JP4546198B2 - 光変調素子を利用したマスクレス露光装置、及び、光変調素子によるパターン生成性能の監視方法 - Google Patents

光変調素子を利用したマスクレス露光装置、及び、光変調素子によるパターン生成性能の監視方法 Download PDF

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Publication number
JP4546198B2
JP4546198B2 JP2004278223A JP2004278223A JP4546198B2 JP 4546198 B2 JP4546198 B2 JP 4546198B2 JP 2004278223 A JP2004278223 A JP 2004278223A JP 2004278223 A JP2004278223 A JP 2004278223A JP 4546198 B2 JP4546198 B2 JP 4546198B2
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JP
Japan
Prior art keywords
light
order
glv
exposure
diffracted light
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2004278223A
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English (en)
Japanese (ja)
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JP2006093460A5 (cg-RX-API-DMAC7.html
JP2006093460A (ja
Inventor
義之 関根
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004278223A priority Critical patent/JP4546198B2/ja
Priority to US11/233,593 priority patent/US7430036B2/en
Publication of JP2006093460A publication Critical patent/JP2006093460A/ja
Publication of JP2006093460A5 publication Critical patent/JP2006093460A5/ja
Application granted granted Critical
Publication of JP4546198B2 publication Critical patent/JP4546198B2/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004278223A 2004-09-24 2004-09-24 光変調素子を利用したマスクレス露光装置、及び、光変調素子によるパターン生成性能の監視方法 Expired - Fee Related JP4546198B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004278223A JP4546198B2 (ja) 2004-09-24 2004-09-24 光変調素子を利用したマスクレス露光装置、及び、光変調素子によるパターン生成性能の監視方法
US11/233,593 US7430036B2 (en) 2004-09-24 2005-09-22 Maskless exposure apparatus using optical modulator, and method for monitoring pattern generating performance by the optical modulator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004278223A JP4546198B2 (ja) 2004-09-24 2004-09-24 光変調素子を利用したマスクレス露光装置、及び、光変調素子によるパターン生成性能の監視方法

Publications (3)

Publication Number Publication Date
JP2006093460A JP2006093460A (ja) 2006-04-06
JP2006093460A5 JP2006093460A5 (cg-RX-API-DMAC7.html) 2007-10-11
JP4546198B2 true JP4546198B2 (ja) 2010-09-15

Family

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Family Applications (1)

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JP2004278223A Expired - Fee Related JP4546198B2 (ja) 2004-09-24 2004-09-24 光変調素子を利用したマスクレス露光装置、及び、光変調素子によるパターン生成性能の監視方法

Country Status (2)

Country Link
US (1) US7430036B2 (cg-RX-API-DMAC7.html)
JP (1) JP4546198B2 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8670029B2 (en) * 2010-06-16 2014-03-11 Microsoft Corporation Depth camera illuminator with superluminescent light-emitting diode
JP2018060001A (ja) * 2016-10-04 2018-04-12 東京エレクトロン株式会社 補助露光装置及び露光量分布取得方法
CN120447307A (zh) * 2025-04-29 2025-08-08 高峰 一种稀疏压缩重建ldi亚像素图像的处理方法、系统及应用

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3550861B2 (ja) * 1996-03-19 2004-08-04 松下電器産業株式会社 光偏向装置
US6335831B2 (en) * 1998-12-18 2002-01-01 Eastman Kodak Company Multilevel mechanical grating device
US6479811B1 (en) * 2000-03-06 2002-11-12 Eastman Kodak Company Method and system for calibrating a diffractive grating modulator
JP2004163652A (ja) * 2002-11-13 2004-06-10 Olympus Corp 光制御装置

Also Published As

Publication number Publication date
US20060066829A1 (en) 2006-03-30
JP2006093460A (ja) 2006-04-06
US7430036B2 (en) 2008-09-30

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