JP2006093460A5 - - Google Patents

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Publication number
JP2006093460A5
JP2006093460A5 JP2004278223A JP2004278223A JP2006093460A5 JP 2006093460 A5 JP2006093460 A5 JP 2006093460A5 JP 2004278223 A JP2004278223 A JP 2004278223A JP 2004278223 A JP2004278223 A JP 2004278223A JP 2006093460 A5 JP2006093460 A5 JP 2006093460A5
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JP
Japan
Prior art keywords
light
monitoring method
pattern
diffracted light
exposed
Prior art date
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Granted
Application number
JP2004278223A
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English (en)
Japanese (ja)
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JP4546198B2 (ja
JP2006093460A (ja
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Priority to JP2004278223A priority Critical patent/JP4546198B2/ja
Priority claimed from JP2004278223A external-priority patent/JP4546198B2/ja
Priority to US11/233,593 priority patent/US7430036B2/en
Publication of JP2006093460A publication Critical patent/JP2006093460A/ja
Publication of JP2006093460A5 publication Critical patent/JP2006093460A5/ja
Application granted granted Critical
Publication of JP4546198B2 publication Critical patent/JP4546198B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004278223A 2004-09-24 2004-09-24 光変調素子を利用したマスクレス露光装置、及び、光変調素子によるパターン生成性能の監視方法 Expired - Fee Related JP4546198B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004278223A JP4546198B2 (ja) 2004-09-24 2004-09-24 光変調素子を利用したマスクレス露光装置、及び、光変調素子によるパターン生成性能の監視方法
US11/233,593 US7430036B2 (en) 2004-09-24 2005-09-22 Maskless exposure apparatus using optical modulator, and method for monitoring pattern generating performance by the optical modulator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004278223A JP4546198B2 (ja) 2004-09-24 2004-09-24 光変調素子を利用したマスクレス露光装置、及び、光変調素子によるパターン生成性能の監視方法

Publications (3)

Publication Number Publication Date
JP2006093460A JP2006093460A (ja) 2006-04-06
JP2006093460A5 true JP2006093460A5 (cg-RX-API-DMAC7.html) 2007-10-11
JP4546198B2 JP4546198B2 (ja) 2010-09-15

Family

ID=36098653

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004278223A Expired - Fee Related JP4546198B2 (ja) 2004-09-24 2004-09-24 光変調素子を利用したマスクレス露光装置、及び、光変調素子によるパターン生成性能の監視方法

Country Status (2)

Country Link
US (1) US7430036B2 (cg-RX-API-DMAC7.html)
JP (1) JP4546198B2 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8670029B2 (en) * 2010-06-16 2014-03-11 Microsoft Corporation Depth camera illuminator with superluminescent light-emitting diode
JP2018060001A (ja) * 2016-10-04 2018-04-12 東京エレクトロン株式会社 補助露光装置及び露光量分布取得方法
CN120447307A (zh) * 2025-04-29 2025-08-08 高峰 一种稀疏压缩重建ldi亚像素图像的处理方法、系统及应用

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3550861B2 (ja) * 1996-03-19 2004-08-04 松下電器産業株式会社 光偏向装置
US6335831B2 (en) * 1998-12-18 2002-01-01 Eastman Kodak Company Multilevel mechanical grating device
US6479811B1 (en) * 2000-03-06 2002-11-12 Eastman Kodak Company Method and system for calibrating a diffractive grating modulator
JP2004163652A (ja) * 2002-11-13 2004-06-10 Olympus Corp 光制御装置

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