JP2000058605A - Wiring member and manufacture thereof - Google Patents

Wiring member and manufacture thereof

Info

Publication number
JP2000058605A
JP2000058605A JP10220463A JP22046398A JP2000058605A JP 2000058605 A JP2000058605 A JP 2000058605A JP 10220463 A JP10220463 A JP 10220463A JP 22046398 A JP22046398 A JP 22046398A JP 2000058605 A JP2000058605 A JP 2000058605A
Authority
JP
Japan
Prior art keywords
contact
hole
inspected
wiring member
wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10220463A
Other languages
Japanese (ja)
Other versions
JP4520543B2 (en
Inventor
Hidehiro Nakamura
英博 中村
Yoshiaki Tsubomatsu
良明 坪松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP22046398A priority Critical patent/JP4520543B2/en
Publication of JP2000058605A publication Critical patent/JP2000058605A/en
Application granted granted Critical
Publication of JP4520543B2 publication Critical patent/JP4520543B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain a wiring member used in electrical inspection requiring contact conduction and having excellent reliability on contacts by forming an insulating layer to support a wiring in the direction that a connecting terminal on the outside of a part to be inspected is brought into contact towards the wiring member. SOLUTION: The wiring member has an insulating substrate 1 with through-holes 4 as guides for the external terminals 3 of a part to be inspected 2, contact terminal sections 5, with which the external terminals 3 of the part to be inspected formed at the places of the through-holes 4 are brought into contact, on the reverse surface of a surface, to which the part to be inspected 2 is faced oppositely, and the expanded wirings of contact terminal sections 5. The contact terminal sections 5 have corner sections, with which the external terminals 3 of the part to be inspected are brought into contact. Accordingly, when an elastomer is brought into contact under a wiring layer and the solder ball terminals of packages as the external terminals 3 of the part to be inspected are brought into contact from the insulating substrate 1 side, contacts among solder balls and drawing-around wirings can be prevented. The oxide films of the solder balls are broken by wiping, and a sure contact test is carried out with low resistance.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プリント基板、集
積回路用基板、液晶表示基板、半導体パッケージ用基板
(半導体チップ搭載用基板、フリップチップ用基板)な
どの高密度配線基板や、半導体、各種パッケージにおけ
る導通抵抗検査、バーンインテストをはじめとする接触
導通を要する電気的検査用に使用される配線部材とその
製造法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-density wiring board such as a printed board, an integrated circuit board, a liquid crystal display board, a semiconductor package board (a semiconductor chip mounting board, a flip chip board), a semiconductor, and various kinds of substrates. The present invention relates to a wiring member used for an electrical inspection requiring contact conduction such as a conduction resistance test and a burn-in test in a package, and a method of manufacturing the wiring member.

【0002】[0002]

【従来の技術】プリント基板上への電子部品実装密度が
増大しており、このため実装部の相互配線間隔が縮小し
ている。相互結線が確保できるようにする微細配線化お
よび多層化技術が進むに伴い、これら配線形成技術を駆
使して、半導体実装基板によるパッケージの小型化が図
られている。例えばシリコン基板上に半導体素子が集積
回路化されたベアチップを、これまでリードフレームに
実装封止して、挿入部品もしくは面実装部品としてき
た。このようなパッケージでは、実装密度が向上しない
ため、ベアチップを複数個、ひとつの基板にワイヤボン
ド接続またはTAB接続あるいはCCB接続し封止後、
リードフレームに実装して機能化するMCMが注目され
た。しかし、近年ではベアチップの外形寸法に限りな
く、パッケージサイズを近づけるCSP技術が台頭して
いる。このようなパッケージは、2次元アレイ状に配置
されたはんだボールをはじめとする二次接続用電極が形
成されている。このようなパッケージは、初期不良テス
トのため125℃および通電でバーンインテストが必要
である。このため、高温でも、酸化皮膜を作らず、導電
性の良い検査用端子および安価な検査用部材が望まれて
いる。
2. Description of the Related Art The mounting density of electronic components on a printed circuit board has been increasing, and as a result, the distance between interconnections in the mounting portion has been reduced. Along with the progress of fine wiring and multi-layer techniques for securing interconnections, these wiring forming techniques are being used to reduce the size of a package using a semiconductor mounting substrate. For example, a bare chip in which a semiconductor element is integrated into a circuit on a silicon substrate has been mounted and sealed on a lead frame to form an insert component or a surface mount component. In such a package, since the mounting density does not improve, a plurality of bare chips are connected to one substrate by wire bond connection, TAB connection or CCB connection, and after sealing,
Attention has been paid to an MCM that is mounted on a lead frame and functionalized. However, in recent years, a CSP technology for reducing the package size without limitation to the outer dimensions of the bare chip has been emerging. In such a package, secondary connection electrodes including solder balls arranged in a two-dimensional array are formed. Such a package requires a burn-in test at 125 ° C. and an electric current for an initial failure test. Therefore, there is a demand for an inspection terminal and an inexpensive inspection member that do not form an oxide film even at high temperatures and have good conductivity.

【0003】[0003]

【発明が解決しようとする課題】本発明は、プリント基
板、集積回路用基板、液晶表示基板、半導体パッケージ
用基板(半導体チップ搭載用基板、フリップチップ用基
板)などの高密度配線基板や、半導体、各種パッケージ
における導通抵抗検査、バーンインテストをはじめとす
る接触導通を要する電気的検査用に使用される接触信頼
性に優れる配線部材及びその安価な製造法を提供するも
のである。
SUMMARY OF THE INVENTION The present invention relates to a high-density wiring board such as a printed board, an integrated circuit board, a liquid crystal display board, a semiconductor package board (semiconductor chip mounting board, flip chip board), and the like. Another object of the present invention is to provide a wiring member having excellent contact reliability used for an electrical inspection requiring contact continuity such as a conduction resistance test and a burn-in test in various packages, and an inexpensive manufacturing method thereof.

【0004】[0004]

【課題を解決するための手段】本発明の配線部材は、被
検査部品の外部端子のガイドとなる貫通孔を有す絶縁基
板、前記絶縁基板の被検査部品が対向する面の反対面で
あって前記貫通孔の箇所に設けられた被検査部品外部端
子が接触する接触端子部、前記接触端子部の展開配線を
備えている。接触端子部には、被検査部品外部端子が接
触する角部が構成されていることが好ましい。このよう
な角部は、接触端子部に多角形、円形でかつ各頂点の角
度が鈍角および鋭角にエッチングされた構造の貫通孔を
設けて形成することができる。これにより、ワイピング
効果が得られる。接触端子部の被検査部品外部端子が接
触する面が粗化面であることが好ましい。これにより、
パッケージの二次接続用電極部などとの接触性を向上さ
せる。
According to the present invention, there is provided a wiring member having an insulating substrate having a through hole serving as a guide for an external terminal of a component to be inspected, and a surface opposite to a surface of the insulating substrate facing the component to be inspected. And a contact terminal portion with which the external terminal of the component to be inspected provided at the location of the through hole comes into contact, and a development wiring of the contact terminal portion. It is preferable that the contact terminal portion has a corner portion with which the external terminal of the component to be inspected contacts. Such a corner portion can be formed by providing a through hole having a structure in which the contact terminal portion has a polygonal or circular shape and each vertex is etched at an obtuse angle or an acute angle. Thereby, a wiping effect is obtained. It is preferable that the surface of the contact terminal portion that contacts the external terminal of the component under test is a roughened surface. This allows
Improve the contact with the secondary connection electrode of the package.

【0005】本発明の配線部材の製造法は、絶縁基板の
片面に金属層を備える回路形成材料を準備する工程、前
記金属層に接触端子部及び展開配線を形成する工程、絶
縁基板を金属層を有しない側から接触端子部に対応する
箇所に貫通孔を形成する工程を備える。また本発明の配
線部材の製造法は、絶縁基板の片面に金属層を備える回
路形成材料を準備する工程、前記金属層にエッチングに
より所定形状の第一の穴群を形成する工程、前記金属層
に形成された第一の穴群の各穴を含む接触端子部を形成
する工程、絶縁基板を金属層を有しない側から、第一の
穴群の各穴に対向して所定形状の第二の穴群を形成する
工程を備えることができる。
According to the method of manufacturing a wiring member of the present invention, a step of preparing a circuit forming material having a metal layer on one surface of an insulating substrate, a step of forming a contact terminal portion and a developed wiring on the metal layer, Forming a through-hole at a position corresponding to the contact terminal portion from the side having no contact hole. The method of manufacturing a wiring member according to the present invention includes a step of preparing a circuit-forming material having a metal layer on one surface of an insulating substrate; a step of forming a first hole group having a predetermined shape by etching the metal layer; Forming a contact terminal portion including each hole of the first hole group formed on the insulating substrate from a side not having a metal layer, facing the respective hole of the first hole group from the side having no metal layer, and forming a second terminal having a predetermined shape. May be provided.

【0006】[0006]

【発明の実施の形態】図面に基づいて本発明の実施例を
説明する。図1は、本発明の配線部材の一実施例を示す
もので、1は被検査部品2の外部端子3のガイドとなる
貫通孔4を有す絶縁基板、5は接触端子部である。図2
は図1の配線部材の下方からみた平面図で、6は展開配
線である。図3は、接触端子部には、被検査部品外部端
子が接触する角部7を構成するように、貫通孔8を設け
た配線部材である。図4は、接触端子部に角部7を構成
するように、接触端子部に円形の貫通孔を設けて場合
の、絶縁基板の貫通孔との位置関係を示す平面図であ
り、5が接触端子部、4が絶縁基板の貫通孔、8が接触
端子部設けた円形の貫通孔である。図5は、接触端子部
に角部7を構成するように、接触端子部に多角形の貫通
孔を設けて場合の、絶縁基板の貫通孔との位置関係を示
す平面図であり、5が接触端子部、4が絶縁基板の貫通
孔、8が接触端子部設けた多角形の貫通孔である。
Embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows an embodiment of a wiring member according to the present invention. Reference numeral 1 denotes an insulating substrate having a through hole 4 serving as a guide for an external terminal 3 of a component 2 to be inspected, and reference numeral 5 denotes a contact terminal portion. FIG.
Is a plan view of the wiring member of FIG. 1 as viewed from below, and 6 is a developed wiring. FIG. 3 shows a wiring member in which a through hole 8 is provided in the contact terminal portion so as to form a corner portion 7 with which the external terminal of the component under test contacts. FIG. 4 is a plan view showing a positional relationship with a through hole of an insulating substrate when a circular through hole is provided in the contact terminal portion so as to form the corner portion 7 in the contact terminal portion. The terminal portion 4 is a through hole of the insulating substrate, and 8 is a circular through hole provided with the contact terminal portion. FIG. 5 is a plan view showing a positional relationship with a through hole of an insulating substrate when a polygonal through hole is provided in the contact terminal portion so as to form the corner portion 7 in the contact terminal portion. The contact terminals 4 and 4 are through holes in the insulating substrate, and 8 is a polygonal through hole provided with the contact terminals.

【0007】本発明の配線部材の製造法を説明する。図
6に示す示す絶縁基板1の片面に金属層を備える回路形
成材料を準備する。9で示す金属層の18μmの電解銅
箔または圧延銅箔が、1で示すポリイミド、あるいはガ
ラス/エポキシ積層板等の絶縁材料上に形成された基板
を用いる。銅箔は、絶縁材料との接続界面が粗化処理さ
れていることがのぞましい。粗化の程度を、一般に広く
知られるJIS表面粗さ(B0601)に基づく粗さパ
ラメータであらわすと、中心線平均粗さRaでは、0.
05〜5μm、最大粗さRtでは1から5μmの範囲が
よい。また、パラメータ表記はできないが、このような
一次粗化に2次粗化をした銅箔を用いてもよい。
A method for manufacturing a wiring member according to the present invention will be described. A circuit forming material including a metal layer on one surface of the insulating substrate 1 shown in FIG. 6 is prepared. A substrate in which an 18 μm electrolytic copper foil or a rolled copper foil of a metal layer indicated by 9 is formed on an insulating material such as polyimide or a glass / epoxy laminate indicated by 1 is used. It is desirable that the copper foil has a roughened connection interface with the insulating material. When the degree of roughening is represented by a roughness parameter based on a generally well-known JIS surface roughness (B0601), the center line average roughness Ra is 0.
The maximum roughness Rt is preferably in the range of 1 to 5 μm. Although the parameter cannot be described, a copper foil subjected to secondary roughening for such primary roughening may be used.

【0008】図7に前記金属層9にエッチングにより所
定形状の第一の穴群を形成する工程を示す。基材の銅表
面に、レジストフィルムをラミネートし、露光・現像し
てレジスト10を形成する。このときに形成する第一の
穴部のレジスト像の例を図8に示す。こののち、主成分
が塩化第二鉄、塩化第二銅のエッチング液、あるいはア
ルカリエッチング液たとえばメルストリップ社製Aプロ
セス液でエッチングし第一の穴部11を形成する。
FIG. 7 shows a step of forming a first hole group having a predetermined shape in the metal layer 9 by etching. A resist film is laminated on the copper surface of the base material, and is exposed and developed to form a resist 10. FIG. 8 shows an example of a resist image of the first hole formed at this time. Thereafter, the first hole portion 11 is formed by etching with an etching solution containing ferric chloride or cupric chloride as a main component or an alkali etching solution such as an A process solution manufactured by Merstrip.

【0009】図9に前記金属層に形成された第一の穴群
の各穴11含む電極部(接触端子部)を形成する工程を
示す。第一の穴11群を形成した基材の銅表面にレジス
トフィルムをラミネートし、露光・現像してレジスト1
2を形成する。レジスト12は図10に示すように第一
の穴群の各穴11を含む電極部(接触端子部)となるよ
うに形成する。こののち、主成分が塩化第二鉄、塩化第
二銅のエッチング液、あるいはアルカリエッチング液た
とえばメルストリップ社製Aプロセス液でエッチングす
る。これにより第一の穴群の各穴を含む電極部(接触端
子部5)とを形成する。
FIG. 9 shows a process of forming an electrode portion (contact terminal portion) including each hole 11 of the first hole group formed in the metal layer. A resist film is laminated on the copper surface of the substrate on which the first group of holes 11 is formed, and is exposed and developed to form a resist 1
Form 2 The resist 12 is formed so as to become an electrode portion (contact terminal portion) including each hole 11 of the first hole group as shown in FIG. Thereafter, etching is performed using an etching solution containing ferric chloride or cupric chloride as a main component, or an alkali etching solution such as an A process solution manufactured by Merstrip. Thus, an electrode portion (contact terminal portion 5) including each hole of the first hole group is formed.

【0010】図11に絶縁基板を金属層を有しない側か
ら、第一の穴群の各穴に対向して所定形状の第二の穴1
3群を形成する工程を示す。銅層を有しない側から絶縁
層を炭酸ガスレーザ、YAGまたはエキシマレーザある
いは絶縁材料がポリイミドである場合、エッチング可能
な薬液で穴明けする。もしくは、絶縁材料が感光性で露
光・現像可能なものであれば露光・現像により行うこと
ができる。第二の穴13群は、被検査部品2の外部端子
3のガイドとなる貫通孔4となる。第一、第二の穴およ
び電極配線外形の位置関係は、第二の穴外形が第一の穴
の最外形より小さくても第一の穴を内包していてもよ
い。第一の穴群の各穴形状が、多角形でかつ各頂点の角
度が鈍角および鋭角にエッチングされた構造であること
ができる。
FIG. 11 shows a second hole 1 having a predetermined shape facing an insulating substrate from the side having no metal layer and facing each hole of the first hole group.
The process of forming three groups is shown. When the insulating layer is a carbon dioxide gas laser, a YAG or excimer laser, or the insulating material is polyimide, the insulating layer is perforated from the side having no copper layer with an etchable chemical. Alternatively, exposure and development can be performed if the insulating material is photosensitive and can be exposed and developed. The second group of holes 13 is a through hole 4 serving as a guide for the external terminal 3 of the component 2 to be inspected. Regarding the positional relationship between the first and second holes and the outer shape of the electrode wiring, the outer shape of the second hole may be smaller than the outermost shape of the first hole or may include the first hole. Each hole shape of the first hole group may have a polygonal shape and an angle of each vertex etched at an obtuse angle and an acute angle.

【0011】次に金属層の表面に、少なくともニッケ
ル、またはニッケルおよび金を電解または無電解めっき
した後、ロジウムを望ましくは電解、または無電解めっ
きする。例えばロジウムめっきとして、日本エレクトロ
プレーテイング・エンジニヤーズ株式会社製厚付け用低
応力ロジウムめっき液を使用して、電解ロジウムをめっ
きする。条件は、例えば液温50〜60℃、電流密度2
A/dm2電圧4V、時間150秒である。これにより
被検査部品電極部の酸化皮膜を破壊して低抵抗の接触が
できる。
Next, after at least nickel or nickel and gold are electrolytically or electrolessly plated on the surface of the metal layer, rhodium is desirably electrolytically or electrolessly plated. For example, as rhodium plating, electrolytic rhodium is plated by using a low-stress rhodium plating solution for thickening manufactured by Japan Electroplating Engineers Co., Ltd. The conditions are, for example, a liquid temperature of 50 to 60 ° C. and a current density of 2
The A / dm2 voltage is 4 V and the time is 150 seconds. As a result, the oxide film on the electrode portion of the component to be inspected is broken, and low-resistance contact can be made.

【0012】[0012]

【発明の効果】本発明の配線部材は、例えば配線層の下
にエラストマを接触させ、絶縁基板側から被検査部品外
部接続端子であるパッケージのはんだボール端子を接触
させたとき、はんだボールと引き回し配線との接触を防
止できる。接触端子部に被検査部品外部端子が接触する
角部が構成されている場合は、ワイピング(微少な摺
動)ではんだボールの酸化膜を破壊し、低抵抗で確実な
接触テストを可能にする。
According to the wiring member of the present invention, for example, when the elastomer is brought into contact with the lower part of the wiring layer and the solder ball terminal of the package which is the external connection terminal of the component to be inspected is brought into contact from the insulating substrate side, the solder ball and the wiring are drawn. Contact with wiring can be prevented. If the contact terminal has a corner that contacts the external terminal of the component under test, the oxidized film of the solder ball is destroyed by wiping (fine sliding), enabling a low-resistance and reliable contact test. .

【0013】このようにボール(被検査部品外部接続端
子)をバーンインボード(配線部材)に向けて接触させ
る方向に、配線の支持となる絶縁層がある。このため、
配線の保護となり、ボールは電極間の配線とショートす
ることなく、電極(接触端子部)と接触させることがで
きる。ボールと接触する電極(接触端子部)表面は粗化
されている場合は、はんだボールの酸化膜を破り、繰り
返しのテストに優れる。また、電極(接触端子部)に第
1の穴(貫通孔)を設けた場合、特に多角形の星形状の
穴をあけておくと、その先端が、はんだボールの酸化膜
をべたの場合に比べて、ワイピングというこすれ現象で
さらに、有効に酸化皮膜を破り、繰り返しのテストに優
れる。また、配線は、一層内に形成するため、安価であ
る。配線側から、エラストマをあてて使用すると、第一
の穴(接触端子部の貫通孔)の星状の角部がボールを多
点で接触するため、ボール高さばらつきの吸収を助け
る。
As described above, there is an insulating layer for supporting the wiring in a direction in which the ball (the external connection terminal of the component to be inspected) contacts the burn-in board (wiring member). For this reason,
As a result, the ball can be brought into contact with the electrode (contact terminal portion) without short-circuiting with the wire between the electrodes. If the surface of the electrode (contact terminal portion) in contact with the ball is roughened, it breaks the oxide film of the solder ball and is excellent in repeated tests. Also, when a first hole (through hole) is provided in the electrode (contact terminal portion), particularly when a polygonal star-shaped hole is formed, the tip of the hole is covered with an oxide film of a solder ball. In comparison, the rubbing phenomenon of wiping further breaks the oxide film more effectively, and is excellent in repeated tests. Further, since the wiring is formed in one layer, it is inexpensive. If an elastomer is used from the wiring side, the star-shaped corners of the first hole (through-hole of the contact terminal portion) contact the ball at multiple points, thereby helping to absorb variations in ball height.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の配線部材の一実施例を示す断面図。FIG. 1 is a sectional view showing one embodiment of a wiring member of the present invention.

【図2】 図1の配線部材の下方からみた平面図。FIG. 2 is a plan view of the wiring member of FIG. 1 as viewed from below.

【図3】 本発明の配線部材の他の一実施例を示す断面
図。
FIG. 3 is a sectional view showing another embodiment of the wiring member of the present invention.

【図4】 接触端子部に円形の貫通孔を設けた場合の、
絶縁基板の貫通孔との位置関係を示す平面図。
FIG. 4 shows a case where a circular through hole is provided in the contact terminal portion.
FIG. 3 is a plan view showing a positional relationship with a through hole of an insulating substrate.

【図5】 接触端子部に多角形の貫通孔を設けた場合
の、絶縁基板の貫通孔との位置関係を示す平面図。
FIG. 5 is a plan view showing a positional relationship with a through hole of an insulating substrate when a polygonal through hole is provided in a contact terminal portion.

【図6】 回路形成材料の断面図。FIG. 6 is a cross-sectional view of a circuit forming material.

【図7】 金属層9に第一の穴11群を形成する工程を
示す断面図。
FIG. 7 is a sectional view showing a step of forming a first hole group 11 in the metal layer 9;

【図8】 図7の配線部材の下方からみた平面図。8 is a plan view of the wiring member of FIG. 7 as viewed from below.

【図9】 金属層9に電極部(接触端子部)5を形成す
る工程を示す断面図。
FIG. 9 is a sectional view showing a step of forming an electrode portion (contact terminal portion) 5 on the metal layer 9.

【図10】 図9の配線部材の下方からみた平面図。FIG. 10 is a plan view of the wiring member of FIG. 9 as viewed from below.

【図11】 本発明の配線部材の他の一実施例を示す断
面図。
FIG. 11 is a sectional view showing another embodiment of the wiring member of the present invention.

【符号の説明】[Explanation of symbols]

1.絶縁基板 2.被検査部品 3.外部端子3 4.貫通孔 5.接触端子部 6.展開配線 7.角部 8.貫通孔 9.金属層 10.レジスト 11.第一の穴 12.レジスト 13.第二の穴 1. 1. Insulating substrate Inspected part 3. External terminal 3 4. Through hole 5. 5. Contact terminal section Deployment wiring 7. Corner 8. Through hole 9. Metal layer 10. Resist 11. First hole 12. Resist 13. Second hole

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2G003 AA07 AC01 AG08 AG12 2G011 AA16 AA21 AB06 AB07 AC14 AE03 4M106 AA01 AA02 AD08 AD09 BA14 CA16 CA56 DG25 DJ33  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2G003 AA07 AC01 AG08 AG12 2G011 AA16 AA21 AB06 AB07 AC14 AE03 4M106 AA01 AA02 AD08 AD09 BA14 CA16 CA56 DG25 DJ33

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】被検査部品の外部端子用ガイドとなる貫通
孔を有す絶縁基板、 前記絶縁基板の被検査部品が対向する面の反対面であっ
て前記貫通孔の箇所に設けられた被検査部品外部端子が
接触する接触端子部、 前記接触端子部の展開配線を備えた配線部材。
An insulating substrate having a through hole serving as a guide for an external terminal of a component to be inspected; a substrate provided at a position of the through hole on a surface of the insulating substrate opposite to a surface facing the component to be inspected; A contact member to be contacted by an external terminal of the inspection component, and a wiring member provided with a developed wiring of the contact terminal.
【請求項2】 接触端子部には、被検査部品外部端子が
接触する角部が構成されている請求項1記載の配線部
材。
2. The wiring member according to claim 1, wherein the contact terminal portion has a corner portion with which the external terminal of the component to be inspected contacts.
【請求項3】 接触端子部には、被検査部品外部端子が
接触する面に粗化面が構成されている請求項1又は2記
載の配線部材。
3. The wiring member according to claim 1, wherein the contact terminal portion has a roughened surface on a surface with which the external terminal of the component to be inspected contacts.
【請求項4】絶縁基板の片面に金属層を備える回路形成
材料を準備する工程、 前記金属層に接触端子部及び展開配線を形成する工程、 絶縁基板を金属層を有しない側から接触端子部に対応す
る箇所に貫通孔を形成する工程を備える配線部材の製造
法。
4. A step of preparing a circuit forming material including a metal layer on one surface of an insulating substrate; a step of forming a contact terminal portion and a development wiring on the metal layer; and a step of contacting the insulating substrate from a side having no metal layer. A method for manufacturing a wiring member, comprising: a step of forming a through hole at a location corresponding to the above.
【請求項5】絶縁基板の片面に金属層を備える回路形成
材料を準備する工程、 前記金属層にエッチングにより所定形状の第一の穴群を
形成する工程、 前記金属層に形成された第一の穴群の各穴を含む接触端
子部を形成する工程、 絶縁基板を金属層を有しない側から、第一の穴群の各穴
に対向して所定形状の第二の穴群を形成する工程を備え
る配線部材の製造法。
5. A step of preparing a circuit forming material having a metal layer on one surface of an insulating substrate; a step of forming a first hole group having a predetermined shape by etching in the metal layer; Forming a contact terminal portion including each hole of the group of holes, forming a second group of holes of a predetermined shape facing the respective holes of the first group of holes from the side having no metal layer on the insulating substrate. A method for manufacturing a wiring member comprising a process.
JP22046398A 1998-08-04 1998-08-04 Wiring member for electrical inspection and manufacturing method thereof Expired - Fee Related JP4520543B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22046398A JP4520543B2 (en) 1998-08-04 1998-08-04 Wiring member for electrical inspection and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22046398A JP4520543B2 (en) 1998-08-04 1998-08-04 Wiring member for electrical inspection and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JP2000058605A true JP2000058605A (en) 2000-02-25
JP4520543B2 JP4520543B2 (en) 2010-08-04

Family

ID=16751520

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22046398A Expired - Fee Related JP4520543B2 (en) 1998-08-04 1998-08-04 Wiring member for electrical inspection and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JP4520543B2 (en)

Also Published As

Publication number Publication date
JP4520543B2 (en) 2010-08-04

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