JPH118194A5 - - Google Patents

Info

Publication number
JPH118194A5
JPH118194A5 JP1998113907A JP11390798A JPH118194A5 JP H118194 A5 JPH118194 A5 JP H118194A5 JP 1998113907 A JP1998113907 A JP 1998113907A JP 11390798 A JP11390798 A JP 11390798A JP H118194 A5 JPH118194 A5 JP H118194A5
Authority
JP
Japan
Prior art keywords
exposure
substrate
energy
resist image
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998113907A
Other languages
English (en)
Japanese (ja)
Other versions
JPH118194A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10113907A priority Critical patent/JPH118194A/ja
Priority claimed from JP10113907A external-priority patent/JPH118194A/ja
Publication of JPH118194A publication Critical patent/JPH118194A/ja
Publication of JPH118194A5 publication Critical patent/JPH118194A5/ja
Pending legal-status Critical Current

Links

JP10113907A 1997-04-25 1998-04-23 露光条件測定方法、投影光学系の評価方法及びリソグラフィシステム Pending JPH118194A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10113907A JPH118194A (ja) 1997-04-25 1998-04-23 露光条件測定方法、投影光学系の評価方法及びリソグラフィシステム

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-109063 1997-04-25
JP10906397 1997-04-25
JP10113907A JPH118194A (ja) 1997-04-25 1998-04-23 露光条件測定方法、投影光学系の評価方法及びリソグラフィシステム

Publications (2)

Publication Number Publication Date
JPH118194A JPH118194A (ja) 1999-01-12
JPH118194A5 true JPH118194A5 (cg-RX-API-DMAC7.html) 2005-09-22

Family

ID=26448853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10113907A Pending JPH118194A (ja) 1997-04-25 1998-04-23 露光条件測定方法、投影光学系の評価方法及びリソグラフィシステム

Country Status (1)

Country Link
JP (1) JPH118194A (cg-RX-API-DMAC7.html)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002029870A1 (en) 2000-10-05 2002-04-11 Nikon Corporation Method of determining exposure conditions, exposure method, device producing method and recording medium
TW563178B (en) * 2001-05-07 2003-11-21 Nikon Corp Optical properties measurement method, exposure method, and device manufacturing method
WO2004090952A1 (ja) 2003-04-09 2004-10-21 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
TWI474132B (zh) 2003-10-28 2015-02-21 尼康股份有限公司 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
JP4786224B2 (ja) * 2005-03-30 2011-10-05 富士フイルム株式会社 投影ヘッドピント位置測定方法および露光方法
KR101544336B1 (ko) 2005-05-12 2015-08-12 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
KR20080059572A (ko) * 2005-10-07 2008-06-30 가부시키가이샤 니콘 광학 특성 계측 방법, 노광 방법 및 디바이스 제조 방법,그리고 검사 장치 및 계측 방법
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN102402126B (zh) * 2010-09-17 2014-07-16 中芯国际集成电路制造(北京)有限公司 一种用于检测光刻过程中照明条件的结构及其检测方法

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