JP4483263B2 - 液晶装置及びその製造方法 - Google Patents
液晶装置及びその製造方法 Download PDFInfo
- Publication number
- JP4483263B2 JP4483263B2 JP2003374435A JP2003374435A JP4483263B2 JP 4483263 B2 JP4483263 B2 JP 4483263B2 JP 2003374435 A JP2003374435 A JP 2003374435A JP 2003374435 A JP2003374435 A JP 2003374435A JP 4483263 B2 JP4483263 B2 JP 4483263B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- liquid crystal
- transmittance
- transparent conductive
- optical thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 95
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000010408 film Substances 0.000 claims description 291
- 239000000758 substrate Substances 0.000 claims description 107
- 238000002834 transmittance Methods 0.000 claims description 77
- 150000004767 nitrides Chemical class 0.000 claims description 74
- 239000010409 thin film Substances 0.000 claims description 53
- 230000003287 optical effect Effects 0.000 claims description 50
- 229920001721 polyimide Polymers 0.000 claims description 10
- 239000004642 Polyimide Substances 0.000 claims description 9
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 230000002238 attenuated effect Effects 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 30
- 239000003566 sealing material Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 12
- 230000006872 improvement Effects 0.000 description 11
- 238000010030 laminating Methods 0.000 description 8
- 239000011159 matrix material Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 230000035699 permeability Effects 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- 229910020187 CeF3 Inorganic materials 0.000 description 1
- 229910002319 LaF3 Inorganic materials 0.000 description 1
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
- 229910020286 SiOxNy Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910003087 TiOx Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Landscapes
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003374435A JP4483263B2 (ja) | 2003-11-04 | 2003-11-04 | 液晶装置及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003374435A JP4483263B2 (ja) | 2003-11-04 | 2003-11-04 | 液晶装置及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005140836A JP2005140836A (ja) | 2005-06-02 |
| JP2005140836A5 JP2005140836A5 (enExample) | 2006-06-01 |
| JP4483263B2 true JP4483263B2 (ja) | 2010-06-16 |
Family
ID=34686150
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003374435A Expired - Fee Related JP4483263B2 (ja) | 2003-11-04 | 2003-11-04 | 液晶装置及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4483263B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102455535A (zh) * | 2010-10-18 | 2012-05-16 | 精工爱普生株式会社 | 电光装置以及电子设备 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7898632B2 (en) | 2005-12-28 | 2011-03-01 | Seiko Epson Corporation | Electro-optical device, manufacturing method thereof, and electronic apparatus |
| JP4626528B2 (ja) * | 2006-02-10 | 2011-02-09 | セイコーエプソン株式会社 | 電気光学装置及び電子機器 |
| JP5970688B2 (ja) * | 2011-11-02 | 2016-08-17 | セイコーエプソン株式会社 | 液晶装置および電子機器 |
| CN107085337B (zh) * | 2017-06-14 | 2020-07-10 | 厦门天马微电子有限公司 | 阵列基板、显示面板和显示装置 |
-
2003
- 2003-11-04 JP JP2003374435A patent/JP4483263B2/ja not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102455535A (zh) * | 2010-10-18 | 2012-05-16 | 精工爱普生株式会社 | 电光装置以及电子设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005140836A (ja) | 2005-06-02 |
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