JP4596846B2 - Circuit device manufacturing method - Google Patents

Circuit device manufacturing method Download PDF

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Publication number
JP4596846B2
JP4596846B2 JP2004222115A JP2004222115A JP4596846B2 JP 4596846 B2 JP4596846 B2 JP 4596846B2 JP 2004222115 A JP2004222115 A JP 2004222115A JP 2004222115 A JP2004222115 A JP 2004222115A JP 4596846 B2 JP4596846 B2 JP 4596846B2
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Japan
Prior art keywords
conductive
convex portion
circuit device
hole
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004222115A
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Japanese (ja)
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JP2006041376A (en
Inventor
貞道 高草木
優助 五十嵐
元一 根津
隆也 草部
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Sanyo Electric Co Ltd
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Sanyo Electric Co Ltd
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Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP2004222115A priority Critical patent/JP4596846B2/en
Priority to TW094113626A priority patent/TWI267115B/en
Priority to US11/179,431 priority patent/US7163841B2/en
Priority to CNB2005100836419A priority patent/CN100444342C/en
Priority to KR1020050066260A priority patent/KR100728855B1/en
Publication of JP2006041376A publication Critical patent/JP2006041376A/en
Application granted granted Critical
Publication of JP4596846B2 publication Critical patent/JP4596846B2/en
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    • H05K3/4647—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits by applying an insulating layer around previously made via studs
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    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203—Fillers and particles
    • H05K2201/0206—Materials
    • H05K2201/0209—Inorganic, non-metallic particles
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    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/095—Conductive through-holes or vias
    • H05K2201/09509—Blind vias, i.e. vias having one side closed
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    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/095—Conductive through-holes or vias
    • H05K2201/09563—Metal filled via
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    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/09654—Shape and layout details of conductors covering at least two types of conductors provided for in H05K2201/09218 - H05K2201/095
    • H05K2201/09736—Varying thickness of a single conductor; Conductors in the same plane having different thicknesses
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0147—Carriers and holders
    • H05K2203/0152—Temporary metallic carrier, e.g. for transferring material
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    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0369—Etching selective parts of a metal substrate through part of its thickness, e.g. using etch resist
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    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14—Related to the order of processing steps
    • H05K2203/1476—Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning
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    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
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    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
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    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
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    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
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    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
    • H05K3/4658—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern characterized by laminating a prefabricated metal foil pattern, e.g. by transfer

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Abstract

To provide a method of manufacturing a highly reliable circuit device realizing a smaller, thinner and lighter configuration. In the method of manufacturing a circuit device according to the invention, a resin sealed body is separated from a supporting substrate, after the resin sealed body containing a circuit device is formed on a top surface of the supporting substrate. Therefore, manufacture of a circuit device having no substrate becomes possible and it realizes a thinner and lighter circuit device with improved heat dissipation. Moreover, since sealing with a sealing resin can be performed on the supporting substrate, warps, caused by the differences in thermal expansion coefficients between the sealing resin and conductive patterns and between the sealing resin and circuit components, can be prevented. Hence, it becomes possible to prevent flaking of conductive patterns from the substrate and a poor contact between the conductive patterns and a metal thin wire, and consequently to manufacture a highly reliable circuit device.

Description

本発明は回路装置の製造方法に関し、特に、薄型の回路装置を実現する回路装置の製造方法に関するものである。   The present invention relates to a method of manufacturing a circuit device, and more particularly to a method of manufacturing a circuit device that realizes a thin circuit device.

電子機器の小型化および高機能化に伴い、その内部で使用される回路装置においても小型化および高密度化が要求されている。図９を参照して従来の回路装置の製造方法の一例を説明する（特許文献１を参照）。   Along with the downsizing and high functionality of electronic devices, miniaturization and high density are also required in circuit devices used therein. An example of a conventional method for manufacturing a circuit device will be described with reference to FIG. 9 (see Patent Document 1).

先ず、図９（Ａ）を参照して、樹脂等の絶縁性の材料から成る基板１０１にレーザー等でコンタクトホール１０３を形成する。そして、コンタクトホール１０３の内を含む基板１０１の両面にメッキ膜１０２を形成する。   First, referring to FIG. 9A, a contact hole 103 is formed with a laser or the like in a substrate 101 made of an insulating material such as a resin. Then, the plating film 102 is formed on both surfaces of the substrate 101 including the inside of the contact hole 103.

次に、図９（Ｂ）を参照して、メッキ膜１０２をエッチングすることにより、基板１０１の表面に第１の導電パターン１０２Ａを形成し、裏面に第２の導電パターン１０２Ｂを形成する。   Next, referring to FIG. 9B, the plating film 102 is etched to form the first conductive pattern 102A on the front surface of the substrate 101 and the second conductive pattern 102B on the back surface.

図９（Ｃ）を参照して、第１の導電パターン１０２Ａ上に半導体素子１０４を載置し、金属細線１０５を介して第１の導電パターン１０２Ａと半導体素子１０４とを電気的に接続する。そして、半導体素子１０４、金属細線１０５および第１の導電パターン１０２Ａが覆われるように封止樹脂１０７で封止する。最後に、第２の導電パターン１０２Ｂをソルダーレジスト１０９で被覆し、所定の箇所に外部電極１０８を形成する。このようにして回路装置１００が製造される。
特開２００２−２６１９８号公報 Referring to FIG. 9C, the semiconductor element 104 is placed on the first conductive pattern 102A, and the first conductive pattern 102A and the semiconductor element 104 are electrically connected through the thin metal wire 105. And it seals with the sealing resin 107 so that the semiconductor element 104, the metal fine wire 105, and the 1st conductive pattern 102A may be covered. Finally, the second conductive pattern 102B is covered with a solder resist 109, and external electrodes 108 are formed at predetermined locations. In this way, the circuit device 100 is manufactured.
JP 2002-26198 A

しかしながら、上述した回路装置の製造方法では、基板１０１にガラスエポキシ基板が用いられており、製造過程に於いて、配線を支持するために使用されていた。そのため、製造コストの上昇や、基板１０１の厚みによる回路装置の小型化、薄型化、軽量化の限界が問題視されていた。更には、ガラスエポキシ基板を用いることによる放熱性の悪化が指摘されていた。   However, in the circuit device manufacturing method described above, a glass epoxy substrate is used as the substrate 101, and is used to support the wiring in the manufacturing process. For this reason, there has been a problem of an increase in manufacturing cost and limitations of miniaturization, thinning, and weight reduction of the circuit device due to the thickness of the substrate 101. Furthermore, it has been pointed out that heat dissipation is deteriorated by using a glass epoxy substrate.

また、封止樹脂１０７を硬化させる際に、基板１０１と封止樹脂１０７および、半導体素子１０４と封止樹脂１０７との熱膨張係数の差によって反りが発生していた。このことにより、導電パターン１０２が基板１０１から剥離したり、第１の導電パターン１０２Ｂと金属細線１０５との接続に不良が生じるなどの問題があった。   Further, when the sealing resin 107 is cured, warpage is generated due to differences in thermal expansion coefficients between the substrate 101 and the sealing resin 107 and between the semiconductor element 104 and the sealing resin 107. As a result, there is a problem that the conductive pattern 102 is peeled off from the substrate 101, or the connection between the first conductive pattern 102B and the thin metal wire 105 is defective.

更に、基板１０１にガラスエポキシ基板を採用した場合は、両面の電極を電気的に接続するためのコンタクトホール１０３の形成が不可欠であり、製造工程が長くなる問題があった。   Further, when a glass epoxy substrate is used as the substrate 101, it is indispensable to form the contact hole 103 for electrically connecting the electrodes on both sides, and there is a problem that the manufacturing process becomes long.

更に、大電流が流れる導電パターンを形成する場合、導電パターンの面積を広くすることによって、その電気容量を確保していた。従って、回路装置の小型化が困難であった。   Furthermore, when forming a conductive pattern through which a large current flows, the electric capacity is secured by increasing the area of the conductive pattern. Therefore, it is difficult to reduce the size of the circuit device.

本発明は、上記した問題を鑑みて成されたものである。本発明の主な目的は、回路装置の小型化、薄型化および軽量化を実現する信頼性の高い回路装置の製造方法を提供することにある。   The present invention has been made in view of the above problems. A main object of the present invention is to provide a method of manufacturing a highly reliable circuit device that realizes a reduction in size, thickness and weight of the circuit device.

本発明の回路装置の製造方法は、支持基板の表面に第１の導電パターンと前記第１の導電パターンよりも厚く形成される第２の導電パターンとから成る配線層を形成する工程と、前記配線層と回路素子とを電気的に接続する工程と、前記回路素子が被覆されるように前記支持基板の上面を封止樹脂で封止する工程と、前記配線層および前記封止樹脂の裏面を前記支持基板から分離する工程とを具備することを特徴とする。従って、基板のない回路装置を製造することができるので、製造コストの低減や、回路装置の薄型化、軽量化および放熱性の向上を実現することが可能となる。更に、厚みの異なる導電パターンを同一回路装置内に形成することができるので、要求される電流量に対応した導電パターンをそれぞれ形成することにより回路装置の小型化が可能となる。   The method of manufacturing a circuit device according to the present invention includes a step of forming a wiring layer including a first conductive pattern and a second conductive pattern formed thicker than the first conductive pattern on a surface of a support substrate, A step of electrically connecting the wiring layer and the circuit element; a step of sealing the upper surface of the support substrate with a sealing resin so as to cover the circuit element; and a back surface of the wiring layer and the sealing resin. Separating the substrate from the support substrate. Therefore, since a circuit device without a substrate can be manufactured, it is possible to reduce the manufacturing cost, reduce the thickness and weight of the circuit device, and improve the heat dissipation. Furthermore, since conductive patterns having different thicknesses can be formed in the same circuit device, it is possible to reduce the size of the circuit device by forming each conductive pattern corresponding to the required amount of current.

また、本発明の回路装置の製造方法は、支持基板の表面に厚み方向に突出する凸部を有する第１の配線層を形成する工程と、絶縁層を介して前記第1の配線層に導電膜を積層させる工程と、前記凸部と前記導電膜とを導通させる接続部を形成する工程と、前記導電膜をパターニングすることにより、第２の配線層を形成する工程と、前記第２の配線層と回路素子を電気的に接続する工程と、前記回路素子が被覆されるように前記支持基板の上面を封止樹脂で封止する工程と、前記第１の配線層、絶縁層および前記封止樹脂の裏面を前記支持基板から分離する工程とを具備することを特徴とする。従って、上記した効果の他に、多層配線を可能にしたことにより、回路装置の高密度化を実現した。   The method for manufacturing a circuit device according to the present invention includes a step of forming a first wiring layer having a protrusion projecting in a thickness direction on a surface of a support substrate, and a conductive property to the first wiring layer through an insulating layer. A step of laminating a film, a step of forming a connecting portion for conducting the convex portion and the conductive film, a step of forming a second wiring layer by patterning the conductive film, and the second A step of electrically connecting the wiring layer and the circuit element, a step of sealing the upper surface of the support substrate with a sealing resin so as to cover the circuit element, the first wiring layer, the insulating layer, and the Separating the back surface of the sealing resin from the support substrate. Therefore, in addition to the effects described above, the high density of the circuit device has been realized by enabling multilayer wiring.

本発明の回路装置の製造方法によれば、基板を持たない回路装置を製造することができる。従って、回路装置の薄型化、軽量化および放熱性の向上を実現することが可能となる。   According to the method for manufacturing a circuit device of the present invention, a circuit device without a substrate can be manufactured. Therefore, the circuit device can be made thinner, lighter, and improved in heat dissipation.

また、本発明の回路装置の製造方法によれば、支持基板上で封止樹脂による封止ができるため、封止樹脂と導電箔および、封止樹脂と回路素子との熱膨張係数の差による反りを防止することができる。従って、導電パターンの剥離や導電パターンと金属細線との接続不良を抑止できるので、信頼性の高い回路装置を製造することが可能となる。   Further, according to the method for manufacturing a circuit device of the present invention, since sealing with a sealing resin can be performed on the support substrate, the difference in thermal expansion coefficient between the sealing resin and the conductive foil and between the sealing resin and the circuit element Warpage can be prevented. Therefore, peeling of the conductive pattern and poor connection between the conductive pattern and the fine metal wire can be suppressed, so that a highly reliable circuit device can be manufactured.

更に、本発明の回路装置の製造方法によれば、ガラスエポキシ基板では必要であったコンタクトホールの形成を省くことができるので、製造工程を大幅に短縮することが可能となる。   Furthermore, according to the method for manufacturing a circuit device of the present invention, it is possible to omit the formation of contact holes, which is necessary for a glass epoxy substrate, so that the manufacturing process can be greatly shortened.

更に、本発明の回路装置の製造方法によれば、大電流が流れる導電パターンを厚く形成することができるので、回路装置の小型化が可能となる。   Furthermore, according to the method for manufacturing a circuit device of the present invention, since the conductive pattern through which a large current flows can be formed thick, the circuit device can be miniaturized.

更に、本発明の回路装置の製造方法によれば、凸部が埋め込まれることにより薄く形成された絶縁層に貫通孔を設けることができる。従って、絶縁層に貫通孔を容易に形成することが可能となる。更に、貫通孔を浅く形成することが可能になることから、この貫通孔へのメッキ膜の形成を容易にすることができる。更に、フィラーが混入された絶縁層を介して多層の配線層が積層された場合でも、前記絶縁層を貫通して配線層同士を導通させる接続部を形成することが可能となる。   Furthermore, according to the method for manufacturing a circuit device of the present invention, the through hole can be provided in the insulating layer formed thin by embedding the convex portion. Therefore, it is possible to easily form a through hole in the insulating layer. Furthermore, since the through hole can be formed shallow, it is possible to easily form a plating film in the through hole. Furthermore, even when a multilayer wiring layer is laminated through an insulating layer mixed with a filler, it is possible to form a connection portion that penetrates the insulating layer and makes the wiring layers conductive.

〈第１の実施形態〉
図１および図２を参照して、第１の実施形態の回路装置の製造方法を説明する。
先ず、図１（Ａ）を参照して、支持基板１１上に接着剤１２を介して導電箔１３を貼着する。導電箔１３は、ロウ材の付着性、ボンディング性、メッキ性が考慮されて、その材料が選択される。具体的な材料としては、Ｃｕを主原料とした導電箔、Ａｌを主原料とした導電箔または、Ｆｅ−Ｎｉ等の合金から成る導電箔などが採用される。また、他の導電材料でも可能であり、特にエッチングできる導電材が好ましい。導電箔１３の厚さは、１０μｍ〜３００μｍ程度である。しかし、１０μｍ以下または３００μｍ以上の導電箔を採用することも可能である。 <First Embodiment>
With reference to FIG. 1 and FIG. 2, the manufacturing method of the circuit device of 1st Embodiment is demonstrated.
First, referring to FIG. 1A, a conductive foil 13 is attached on a support substrate 11 via an adhesive 12. The conductive foil 13 is selected in consideration of the adhesion of the brazing material, bonding properties, and plating properties. As a specific material, a conductive foil using Cu as a main raw material, a conductive foil using Al as a main raw material, a conductive foil made of an alloy such as Fe-Ni, or the like is employed. Other conductive materials are also possible, and conductive materials that can be etched are particularly preferable. The thickness of the conductive foil 13 is about 10 μm to 300 μm. However, it is also possible to employ a conductive foil of 10 μm or less or 300 μm or more.

接着剤１２は熱可塑性樹脂、ＵＶシート（紫外線を照射することにより接着性が落ちるもの）等が採用される。また、接着剤１２は、溶剤に溶かしたり、加熱することにより液状にしたり、紫外線照射により接着性を低減させることが可能な材料であればよい。   As the adhesive 12, a thermoplastic resin, a UV sheet (a material whose adhesiveness decreases when irradiated with ultraviolet rays), or the like is employed. The adhesive 12 may be any material that can be dissolved in a solvent, made liquid by heating, or reduced in adhesiveness by ultraviolet irradiation.

支持基板１１はＣｕ、Ａｌなどの金属または、樹脂などの材料から成り、導電箔１３を平坦に支持することが可能な強度または厚みを有する。また、接着剤１２にＵＶシートを採用した場合はガラス、またはプラスチック等の透明基板を採用することが好適である。   The support substrate 11 is made of a metal such as Cu or Al, or a material such as a resin, and has a strength or thickness that can support the conductive foil 13 flatly. When a UV sheet is used for the adhesive 12, it is preferable to use a transparent substrate such as glass or plastic.

図１（Ｂ）を参照して、導電箔１３の上面にレジスト１４をパターニングする。そしてレジスト１４をエッチングマスクとしてウエットエッチングを行い、レジスト１４が形成されない主面のエッチングを行う。このエッチングにより凸部１８と薄い導電箔の二種類が形成される。エッチングが終了した後、レジスト１４は除去される。   Referring to FIG. 1B, a resist 14 is patterned on the upper surface of conductive foil 13. Then, wet etching is performed using the resist 14 as an etching mask, and the main surface where the resist 14 is not formed is etched. By this etching, two types of protrusions 18 and a thin conductive foil are formed. After the etching is completed, the resist 14 is removed.

図１（Ｃ）を参照して、導電箔１３をエッチングすることにより、導電パターン２０Ａ、２０Ｂを形成する。先ず、レジスト１４を導電パターン形成予定領域の上面を覆うようにパターニングする。このとき、レジスト１４は厚く形成された凸部１８よりも広い領域を被覆するようにパターニングされる。これは、一回のエッチングで導電箔１３をパターンニングするには、厚みの薄い部分をエッチングすればよいからである。例えばマスクズレを考慮すれば、すこし縁が形成されるようにパターニングした方が、導電箔１３を完全に分離できるからである。また薄い部分でパターニングすれば、一回のエッチングですむ。逆に凸部１８の厚みでパターニングすれば、薄い導電膜はオーバーエッチングになってしまい、パターン幅が狭くなってしまう。   Referring to FIG. 1C, conductive patterns 20A and 20B are formed by etching conductive foil 13. First, the resist 14 is patterned so as to cover the upper surface of the conductive pattern formation scheduled region. At this time, the resist 14 is patterned so as to cover a region wider than the thick convex portion 18. This is because in order to pattern the conductive foil 13 by a single etching, it is sufficient to etch a thin portion. For example, if mask misalignment is taken into account, the conductive foil 13 can be completely separated by patterning so that a slight edge is formed. If patterning is done on thin parts, only one etching is required. On the contrary, if patterning is performed with the thickness of the convex portion 18, the thin conductive film is over-etched, and the pattern width is narrowed.

このように、厚さの異なる導電パターンを薄い導電箔側で一度にパターニングすることで、厚薄のパターンが一度に形成でき、例えばパワー系のパターンと小信号系のパターンが、２回のエッチングにより可能となる。   Thus, by patterning conductive patterns with different thicknesses at the same time on the thin conductive foil side, a thin pattern can be formed at one time. For example, a power pattern and a small signal pattern can be formed by two etchings It becomes possible.

また、導電パターンの面積を広くして大電流に対応するのでなく、導電パターンの厚みを増加させることによって対応でき、回路装置の平面サイズを小さくできる。   In addition, the area of the conductive pattern can be widened to cope with a large current, but can be dealt with by increasing the thickness of the conductive pattern, and the planar size of the circuit device can be reduced.

更に、発熱量の大きい回路素子を厚く形成された導電パターン上に配置することにより、放熱性を向上させることが可能となる。   Furthermore, by disposing a circuit element that generates a large amount of heat on a thick conductive pattern, it is possible to improve heat dissipation.

図２（Ａ）を参照して、導電パターン２０に回路素子２５を実装し、封止樹脂２８にて封止された樹脂封止体３１を形成する。ここで、第１の回路素子２５Ａは第１の導電パターン２０Ａに載置され、第２の回路素子２５Ｂは第２の導電パターン２０Ｂに載置される。同図に示すように、回路素子２５は金属細線２７介して導電パターン２０と電気的に接続されている。当然であるがフェイスダウンでも可能である。   With reference to FIG. 2A, the circuit element 25 is mounted on the conductive pattern 20, and the resin sealing body 31 sealed with the sealing resin 28 is formed. Here, the first circuit element 25A is placed on the first conductive pattern 20A, and the second circuit element 25B is placed on the second conductive pattern 20B. As shown in the figure, the circuit element 25 is electrically connected to the conductive pattern 20 through a thin metal wire 27. Of course, face-down is also possible.

本形態では、比較的小さな電流が流れる第１の回路素子２５Ａと、大電流が流れる第２の回路素子２５Ｂとが載置されるとして説明する。   In the present embodiment, a description will be given assuming that the first circuit element 25A through which a relatively small current flows and the second circuit element 25B through which a large current flows are placed.

第１の回路素子２５Ａとしては、チップコンデンサが開示されているが、トランジスタ、ＬＳＩチップ、チップ抵抗またはソレノイド等を採用することができる。   A chip capacitor is disclosed as the first circuit element 25A, but a transistor, an LSI chip, a chip resistor, a solenoid, or the like can be employed.

第２の回路素子２５Ｂとしては、大きな電流を流すパワー系のトランジスタ、例えばパワーモス、ＧＴＢＴ、ＩＧＢＴ、サイリスタ等を採用することができる。またパワー系のＩＣも該当する。近年、チップもサイズが小さく薄型で高機能なため、昔と比べて大量に熱が発生する。従って、放熱を必要とされる回路素子も第２の導電パターン２０Ｂに載置することにより放熱性を向上させることができる。   As the second circuit element 25B, a power-type transistor that supplies a large current, such as a power moss, GTBT, IGBT, thyristor, or the like, can be used. A power IC is also applicable. In recent years, since chips are small in size and thin and have high functionality, a large amount of heat is generated compared to the past. Therefore, heat dissipation can be improved by placing circuit elements that require heat dissipation on the second conductive pattern 20B.

そして、回路素子２５と導電パターンとの接続は、フェイスアップまたはダウンにより、金属細線、ロウ材または、導電ペースト等によって成される。その後、回路素子２５は封止樹脂２８によって封止される。ここではトランスファーモールド、インジェクションモールド、ディッピングまたは、塗布によりに樹脂封止することができる。樹脂材料としては、エポキシ樹脂などの熱硬化性樹脂またはポリイミド樹脂などの熱可塑性樹脂を採用することが可能である。   The circuit element 25 and the conductive pattern are connected to each other by a fine metal wire, a brazing material, a conductive paste, or the like by face-up or down. Thereafter, the circuit element 25 is sealed with a sealing resin 28. Here, resin sealing can be performed by transfer molding, injection molding, dipping or coating. As the resin material, a thermosetting resin such as an epoxy resin or a thermoplastic resin such as a polyimide resin can be employed.

ここで、樹脂封止体３１は、封止樹脂２８が硬化するまで表面が平坦な支持基板１１と一体であるため、その平坦性を維持することが可能となる。   Here, since the resin sealing body 31 is integrated with the support substrate 11 having a flat surface until the sealing resin 28 is cured, the flatness of the resin sealing body 31 can be maintained.

図２（Ｂ）を参照して、樹脂封止体３１を支持基板１１から分離する。ここで、接着剤１２に熱可塑性樹脂を採用した場合には、熱可塑性樹脂を加熱して溶融することにより分離することが可能となる。また、有機溶剤などの薬剤で選択的に接着剤１２を溶かすことも可能である。   With reference to FIG. 2B, the resin sealing body 31 is separated from the support substrate 11. Here, when a thermoplastic resin is employed for the adhesive 12, it can be separated by heating and melting the thermoplastic resin. It is also possible to selectively dissolve the adhesive 12 with a chemical such as an organic solvent.

接着剤１２にＵＶシートを採用した場合には、紫外線を照射することにより分離することが可能となる。このとき、支持基板１１にガラスなどの紫外線を通過させる材料を採用することにより、迅速かつ効率的な分離を行うことが可能である。   When a UV sheet is employed for the adhesive 12, it can be separated by irradiating with ultraviolet rays. At this time, it is possible to perform rapid and efficient separation by adopting a material that transmits ultraviolet rays such as glass for the support substrate 11.

支持基板１１から分離が行われた後、樹脂封止体３１の裏面には接着剤１２の一部が残存する恐れがある。これは、再度、有機溶剤などの薬剤を用いて溶融除去することによって解決される。   After separation from the support substrate 11, a part of the adhesive 12 may remain on the back surface of the resin sealing body 31. This is solved again by melting and removing using a chemical such as an organic solvent.

図２（Ｃ）を参照して、樹脂封止体３１の裏面処理を施し、ダイシングして個別に分離することにより、回路装置１０Ａを完成させる。ここでは、樹脂封止体３１の裏面にソルダーレジスト２９をパターニングして導電パターンを露出し、この箇所に外部電極３０、例えばロウ材を形成する。しかし、樹脂封止体３１の裏面から露出した導電パターン２０を外部電極として機能させることも可能である。   With reference to FIG. 2 (C), the back surface process of the resin sealing body 31 is performed, and the circuit device 10A is completed by dicing and separating individually. Here, the solder resist 29 is patterned on the back surface of the resin sealing body 31 to expose the conductive pattern, and the external electrode 30, for example, a brazing material is formed at this location. However, the conductive pattern 20 exposed from the back surface of the resin sealing body 31 can also function as an external electrode.

以上の構成により、薄い導電パターンと厚い導電パターンが形成でき、パワー系／小信号系の素子が一つのパッケージに収納することができる。例えば、インバータモジュールとして、６つのパワー素子と１つの制御ＩＣを1パッケージする場合、６つのパワー素子のソース・ドレインは、厚い導電パターンに、ゲートやパワートランジスタを制御するＩＣは、薄い導電パターンに電気的に接続すれば、１パッケージからなるＳＩＰが可能となる。   With the above configuration, a thin conductive pattern and a thick conductive pattern can be formed, and power / small signal elements can be housed in one package. For example, when an inverter module packages six power elements and one control IC, the source and drain of the six power elements have a thick conductive pattern, and the IC that controls the gate and power transistor has a thin conductive pattern. If electrically connected, SIP consisting of one package becomes possible.

〈第２の実施形態〉
図３から図５を参照して、第２の実施形態の回路装置の製造方法を説明する。本形態の回路装置の製造方法は、第１の実施形態と基本工程は同じである。従って、ここでは相違点を中心に説明する。 <Second Embodiment>
With reference to FIG. 3 to FIG. 5, a method for manufacturing the circuit device of the second embodiment will be described. The circuit device manufacturing method of the present embodiment has the same basic steps as the first embodiment. Therefore, here, the difference will be mainly described.

先ず、図３（Ａ）を参照して、支持基板１１上に接着剤１２を介して貼着された第１の導電膜３３に凸部１８を形成する。第１の導電膜３３がレジスト１４をマスクにしてハーフエッチングされることにより、厚い部分である凸部１８と薄い部分が形成される。凸部１８を形成した後、レジスト１４は除去される。   First, with reference to FIG. 3A, the convex portion 18 is formed on the first conductive film 33 attached to the support substrate 11 via the adhesive 12. The first conductive film 33 is half-etched using the resist 14 as a mask, so that the convex portions 18 and the thin portions which are thick portions are formed. After the projection 18 is formed, the resist 14 is removed.

図３（Ｂ）を参照して、前実施形態と同様に、薄い部分をエッチングして、厚い導電パターンと薄い導電パターンを形成する。ここで、レジスト１４は凸部１８の領域よりも広い範囲を覆うようにパターニングされる。そして、レジスト１４をマスクにしてウエットエッチングすることで、第１の導電パターン４０Ａと第１の導電パターン４０Ａよりも厚く形成される第２の導電パターン４０Ｂから成る第１の配線層４０が形成される。   Referring to FIG. 3B, as in the previous embodiment, the thin portion is etched to form a thick conductive pattern and a thin conductive pattern. Here, the resist 14 is patterned so as to cover a wider area than the area of the protrusion 18. Then, the first wiring layer 40 including the first conductive pattern 40A and the second conductive pattern 40B formed thicker than the first conductive pattern 40A is formed by wet etching using the resist 14 as a mask. The

図３（Ｃ）を参照して、絶縁層４１を介して第１の配線層４０の上面に第２の導電膜３４を積層させる。これは、表面に接着層等の絶縁層４１が設けられた第２の導電膜３４を第１の配線層４０と密着させることで成される。また、絶縁層４１を第１の配線層に塗布してから第２の導電膜３４を積層させることも可能である。   With reference to FIG. 3C, the second conductive film 34 is stacked on the upper surface of the first wiring layer 40 with the insulating layer 41 interposed therebetween. This is achieved by bringing the second conductive film 34 provided with an insulating layer 41 such as an adhesive layer on the surface into close contact with the first wiring layer 40. It is also possible to stack the second conductive film 34 after applying the insulating layer 41 to the first wiring layer.

ここで、凸部１８は絶縁層４１に埋め込まれるように密着される。この密着を真空プレスで行うことにより、第１の配線層４０と絶縁層４１の間の空気により発生するボイドを防止することができる。また、等方エッチングにより形成される凸部１８の側面は、滑らかな曲面となっている。従って、第１の配線層４０を絶縁層４１に埋め込む際に、この曲面に沿って樹脂が浸入し、未充填部が無くなる。このことから、凸部１８の側面形状によっても、ボイドの発生を抑止することができる。更に、凸部１８が絶縁層４１に埋め込まれることで、第１の配線層４０と絶縁層４１との密着強度を向上させることができる。   Here, the convex portion 18 is closely attached so as to be embedded in the insulating layer 41. By performing this close contact with a vacuum press, voids generated by air between the first wiring layer 40 and the insulating layer 41 can be prevented. Moreover, the side surface of the convex part 18 formed by isotropic etching is a smooth curved surface. Therefore, when the first wiring layer 40 is embedded in the insulating layer 41, the resin enters along the curved surface, and there is no unfilled portion. For this reason, the generation of voids can also be suppressed by the side shape of the convex portion 18. Furthermore, since the convex portion 18 is embedded in the insulating layer 41, the adhesion strength between the first wiring layer 40 and the insulating layer 41 can be improved.

本形態では、放熱性を向上させるために、絶縁層４１としてエポキシ樹脂等の絶縁性樹脂にフィラーが混入されたものを採用している。ここで、混入されるフィラーとしては、ＳｉＯ２、Ａｌ２Ｏ３、ＳｉＣ、ＡｌＮ等である。もちろん、絶縁層４１にフィラーが混入されていない樹脂を採用することも可能である。   In this embodiment, in order to improve heat dissipation, an insulating layer 41 in which a filler is mixed in an insulating resin such as an epoxy resin is employed. Here, the filler to be mixed is SiO2, Al2O3, SiC, AlN or the like. Of course, it is also possible to employ a resin in which no filler is mixed in the insulating layer 41.

図４（Ａ）から図４（Ｃ）を参照して、第１の配線層４０と第２の導電膜３４を導通させる接続部を形成する工程を説明する。先ず、レジスト１４をマスクにして、接続部４３が形成される予定の領域をエッチングして絶縁層４１の表面が露出するように貫通孔４２を形成する。そして、第２の導電膜３４をマスクとして、レーザーを照射することにより貫通孔４２の下部から凸部１８を露出させる。そして、貫通孔４２にメッキ層を形成することにより、接続部４３を形成する。接続部４３を形成することによって第１の配線層４０と第２の導電膜３４とを導通させることができる。   With reference to FIGS. 4A to 4C, a process of forming a connection portion for electrically connecting the first wiring layer 40 and the second conductive film 34 will be described. First, using the resist 14 as a mask, a region where the connection portion 43 is to be formed is etched to form a through hole 42 so that the surface of the insulating layer 41 is exposed. Then, using the second conductive film 34 as a mask, the projection 18 is exposed from the lower portion of the through hole 42 by irradiating a laser. Then, the connecting portion 43 is formed by forming a plated layer in the through hole 42. By forming the connection portion 43, the first wiring layer 40 and the second conductive film 34 can be made conductive.

この接続部４３の形成工程の詳細は図６から図９を参照して後述する。   Details of the process of forming the connecting portion 43 will be described later with reference to FIGS.

図５（Ａ）を参照して、第２の導電膜３４をパターニングすることにより、第２の配線層４５を形成する。そして、第２の配線層４５上に回路素子２５を電気的に接続した後、封止樹脂２８にて封止する。   Referring to FIG. 5A, the second wiring layer 45 is formed by patterning the second conductive film 34. Then, after the circuit element 25 is electrically connected to the second wiring layer 45, the circuit element 25 is sealed with a sealing resin 28.

ここで、第１の配線層４０と第２の配線層４５とは、平面的に交差するように形成することができる。そして、第１の配線層４０と第２の配線層４５とは、接続部４３を介して所望の箇所で接続されている。従って、回路素子２５が多数個の電極を有する場合でも、本形態の多層配線構造により、クロスオーバーが可能となり配線の引き回しを自由に行うことができる。当然、回路素子の電極の数、素子の実装密度等により、３層、４層、５層以上に増やすことも可能である。   Here, the first wiring layer 40 and the second wiring layer 45 can be formed so as to intersect in a plane. The first wiring layer 40 and the second wiring layer 45 are connected to each other at a desired location via the connection portion 43. Accordingly, even when the circuit element 25 has a large number of electrodes, the multi-layer wiring structure of this embodiment enables crossover and wiring can be freely performed. Naturally, it is possible to increase to three layers, four layers, five layers or more depending on the number of electrodes of the circuit elements, the mounting density of the elements, and the like.

また、本形態では、第２の配線層４５は同一の厚みのパターンによって形成されているが、図１を参照して説明したように、厚みの異なるパターンを有する配線層にすることも可能である。従って、厚く形成された導電パターンを形成することにより、電気容量の確保ができるとともに、ヒートシンクとしての機能を持たせることができる。更に、接続部４３をサーマルビアとして機能させることも可能である。   In the present embodiment, the second wiring layer 45 is formed with a pattern having the same thickness. However, as described with reference to FIG. 1, the second wiring layer 45 may be a wiring layer having patterns with different thicknesses. is there. Therefore, by forming a thick conductive pattern, it is possible to ensure electric capacity and to have a function as a heat sink. Furthermore, the connection part 43 can also function as a thermal via.

図５（Ｂ）を参照して、樹脂封止体３１を支持基板１１から分離する。この分離方法は上述した方法にて実施することができる。そして、樹脂封止体３１の裏面処理を行い、ダイシングして個別に分離することにより、図５（Ｃ）に示すような回路素子１０Ｂが完成される。   With reference to FIG. 5B, the resin sealing body 31 is separated from the support substrate 11. This separation method can be carried out by the method described above. And the back surface process of the resin sealing body 31 is performed, and the circuit element 10B as shown in FIG.5 (C) is completed by dicing and isolate | separating separately.

図６から図９を参照して接続部４３の形成方法を説明する。   A method for forming the connecting portion 43 will be described with reference to FIGS.

図６（Ａ）では、第１の配線層４０の上面に絶縁層４１を介して第２の導電膜３４が積層されている。ここで、第２の導電膜３４は、接続部４３を形成する予定の領域が除去されている。そして、貫通孔４２の下部から絶縁層４１の表面が露出している。更に、絶縁層４１には放熱性が考慮されてフィラーが混入されている。ここでは、先ず、破線で囲まれた接続部形成領域４４の拡大図を図６（Ｂ）および図６（Ｃ）に示し、貫通孔４２の形成方法を詳述する。   In FIG. 6A, a second conductive film 34 is stacked on the upper surface of the first wiring layer 40 with an insulating layer 41 interposed therebetween. Here, the region where the connection portion 43 is to be formed is removed from the second conductive film 34. The surface of the insulating layer 41 is exposed from the lower part of the through hole 42. Furthermore, a filler is mixed in the insulating layer 41 in consideration of heat dissipation. Here, first, an enlarged view of the connection portion formation region 44 surrounded by a broken line is shown in FIGS. 6B and 6C, and a method of forming the through hole 42 will be described in detail.

図６（Ｂ）を参照して、本形態では、凸部１８が埋め込まれることにより、貫通孔４２の下方の絶縁層４１の膜厚は薄くなる。そして、薄くなった領域の絶縁層４１を、レーザー３９を用いて除去することで、貫通孔４２の下部に、凸部１８の上面を露出させている。大部分の領域に於いて、絶縁層４１の厚みＴ２は、例えば５０μｍ程度である。それに対して、貫通孔４２の下方に対応する領域の絶縁層４１の厚みＴ１は、例えば１０μｍ〜２５μｍ程度と薄くなっている。   With reference to FIG. 6B, in this embodiment, the thickness of the insulating layer 41 below the through hole 42 is reduced by embedding the convex portion 18. Then, the insulating layer 41 in the thinned region is removed using the laser 39, so that the upper surface of the convex portion 18 is exposed at the lower portion of the through hole 42. In most regions, the thickness T2 of the insulating layer 41 is, for example, about 50 μm. On the other hand, the thickness T1 of the insulating layer 41 in the region corresponding to the lower part of the through hole 42 is as thin as about 10 μm to 25 μm, for example.

後の工程で、メッキにて接続部４３を形成する場合、低アスペクト比の貫通孔４２を形成する必要がある。これは、アスペクト比が高いと、貫通孔４２内部におけるメッキ液の流動性の悪化や、メッキ液の供給が不十分になることにより、接続部４３の形成が困難になるからである。   When the connection portion 43 is formed by plating in a later step, it is necessary to form the through hole 42 having a low aspect ratio. This is because when the aspect ratio is high, the formation of the connecting portion 43 becomes difficult due to the deterioration of the fluidity of the plating solution inside the through hole 42 and the insufficient supply of the plating solution.

ここで、メッキにて信頼性の高い接続部４３が形成可能な貫通孔４２のアスペクト比は１以下であることが確認されていることから、本形態の貫通孔４２をアスペクト比が１またはそれ以下になるように形成した。ここで、アスペクト比とは、貫通孔４２の径をＤとし、貫通孔４２の深さＬとするとＬ／Ｄで示される値である。   Here, since it has been confirmed that the aspect ratio of the through hole 42 in which the highly reliable connection portion 43 can be formed by plating is 1 or less, the aspect ratio of the through hole 42 of this embodiment is 1 or less. It formed so that it might become the following. Here, the aspect ratio is a value represented by L / D, where D is the diameter of the through hole 42 and L is the depth L of the through hole 42.

また、絶縁層４１には、放熱性を確保するためのフィラーは、レーザーによる貫通孔４２の形成を若干困難にする。このような状況下に於いて、貫通孔４２が形成される絶縁層４１を薄くすることは有意義である。   Moreover, the filler for ensuring heat dissipation in the insulating layer 41 makes the formation of the through-hole 42 by laser slightly difficult. Under such circumstances, it is meaningful to make the insulating layer 41 in which the through hole 42 is formed thin.

図６（Ｃ）を参照して、上記方法により貫通孔４２を形成した後の断面を示す。貫通孔４２の下面からは、凸部１８の上面が露出している。そして、レーザー処理により形成される貫通孔４２の側壁からは、絶縁層４１に混入されているフィラーが露出している。本形態の絶縁層４１には、放熱性の向上のために、幅広い径のフィラーが混入されている。従って、貫通孔４２の側壁は、凹凸を有する形状となっている。尚、上記レーザー処理にて、貫通孔４２の底部に残渣が残留する場合は、この残渣を取り除くための洗浄を行う。   Referring to FIG. 6C, a cross section after the through hole 42 is formed by the above method is shown. From the lower surface of the through hole 42, the upper surface of the convex portion 18 is exposed. And the filler mixed in the insulating layer 41 is exposed from the side wall of the through-hole 42 formed by laser processing. Insulating layer 41 of this embodiment is mixed with a filler having a wide diameter to improve heat dissipation. Therefore, the side wall of the through hole 42 has a shape with irregularities. If a residue remains at the bottom of the through hole 42 by the laser treatment, cleaning is performed to remove the residue.

凸部１８の平面的な大きさは、その上方に形成さえる貫通孔４２よりも大きく形成される。換言すると、貫通孔４２および凸部１８の平面的な形状は、例えば円形であるので、凸部１８の径は、貫通孔４２の径よりも大きく形成されている。一例を挙げると、貫通孔４２の径Ｗ１が１００μｍ程度である場合は、凸部１８の径Ｗ２は、１５０μｍから２００μｍ程度に形成される。また、貫通孔４２の径Ｗ１が３０μｍから５０μｍ程度である場合は、凸部１８の径Ｗ２は、５０μｍかあら７０μｍ程度に調整される。このように凸部１８の平面的な大きさを、貫通孔４２よりも大きくすることで、貫通孔４２が多少の位置ズレを伴って形成された場合でも、貫通孔４２を凸部１８の上方に位置させることができる。従って上記位置ズレに起因した、接続信頼性の低下を防止することができる。また、凸部１８の平面的な形状としては、円形以外の形状も採用可能である。   The planar size of the convex portion 18 is larger than the through hole 42 formed above. In other words, since the planar shapes of the through hole 42 and the convex portion 18 are, for example, circular, the diameter of the convex portion 18 is formed larger than the diameter of the through hole 42. As an example, when the diameter W1 of the through hole 42 is about 100 μm, the diameter W2 of the convex portion 18 is formed to be about 150 μm to 200 μm. Further, when the diameter W1 of the through hole 42 is about 30 μm to 50 μm, the diameter W2 of the convex portion 18 is adjusted to about 50 μm or about 70 μm. Thus, even when the through hole 42 is formed with some positional deviation, the planar size of the convex portion 18 is made larger than that of the through hole 42 so that the through hole 42 is located above the convex portion 18. Can be located. Therefore, it is possible to prevent a decrease in connection reliability due to the positional deviation. Moreover, as a planar shape of the convex part 18, shapes other than circular are employable.

また、図示しないが、絶縁層４１を第１の樹脂膜と第２の樹脂膜から形成することにより、貫通孔４２の形成を容易にすることができる。具体的には、絶縁層４１の下層を第１の樹脂膜によって形成する。ここで、第１の樹脂膜の上面は凸部１８の上面と同じ高さにする。そして、第１の樹脂膜の上面に第２の樹脂膜を形成する。ここで、第１の樹脂膜は放熱性が十分維持するためにフィラーの充填率を高くし、第２の樹脂膜はレーザーによって貫通孔４２の形成を容易にできるように充填率を低くする。こうすることによって、貫通孔内部にフィラーの残渣または貫通孔４２の側面から剥離したフィラーによる貫通孔４２の詰まりを抑止することができる。従って、信頼性の高い接続部の形成が可能となる。また、第２の樹脂膜に混入されるフィラーの径を小さくしてもよい。更には、第２の樹脂膜にフィラーが混入されなくてもよい。   Although not shown, the formation of the through hole 42 can be facilitated by forming the insulating layer 41 from the first resin film and the second resin film. Specifically, the lower layer of the insulating layer 41 is formed by the first resin film. Here, the upper surface of the first resin film is set to the same height as the upper surface of the convex portion 18. Then, a second resin film is formed on the upper surface of the first resin film. Here, the first resin film has a high filler filling rate in order to maintain sufficient heat dissipation, and the second resin film has a low filling rate so that the through holes 42 can be easily formed by a laser. By doing so, clogging of the through-hole 42 due to the filler residue inside the through-hole or the filler peeled off from the side surface of the through-hole 42 can be suppressed. Therefore, a highly reliable connection part can be formed. Moreover, the diameter of the filler mixed in the second resin film may be reduced. Furthermore, the filler may not be mixed into the second resin film.

更に、上記説明では、絶縁層４１を第２の導電膜３４にて被覆した後に貫通孔４２を形成したが、他の方法により貫通孔４２の形成を行うこともできる。具体的には、第２の導電膜３４を被覆する前に、絶縁層４１を除去することで貫通孔４２を形成し、貫通孔４２の下部から凸部１８の上面を露出させることが可能である。ここで、樹脂を除去する手段としてＹＡＧレーザーまたは、ウエットエッチングを採用することができる。そして、接続部４３と第２の導電膜３４を無電解メッキによって形成することも可能である。更に、無電解メッキによって形成された第２の導電膜３４をカソードとして電解メッキをすることにより、ある程度の厚みを有する導電膜を形成することが可能となる。   Further, in the above description, the through hole 42 is formed after the insulating layer 41 is covered with the second conductive film 34. However, the through hole 42 may be formed by other methods. Specifically, before covering the second conductive film 34, it is possible to form the through hole 42 by removing the insulating layer 41 and expose the upper surface of the convex portion 18 from the lower portion of the through hole 42. is there. Here, a YAG laser or wet etching can be employed as a means for removing the resin. The connection portion 43 and the second conductive film 34 can be formed by electroless plating. Furthermore, a conductive film having a certain thickness can be formed by performing electrolytic plating using the second conductive film 34 formed by electroless plating as a cathode.

次に、図７および図８を参照して、貫通孔４２にメッキ膜を形成することで、接続部４３を形成し、第1の配線層４０と第２の導電膜３４とを導通させる工程を説明する。このメッキ膜の形成は２つの方法が考えられる。第1の方法は無電解メッキによりメッキ膜を形成した後に、電解メッキにより再びメッキ膜を成膜させる方法である。第２の方法は、電解メッキ処理のみでメッキ膜を成膜する方法である。   Next, referring to FIG. 7 and FIG. 8, a step of forming a connection portion 43 by forming a plating film in the through hole 42 and electrically connecting the first wiring layer 40 and the second conductive film 34. Will be explained. There are two methods for forming the plating film. The first method is a method of forming a plated film again by electrolytic plating after forming the plated film by electroless plating. The second method is a method of forming a plating film only by electrolytic plating.

図７を参照して、メッキ膜を形成する上記第1の方法を説明する。先ず図７（Ａ）を参照して、貫通孔４２の側壁も含めた第２の導電膜３４の表面に、無電解メッキ処理により第１のメッキ膜４６を形成する。この第１のメッキ膜４６の厚みは、３μｍから５μｍ程度で良い。   With reference to FIG. 7, the first method for forming a plating film will be described. First, referring to FIG. 7A, a first plating film 46 is formed on the surface of the second conductive film 34 including the side wall of the through hole 42 by electroless plating. The thickness of the first plating film 46 may be about 3 μm to 5 μm.

次に、図７（Ｂ）を参照して、第１のメッキ膜４６の上面に、電解メッキ法により新たな第２のメッキ膜４７を形成する。具体的には、第１のメッキ膜４６が形成された第２の導電膜３４をカソード電極として、電解メッキ法により第２のメッキ膜４７を形成する。上述した無電解メッキ法により、貫通孔４２の内壁には第１のメッキ膜４６が形成されている。従って、ここで形成される第２のメッキ膜４７は、貫通孔４２の内壁も含めて一様の厚みに形成される。このようにして、メッキ膜から接続部４３が形成される。具体的な第２のメッキ膜４７の厚みは、例えば２０μｍ程度である。上記した第１のメッキ膜４６および第２のメッキ膜４７の材料としては、第２の導電膜３４と同じ材料である銅を採用することができる。また、銅以外の金属を第１のメッキ膜４６および第２のメッキ膜４７の材料として採用することができる。   Next, referring to FIG. 7B, a new second plating film 47 is formed on the upper surface of the first plating film 46 by electrolytic plating. Specifically, the second plating film 47 is formed by an electrolytic plating method using the second conductive film 34 on which the first plating film 46 is formed as a cathode electrode. A first plating film 46 is formed on the inner wall of the through hole 42 by the electroless plating method described above. Accordingly, the second plating film 47 formed here is formed to have a uniform thickness including the inner wall of the through hole 42. In this way, the connection portion 43 is formed from the plating film. A specific thickness of the second plating film 47 is, for example, about 20 μm. As the material of the first plating film 46 and the second plating film 47 described above, copper which is the same material as that of the second conductive film 34 can be employed. A metal other than copper can be used as the material of the first plating film 46 and the second plating film 47.

図７（Ｃ）を参照して、ここではフィリングメッキを行うことにより、第２のメッキ膜４７により貫通孔４２を埋め込んでいる。このフィリングメッキを行うことにより、接続部４３の機械的強度を向上させることができる。   Referring to FIG. 7C, here, through-hole 42 is filled with second plating film 47 by performing filling plating. By performing the filling plating, the mechanical strength of the connection portion 43 can be improved.

次に図８を参照して、電解メッキ法を用いて接続部４３を形成する方法を説明する。   Next, with reference to FIG. 8, a method of forming the connection portion 43 using the electrolytic plating method will be described.

図８（Ａ）を参照して、先ず、金属イオンを含む溶液を貫通孔４２に接触させる。ここで、メッキ膜４８の材料としては、銅、金、銀、パラジューム等を採用することができる。そして、第２の導電膜３４をカソード電極として電流を流すと、カソード電極である第２の導電膜３４に金属が析出してメッキ膜が形成される。ここでは、メッキ膜が成長する様子を４８Ａ、４８Ｂにて表している。電解メッキ法では、電界が強い箇所に優先的にメッキ膜が形成される。本形態ではこの電界は、貫通孔４２の周縁部に面する部分の第２の導電膜３４で強くなる。従って、この図に示すように、貫通孔４２の周縁部に面する部分の第２の導電膜３４から、優先的にメッキ膜が成長する。形成されたメッキ膜が凸部に接触した時点で、第1の配線層４０と第２の導電膜３４とが導通する。その後は、貫通孔４２内部に、一様にメッキ膜が形成される。このことにより、貫通孔４２の内部に、第２の導電膜３４と一体化した接続部４３が形成される。   Referring to FIG. 8A, first, a solution containing metal ions is brought into contact with through-hole 42. Here, as the material of the plating film 48, copper, gold, silver, palladium or the like can be employed. Then, when a current is passed using the second conductive film 34 as a cathode electrode, metal is deposited on the second conductive film 34 that is the cathode electrode to form a plating film. Here, the state of growth of the plating film is represented by 48A and 48B. In the electrolytic plating method, a plating film is preferentially formed at a place where the electric field is strong. In this embodiment, this electric field is strengthened by the second conductive film 34 at the portion facing the peripheral edge of the through hole 42. Therefore, as shown in this figure, a plating film grows preferentially from the portion of the second conductive film 34 facing the peripheral edge of the through hole 42. When the formed plating film comes into contact with the convex portion, the first wiring layer 40 and the second conductive film 34 become conductive. Thereafter, a plating film is uniformly formed in the through hole 42. As a result, a connection portion 43 integrated with the second conductive film 34 is formed inside the through hole 42.

図８（Ｂ）を参照して、次に、接続部４３を形成する他の方法を説明する。ここでは、ひさし５０を貫通孔４２の周辺部に設けることにより、電解メッキ法による接続部４３の形成を容易にしている。ここで、「ひさし」とは、貫通孔４２の周辺部を覆うように、せり出す第２の導電膜３４から成る部位を指す。ひさし５０の具体的な製造方法は、レーザーによる貫通孔４２の形成を行う際に、このレーザーの出力を大きくすることで行うことができる。レーザーの出力を大きくすることにより、レーザーによる第２の導電膜３４の除去が横方向に進行することで、ひさし５０の下方の領域の樹脂が除去される。上記した条件にて、第２の導電膜３４をカソード電極とした電解メッキ処理を行うことで、ひさし５０の部分から優先的にメッキ膜が成長する。ひさし５０から、メッキ膜が成長することにより、図８（Ａ）の場合と比較して、下方向に優先してメッキ膜を成長させることができる。従って、メッキ膜による貫通孔４２の埋め込みを確実に行うことが可能となる。   Next, another method for forming the connection portion 43 will be described with reference to FIG. Here, the eaves 50 are provided in the peripheral portion of the through hole 42 to facilitate the formation of the connection portion 43 by electrolytic plating. Here, the “eave” refers to a portion made of the second conductive film 34 protruding so as to cover the peripheral portion of the through hole 42. A specific method for manufacturing the eaves 50 can be performed by increasing the output of the laser when the through hole 42 is formed by the laser. By increasing the output of the laser, the removal of the second conductive film 34 by the laser proceeds in the lateral direction, so that the resin in the region below the eaves 50 is removed. By performing the electrolytic plating process using the second conductive film 34 as the cathode electrode under the above-described conditions, the plating film grows preferentially from the eaves 50 portion. By growing the plating film from the eaves 50, it is possible to grow the plating film with priority in the downward direction as compared with the case of FIG. Therefore, it is possible to reliably fill the through hole 42 with the plating film.

上述したように、本形態の貫通孔４２の側壁は凹凸を有する形状となっている。更に、貫通孔４２の側壁には、絶縁層４１に混入されたフィラーが露出している。これらのことにより、貫通孔４２の側壁にメッキ膜を形成することが困難になっている。一般的に無機物であるフィラーの表面には、メッキ膜が付着し難い。特に、ＡｌＮが貫通孔４２の側壁に露出する場合は、メッキ膜の形成が困難になる。そこで本形態では、上記電解メッキ法を用いた方法により、接続部４３を形成した。   As described above, the side wall of the through-hole 42 of this embodiment has a shape with irregularities. Further, the filler mixed in the insulating layer 41 is exposed on the side wall of the through hole 42. For these reasons, it is difficult to form a plating film on the side wall of the through hole 42. In general, a plating film hardly adheres to the surface of a filler that is an inorganic substance. In particular, when AlN is exposed on the side wall of the through hole 42, it is difficult to form a plating film. Therefore, in this embodiment, the connection portion 43 is formed by a method using the electrolytic plating method.

更にまた、フィリングメッキを施すことにより貫通孔４２を埋め込む場合でも、上記したように貫通孔４２が浅く形成されることから、フィリングメッキを容易に行うことができる。   Furthermore, even when the through hole 42 is embedded by performing filling plating, the through hole 42 is shallowly formed as described above, so that the filling plating can be easily performed.

本形態では、上記した凸部１８と接続部４３とが接触する箇所を、絶縁層４１の厚み方向の中間部に位置させている。ここで、中間部とは、第1の配線層４０の上面より上方であり、第２の配線層４５の下面より下方であることを意味している。従って、紙面では、凸部１８と接続部４３とが接触する箇所は、絶縁層４１の厚み方向の中央部付近となっている。そして、この箇所は上記した中間部の範囲で変化させることができる。接続部４３をメッキ処理により形成することを考慮した場合、凸部１８と接続部４３とがコンタクトする部分は、第１の配線層４０の上面と、第２の配線層４５の下面の間において、その中間位置よりも上方に配置されることが好ましい。このことにより、メッキ膜から成る接続部４３の形成が容易になる利点がある。つまり、接続部４３を形成するために、貫通孔４２を形成するが、この貫通孔４２の深さを浅くできるからである。また、浅い分、貫通孔４２の径も小さくすることができる。更に、貫通孔４２の径が小さい分、貫通孔４２の間隔も狭めることができる。従って、全体的に微細パターンを実現でき、回路装置の小型化が可能となる。
In this embodiment, the place where the above-described convex portion 18 and the connection portion 43 are in contact is located in the middle portion of the insulating layer 41 in the thickness direction. Here, the intermediate portion means that it is above the upper surface of the first wiring layer 40 and below the lower surface of the second wiring layer 45. Therefore, on the paper surface, the portion where the convex portion 18 and the connection portion 43 are in contact is near the central portion in the thickness direction of the insulating layer 41. And this part can be changed in the range of the above-mentioned intermediate part. In consideration of forming the connection portion 43 by plating, the portion where the projection 18 and the connection portion 43 are in contact is between the upper surface of the first wiring layer 40 and the lower surface of the second wiring layer 45. , It is preferably arranged above the intermediate position. Thus, there is an advantage that the connection portion 43 made of a plating film can be easily formed. That is, the through hole 42 is formed in order to form the connection portion 43, but the depth of the through hole 42 can be reduced. In addition, the diameter of the through hole 42 can be reduced by the shallowness. Furthermore, since the diameter of the through hole 42 is small, the interval between the through holes 42 can be narrowed. Therefore, a fine pattern can be realized as a whole, and the circuit device can be miniaturized.

本発明の回路装置の製造方法を説明する（Ａ）断面図−（Ｃ）断面図である。It is (A) sectional drawing- (C) sectional drawing explaining the manufacturing method of the circuit apparatus of this invention. 本発明の回路装置の製造方法を説明する（Ａ）断面図−（Ｃ）断面図である。It is (A) sectional drawing- (C) sectional drawing explaining the manufacturing method of the circuit apparatus of this invention. 本発明の回路装置の製造方法を説明する（Ａ）断面図−（Ｃ）断面図である。It is (A) sectional drawing- (C) sectional drawing explaining the manufacturing method of the circuit apparatus of this invention. 本発明の回路装置の製造方法を説明する（Ａ）断面図−（Ｃ）断面図である。It is (A) sectional drawing- (C) sectional drawing explaining the manufacturing method of the circuit apparatus of this invention. 本発明の回路装置の製造方法を説明する（Ａ）断面図−（Ｃ）断面図である。It is (A) sectional drawing- (C) sectional drawing explaining the manufacturing method of the circuit apparatus of this invention. 本発明の回路装置の製造方法を説明する（Ａ）断面図−（Ｃ）断面図である。It is (A) sectional drawing- (C) sectional drawing explaining the manufacturing method of the circuit apparatus of this invention. 本発明の回路装置の製造方法を説明する（Ａ）断面図−（Ｃ）断面図である。It is (A) sectional drawing- (C) sectional drawing explaining the manufacturing method of the circuit apparatus of this invention. 本発明の回路装置の製造方法を説明する（Ａ）断面図、（Ｂ）断面図である。It is (A) sectional drawing explaining the manufacturing method of the circuit device of this invention, (B) sectional drawing. 従来の回路装置の製造方法を説明する（Ａ）断面図−（Ｃ）断面図である。It is (A) sectional drawing- (C) sectional drawing explaining the manufacturing method of the conventional circuit device.

符号の説明Explanation of symbols

１０ 回路装置
１１ 支持基板
１２ 接着剤
１３ 導電箔
１４ レジスト
１８ 凸部
２０Ａ 第１の導電パターン
２０Ｂ 第２の導電パターン
２５Ａ 第１の回路素子
２５Ｂ 第２の回路素子
２７ 金属細線
２８ 封止樹脂
２９ ソルダーレジスト
３０ 外部電極
３１ 樹脂封止体
３３ 第１の導電膜
３４ 第２の導電膜
４０ 第１の配線層
４０Ａ 第１の導電パターン
４０Ｂ 第２の導電パターン
４１ 絶縁層
４２ 貫通孔
４３ 接続部
４５ 第２の配線層
４６ 第１のメッキ膜
４７ 第２のメッキ膜
４８ メッキ膜
５０ ひさし
DESCRIPTION OF SYMBOLS 10 Circuit apparatus 11 Support substrate 12 Adhesive 13 Conductive foil 14 Resist 18 Protrusion 20A 1st conductive pattern 20B 2nd conductive pattern 25A 1st circuit element 25B 2nd circuit element 27 Metal fine wire 28 Sealing resin 29 Solder Resist 30 External electrode 31 Resin encapsulant 33 First conductive film 34 Second conductive film 40 First wiring layer 40A First conductive pattern 40B Second conductive pattern 41 Insulating layer 42 Through-hole 43 Connection 45 2 wiring layers 46 1st plating film 47 2nd plating film 48 plating film 50 eaves

Claims (8)

表面に導電箔が貼り付けられた支持基板を用意し、
凸状に成る様に前記導電箔をエッチングし、前記凸状に成った前記導電箔から成る凸部と前記凸部の周囲に前記凸部と一体となり、前記凸部の厚みよりも厚みが薄い導電箔を形成し、
前記凸部および前記凸部の周囲の前記薄い導電箔にレジストを形成し、更には前記薄い導電箔からなる導電パターンの形成領域に前記レジストを形成し、
前記レジストをマスクとして前記導電箔をエッチングし、前記支持基板には、前記薄い導電箔から成る第１の導電パターンと、前記凸部と前記凸部の周囲の前記薄い導電箔とが一体となった第２の導電パターンとを形成し、
前記第２の導電パターンの前記凸部に回路素子を固着し、前記回路素子と前記第１の導電パターンを電気的に接続し、
前記回路素子、第１の導電パターンおよび第２の導電パターンが被覆されるように前記支持基板の上面を封止樹脂で封止し、
前記第１の導電パターン、前記第２の導電パターンおよび前記封止樹脂の裏面を前記支持基板から分離することを特徴とする回路装置の製造方法。 Prepare a support substrate with conductive foil on the surface,
The conductive foil is etched so as to have a convex shape, and the convex portion made of the conductive foil having the convex shape is integrated with the convex portion around the convex portion, and the thickness is larger than the thickness of the convex portion. Forming a thin conductive foil ,
Forming a resist on the thin conductive foil around the convex portion and the convex portion, and further forming the resist in a conductive pattern forming region made of the thin conductive foil;
The conductive foil is etched using the resist as a mask, and the first conductive pattern made of the thin conductive foil and the thin conductive foil around the convex portion are integrated with the support substrate. Forming a second conductive pattern,
A circuit element is fixed to the convex portion of the second conductive pattern, the circuit element and the first conductive pattern are electrically connected,
Sealing the upper surface of the support substrate with a sealing resin so that the circuit element, the first conductive pattern and the second conductive pattern are covered;
A method of manufacturing a circuit device, wherein the first conductive pattern, the second conductive pattern, and the back surface of the sealing resin are separated from the support substrate. 表面に導電箔が貼り付けられた支持基板を用意し、
凸状に成る様に前記導電箔をエッチングし、前記凸状に成った前記導電箔から成る凸部と前記凸部の周囲に前記凸部と一体となり、前記凸部の厚みよりも厚みが薄い導電箔を形成し、
前記凸部および前記凸部の周囲の前記薄い導電箔にレジストを形成し、更には前記薄い導電箔からなる導電パターンの形成領域に前記レジストを形成し、
前記レジストをマスクとして前記導電箔をエッチングし、前記支持基板には、前記薄い導電箔から成る第１の導電パターンと、前記凸部と前記凸部の周囲の前記薄い導電箔とが一体となった第２の導電パターンとからなる第１の配線層を形成し、
絶縁層を介して前記第１の配線層の上に導電膜を積層し、
前記凸部と前記導電膜とを導通させる接続部を形成し、
前記導電膜をパターニングすることにより、第２の配線層を形成し、
前記第２の配線層と回路素子を電気的に接続し、
前記回路素子が被覆されるように前記支持基板の上面を封止樹脂で封止し、
前記第１の配線層および絶縁層の裏面を前記支持基板から分離することを特徴とする回路装置の製造方法。 Prepare a support substrate with conductive foil on the surface,
The conductive foil is etched to have a convex shape, and the convex portion made of the conductive foil having the convex shape is integrated with the convex portion around the convex portion, and is thinner than the thickness of the convex portion. Forming a conductive foil ,
Forming a resist on the thin conductive foil around the convex portion and the convex portion, and further forming the resist in a conductive pattern forming region made of the thin conductive foil;
Etching the conductive foil using the resist as a mask, the the supporting substrate includes a first conductive pattern composed of the thin conductive foil, and the thin conductive foil around the convex portion and the convex portion together Forming a first wiring layer comprising the second conductive pattern,
A conductive film is laminated on the first wiring layer via an insulating layer;
Forming a connecting portion for conducting the convex portion and the conductive film;
By patterning the conductive film, a second wiring layer is formed,
Electrically connecting the second wiring layer and the circuit element;
Sealing the upper surface of the support substrate with a sealing resin so that the circuit element is covered;
A method for manufacturing a circuit device, comprising: separating back surfaces of the first wiring layer and the insulating layer from the support substrate. 前記接続部は、前記導電膜を部分的に除去して前記絶縁層を露出させ、露出した前記絶縁層を除去することにより貫通孔を形成し、前記貫通孔にメッキ膜を形成することにより形成されることを特徴とする請求項２記載の回路装置の製造方法。   The connecting portion is formed by partially removing the conductive film to expose the insulating layer, removing the exposed insulating layer to form a through hole, and forming a plated film in the through hole. The method of manufacturing a circuit device according to claim 2, wherein: 前記メッキ膜は、無電解メッキ処理により前記貫通孔の側壁にメッキ膜を形成した後に、電解メッキ処理を行い、新たなメッキ膜を前記貫通孔に形成することにより形成されることを特徴とする請求項３記載の回路装置の製造方法。   The plating film is formed by forming a plating film on the side wall of the through hole by electroless plating and then performing electrolytic plating to form a new plating film in the through hole. A method for manufacturing a circuit device according to claim 3. 前記メッキ膜は、前記導電膜を電極として用いた電解メッキ処理を行うことにより、前記貫通孔の周辺部に位置する前記導電膜から前記貫通孔の内側に形成されることを特徴とする請求項３記載の回路装置の製造方法。   The plating film is formed inside the through hole from the conductive film located in a peripheral portion of the through hole by performing an electrolytic plating process using the conductive film as an electrode. 3. A method of manufacturing a circuit device according to 3. 前記導電膜から成るひさしを前記貫通孔の周辺部に形成し、
前記ひさしから前記貫通孔の内側に向けてメッキ膜を形成することを特徴とする請求項５記載の回路装置の製造方法。 Forming an eaves made of the conductive film around the through hole;
6. The method of manufacturing a circuit device according to claim 5, wherein a plating film is formed from the eaves toward the inside of the through hole. 前記絶縁層にはフィラーが混入されていることを特徴とする請求項２記載の回路装置の製造方法。   3. The method for manufacturing a circuit device according to claim 2, wherein a filler is mixed in the insulating layer. 前記支持基板と前記第１の配線層とは接着剤で貼着されており、前記接着剤を溶融することにより前記第１の配線層、前記絶縁層および前記封止樹脂の裏面は前記支持基板から分離されることを特徴とする請求項１または請求項２記載の回路装置の製造方法。   The support substrate and the first wiring layer are bonded with an adhesive, and the back surface of the first wiring layer, the insulating layer, and the sealing resin is formed by melting the adhesive. 3. The method of manufacturing a circuit device according to claim 1, wherein the circuit device is separated from the circuit device.
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