JP2004323422A5 - - Google Patents

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Publication number
JP2004323422A5
JP2004323422A5 JP2003120921A JP2003120921A JP2004323422A5 JP 2004323422 A5 JP2004323422 A5 JP 2004323422A5 JP 2003120921 A JP2003120921 A JP 2003120921A JP 2003120921 A JP2003120921 A JP 2003120921A JP 2004323422 A5 JP2004323422 A5 JP 2004323422A5
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JP
Japan
Prior art keywords
group
compound
fluorine
nmr
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003120921A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004323422A (ja
JP4557500B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2003120921A external-priority patent/JP4557500B2/ja
Priority to JP2003120921A priority Critical patent/JP4557500B2/ja
Priority to KR1020077006877A priority patent/KR100756400B1/ko
Priority to KR1020057019871A priority patent/KR100756401B1/ko
Priority to PCT/JP2004/004007 priority patent/WO2004096786A1/ja
Priority to US10/553,600 priority patent/US20060135744A1/en
Publication of JP2004323422A publication Critical patent/JP2004323422A/ja
Publication of JP2004323422A5 publication Critical patent/JP2004323422A5/ja
Priority to US11/941,433 priority patent/US7781602B2/en
Publication of JP4557500B2 publication Critical patent/JP4557500B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003120921A 2003-04-25 2003-04-25 フッ素系環状化合物 Expired - Fee Related JP4557500B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2003120921A JP4557500B2 (ja) 2003-04-25 2003-04-25 フッ素系環状化合物
US10/553,600 US20060135744A1 (en) 2003-04-25 2004-03-24 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same
KR1020057019871A KR100756401B1 (ko) 2003-04-25 2004-03-24 함불소 환상화합물, 함불소 중합성 단량체, 함불소고분자화합물 및 이를 이용한 레지스트 재료 및 패턴형성방법
PCT/JP2004/004007 WO2004096786A1 (ja) 2003-04-25 2004-03-24 含フッ素環状化合物、含フッ素重合性単量体、含フッ素高分子化合物並びにそれを用いたレジスト材料及びパターン形成方法
KR1020077006877A KR100756400B1 (ko) 2003-04-25 2004-03-24 함불소 환상화합물, 함불소 중합성 단량체, 함불소고분자화합물 및 이를 이용한 레지스트 재료 및 패턴형성방법
US11/941,433 US7781602B2 (en) 2003-04-25 2007-11-16 Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003120921A JP4557500B2 (ja) 2003-04-25 2003-04-25 フッ素系環状化合物

Publications (3)

Publication Number Publication Date
JP2004323422A JP2004323422A (ja) 2004-11-18
JP2004323422A5 true JP2004323422A5 (enExample) 2007-11-08
JP4557500B2 JP4557500B2 (ja) 2010-10-06

Family

ID=33410026

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003120921A Expired - Fee Related JP4557500B2 (ja) 2003-04-25 2003-04-25 フッ素系環状化合物

Country Status (4)

Country Link
US (1) US20060135744A1 (enExample)
JP (1) JP4557500B2 (enExample)
KR (2) KR100756400B1 (enExample)
WO (1) WO2004096786A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4235810B2 (ja) * 2003-10-23 2009-03-11 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
US20060194143A1 (en) * 2005-02-25 2006-08-31 Shinichi Sumida Fluorine-containing polymerizable monomers, fluorine-containing polymer compounds, resist compositions using the same, and patterning process
TWI332122B (en) 2005-04-06 2010-10-21 Shinetsu Chemical Co Novel sulfonate salts and derivatives, photoacid generators, resist compositions and patterning process
EP1780199B1 (en) 2005-10-31 2012-02-01 Shin-Etsu Chemical Co., Ltd. Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
EP1780198B1 (en) 2005-10-31 2011-10-05 Shin-Etsu Chemical Co., Ltd. Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
JP5124805B2 (ja) 2006-06-27 2013-01-23 信越化学工業株式会社 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
JP5124806B2 (ja) 2006-06-27 2013-01-23 信越化学工業株式会社 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
US7527912B2 (en) 2006-09-28 2009-05-05 Shin-Etsu Chemical Co., Ltd. Photoacid generators, resist compositions, and patterning process
US7568527B2 (en) * 2007-01-04 2009-08-04 Rock Well Petroleum, Inc. Method of collecting crude oil and crude oil collection header apparatus
US7543649B2 (en) * 2007-01-11 2009-06-09 Rock Well Petroleum Inc. Method of collecting crude oil and crude oil collection header apparatus
US7823662B2 (en) * 2007-06-20 2010-11-02 New Era Petroleum, Llc. Hydrocarbon recovery drill string apparatus, subterranean hydrocarbon recovery drilling methods, and subterranean hydrocarbon recovery methods
US7832483B2 (en) * 2008-01-23 2010-11-16 New Era Petroleum, Llc. Methods of recovering hydrocarbons from oil shale and sub-surface oil shale recovery arrangements for recovering hydrocarbons from oil shale
JP7140964B2 (ja) * 2017-06-05 2022-09-22 セントラル硝子株式会社 含フッ素単量体、含フッ素重合体およびそれを用いたパターン形成用組成物、並びにそのパターン形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3036091A (en) * 1958-12-24 1962-05-22 Du Pont Addition products of polyfluorocyclobutanones and a diene
EP1331216A4 (en) * 2000-10-31 2005-12-07 Daicel Chem MONOMERS HAVING ELECTRON SUPPRESSOR GROUPS AND METHODS OF PREPARING THE SAME
JP4071021B2 (ja) * 2001-04-10 2008-04-02 信越化学工業株式会社 ラクトン構造を有する(メタ)アクリレート化合物、その重合体、レジスト材料及びパターン形成方法
JP4924783B2 (ja) * 2001-08-06 2012-04-25 昭和電工株式会社 脂環式化合物
CN1675179A (zh) * 2002-08-09 2005-09-28 E.I.内穆尔杜邦公司 用作光致抗蚀剂的具有稠合的4-元杂环的多环基团的氟化单体,氟化聚合物和用于微石印术的方法

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