JP4520543B2 - Wiring member for electrical inspection and manufacturing method thereof - Google Patents

Wiring member for electrical inspection and manufacturing method thereof Download PDF

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Publication number
JP4520543B2
JP4520543B2 JP22046398A JP22046398A JP4520543B2 JP 4520543 B2 JP4520543 B2 JP 4520543B2 JP 22046398 A JP22046398 A JP 22046398A JP 22046398 A JP22046398 A JP 22046398A JP 4520543 B2 JP4520543 B2 JP 4520543B2
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Japan
Prior art keywords
hole
contact terminal
wiring member
terminal portion
electrical inspection
Prior art date
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Expired - Fee Related
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JP22046398A
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Japanese (ja)
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JP2000058605A (en
Inventor
英博 中村
良明 坪松
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Showa Denko Materials Co Ltd
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Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
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Priority to JP22046398A priority Critical patent/JP4520543B2/en
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Description

【0001】
【発明の属する技術分野】
本発明は、プリント基板、集積回路用基板、液晶表示基板、半導体パッケージ用基板(半導体チップ搭載用基板、フリップチップ用基板)などの高密度配線基板や、半導体、各種パッケージにおける導通抵抗検査、バーンインテストをはじめとする接触導通を要する電気的検査用に使用される電気的検査用配線部材とその製造法に関する。
【0002】
【従来の技術】
プリント基板上への電子部品実装密度が増大しており、このため実装部の相互配線間隔が縮小している。相互結線が確保できるようにする微細配線化および多層化技術が進むに伴い、これら配線形成技術を駆使して、半導体実装基板によるパッケージの小型化が図られている。例えばシリコン基板上に半導体素子が集積回路化されたベアチップを、これまでリードフレームに実装封止して、挿入部品もしくは面実装部品としてきた。このようなパッケージでは、実装密度が向上しないため、ベアチップを複数個、ひとつの基板にワイヤボンド接続またはTAB接続あるいはCCB接続し封止後、リードフレームに実装して機能化するMCMが注目された。しかし、近年ではベアチップの外形寸法に限りなく、パッケージサイズを近づけるCSP技術が台頭している。このようなパッケージは、2次元アレイ状に配置されたはんだボールをはじめとする二次接続用電極が形成されている。このようなパッケージは、初期不良テストのため125℃および通電でバーンインテストが必要である。このため、高温でも、酸化皮膜を作らず、導電性の良い検査用端子および安価な検査用部材が望まれている。
【0003】
【発明が解決しようとする課題】
本発明は、プリント基板、集積回路用基板、液晶表示基板、半導体パッケージ用基板(半導体チップ搭載用基板、フリップチップ用基板)などの高密度配線基板や、半導体、各種パッケージにおける導通抵抗検査、バーンインテストをはじめとする接触導通を要する電気的検査用に使用される接触信頼性に優れる電気的検査用配線部材及びその安価な製造法を提供するものである。
【0004】
【課題を解決するための手段】
本発明の電気的検査用配線部材は、被検査部品の外部端子のガイドとなる貫通孔を有す絶縁基板、前記絶縁基板の被検査部品が対向する面の反対面であって前記貫通孔の箇所に設けられた被検査部品外部端子が接触する接触端子部、前記接触端子部の展開配線を備え、接触端子部には、被検査部品外部端子が直接接触する多角形の角部が構成されている。このような角部は、接触端子部に多角形でかつ各頂点の角度が鈍角および鋭角にエッチングされた構造の貫通孔を設けて形成することができる。これにより、ワイピング効果が得られる。接触端子部の貫通孔が多角形の星形状の孔であると好ましい
【0005】
発明の電気的検査用配線部材の製造法は、絶縁基板の片面に金属層を備える回路形成材料を準備する工程、前記金属層にエッチングにより被検査部品外部端子が直接接触するよう多角形の角部が構成されている第一の穴群を形成する工程、前記金属層に形成された第一の穴群の各穴を含む接触端子部を形成する工程、絶縁基板を金属層を有しない側から、第一の穴群の各穴に対向して所定形状の第二の穴群を形成する工程を備えることができる。
【0006】
【発明の実施の形態】
図面に基づいて本発明の実施例を説明する。図1は、本発明の電気的検査用配線部材の一実施例を示すもので、1は被検査部品2の外部端子3のガイドとなる貫通孔4を有す絶縁基板、5は接触端子部である。図2は図1の電気的検査用配線部材の下方からみた平面図で、6は展開配線である。図3は、接触端子部には、被検査部品外部端子が接触する角部7を構成するように、貫通孔8を設けた配線部材である。参考例の図4は、接触端子部に角部7を構成するように、接触端子部に円形の貫通孔を設けて場合の、絶縁基板の貫通孔との位置関係を示す平面図であり、5が接触端子部、4が絶縁基板の貫通孔、8が接触端子部に設けた円形の貫通孔である。図5は、接触端子部に角部7を構成するように、接触端子部に多角形の貫通孔を設けた場合の、絶縁基板の貫通孔との位置関係を示す平面図であり、5が接触端子部、4が絶縁基板の貫通孔、8が接触端子部設けた多角形の貫通孔である。
【0007】
本発明の電気的検査用配線部材の製造法を説明する。図6に示す絶縁基板1の片面に金属層を備える回路形成材料を準備する。9で示す金属層の18μmの電解銅箔または圧延銅箔が、1で示すポリイミド、あるいはガラス/エポキシ積層板等の絶縁材料上に形成された基板を用いる。銅箔は、絶縁材料との接続界面が粗化処理されていることがのぞましい。粗化の程度を、一般に広く知られるJIS表面粗さ(B0601)に基づく粗さパラメータであらわすと、中心線平均粗さRaでは、0.05〜5μm、最大粗さRtでは1から5μmの範囲がよい。また、パラメータ表記はできないが、このような一次粗化に2次粗化をした銅箔を用いてもよい。
【0008】
図7に前記金属層9にエッチングにより所定形状の第一の穴群を形成する工程を示す。基材の銅表面に、レジストフィルムをラミネートし、露光・現像してレジスト10を形成する。このときに形成する第一の穴部のレジスト像の例を図8に示す。こののち、主成分が塩化第二鉄、塩化第二銅のエッチング液、あるいはアルカリエッチング液たとえばメルストリップ社製Aプロセス液でエッチングし第一の穴部11を形成する。
【0009】
図9に前記金属層に形成された第一の穴群の各穴11含む電極部(接触端子部)を形成する工程を示す。第一の穴11群を形成した基材の銅表面にレジストフィルムをラミネートし、露光・現像してレジスト12を形成する。レジスト12は図10に示すように第一の穴群の各穴11を含む電極部(接触端子部)となるように形成する。こののち、主成分が塩化第二鉄、塩化第二銅のエッチング液、あるいはアルカリエッチング液たとえばメルストリップ社製Aプロセス液でエッチングする。これにより第一の穴群の各穴を含む電極部(接触端子部5)を形成する。
【0010】
図11に絶縁基板を金属層を有しない側から、第一の穴群の各穴に対向して所定形状の第二の穴13群を形成する工程を示す。銅層を有しない側から絶縁層を炭酸ガスレーザ、YAGまたはエキシマレーザあるいは絶縁材料がポリイミドである場合、エッチング可能な薬液で穴明けする。もしくは、絶縁材料が感光性で露光・現像可能なものであれば露光・現像により行うことができる。第二の穴13群は、被検査部品2の外部端子3のガイドとなる貫通孔4となる。第一、第二の穴および電極配線外形の位置関係は、第二の穴外形が第一の穴の最外形より小さくても第一の穴を内包していてもよい。第一の穴群の各穴形状が、多角形でかつ各頂点の角度が鈍角および鋭角にエッチングされた構造であることができる。
【0011】
次に金属層の表面に、少なくともニッケル、またはニッケルおよび金を電解または無電解めっきした後、ロジウムを望ましくは電解、または無電解めっきする。例えばロジウムめっきとして、日本エレクトロプレーテイング・エンジニヤーズ株式会社製厚付け用低応力ロジウムめっき液を使用して、電解ロジウムをめっきする。条件は、例えば液温50〜60℃、電流密度2A/dm 電圧4V、時間150秒である。これにより被検査部品電極部の酸化皮膜を破壊して低抵抗の接触ができる。
【0012】
【発明の効果】
本発明の電気的検査用配線部材は、例えば配線層の下にエラストマを接触させ、絶縁基板側から被検査部品外部接続端子であるパッケージのはんだボール端子を接触させたとき、はんだボールと引き回し配線との接触を防止できる。接触端子部に被検査部品外部端子が接触する角部が構成されているので、ワイピング(微少な摺動)ではんだボールの酸化膜を破壊し、低抵抗で確実な接触テストを可能にする。
【0013】
このようにボール(被検査部品外部接続端子)をバーンインボード(電気的検査用配線部材)に向けて接触させる方向に、配線の支持となる絶縁層がある。このため、配線の保護となり、ボールは電極間の配線とショートすることなく、電極(接触端子部)と接触させることができる。また、電極(接触端子部)に第1の穴(貫通孔)を設けた場合、特に多角形の星形状の穴をあけておくと、その先端が、はんだボールの酸化膜をべたの場合に比べて、ワイピングというこすれ現象でさらに、有効に酸化皮膜を破り、繰り返しのテストに優れる。また、配線は、一層内に形成するため、安価である。配線側から、エラストマをあてて使用すると、第一の穴(接触端子部の貫通孔)の星状の角部がボールを多点で接触するため、ボール高さばらつきの吸収を助ける。
【図面の簡単な説明】
【図1】 本発明の電気的検査用配線部材の一実施例を示す断面図。
【図2】 図1の電気的検査用配線部材の下方からみた平面図。
【図3】 本発明の電気的検査用配線部材の他の一実施例を示す断面図。
【図4】 接触端子部に円形の貫通孔を設けた場合の、絶縁基板の貫通孔との位置関係を示す参考平面図。
【図5】 接触端子部に多角形の貫通孔を設けた場合の、絶縁基板の貫通孔との位置関係を示す平面図。
【図6】 回路形成材料の断面図。
【図7】 金属層9に第一の穴11群を形成する工程を示す断面図。
【図8】 図7の配線部材の下方からみた平面図。
【図9】 金属層9に電極部(接触端子部)5を形成する工程を示す断面図。
【図10】 図9の配線部材の下方からみた平面図。
【図11】 本発明の配線部材の他の一実施例を示す断面図。
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a high-density wiring substrate such as a printed circuit board, an integrated circuit substrate, a liquid crystal display substrate, a semiconductor package substrate (a semiconductor chip mounting substrate, a flip chip substrate), a conduction resistance test, and a burn-in in semiconductors and various packages. The present invention relates to a wiring member for electrical inspection used for electrical inspection requiring contact conduction such as a test and a manufacturing method thereof.
[0002]
[Prior art]
The mounting density of electronic components on a printed circuit board has increased, and as a result, the mutual wiring interval of the mounting portion has been reduced. As micro wiring and multi-layer technology for ensuring mutual connection are advanced, miniaturization of a package using a semiconductor mounting substrate is attempted by making full use of these wiring forming technologies. For example, a bare chip in which a semiconductor element is integrated on a silicon substrate has been mounted and sealed on a lead frame so far as an insertion component or a surface mounting component. In such a package, since the mounting density does not improve, attention has been paid to MCMs that are functionalized by mounting a plurality of bare chips on one substrate after wire bonding connection, TAB connection, or CCB connection and sealing them. . However, in recent years, CSP technology that brings the package size closer to the bare chip dimensions has risen. In such a package, secondary connection electrodes such as solder balls arranged in a two-dimensional array are formed. Such a package requires a burn-in test at 125 ° C. and energization for an initial failure test. For this reason, a test terminal with good conductivity and an inexpensive test member that does not form an oxide film even at high temperatures is desired.
[0003]
[Problems to be solved by the invention]
The present invention relates to a high-density wiring substrate such as a printed circuit board, an integrated circuit substrate, a liquid crystal display substrate, a semiconductor package substrate (a semiconductor chip mounting substrate, a flip chip substrate), a conduction resistance test, and a burn-in in semiconductors and various packages. It is an object of the present invention to provide an electrical inspection wiring member excellent in contact reliability used for electrical inspection that requires contact conduction such as a test, and an inexpensive manufacturing method thereof.
[0004]
[Means for Solving the Problems]
The wiring member for electrical inspection according to the present invention includes an insulating substrate having a through-hole serving as a guide for an external terminal of a component to be inspected, and a surface opposite to the surface of the insulating substrate facing the component to be inspected. A contact terminal portion that contacts the external terminal to be inspected provided at a location, and a developed wiring of the contact terminal portion, and the contact terminal portion is formed with a polygonal corner that directly contacts the external terminal to be inspected. It is . Corners like this can and polygon angle of each vertex is formed by providing a through hole etched structures obtuse and acute angles to the contact terminal. Thereby, the wiping effect is obtained. It is preferable that the through hole of the contact terminal portion is a polygonal star-shaped hole .
[0005]
The method for manufacturing a wiring member for electrical inspection according to the present invention includes a step of preparing a circuit forming material having a metal layer on one side of an insulating substrate, and a polygonal shape so that an external terminal to be inspected directly contacts the metal layer by etching . A step of forming a first hole group in which corner portions are formed; a step of forming a contact terminal portion including each hole of the first hole group formed in the metal layer; and an insulating substrate having no metal layer From the side, a step of forming a second hole group having a predetermined shape facing each hole of the first hole group can be provided.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows an embodiment of a wiring member for electrical inspection according to the present invention. Reference numeral 1 denotes an insulating substrate having a through hole 4 serving as a guide for an external terminal 3 of a component 2 to be inspected, and 5 denotes a contact terminal portion. It is. 2 is a plan view of the electrical inspection wiring member shown in FIG. 1 as viewed from below, and 6 is a developed wiring. FIG. 3 shows a wiring member in which a through hole 8 is provided in the contact terminal portion so as to form a corner portion 7 that contacts an external terminal to be inspected. FIG. 4 of the reference example is a plan view showing a positional relationship with the through hole of the insulating substrate when a circular through hole is provided in the contact terminal portion so as to configure the corner portion 7 in the contact terminal portion. 5 is a contact terminal part, 4 is a through-hole of an insulated substrate, 8 is the circular through-hole provided in the contact terminal part. FIG. 5 is a plan view showing a positional relationship with the through hole of the insulating substrate when a polygonal through hole is provided in the contact terminal portion so that the corner portion 7 is formed in the contact terminal portion. contact terminal, 4 is an insulating substrate through-hole of 8 are through-holes of a polygon formed in the contact terminal portion.
[0007]
The manufacturing method of the wiring member for electrical inspection of this invention is demonstrated . Preparing a circuit forming material having a metal layer on one surface of the insulation substrate 1 are shown in FIG. The board | substrate formed in 18 micrometers electrolytic copper foil or rolled copper foil of the metal layer shown by 9 on insulating materials, such as a polyimide shown by 1, or a glass / epoxy laminated board, is used. It is desirable that the copper foil has a roughened connection interface with the insulating material. When the degree of roughening is represented by a generally known roughness parameter based on JIS surface roughness (B0601), the center line average roughness Ra is in the range of 0.05 to 5 μm, and the maximum roughness Rt is in the range of 1 to 5 μm. Is good. Moreover, although parameter description is not possible, you may use the copper foil which carried out the secondary roughening for such primary roughening.
[0008]
FIG. 7 shows a step of forming a first hole group having a predetermined shape in the metal layer 9 by etching. A resist film is laminated on the copper surface of the substrate, and the resist 10 is formed by exposure and development. An example of the resist image of the first hole formed at this time is shown in FIG. After that, the first hole portion 11 is formed by etching with an etching solution whose main component is ferric chloride or cupric chloride, or an alkaline etching solution such as A process solution manufactured by Melstrip.
[0009]
FIG. 9 shows a step of forming an electrode portion (contact terminal portion) including each hole 11 of the first hole group formed in the metal layer. A resist film is laminated on the copper surface of the base material in which the first group of holes 11 is formed, and the resist 12 is formed by exposure and development. As shown in FIG. 10, the resist 12 is formed so as to be an electrode part (contact terminal part) including each hole 11 of the first hole group. After that, etching is performed with an etching solution containing ferric chloride or cupric chloride as a main component, or an alkaline etching solution such as A process solution manufactured by Melstrip. Thereby, the electrode part (contact terminal part 5 ) containing each hole of a 1st hole group is formed.
[0010]
FIG. 11 shows a step of forming the second hole 13 group having a predetermined shape so as to face each hole of the first hole group from the side having no metal layer on the insulating substrate. When the insulating layer is made of carbon dioxide laser, YAG or excimer laser, or when the insulating material is polyimide, the insulating layer is punched with an etchable chemical solution from the side not having the copper layer. Alternatively, if the insulating material is photosensitive and can be exposed and developed, exposure and development can be performed. The second hole 13 group serves as a through hole 4 that serves as a guide for the external terminal 3 of the component 2 to be inspected. Regarding the positional relationship between the first and second holes and the electrode wiring outer shape, the second hole outer shape may be smaller than the outermost outer shape of the first hole or may contain the first hole. Each hole shape of the first hole group may be a polygon and a structure in which the angle of each vertex is etched to an obtuse angle and an acute angle.
[0011]
Next, after electrolytically or electrolessly plating at least nickel or nickel and gold on the surface of the metal layer, rhodium is preferably electrolytically or electrolessly plated. For example, as rhodium plating, electrolytic rhodium is plated using a low stress rhodium plating solution for thickening manufactured by Nippon Electroplating Engineers Co., Ltd. The conditions are, for example, a liquid temperature of 50 to 60 ° C., a current density of 2 A / dm 2 , a voltage of 4 V, and a time of 150 seconds. As a result, the oxide film on the electrode part to be inspected can be destroyed to make a low resistance contact.
[0012]
【The invention's effect】
The wiring member for electrical inspection according to the present invention, for example, when an elastomer is brought into contact under the wiring layer and a solder ball terminal of a package that is an external connection terminal of a component to be inspected is brought into contact from the insulating substrate side, the solder ball and the lead wiring Can be prevented. Since corners parts for inspection external terminals into contact with the contact terminal portion is configured to break the oxide film of the solder balls in the wiping (minute sliding), allowing reliable contact tests at low resistance.
[0013]
In this way, there is an insulating layer serving as a wiring support in a direction in which the balls (inspected component external connection terminals) are brought into contact with the burn-in board (wiring member for electrical inspection). For this reason, it becomes protection of wiring and a ball can be made to contact with an electrode (contact terminal part), without short-circuiting with wiring between electrodes . Also, the case of providing the electrode first hole (through hole) to (contact terminal), in particular leave a hole in the polygonal star shape, the tip, when the oxide film of the solder balls of solid Compared with, the rubbing phenomenon of wiping further breaks the oxide film effectively and is excellent in repeated tests. Further, since the wiring is formed in one layer, it is inexpensive. When the elastomer is applied from the wiring side, the star-shaped corners of the first hole (through hole of the contact terminal portion) contact the ball at multiple points, thus helping to absorb variations in ball height.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing an embodiment of an electrical inspection wiring member according to the present invention.
FIG. 2 is a plan view of the electrical inspection wiring member of FIG. 1 as viewed from below.
FIG. 3 is a cross-sectional view showing another embodiment of the electrical inspection wiring member of the present invention.
FIG. 4 is a reference plan view showing a positional relationship with a through hole of an insulating substrate when a circular through hole is provided in a contact terminal portion.
FIG. 5 is a plan view showing a positional relationship with a through hole of an insulating substrate when a polygonal through hole is provided in the contact terminal portion.
FIG. 6 is a cross-sectional view of a circuit forming material.
7 is a cross-sectional view showing a process of forming a first group of holes 11 in the metal layer 9. FIG.
FIG. 8 is a plan view of the wiring member of FIG. 7 as viewed from below.
9 is a cross-sectional view showing a process of forming an electrode portion (contact terminal portion) 5 on the metal layer 9. FIG.
10 is a plan view of the wiring member of FIG. 9 as viewed from below.
FIG. 11 is a sectional view showing another embodiment of the wiring member of the present invention.

Claims (3)

被検査部品の外部端子用ガイドとなる貫通孔を有す絶縁基板、
前記絶縁基板の被検査部品が対向する面の反対面であって前記貫通孔の箇所に設けられた被検査部品外部端子が接触する接触端子部、
前記接触端子部の展開配線を備えた配線部材であって、
接触端子部には、被検査部品外部端子が直接接触する多角形の角部が構成されている電気的検査用配線部材。
An insulating substrate having a through-hole that serves as a guide for external terminals of the component under test;
A contact terminal portion that is in contact with an external terminal to be inspected that is provided at a location of the through hole on the opposite side of the surface of the insulating substrate that faces the inspected component;
A wiring member provided with the developed wiring of the contact terminal portion,
A wiring member for electrical inspection in which the contact terminal portion is formed with a polygonal corner portion that directly contacts an external terminal to be inspected.
接触端子部の貫通孔が多角形の星形状の孔である請求項1記載の電気的検査用配線部材。  The wiring member for electrical inspection according to claim 1, wherein the through hole of the contact terminal portion is a polygonal star-shaped hole. 絶縁基板の片面に金属層を備える回路形成材料を準備する工程、
前記金属層にエッチングにより被検査部品外部端子が直接接触するよう多角形の角部が構成されている第一の穴群を形成する工程、
前記金属層に形成された第一の穴群の各穴を含む接触端子部を形成する工程、
絶縁基板を金属層を有しない側から、第一の穴群の各穴に対向して所定形状の第二の穴群を形成する工程、を備える電気的検査用配線部材の製造法。
Preparing a circuit forming material having a metal layer on one side of an insulating substrate;
Forming a first hole group in which polygonal corners are configured so that the external terminal to be inspected directly contacts the metal layer by etching;
Forming a contact terminal portion including each hole of the first hole group formed in the metal layer;
A method of manufacturing a wiring member for electrical inspection, comprising: forming a second hole group having a predetermined shape so as to face each hole of the first hole group from the side having no metal layer on the insulating substrate.
JP22046398A 1998-08-04 1998-08-04 Wiring member for electrical inspection and manufacturing method thereof Expired - Fee Related JP4520543B2 (en)

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Application Number Priority Date Filing Date Title
JP22046398A JP4520543B2 (en) 1998-08-04 1998-08-04 Wiring member for electrical inspection and manufacturing method thereof

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JP4520543B2 true JP4520543B2 (en) 2010-08-04

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