JP4533025B2 - Electrodeposition abrasive tool manufacturing method and electrodeposition abrasive tool - Google Patents

Description

  The present invention relates to a method for manufacturing an electrodeposited abrasive tool and an electrodeposited abrasive tool.

As a tool for grinding or cutting a hard brittle material such as silicon, an electrodeposition abrasive tool in which abrasive grains made of diamond or the like are electrodeposited on a base material is used. In such an electrodeposition abrasive tool, from the viewpoint of extending the life of the tool, an abrasive having multi-layered pores so that the abrasive grain layer formed on the substrate has a thickness exceeding the grain size of the abrasive grain. An electrodeposited abrasive tool in which a grain layer is formed has been proposed. For example, Patent Document 1 describes an electrodeposition grindstone having a porous pore type electrodeposited abrasive grain layer formed by electrodepositing abrasive grains to an electrodeposition thickness of at least three times the abrasive grain size. .
Japanese Patent Laid-Open No. 60-80562 (FIG. 1)

However, when an abrasive grain layer having a multilayer structure as described above is actually formed, the abrasive grains easily peel off from the substrate, and the electrodeposition strength of the desired abrasive grains may not be obtained.
In view of such circumstances, the present invention intends to provide a method for producing an electrodeposited abrasive tool and an electrodeposited abrasive tool with improved electrodeposition strength of abrasive grains.

  The present invention is a method for manufacturing an abrasive electrodeposition tool for forming a plurality of abrasive layers by electrodepositing abrasive grains on a substrate in a plating solution containing abrasive grains having conductivity. A first abrasive layer forming step of forming the first abrasive layer by fixing the attached one abrasive grain by electrodeposition, and fixing the one abrasive grain adhered to the first abrasive layer by electrodeposition And a second abrasive layer forming step of forming a second abrasive layer.

With this configuration, conductive abrasive grains are used to form an abrasive grain layer having pores for each layer, and therefore, in each abrasive grain layer, a plating layer is formed on the surface of the abrasive grains. Thus, an abrasive electrodeposition tool having high electrodeposition strength of abrasive grains can be produced.
In this specification, the term “conductive abrasive” means that the abrasive itself is conductive, such as abrasive grains made of diamond semiconductor or the like, and abrasive grains coated with a metal film. Includes both conductive and conductive coatings.

In this case, a first plating tank and a second plating tank containing a plating solution are prepared, a first abrasive layer forming step is performed in the first plating tank, and a second abrasive layer formation is performed in the second plating tank. A process can be performed.
If it is this structure, in each plating tank, the same abrasive grain layer will be formed and an abrasive grain layer formation can be performed smoothly.

In this case, a plating tank containing a plating solution is prepared, and both the first abrasive layer forming process and the second abrasive layer forming process can be performed in the plating tank.
With this configuration, a plurality of abrasive grain layers can be formed in the same plating tank, and there is no need to prepare a plurality of plating tanks.

In this case, it is preferable to simultaneously perform the second abrasive layer forming step on the substrate on which the first abrasive layer has been previously formed while performing the first abrasive layer forming step on the substrate. is there.
If it is this structure, since each layer in a multilayer structure is simultaneously formed in a several base material, the efficiency which manufactures an electrodeposition abrasive grain tool can be made high.

And the abrasive electrodeposition tool manufactured by the manufacturing method of the abrasive electrodeposition tool of the present invention is, for example, an abrasive grain in which a plurality of abrasive layers having pores are formed by electrodepositing abrasive grains on a substrate. The electrodeposition tool is characterized in that all of the electrodeposited abrasive grains have a plating layer formed by electrodeposition on the surface of the abrasive grains.
If it is this structure, the electrodeposition intensity | strength of an abrasive grain will be strong and it will be a porous electrode type abrasive electrodeposition tool with a long lifetime.

  ADVANTAGE OF THE INVENTION According to the manufacturing method of the abrasive electrodeposition tool and abrasive electrodeposition tool by this invention, the electrodeposition intensity | strength of an abrasive grain is strong and it can provide the abrasive electrodeposition tool which has an abrasive grain layer with a long lifetime.

  Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

  Fig.1 (a) is a perspective view which shows the abrasive electrodeposition tool which concerns on this embodiment, FIG.1 (b) is the top view, FIG.1 (c) is sectional drawing in the AA line | wire. It is. As shown in FIGS. 1A to 1C, the abrasive electrodeposition tool 2 of this embodiment is a porous type abrasive in which a plurality of layers of abrasive grains are electrodeposited on the outer periphery of a disk-shaped substrate 4. The structure has a grain layer 6. The abrasive electrodeposition tool 2 of the present embodiment is provided with a shaft hole 8 at the center of a base material 4, and when used, the shaft hole 8 is fixed to the rotating shaft of a grinding machine to grind a high hardness brittle material such as silicon. It is designed to function as an abrasive wheel that can be processed. The base material 4 can be made of ordinary steel, stainless steel (SUS), carbon tool steel (SK), alloy tool steel (SKS, SKD, SKT), or high speed steel (SKH). In the present embodiment, the abrasive grain layer 6 is formed by electrodepositing synthetic diamond (SD) abrasive grains. In addition, the abrasive grains constituting the abrasive layer 6 are composed of natural diamond (D), metal-coated synthetic diamond (SDC), cubic boron nitride (CBN), and metal-coated cubic boron nitride (CBNC). I can do it. As the abrasive grains, coated abrasive grains coated with a metal film such as nickel or the like can be used. Alternatively, conductive abrasive grains made of a diamond semiconductor or the like can be applied even if they are not coated.

  FIG. 2 is an enlarged view showing the abrasive layer of the abrasive electrodeposition tool according to the embodiment of the present invention. The abrasive grain layer 6 according to this embodiment is composed of two layers, a first abrasive grain layer 10 and a second abrasive grain layer 12. The abrasive grains 10 of the first abrasive layer are electrodeposited on the surface of the substrate 4. The surfaces of the abrasive grains 14 of all the first abrasive grain layers are covered with the plating layer 16 of the first abrasive grain layer. The abrasive grains 18 of the second abrasive layer are electrodeposited on the abrasive grains 14 of the first abrasive layer. The surfaces of the abrasive grains 18 of all the second abrasive grain layers are covered with the plating layer 20 of the second abrasive grain layer. Pores 22 are formed between the abrasive grains. In the present embodiment, the plating layer 16 of the first abrasive layer and the plating layer 20 of the second abrasive layer are made of nickel. In addition, although the abrasive grain layer 6 which concerns on this embodiment is comprised from 2 layers, it is good also as what has a multilayered structure of 3 layers or more. More preferably, the total layer thickness of the abrasive layer 6 is 3 times or more of the average abrasive grain size of the abrasive grains, more preferably 6 times or more, and even more preferably 10 times or more. The life of the tool 2 can be extended.

  In the conventional manufacturing method, a porous-structured abrasive grain layer having a multilayer structure has been formed by electrodepositing all the layers of the abrasive grain layer covering multiple layers at once. Therefore, even when the electrodeposition of the abrasive grains was performed, only the abrasive grains of the last laminated abrasive layer were plated, and the abrasive grains of the abrasive layer on the side in contact with the substrate were hardly plated. Therefore, the electrodeposition strength of the abrasive grains is weak, and the life of the abrasive electrodeposition tool is short. On the other hand, the porous-hole type abrasive grain layer applied to the abrasive electrodeposition tool of the present embodiment is covered with a plating layer from the layer in contact with the base material to all the layers in the stacking direction. Therefore, the electrodeposition strength of the abrasive grains becomes strong, and the life of the abrasive electrodeposition tool becomes long. In the present embodiment, the abrasive grains are electrodeposited without using an adhesive or the like. Further, in order to increase the electrodeposition strength, a step of intentionally imparting fine irregularities to the surface of the abrasive grains is not performed.

  Hereinafter, the process of manufacturing the abrasive electrodeposition tool according to the present embodiment will be described. FIG. 3 is a view showing a plating apparatus used in the method for manufacturing an abrasive electrodeposition tool according to this embodiment. As shown in FIG. 3, the plating apparatus 24 includes a plating tank 26 that stores a plating solution 28. An electrode 32 for applying a voltage to the plating solution 28 is provided in the plating tank 26. A positive voltage is applied to the electrode 32 and acts as an anode. As the plating solution 28, for example, a mixed solution of nickel sulfamate, nickel chloride, boric acid or the like can be used. In the plating solution 28, abrasive grains 30 made of the above synthetic diamond or the like and coated with a metal film such as nickel are mixed.

  In the plating tank 26, the base material 4 for electrodepositing the abrasive grains 30 is arranged. A negative voltage is applied to the substrate 4 to act as a cathode. The base material 4 is configured to be rotatable in the plating solution 28 of the plating tank 26.

  Hereinafter, a method for electrodeposition of abrasive grains in the plating apparatus shown in FIG. 3 will be described. First, by stirring the plating solution 28, the abrasive grains 30 float in the plating solution 28. Next, after the stirring of the plating solution 28 is stopped, the abrasive grains 30 are slowly settled and fixed on the surface of the substrate 4. At this time, the abrasive grains can be fixed to the surface of the substrate 4 by one layer by appropriately adjusting the content of the abrasive grains 30 in the abrasive liquid 28.

  At this time, when a voltage is applied to the electrode 32 and the substrate 4, the fixed abrasive grains 30 are plated and fixed to the substrate 4. However, since the base material 4 has a disk shape, the abrasive grains 30 adhere only to the vicinity of the apex among the peripheral portions. When the abrasive grains 30 are fixed, the base material 4 is rotated about one-fifth of the circumference, and the abrasive grains 30 are sequentially attached to the unattached portions of the abrasive grains 30 of the base material 4 in the above process. At this time, since a current always flows through the base material 4, the plating layer is gradually thickened in the abrasive grains 30 already fixed to the base material 4 in the above-described process.

  When the substrate 4 rotates once, a single abrasive layer is formed on the entire periphery of the substrate 4. Then, when the substrate 4 is rotated one more time, a second abrasive layer is formed around the substrate 4 this time. In this way, by rotating the base material 4 while constantly passing an electric current through the base material 4, it is possible to form an abrasive layer having a multilayer structure on the base material 4.

  FIG. 4 is a diagram illustrating a method for manufacturing an abrasive electrodeposition tool according to an embodiment of the present invention. As shown in FIG. 4A, the abrasive grains 14 of the first abrasive layer adhere to the surface of the substrate 4. Next, as shown in FIG. 4B, a plating layer 16 of the first abrasive layer is formed on the surface of the abrasive grains 14 of the first abrasive layer attached to the substrate 4, and the first abrasive layer Abrasive grains 14 are electrodeposited. Next, as shown in FIG. 4C, the abrasive grains 18 of the second abrasive layer adhere to the abrasive grains 14 of the first abrasive grain layer. Next, as shown in FIG. 4D, a plating layer 20 of the second abrasive layer is formed on the surface of the abrasive grains 18 of the second abrasive layer, and the abrasive grains 18 of the second abrasive layer are electrodeposited. Is done. The gaps between the individual grains have a plating solution at this electrodeposition stage and are not pores in the plating process, but become pores when the substrate is taken out from the plating tank after the manufacturing process is completed. Unless the pores are intentionally excluded, the pores coexist naturally. If the pores are blocked, there is a possibility that the plating solution may remain, but there is no problem in the grinding, polishing, or cutting operation.

  In the method of the present embodiment, a multilayer abrasive layer is formed one layer at a time in this way, so that the layer on the surface of the abrasive grain from the layer in contact with the multilayer substrate to the layer laminated on the uppermost layer A plating layer is formed. Therefore, the electrodeposition strength of the abrasive grains is strong. In addition, although the example which laminates | stacks two layers, a 1st abrasive grain layer and a 2nd abrasive grain layer, on the base material 4 was shown in FIG. 4, the number of layers is not limited to two layers. For example, a multilayer structure of three or more layers is formed on a substrate, such as forming a third abrasive layer on the second abrasive layer and further forming a fourth abrasive layer on the third abrasive layer. Can do.

  When mass-producing an abrasive electrodeposition tool industrially, it can be performed as follows. FIG. 5 is a view showing the arrangement of the plating tank and the base material in the method for manufacturing an abrasive electrodeposition tool according to the embodiment of the present invention. In the present embodiment, a first plating tank 36 and a second plating tank 38 are prepared. Each plating tank is filled with a plating solution 28 containing abrasive grains 30 coated with a metal film.

  Then, the base material 4 is immersed in the first plating tank 36, and the base material 40 on which the first abrasive grain layer is previously formed is immersed in the second plating tank 38. In the two plating tanks, the first abrasive layer forming step and the second abrasive layer forming step are simultaneously performed in parallel. As a result, the base material 40 on which the first abrasive grain layer is formed is manufactured from the first plating tank 36, and the base material 42 on which the second abrasive grain layer is formed is manufactured from the second plating tank 38, respectively. .

  And the manufactured base material is sent to the plating tank which performs each next process, the base material 4 is again immersed in the 1st plating tank 36, and the 1st abrasive grain layer is formed in the 2nd plating tank 38. The base material 40 is immersed. And the base material in which the abrasive grain layer was formed in each plating tank is manufactured, and it moves again to the plating tank which performs the next process.

  In the manufacturing method of this embodiment, since each abrasive grain layer formation process is performed simultaneously in parallel in each plating tank, the abrasive grain layer of a multilayer structure can be formed efficiently. In the present embodiment, the number of plating tanks can be increased to 3 or more, and three or more abrasive grain layer forming steps can be simultaneously performed in parallel.

  FIG. 6 is a view showing the arrangement of the plating tank and the base material in the method for manufacturing an abrasive electrodeposition tool according to another embodiment of the present invention. In this embodiment, a large plating tank 44 capable of immersing a plurality of base materials is prepared. A plating solution 28 containing abrasive grains 30 coated with a metal film is placed in the large plating tank 44. In the plating solution 28, the base material 4 and the base material 40 on which the first abrasive layer has been previously formed are immersed. In the large plating tank 44, the first abrasive layer forming step is performed on the base material 4 in parallel with each other, and the second abrasive layer is formed on the base material 40 on which the first abrasive layer is formed. A process is performed. Thereafter, the base material 42 on which the second abrasive layer is formed is taken out from the large plating tank 44 and the base material 4 is newly immersed in the plating solution 28. Then, again, as described above, the first abrasive layer forming step and the second abrasive layer forming step are simultaneously performed in parallel in the large plating tank 44, whereby the abrasive layer of each layer is formed. In this embodiment, since all the abrasive layer forming steps are performed in one large plating tank, there is an advantage that it is not necessary to prepare a plurality of plating tanks.

Hereinafter, the result of actually manufacturing an abrasive wheel by the method of the present invention will be shown. A plating tank as shown in FIG. 3 was prepared, and an abrasive wheel was produced under the following conditions.
· Plating solution composition: sulfamic acid bath of nickel ^{sulfamate; 420ml / l (0.42m 3 /} m 3)
Nickel chloride; 15 g / l (15 kg / m ³ )
Boric acid; 35 g / l (35 kg / m ³ )
Energizing time: Always energized, total time 2 hoursVoltage: 1 V, current: 0.1 A (current density: 15 A / dm ² )
・ Stirring: 1 minute, Stirring stopped: 5 minutes ・ Abrasive grain size: 5 μm to 80 μm
-Thickness of one layer: 1 to 2 times the abrasive grain size, the total thickness of the abrasive grain layer is about 1 mm (plating layer: 3 to 10 μm)

  FIG. 7 is a photomicrograph of the abrasive layer of an actually produced abrasive electrodeposition tool, and FIG. 8 is a photomicrograph showing an enlarged view of the abrasive layer of the actually produced abrasive electrodeposition tool. is there. FIG. 9 is a photomicrograph showing the cross section of the abrasive layer of the actually produced abrasive electrodeposition tool, and FIG. 10 is an enlarged view of the cross section of the abrasive layer of the actually produced abrasive electrodeposition tool. It is a microscope picture shown. As can be seen from FIGS. 7 to 10, it can be seen that pores are formed in the abrasive layer having a multilayer structure. And when the abrasive grain of each layer was confirmed, it turned out that the plating layer is formed in all the abrasive grains.

  The method for producing an electrodeposited abrasive tool and the electrodeposited abrasive tool of the present invention are not limited to the above-described embodiments, and various modifications can be made without departing from the scope of the present invention. Of course.

(A) is a perspective view which shows the abrasive electrodeposition tool which concerns on this embodiment, (b) is the top view, (c) is sectional drawing in the AA line. It is an enlarged view which shows the abrasive grain layer of the abrasive grain electrodeposition tool which concerns on embodiment of this invention. It is a figure which shows the plating apparatus used with the manufacturing method of the abrasive electrodeposition tool which concerns on embodiment of this invention. It is a figure which shows the manufacturing method of the abrasive electrodeposition tool which concerns on embodiment of this invention. It is a figure which shows arrangement | positioning of the plating tank and a base material in the manufacturing method of the abrasive electrodeposition tool which concerns on embodiment of this invention. It is a figure which shows arrangement | positioning of the plating tank and a base material in the manufacturing method of the abrasive electrodeposition tool which concerns on another embodiment of this invention. It is a microscope picture of the abrasive grain layer of the abrasive electrodeposition tool actually manufactured. It is a microscope picture which expands and shows an abrasive grain layer of an actually manufactured abrasive electrodeposition tool. It is a microscope picture which shows the cross section of the abrasive grain layer of the abrasive electrodeposition tool actually manufactured. It is a microscope picture which expands and shows the cross section of the abrasive grain layer of the abrasive electrodeposition tool actually manufactured.

Explanation of symbols

DESCRIPTION OF SYMBOLS 2 ... Abrasive electrodeposition tool, 4 ... Base material, 6 ... Abrasive layer, 8 ... Shaft hole, 10 ... 1st abrasive layer, 12 ... 2nd abrasive layer, 14 ... Abrasive grain of 1st abrasive layer , 16 ... plating layer of the first abrasive grain layer, 18 ... abrasive grains of the second abrasive grain layer, 20 ... plating layer of the second abrasive grain layer, 22 ... pores, 24 ... plating machine, 26 ... plating tank, 28 ... A plating solution, 30 ... abrasive grains, 32 ... an electrode, 36 ... a first plating tank, 38 ... a second plating tank, 40 ... a base material on which a first abrasive grain layer is formed, 42 ... a second abrasive grain layer is formed. Base material, 44 ...

Claims (5)

In the plating solution containing conductive abrasive grains, the abrasive grains are electrodeposited on a base material, and a plurality of abrasive grain layers formed on the base material have a thickness exceeding the grain size of the abrasive grains as a whole. A method of manufacturing an abrasive electrodeposition tool for forming an abrasive layer of a layer,
After the abrasive grains are attached to the base material, the abrasive grains attached to the base material are fixed by electrodeposition so that a plating layer is formed by electrodeposition on all surfaces of the abrasive grains. A first abrasive layer forming step of forming a first abrasive layer,
The plating layer is formed by electrodeposition on the entire surface of the abrasive grains after the abrasive grains are further adhered to the first abrasive grain layer formed in the first abrasive grain layer forming step. A second abrasive layer forming step of forming the second abrasive layer by fixing the abrasive particles adhered to the first abrasive layer by electrodeposition;
Including
Prepare a plating tank containing the plating solution,
A method for producing an abrasive electrodeposition tool , wherein both the first abrasive layer forming step and the second abrasive layer forming step are performed in the plating tank . In the plating solution containing conductive abrasive grains, the abrasive grains are electrodeposited on a base material, and a plurality of abrasive grain layers formed on the base material have a thickness exceeding the grain size of the abrasive grains as a whole. A method of manufacturing an abrasive electrodeposition tool for forming an abrasive layer of a layer,
After the abrasive grains are attached to the base material, the abrasive grains attached to the base material are fixed by electrodeposition so that a plating layer is formed by electrodeposition on all surfaces of the abrasive grains. A first abrasive layer forming step of forming a first abrasive layer,
The plating layer is formed by electrodeposition on the entire surface of the abrasive grains after the abrasive grains are further adhered to the first abrasive grain layer formed in the first abrasive grain layer forming step. A second abrasive layer forming step of forming the second abrasive layer by fixing the abrasive particles adhered to the first abrasive layer by electrodeposition;
Including
Preparing a first plating tank and a second plating tank containing the plating solution;
In the first plating tank, the first abrasive layer forming step is performed,
In the second plating tank, the second abrasive layer forming step is performed.
A method for producing an abrasive electrodeposition tool. In the plating solution containing conductive abrasive grains, the abrasive grains are electrodeposited on a base material, and a plurality of abrasive grain layers formed on the base material have a thickness exceeding the grain size of the abrasive grains as a whole. A method of manufacturing an abrasive electrodeposition tool for forming an abrasive layer of a layer,
After the abrasive grains are attached to the base material, the abrasive grains attached to the base material are fixed by electrodeposition so that a plating layer is formed by electrodeposition on all surfaces of the abrasive grains. A first abrasive layer forming step of forming a first abrasive layer,
The plating layer is formed by electrodeposition on the entire surface of the abrasive grains after the abrasive grains are attached to the first abrasive grain layer formed in the first abrasive grain layer forming step. A second abrasive layer forming step of forming the second abrasive layer by fixing the abrasive particles adhered to the first abrasive layer by electrodeposition;
Including
While performing the first abrasive layer forming step on the base material, the second abrasive layer forming step is simultaneously performed in parallel on the base material on which the first abrasive layer is previously formed. A method for manufacturing an abrasive electrodeposition tool. While performing the first abrasive layer forming step on the base material, the second abrasive layer forming step is simultaneously performed in parallel on the base material on which the first abrasive layer is previously formed. The manufacturing method of the abrasive electrodeposition tool of Claim 1 or 2 . And abrasive grains to the substrate is an abrasive electrodeposited tool in which a plurality of abrasive grain layer is formed having pores is more increments electrodeposition,
All of the electrodeposited abrasive grains are formed by forming a plating layer by electrodeposition on the surface of the abrasive grains.

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