JP2007021668A - Electrodeposited abrasive tool and method of producing electrodeposited abrasive tool - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a means for enhancing the electrodeposition strength of abrasive grains and a filler. <P>SOLUTION: In production of an electrodeposited abrasive tool, the abrasive grains 14 and the conductive filler 21 of a first abrasive layer are bonded to a surface of a substrate 4, and a plated layer 16 of the first abrasive layer is formed on the entire surfaces of the abrasive grains 14 and the filler 21 of the first abrasive layer, that are bonded to the substrate 4, to thereby electrodeposit the abrasive grains 14 and the filler 21 of the first abrasive layer. Next, the abrasive grains 18 and the filler 21 of a second abrasive layer are bonded to the abrasive grains 14 of the first abrasive layer, and a plated layer 20 of the second abrasive layer is formed on the entire surfaces of the abrasive grains 18 and the filler 21 of the second abrasive layer, to thereby electrodeposit the abrasive grains 18 and the filler of the second abrasive layer. In production of the electrodeposited abrasive tool, the conductive filler is employed, and the abrasive layers of a multi-layer structure are formed layer by layer, which leads to enhance electrodeposition strength of the abrasive grains. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an electrodeposited abrasive tool and a method for producing an electrodeposited abrasive tool.

As a tool for grinding or cutting a hard brittle material such as silicon, an electrodeposition abrasive tool in which abrasive grains made of diamond or the like are electrodeposited on a base material is used. In an electrodeposited abrasive tool, from the viewpoint of extending the life of the tool, an abrasive layer having pores of a multilayer structure is formed so that the abrasive grain layer formed on the substrate has a thickness exceeding the grain size of the abrasive grain. It is formed. In a tool using such abrasive grains, it is known that sharpness is improved when the concentration of abrasive grains is low (see Non-Patent Documents 1 to 3). For this reason, in order to adjust the concentration of abrasive grains, there has been proposed an abrasive tool in which fillers and aggregates called fillers are mixed between abrasive grains and fixed to a base material (Patent Documents 1 to 3). reference).
Japanese Patent Laid-Open No. 11-216657 JP 2002-146344 A JP 2001-79769 A "Honing of fine ceramics (effect of grinding wheel concentration and grain size)", Journal of Precision Engineering, Precision Engineering Society, November 1986, Vol. 52, No. 11, p. 1889 "Study on abrasive wear of superabrasive wheels (1st report) Characteristics of excavated wear of resinoid bond wheels", Journal of Japan Society for Precision Engineering, Japan Society for Precision Engineering, March 2001, Vol. 67, No. 3, page 423 "Cylinder honing of various fine ceramics-Influence of grinding wheel concentration and particle size-", Japan Institute of Mechanical Engineers, Technical Research Institute, 1994, 1994, Case Supplement Special Machining Case No. 2414

  However, in the tool in which the abrasive grains are fixed to the base material by resin bond as in the above-mentioned Patent Document 1, the fixing strength of the abrasive grains is inferior. A tool fixed to the material is desired. However, as in Patent Documents 2 and 3, when a filler is mixed between abrasive grains and an abrasive layer having a multilayer structure is formed by electrodeposition, the abrasive grains and filler are easily peeled off from the substrate. The desired electrodeposition strength may not be obtained.

  In view of such circumstances, the present invention intends to provide means for increasing the electrodeposition strength of abrasive grains and fillers.

  The present invention is formed between a base material, conductive abrasive grains electrodeposited in multiple layers on the base material, conductive fillers dispersed between the abrasive grains, and abrasive grains and filler particles. An abrasive electrodeposition tool provided with a pore.

  According to this configuration, since the abrasive grains and the filler have conductivity, a plating layer is formed by electrodeposition on the surfaces of the abrasive grains and the filler, the electrodeposition strength of the abrasive grains and the filler is strong, Long air-hole type abrasive electrodeposition tool.

  In this specification, the term “conductive abrasive” means that the abrasive itself is conductive, such as abrasive grains made of diamond semiconductor or the like, and abrasive grains coated with a metal film. Includes both conductive and conductive coatings.

  In this case, the filler is preferably made of carbon fiber from the viewpoint of filler conductivity.

  Further, according to another aspect of the present invention, the first step in which conductive abrasive grains and conductive filler are dispersedly disposed on the base material and further adhered thereto, and the single abrasive grain adhered to the base material And the second step of forming the first abrasive layer by electrodeposition in the plating solution, and conductive abrasive particles and the conductive filler are dispersedly arranged in the first abrasive layer. A third step of depositing one layer, and a fourth step of forming the second abrasive layer by fixing the one layer of abrasive grains and the filler deposited on the first abrasive layer by electrodeposition in a plating solution. A method of manufacturing an abrasive electrodeposition tool is provided.

  If it is this structure, in order to form the abrasive grain layer which has a pore for every layer using the abrasive grain and filler which have electroconductivity, in each abrasive grain layer, the plating layer on the surface of an abrasive grain and a filler Thus, an abrasive electrodeposition tool having a high electrodeposition strength between the abrasive grains and the filler can be produced.

  According to the method for producing an abrasive electrodeposition tool and the abrasive electrodeposition tool according to the present invention, it is possible to provide an abrasive electrodeposition tool in which the electrodeposition strength of abrasive grains and filler is strong.

  Embodiments of the present invention will be described below with reference to the accompanying drawings.

  Fig.1 (a) is a perspective view which shows the abrasive electrodeposition tool which concerns on this embodiment, FIG.1 (b) is the top view, FIG.1 (c) is sectional drawing in the AA line | wire. It is. As shown in FIGS. 1A to 1C, the abrasive electrodeposition tool 2 of this embodiment is a porous type in which a plurality of layers of abrasive grains and fillers are electrodeposited on the outer periphery of a disk-shaped substrate 4. It is the structure which has the abrasive grain layer 6 of this. The abrasive electrodeposition tool 2 of the present embodiment is provided with a shaft hole 8 at the center of a base material 4, and when used, the shaft hole 8 is fixed to the rotating shaft of a grinding machine to grind a high hardness brittle material such as silicon. It is designed to function as an abrasive wheel that can be processed. The base material 4 can be made of ordinary steel, stainless steel (SUS), carbon tool steel (SK), alloy tool steel (SKS, SKD, SKT), or high speed steel (SKH).

  In this embodiment, the abrasive layer 6 is formed by electrodepositing synthetic diamond (SD) abrasive grains and a filler made of carbon fiber. In addition, the abrasive grains constituting the abrasive layer 6 are composed of natural diamond (D), metal-coated synthetic diamond (SDC), cubic boron nitride (CBN), and metal-coated cubic boron nitride (CBNC). I can do it. As the abrasive grains, coated abrasive grains coated with a metal film such as nickel or titanium and having conductivity can be used. Alternatively, conductive abrasive grains made of a diamond semiconductor or the like can be applied even if they are not coated.

  In the present embodiment, the filler is composed of carbon fibers (specific gravity 2.00 to 2.50). Instead of carbon fiber, organic conductive polymers such as conductive silicon rubber, polypyrrole, polythiophene, polyisothianaphthene, and polyethylenedioxythiophene (PEDOT) can also be used. The filler can be made of graphite particles. Alternatively, the filler may be a synthetic resin containing a metal. Further, the particle diameter of the filler is preferably 1 to 2 times the particle diameter of the abrasive grains.

  FIG. 2 is an enlarged view showing the abrasive layer of the abrasive electrodeposition tool according to the embodiment of the present invention. The abrasive grain layer 6 according to this embodiment is composed of two layers, a first abrasive grain layer 10 and a second abrasive grain layer 12. The abrasive grains 14 and fillers 21 of the first abrasive grain layer 10 are electrodeposited on the surface of the substrate 4. The surfaces of the abrasive grains 14 and the filler 21 of the first abrasive grain layer 10 are covered with the plating layer 16 of the first abrasive grain layer 10. On the abrasive grains 14 and filler 21 of the first abrasive grain layer 10, the abrasive grains 18 and filler 21 of the second abrasive grain layer 12 are electrodeposited. The surfaces of the abrasive grains 18 and the filler 21 of the second abrasive grain layer 12 are covered with the plating layer 20 of the second abrasive grain layer 12. Pores 22 are formed between the abrasive grains 14 and 18 and the filler 21 grains. In the present embodiment, the plating layer 16 of the first abrasive layer and the plating layer 20 of the second abrasive layer are made of nickel. In addition, although the abrasive grain layer 6 which concerns on this embodiment is comprised from 2 layers, it is good also as what has a multilayered structure of 3 layers or more. More preferably, the total layer thickness of the abrasive layer 6 is 3 times or more of the average abrasive grain size of the abrasive grains, more preferably 6 times or more, and even more preferably 10 times or more. The life of the tool 2 can be extended.

  In the conventional manufacturing method, a porous-hole type abrasive grain layer containing a filler having a multilayer structure is formed by electrodepositing all the layers of the abrasive grain layer covering the multilayer at once. In addition, a filler having no conductivity was used. Therefore, even when electrodeposition of abrasive grains and fillers is performed, only the abrasive grains and filler of the last laminated abrasive layer are plated, and the abrasive grains and filler of the abrasive layer on the side in contact with the substrate are hardly plated. It was. Therefore, the electrodeposition strength of the abrasive grains and the filler is weak, and the life of the abrasive electrodeposition tool is short. On the other hand, a porous-type abrasive grain layer containing a conductive filler applied to the abrasive electrodeposition tool of the present embodiment has a laminating direction from the layer in contact with the base material because both the abrasive grains and the filler are conductive. Abrasive grains and fillers are coated on the plated layer up to all the layers. Therefore, the electrodeposition strength of the abrasive grains and the filler is strong, and the life of the abrasive electrodeposition tool is also long. In the present embodiment, the abrasive grains are electrodeposited without using an adhesive or the like. Further, in order to increase the electrodeposition strength, a step of intentionally imparting fine irregularities to the surface of the abrasive grains is not performed.

  Since the filler has a very small hardness compared to abrasive diamonds, it has substantially the same function as pores, but unlike pores that differ by chance, it can adjust the concentration of abrasive grains and was in the work piece It can be the concentration of abrasive grains.

  Hereinafter, the process of manufacturing the abrasive electrodeposition tool according to the present embodiment will be described. FIG. 3 is a view showing a plating apparatus used in the method for manufacturing an abrasive electrodeposition tool according to this embodiment. As shown in FIG. 3, the plating apparatus 24 includes a plating tank 26 that stores a plating solution 28. An electrode 32 for applying a voltage to the plating solution 28 is provided in the plating tank 26. A positive voltage is applied to the electrode 32 and acts as an anode. As the plating solution 28, for example, a mixed solution of nickel sulfamate, nickel chloride, boric acid or the like can be used. In the plating solution 28, abrasive grains 30 made of the above synthetic diamond or the like and coated with a metal film such as nickel are mixed. Moreover, the filler 31 which consists of carbon fibers is also mixed.

  In the plating tank 26, the base material 4 for electrodepositing the abrasive grains 30 is arranged. A negative voltage is applied to the substrate 4 to act as a cathode. The base material 4 is configured to be rotatable in the plating solution 28 of the plating tank 26.

  Hereinafter, a method for electrodeposition of abrasive grains in the plating apparatus shown in FIG. 3 will be described. First, by stirring the plating solution 28, the abrasive grains 30 and the filler 31 float in the plating solution 28. Next, after the stirring of the plating solution 28 is stopped, the abrasive grains 30 and the filler 31 are slowly settled and fixed on the surface of the substrate 4. At this time, by appropriately adjusting the contents of the abrasive grains 30 and fillers 31 in the abrasive liquid 28, the abrasive grains can be fixed on the surface of the base material 4 only, and the concentration of the abrasive grains is also adjusted. can do.

  At this time, when a voltage is applied to the electrode 32 and the base material 4, the fixed abrasive grains 30 and the filler 31 are plated and fixed to the base material 4. However, since the base material 4 has a disk shape, the abrasive grains 30 and the filler 31 are attached only to the vicinity of the apex among the peripheral portions. When the abrasive grains 30 and the filler 31 are fixed, the base material 4 is rotated about a fraction of the circumference, and the abrasive grains 30 and the filler are applied to the unattached portions of the abrasive grains 30 and the filler 31 of the base material 4 in the above process. 31 are sequentially deposited. At this time, since a current always flows through the base material 4, the plating layer gradually becomes thicker in the abrasive grains 30 and the fillers 31 already fixed to the base material 4 in the above process.

  When the substrate 4 rotates once, a single abrasive layer is formed on the entire periphery of the substrate 4. Then, when the substrate 4 is rotated one more time, a second abrasive layer is formed around the substrate 4 this time. In this way, by rotating the base material 4 while constantly passing an electric current through the base material 4, it is possible to form an abrasive layer having a multilayer structure on the base material 4.

  FIG. 4 is a diagram illustrating a method for manufacturing an abrasive electrodeposition tool according to an embodiment of the present invention. As shown in FIG. 4A, the abrasive grains 14 and the filler 21 of the first abrasive grain layer adhere to the surface of the substrate 4. Next, as shown in FIG. 4B, a plating layer 16 of the first abrasive layer is formed on the surface of the abrasive grains 14 and the filler 21 of the first abrasive layer adhering to the base material 4, and the first abrasive The grain layer abrasive grains 14 and filler 21 are electrodeposited. Next, as shown in FIG. 4C, the abrasive grains 18 of the second abrasive layer adhere to the abrasive grains 14 and the filler 21 of the first abrasive grain layer. Next, as shown in FIG. 4 (d), the plating layer 20 of the second abrasive layer is formed on the surface of the abrasive grains 18 of the second abrasive layer and the filler 21, and the abrasive grains 18 of the second abrasive layer. And the filler 21 are electrodeposited. The gaps between the individual grains have a plating solution at this electrodeposition stage and are not pores in the plating process, but become pores when the substrate is taken out from the plating tank after the manufacturing process is completed. Unless the pores are intentionally excluded, the pores coexist naturally. If the pores are blocked, there is a possibility that the plating solution may remain, but there is no problem in the grinding, polishing, or cutting operation.

  In the method of the present embodiment, the multilayer abrasive layer is formed one layer at a time in this way, so that the layer on the surface of the abrasive grain from the layer in contact with the multilayer substrate to the layer laminated on the uppermost layer is formed. A plating layer is formed. Therefore, the electrodeposition strength of the abrasive grains and the filler is strong. In addition, although the example which laminates | stacks two layers, a 1st abrasive grain layer and a 2nd abrasive grain layer, on the base material 4 was shown in FIG. 4, the number of layers is not limited to two layers. For example, a multilayer structure of three or more layers is formed on a substrate, such as forming a third abrasive layer on the second abrasive layer and further forming a fourth abrasive layer on the third abrasive layer. Can do.

  When mass-producing an abrasive electrodeposition tool industrially, it can be performed as follows. FIG. 5 is a view showing the arrangement of the plating tank and the base material in the method for manufacturing an abrasive electrodeposition tool according to the embodiment of the present invention. In the present embodiment, a first plating tank 36 and a second plating tank 38 are prepared. In each plating tank, a plating solution 28 containing abrasive grains 30 coated with a metal film and a filler 31 made of carbon fiber is placed.

  Then, the base material 4 is immersed in the first plating tank 36, and the base material 40 on which the first abrasive grain layer is previously formed is immersed in the second plating tank 38. In the two plating tanks, the first abrasive layer forming step and the second abrasive layer forming step are simultaneously performed in parallel. As a result, the base material 40 on which the first abrasive grain layer is formed is manufactured from the first plating tank 36, and the base material 42 on which the second abrasive grain layer is formed is manufactured from the second plating tank 38, respectively. .

  And the manufactured base material is sent to the plating tank which performs each next process, respectively, the base material 4 is again immersed in the 1st plating tank 36, and the 1st abrasive grain layer is formed in the 2nd plating tank 38. The base material 40 is immersed. And the base material in which the abrasive grain layer was formed in each plating tank is manufactured, and it moves again to the plating tank which performs the next process.

  In the manufacturing method of this embodiment, since each abrasive grain layer formation process is performed simultaneously in parallel in each plating tank, the abrasive grain layer of a multilayer structure can be formed efficiently. In the present embodiment, the number of plating tanks can be increased to 3 or more, and three or more abrasive grain layer forming steps can be simultaneously performed in parallel.

  FIG. 6 is a view showing the arrangement of the plating tank and the base material in the method for manufacturing an abrasive electrodeposition tool according to another embodiment of the present invention. In this embodiment, a large plating tank 44 capable of immersing a plurality of base materials is prepared. A plating solution 28 containing abrasive grains 30 coated with a metal film and a filler 31 made of carbon fiber is placed in the large plating tank 44. In the plating solution 28, the base material 4 and the base material 40 on which the first abrasive grain layer has been previously formed are immersed. Then, in the large plating tank 44, the first abrasive layer forming step is performed on the base 4 in parallel and the second abrasive layer is formed on the base 40 on which the first abrasive layer is formed. A process is performed. Thereafter, the base material 42 on which the second abrasive layer is formed is taken out from the large plating tank 44, and the base material 4 is newly immersed in the plating solution 28. Then, again, as described above, the first abrasive layer forming step and the second abrasive layer forming step are simultaneously performed in parallel in the large plating tank 44, whereby the abrasive layer of each layer is formed. In this embodiment, since all the abrasive layer forming steps are performed in one large plating tank, there is an advantage that it is not necessary to prepare a plurality of plating tanks.

  The electrodeposition abrasive tool and the electrodeposition abrasive tool manufacturing method of the present invention are not limited to the above-described embodiments, and various modifications can be made without departing from the scope of the present invention. Of course.

(A) is a perspective view which shows the abrasive electrodeposition tool which concerns on this embodiment, (b) is the top view, (c) is sectional drawing in the AA line. It is an enlarged view which shows the abrasive grain layer of the abrasive grain electrodeposition tool which concerns on embodiment of this invention. It is a figure which shows the plating apparatus used with the manufacturing method of the abrasive electrodeposition tool which concerns on embodiment of this invention. It is a figure which shows the manufacturing method of the abrasive electrodeposition tool which concerns on embodiment of this invention. It is a figure which shows arrangement | positioning of the plating tank and a base material in the manufacturing method of the abrasive electrodeposition tool which concerns on embodiment of this invention. It is a figure which shows arrangement | positioning of the plating tank and a base material in the manufacturing method of the abrasive electrodeposition tool which concerns on another embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 2 ... Abrasive electrodeposition tool, 4 ... Base material, 6 ... Abrasive layer, 8 ... Shaft hole, 10 ... 1st abrasive layer, 12 ... 2nd abrasive layer, 14 ... Abrasive grain of 1st abrasive layer , 16 ... plating layer of the first abrasive grain layer, 18 ... abrasive grains of the second abrasive grain layer, 20 ... plating layer of the second abrasive grain layer, 21 ... filler, 22 ... pores, 24 ... plating machine, 26 ... plating Tank, 28 ... plating solution, 30 ... abrasive, 31 ... filler, 32 ... electrode, 36 ... first plating tank, 38 ... second plating tank, 40 ... base material on which first abrasive layer is formed, 42 ... Base material on which second abrasive layer is formed, 44.

Claims (3)

A substrate;
Conductive abrasive grains electrodeposited in multiple layers on the substrate;
Conductive fillers distributed between the abrasive grains, and
Pores formed between the abrasive grains and the filler grains;
Abrasive electrodeposition tool with   The abrasive tool according to claim 1, wherein the filler is made of carbon fiber. A first step in which conductive abrasive grains and a conductive filler are dispersedly disposed on the base material and are further adhered;
A second step of forming a first abrasive layer by fixing the single layer of abrasive grains and filler adhered to the substrate by electrodeposition in a plating solution;
A third step in which conductive abrasive grains and conductive filler are dispersedly disposed on the first abrasive grain layer, and are further adhered;
A fourth step of forming a second abrasive layer by fixing the single abrasive layer and filler adhered to the first abrasive layer by plating in a plating solution;
A method for manufacturing an abrasive electrodeposition tool comprising:

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