JP4494045B2 - ビームホモジナイザ及びレーザ照射装置、並びに半導体装置の作製方法 - Google Patents

ビームホモジナイザ及びレーザ照射装置、並びに半導体装置の作製方法 Download PDF

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Publication number
JP4494045B2
JP4494045B2 JP2004066862A JP2004066862A JP4494045B2 JP 4494045 B2 JP4494045 B2 JP 4494045B2 JP 2004066862 A JP2004066862 A JP 2004066862A JP 2004066862 A JP2004066862 A JP 2004066862A JP 4494045 B2 JP4494045 B2 JP 4494045B2
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Japan
Prior art keywords
laser
optical waveguide
laser beam
film
side direction
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Expired - Fee Related
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JP2004066862A
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English (en)
Japanese (ja)
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JP2004297058A5 (enExample
JP2004297058A (ja
Inventor
幸一郎 田中
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2004066862A priority Critical patent/JP4494045B2/ja
Publication of JP2004297058A publication Critical patent/JP2004297058A/ja
Publication of JP2004297058A5 publication Critical patent/JP2004297058A5/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Thin Film Transistor (AREA)
  • Recrystallisation Techniques (AREA)
  • Lasers (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2004066862A 2003-03-11 2004-03-10 ビームホモジナイザ及びレーザ照射装置、並びに半導体装置の作製方法 Expired - Fee Related JP4494045B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004066862A JP4494045B2 (ja) 2003-03-11 2004-03-10 ビームホモジナイザ及びレーザ照射装置、並びに半導体装置の作製方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003065682 2003-03-11
JP2004066862A JP4494045B2 (ja) 2003-03-11 2004-03-10 ビームホモジナイザ及びレーザ照射装置、並びに半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2004297058A JP2004297058A (ja) 2004-10-21
JP2004297058A5 JP2004297058A5 (enExample) 2007-04-26
JP4494045B2 true JP4494045B2 (ja) 2010-06-30

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JP2004066862A Expired - Fee Related JP4494045B2 (ja) 2003-03-11 2004-03-10 ビームホモジナイザ及びレーザ照射装置、並びに半導体装置の作製方法

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JP (1) JP4494045B2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4921771B2 (ja) * 2004-10-27 2012-04-25 株式会社半導体エネルギー研究所 ビームホモジナイザ、それを利用するレーザ照射方法及びレーザ照射装置、並びに非単結晶半導体膜のレーザアニール方法
JP2007214527A (ja) 2006-01-13 2007-08-23 Ihi Corp レーザアニール方法およびレーザアニール装置
US8164739B2 (en) 2007-09-28 2012-04-24 Asml Holding N.V. Controlling fluctuations in pointing, positioning, size or divergence errors of a beam of light for optical apparatus
US10072971B2 (en) * 2010-04-16 2018-09-11 Metal Improvement Company, Llc Flexible beam delivery system for high power laser systems
JP4834790B1 (ja) * 2011-01-25 2011-12-14 株式会社エタンデュ目白 光照射装置
EP3117979B1 (en) * 2015-07-17 2019-08-21 Shanghai Seeyao Electronics Co Ltd Process and device for simultaneous laser welding
US10132992B2 (en) 2016-03-20 2018-11-20 Robe Lighting S.R.O. Special flower effects beam and washlight luminaire
EP3436740B1 (en) * 2016-04-01 2025-05-28 ROBE lighting s.r.o. A wash light luminaire with special effects capabilities
DE102016121462A1 (de) * 2016-11-09 2018-05-09 Aixtron Se Strukturierte Keimschicht
KR20230020495A (ko) * 2020-06-09 2023-02-10 누부루 인크. 이중 파장 가시 레이저 소스
CN112130319B (zh) * 2020-09-28 2023-02-28 中国工程物理研究院激光聚变研究中心 一种超高通量激光光束陷阱及其制作方法
CN112951745B (zh) * 2021-03-04 2023-02-17 重庆京东方显示技术有限公司 激光退火设备
US12181144B2 (en) 2024-01-30 2024-12-31 Robe Lighting S.R.O. Removable lens system for a luminaire

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DK160357C (da) * 1987-12-08 1991-08-12 Flemming Olsen Optiksystem til lasermaerkning
JPH02175090A (ja) * 1988-12-27 1990-07-06 Isamu Miyamoto レーザビーム成形装置
JPH08238585A (ja) * 1995-03-01 1996-09-17 Toshiba Corp レーザ加工装置
JPH08338962A (ja) * 1995-06-13 1996-12-24 Toshiba Corp ビームホモジナイザ及びレーザ加工装置
JPH10258383A (ja) * 1997-03-14 1998-09-29 Mitsubishi Heavy Ind Ltd 線状レーザビーム光学系
JP3562389B2 (ja) * 1999-06-25 2004-09-08 三菱電機株式会社 レーザ熱処理装置
JP4059623B2 (ja) * 2000-12-15 2008-03-12 株式会社リコー 照明装置、及び均一照明装置
JP3903761B2 (ja) * 2001-10-10 2007-04-11 株式会社日立製作所 レ−ザアニ−ル方法およびレ−ザアニ−ル装置

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JP2004297058A (ja) 2004-10-21

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