フォトマスク外観検査方法
US7020323B2 (en) Pattern defect inspection apparatus and method
JP4710191B2 (ja) フォトマスクパターン形状自動計測方法及びその装置及びそのプログラム及びフォトマスク製造方法及び半導体装置の製造方法
EP1146481A2 (en) Pattern inspection apparatus, pattern inspection method, and recording medium
JP5037590B2 (ja) パターン検査装置および方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070822

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070822

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20091214

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20091214

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20091216

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20091214

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100518

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100701

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100907

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100922

R150 Certificate of patent or registration of utility model

Ref document number: 4597509

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131001

Year of fee payment: 3

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

EXPY Cancellation because of completion of term