JPH1022218A5 - - Google Patents

Info

Publication number
JPH1022218A5
JPH1022218A5 JP1996191559A JP19155996A JPH1022218A5 JP H1022218 A5 JPH1022218 A5 JP H1022218A5 JP 1996191559 A JP1996191559 A JP 1996191559A JP 19155996 A JP19155996 A JP 19155996A JP H1022218 A5 JPH1022218 A5 JP H1022218A5
Authority
JP
Japan
Prior art keywords
alignment marks
alignment
detection
positions
detected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996191559A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1022218A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8191559A priority Critical patent/JPH1022218A/ja
Priority claimed from JP8191559A external-priority patent/JPH1022218A/ja
Publication of JPH1022218A publication Critical patent/JPH1022218A/ja
Publication of JPH1022218A5 publication Critical patent/JPH1022218A5/ja
Pending legal-status Critical Current

Links

JP8191559A 1996-07-02 1996-07-02 基板のアライメント方法 Pending JPH1022218A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8191559A JPH1022218A (ja) 1996-07-02 1996-07-02 基板のアライメント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8191559A JPH1022218A (ja) 1996-07-02 1996-07-02 基板のアライメント方法

Publications (2)

Publication Number Publication Date
JPH1022218A JPH1022218A (ja) 1998-01-23
JPH1022218A5 true JPH1022218A5 (cg-RX-API-DMAC7.html) 2004-07-22

Family

ID=16276694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8191559A Pending JPH1022218A (ja) 1996-07-02 1996-07-02 基板のアライメント方法

Country Status (1)

Country Link
JP (1) JPH1022218A (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI596444B (zh) * 2006-08-31 2017-08-21 尼康股份有限公司 Exposure method and device, and device manufacturing method
NL2007215A (en) 2010-09-08 2012-03-12 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate.

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