JP4571892B2 - 高分子試料分析装置 - Google Patents
高分子試料分析装置 Download PDFInfo
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- JP4571892B2 JP4571892B2 JP2005196597A JP2005196597A JP4571892B2 JP 4571892 B2 JP4571892 B2 JP 4571892B2 JP 2005196597 A JP2005196597 A JP 2005196597A JP 2005196597 A JP2005196597 A JP 2005196597A JP 4571892 B2 JP4571892 B2 JP 4571892B2
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- 229920000642 polymer Polymers 0.000 title claims description 54
- 239000007789 gas Substances 0.000 claims description 173
- 238000000926 separation method Methods 0.000 claims description 54
- 239000012159 carrier gas Substances 0.000 claims description 30
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- 239000010453 quartz Substances 0.000 claims description 14
- 230000001678 irradiating effect Effects 0.000 claims description 11
- 239000013307 optical fiber Substances 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 8
- 238000000354 decomposition reaction Methods 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 claims description 7
- 239000012071 phase Substances 0.000 description 81
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
- 239000002861 polymer material Substances 0.000 description 15
- 239000004793 Polystyrene Substances 0.000 description 12
- 229920002223 polystyrene Polymers 0.000 description 12
- WRMNZCZEMHIOCP-UHFFFAOYSA-N 2-phenylethanol Chemical compound OCCC1=CC=CC=C1 WRMNZCZEMHIOCP-UHFFFAOYSA-N 0.000 description 10
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 10
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 230000015556 catabolic process Effects 0.000 description 9
- 238000006731 degradation reaction Methods 0.000 description 9
- 238000001514 detection method Methods 0.000 description 9
- 230000006866 deterioration Effects 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 238000002347 injection Methods 0.000 description 9
- 239000007924 injection Substances 0.000 description 9
- 239000003507 refrigerant Substances 0.000 description 9
- 238000001819 mass spectrum Methods 0.000 description 8
- 239000001307 helium Substances 0.000 description 7
- 229910052734 helium Inorganic materials 0.000 description 7
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 5
- 238000009835 boiling Methods 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 239000003570 air Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 239000007857 degradation product Substances 0.000 description 2
- 239000007792 gaseous phase Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910052805 deuterium Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000010517 secondary reaction Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N17/00—Investigating resistance of materials to the weather, to corrosion, or to light
- G01N17/004—Investigating resistance of materials to the weather, to corrosion, or to light to light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/44—Resins; Plastics; Rubber; Leather
- G01N33/442—Resins; Plastics
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Biodiversity & Conservation Biology (AREA)
- Ecology (AREA)
- Environmental & Geological Engineering (AREA)
- Environmental Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
- Sampling And Sample Adjustment (AREA)
- Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)
Description
Claims (3)
- 複数の気相成分を生成する気相成分生成手段と、キャリヤガスを該気相成分生成手段に導入するキャリヤガス導入手段と、該気相成分を試料導入部を介して導入し、個々の成分に分離する分離手段と、該分離手段により分離された成分を検出する検出手段とを備える高分子試料分析装置において、
該気相成分生成手段内で上端部から試料容器が挿入可能とされ下端部は該試料導入部に接続されている石英管と、該気相成分生成手段内で該高分子試料に紫外線を照射する紫外線照射手段と、所定の雰囲気ガスを該気相成分生成手段に導入する雰囲気ガス導入手段と、該分離手段に導入されるガスを、該キャリヤガスと該雰囲気ガスとに切り替えるガス切替手段とを備え、
該紫外線照射手段は、光源と、光源から放射される光のうち波長400nm以下の紫外線のみを選択的に透過させる光学フィルターと、光学フィルターに接続された光ファイバーとを有し、該光ファイバーの先端部は、該石英管の上端部から所定の位置に挿入され、該試料容器内の該高分子試料に紫外線を照射するように構成され、
該雰囲気ガス導入手段から導入される所定のガス雰囲気下、該紫外線照射手段により紫外線を照射して該高分子試料を劣化分解させて複数の気相成分を生成すると共に、該高分子試料の劣化分解後に該ガス切替手段により該分離手段に導入されるガスを該雰囲気ガスから該キャリヤガスに切り替え、該気相成分を該キャリヤガスにより該分離手段に導入することを特徴とする高分子試料分析装置。 - 前記試料導入部から前記気相成分の一部を排出して、前記分離手段に導入される該気相成分の流量を調整する流量調整手段を備えることを特徴とする請求項1記載の高分子試料分析装置。
- 前記分離手段の前記試料導入部側で前記気相成分を濃縮する気相成分濃縮部と、該気相成分濃縮部で該気相成分を冷却する気相成分冷却手段とを備えることを特徴とする請求項1または請求項2記載の高分子試料分析装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005196597A JP4571892B2 (ja) | 2005-07-05 | 2005-07-05 | 高分子試料分析装置 |
US11/298,504 US7655185B2 (en) | 2005-07-05 | 2005-12-12 | Polymer sample analyzer |
EP06009451.3A EP1742035B1 (en) | 2005-07-05 | 2006-05-08 | Polymer sample analyzer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005196597A JP4571892B2 (ja) | 2005-07-05 | 2005-07-05 | 高分子試料分析装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007017196A JP2007017196A (ja) | 2007-01-25 |
JP4571892B2 true JP4571892B2 (ja) | 2010-10-27 |
Family
ID=36975264
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005196597A Active JP4571892B2 (ja) | 2005-07-05 | 2005-07-05 | 高分子試料分析装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7655185B2 (ja) |
EP (1) | EP1742035B1 (ja) |
JP (1) | JP4571892B2 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4717700B2 (ja) * | 2006-04-24 | 2011-07-06 | 三菱電機株式会社 | 高分子材料の劣化度の評価方法 |
JP4660799B2 (ja) * | 2007-10-04 | 2011-03-30 | フロンティア・ラボ株式会社 | 高分子試料分析装置 |
JP5087564B2 (ja) * | 2009-02-03 | 2012-12-05 | フロンティア・ラボ株式会社 | 気相成分分析装置 |
JP2010243225A (ja) * | 2009-04-02 | 2010-10-28 | Meidensha Corp | 絶縁材料劣化診断方法 |
JP2010243224A (ja) * | 2009-04-02 | 2010-10-28 | Meidensha Corp | 耐熱性ポリエステルワニス劣化診断方法 |
CZ305797B6 (cs) * | 2010-05-24 | 2016-03-16 | Labio A. S. | Zařízení pro měření spekter plynných látek nebo par v UV oblasti pod 190 nm v průtokovém uspořádání |
CN102226801B (zh) * | 2011-04-11 | 2014-07-02 | 浙江大学 | 采用微气室阵列分时联用技术的气体分析装置 |
EP2954300B1 (en) * | 2013-02-09 | 2021-10-13 | Elemental Scientific Lasers, LLC | In-chamber fluid handling system |
US10168308B2 (en) * | 2016-08-16 | 2019-01-01 | Frontier Laboratories Ltd. | Analysis device |
JP6590871B2 (ja) * | 2016-08-16 | 2019-10-16 | フロンティア・ラボ株式会社 | 分析装置 |
CN107490526B (zh) * | 2017-09-06 | 2023-08-22 | 中国工程物理研究院核物理与化学研究所 | 高分子材料老化效应无损检测装置及其检测方法 |
WO2024004611A1 (ja) * | 2022-06-27 | 2024-01-04 | 株式会社島津製作所 | 劣化促進試験装置、劣化促進試験用解析システムおよび劣化促進試験方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005164598A (ja) * | 2003-12-03 | 2005-06-23 | Atlas Material Testing Technology Llc | 材料の風化相関の特性把握のための方法と装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8900432A (nl) | 1989-02-22 | 1990-09-17 | Tno | Werkwijze voor het versneld vaststellen van fotodegradatie van kunststoffen. |
US5503032A (en) * | 1995-02-23 | 1996-04-02 | Atlas Electric Devices Co. | High accuracy weathering test machine |
JP3801355B2 (ja) | 1998-07-16 | 2006-07-26 | フロンティア・ラボ株式会社 | 未知試料検索方法、未知試料検索装置及び未知試料検索用記録媒体 |
-
2005
- 2005-07-05 JP JP2005196597A patent/JP4571892B2/ja active Active
- 2005-12-12 US US11/298,504 patent/US7655185B2/en active Active
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2006
- 2006-05-08 EP EP06009451.3A patent/EP1742035B1/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005164598A (ja) * | 2003-12-03 | 2005-06-23 | Atlas Material Testing Technology Llc | 材料の風化相関の特性把握のための方法と装置 |
Also Published As
Publication number | Publication date |
---|---|
EP1742035A1 (en) | 2007-01-10 |
EP1742035B1 (en) | 2015-07-01 |
US7655185B2 (en) | 2010-02-02 |
JP2007017196A (ja) | 2007-01-25 |
US20070009385A1 (en) | 2007-01-11 |
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