JP4557500B2 - フッ素系環状化合物 - Google Patents

フッ素系環状化合物 Download PDF

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Publication number
JP4557500B2
JP4557500B2 JP2003120921A JP2003120921A JP4557500B2 JP 4557500 B2 JP4557500 B2 JP 4557500B2 JP 2003120921 A JP2003120921 A JP 2003120921A JP 2003120921 A JP2003120921 A JP 2003120921A JP 4557500 B2 JP4557500 B2 JP 4557500B2
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JP
Japan
Prior art keywords
group
fluorine
compound
nmr
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003120921A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004323422A (ja
JP2004323422A5 (enExample
Inventor
治彦 小森谷
真一 角田
勝則 川村
悟 小林
覚 宮澤
一彦 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2003120921A priority Critical patent/JP4557500B2/ja
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to PCT/JP2004/004007 priority patent/WO2004096786A1/ja
Priority to KR1020057019871A priority patent/KR100756401B1/ko
Priority to US10/553,600 priority patent/US20060135744A1/en
Priority to KR1020077006877A priority patent/KR100756400B1/ko
Publication of JP2004323422A publication Critical patent/JP2004323422A/ja
Publication of JP2004323422A5 publication Critical patent/JP2004323422A5/ja
Priority to US11/941,433 priority patent/US7781602B2/en
Application granted granted Critical
Publication of JP4557500B2 publication Critical patent/JP4557500B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D307/93—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems condensed with a ring other than six-membered
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Furan Compounds (AREA)
  • Epoxy Compounds (AREA)
JP2003120921A 2003-04-25 2003-04-25 フッ素系環状化合物 Expired - Fee Related JP4557500B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2003120921A JP4557500B2 (ja) 2003-04-25 2003-04-25 フッ素系環状化合物
KR1020057019871A KR100756401B1 (ko) 2003-04-25 2004-03-24 함불소 환상화합물, 함불소 중합성 단량체, 함불소고분자화합물 및 이를 이용한 레지스트 재료 및 패턴형성방법
US10/553,600 US20060135744A1 (en) 2003-04-25 2004-03-24 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same
KR1020077006877A KR100756400B1 (ko) 2003-04-25 2004-03-24 함불소 환상화합물, 함불소 중합성 단량체, 함불소고분자화합물 및 이를 이용한 레지스트 재료 및 패턴형성방법
PCT/JP2004/004007 WO2004096786A1 (ja) 2003-04-25 2004-03-24 含フッ素環状化合物、含フッ素重合性単量体、含フッ素高分子化合物並びにそれを用いたレジスト材料及びパターン形成方法
US11/941,433 US7781602B2 (en) 2003-04-25 2007-11-16 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003120921A JP4557500B2 (ja) 2003-04-25 2003-04-25 フッ素系環状化合物

Publications (3)

Publication Number Publication Date
JP2004323422A JP2004323422A (ja) 2004-11-18
JP2004323422A5 JP2004323422A5 (enExample) 2007-11-08
JP4557500B2 true JP4557500B2 (ja) 2010-10-06

Family

ID=33410026

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003120921A Expired - Fee Related JP4557500B2 (ja) 2003-04-25 2003-04-25 フッ素系環状化合物

Country Status (4)

Country Link
US (1) US20060135744A1 (enExample)
JP (1) JP4557500B2 (enExample)
KR (2) KR100756400B1 (enExample)
WO (1) WO2004096786A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4235810B2 (ja) * 2003-10-23 2009-03-11 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
US20060194143A1 (en) * 2005-02-25 2006-08-31 Shinichi Sumida Fluorine-containing polymerizable monomers, fluorine-containing polymer compounds, resist compositions using the same, and patterning process
TWI332122B (en) 2005-04-06 2010-10-21 Shinetsu Chemical Co Novel sulfonate salts and derivatives, photoacid generators, resist compositions and patterning process
EP1780198B1 (en) 2005-10-31 2011-10-05 Shin-Etsu Chemical Co., Ltd. Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
EP1780199B1 (en) 2005-10-31 2012-02-01 Shin-Etsu Chemical Co., Ltd. Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
JP5124806B2 (ja) 2006-06-27 2013-01-23 信越化学工業株式会社 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
JP5124805B2 (ja) 2006-06-27 2013-01-23 信越化学工業株式会社 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
KR101035742B1 (ko) 2006-09-28 2011-05-20 신에쓰 가가꾸 고교 가부시끼가이샤 신규 광산 발생제 및 이것을 이용한 레지스트 재료 및 패턴형성 방법
US7568527B2 (en) * 2007-01-04 2009-08-04 Rock Well Petroleum, Inc. Method of collecting crude oil and crude oil collection header apparatus
US7543649B2 (en) * 2007-01-11 2009-06-09 Rock Well Petroleum Inc. Method of collecting crude oil and crude oil collection header apparatus
US7823662B2 (en) * 2007-06-20 2010-11-02 New Era Petroleum, Llc. Hydrocarbon recovery drill string apparatus, subterranean hydrocarbon recovery drilling methods, and subterranean hydrocarbon recovery methods
US7832483B2 (en) * 2008-01-23 2010-11-16 New Era Petroleum, Llc. Methods of recovering hydrocarbons from oil shale and sub-surface oil shale recovery arrangements for recovering hydrocarbons from oil shale
JP7140964B2 (ja) * 2017-06-05 2022-09-22 セントラル硝子株式会社 含フッ素単量体、含フッ素重合体およびそれを用いたパターン形成用組成物、並びにそのパターン形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3036091A (en) * 1958-12-24 1962-05-22 Du Pont Addition products of polyfluorocyclobutanones and a diene
US6949615B2 (en) * 2000-10-31 2005-09-27 Daicel Chemical Industries, Ltd. Monomer having electron-withdrawing group and process for preparing the same
JP4071021B2 (ja) * 2001-04-10 2008-04-02 信越化学工業株式会社 ラクトン構造を有する（メタ）アクリレート化合物、その重合体、レジスト材料及びパターン形成方法
JP4924783B2 (ja) * 2001-08-06 2012-04-25 昭和電工株式会社 脂環式化合物
EP1539690A4 (en) * 2002-08-09 2007-01-24 Du Pont FLUORINATED MONOMERS, FLUORATED POLYMERS WITH POLYCYCLIC GROUPS WITH ANNELATED 4-LOW HETEROCYCLIC RINGS SUITABLE FOR USE AS PHOTORESISTS, AND MICROLITHOGRAPHIC PROCESSES

Also Published As

Publication number Publication date
KR20070038581A (ko) 2007-04-10
US20060135744A1 (en) 2006-06-22
JP2004323422A (ja) 2004-11-18
KR20050123171A (ko) 2005-12-29
WO2004096786A1 (ja) 2004-11-11
KR100756401B1 (ko) 2007-09-10
KR100756400B1 (ko) 2007-09-11

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