JP4596894B2 - 感光性組成物除去液 - Google Patents

感光性組成物除去液 Download PDF

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Publication number
JP4596894B2
JP4596894B2 JP2004337653A JP2004337653A JP4596894B2 JP 4596894 B2 JP4596894 B2 JP 4596894B2 JP 2004337653 A JP2004337653 A JP 2004337653A JP 2004337653 A JP2004337653 A JP 2004337653A JP 4596894 B2 JP4596894 B2 JP 4596894B2
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JP
Japan
Prior art keywords
photosensitive composition
mass
removal
substrate
pigment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004337653A
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English (en)
Japanese (ja)
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JP2005202363A (ja
JP2005202363A5 (enExample
Inventor
昌人 金田
泰広 三河
孝二 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP2004337653A priority Critical patent/JP4596894B2/ja
Publication of JP2005202363A publication Critical patent/JP2005202363A/ja
Publication of JP2005202363A5 publication Critical patent/JP2005202363A5/ja
Application granted granted Critical
Publication of JP4596894B2 publication Critical patent/JP4596894B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004337653A 2003-12-16 2004-11-22 感光性組成物除去液 Expired - Fee Related JP4596894B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004337653A JP4596894B2 (ja) 2003-12-16 2004-11-22 感光性組成物除去液

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003418112 2003-12-16
JP2004337653A JP4596894B2 (ja) 2003-12-16 2004-11-22 感光性組成物除去液

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010108615A Division JP4776731B2 (ja) 2003-12-16 2010-05-10 感光性組成物除去液

Publications (3)

Publication Number Publication Date
JP2005202363A JP2005202363A (ja) 2005-07-28
JP2005202363A5 JP2005202363A5 (enExample) 2007-07-05
JP4596894B2 true JP4596894B2 (ja) 2010-12-15

Family

ID=34829178

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004337653A Expired - Fee Related JP4596894B2 (ja) 2003-12-16 2004-11-22 感光性組成物除去液

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JP (1) JP4596894B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102097253B1 (ko) * 2019-12-12 2020-04-03 하민아 혼합 용제 조성물 및 이를 포함하는 도료 세정제

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI276929B (en) * 2003-12-16 2007-03-21 Showa Denko Kk Photosensitive composition remover
JP2007002101A (ja) * 2005-06-23 2007-01-11 Tokyo Ohka Kogyo Co Ltd 洗浄剤
JP4668016B2 (ja) * 2005-09-09 2011-04-13 東京応化工業株式会社 ネガ型感光性樹脂組成物およびこれを用いたカラーフィルタの製造方法
JP2007163983A (ja) * 2005-12-15 2007-06-28 Tokyo Ohka Kogyo Co Ltd 洗浄剤
JP2007191525A (ja) 2006-01-17 2007-08-02 Tokyo Ohka Kogyo Co Ltd 洗浄剤組成物
JP2015096590A (ja) * 2013-10-11 2015-05-21 Ｊｘ日鉱日石エネルギー株式会社 硬化性樹脂用洗浄液組成物
WO2021193577A1 (ja) * 2020-03-27 2021-09-30 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS612152A (ja) * 1984-06-14 1986-01-08 Nagase Sangyo Kk 剥離剤組成物
JPH03142821A (ja) * 1989-10-27 1991-06-18 Neos Co Ltd フォトレジスト用剥離剤
JPH06194847A (ja) * 1992-12-22 1994-07-15 Tokuyama Sekiyu Kagaku Kk ネガ型フォトレジスト用現像液
JP3398541B2 (ja) * 1996-03-27 2003-04-21 花王株式会社 樹脂汚れ用洗浄剤組成物及び洗浄方法
JP2000044994A (ja) * 1998-07-29 2000-02-15 Showa Denko Kk レジスト除去溶剤
JP2001226700A (ja) * 2000-02-17 2001-08-21 Japan Energy Corp 洗浄液組成物
JP3479648B2 (ja) * 2001-12-27 2003-12-15 クラリアント インターナショナル リミテッド ポリシラザン処理溶剤およびこの溶剤を用いるポリシラザンの処理方法
JP4005092B2 (ja) * 2004-08-20 2007-11-07 東京応化工業株式会社 洗浄除去用溶剤

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102097253B1 (ko) * 2019-12-12 2020-04-03 하민아 혼합 용제 조성물 및 이를 포함하는 도료 세정제

Also Published As

Publication number Publication date
JP2005202363A (ja) 2005-07-28

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