JP4483069B2 - Printed wiring board and manufacturing method thereof - Google Patents

Printed wiring board and manufacturing method thereof Download PDF

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Publication number
JP4483069B2
JP4483069B2 JP2000333248A JP2000333248A JP4483069B2 JP 4483069 B2 JP4483069 B2 JP 4483069B2 JP 2000333248 A JP2000333248 A JP 2000333248A JP 2000333248 A JP2000333248 A JP 2000333248A JP 4483069 B2 JP4483069 B2 JP 4483069B2
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Japan
Prior art keywords
metal layer
thickness
insulating substrate
conductive material
wiring board
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JP2000333248A
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Japanese (ja)
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JP2002141627A (en
Inventor
輝代隆 塚田
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Ibiden Co Ltd
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Ibiden Co Ltd
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Description

【0001】
【技術分野】
本発明は,電子部品などを搭載するために用いられるプリント配線板及びその製造方法に関する。
【0002】
【従来技術】
プリント配線板には,導体回路が何層にもわたって形成されている。各層間の電気導通は,金属めっきで被覆されたビアホールや,内部に導電材を充填したビアホールを通じて行われる。ビアホールの周囲は,ランドにより囲まれており,これを介してビアホールと導体回路との間が接続されている。
【0003】
【解決しようとする課題】
しかしながら,上記従来のビアホールでは,ビアホールと,その周囲を囲むランドとの間で接続不良が生じることがあった。
【0004】
本発明はかかる従来の問題点に鑑み,ビアホールと導体回路との間の接続信頼性に優れたプリント配線板及びその製造方法を提供しようとするものである。
【0005】
【課題の解決手段】
請求項1の発明は,絶縁基板と,該絶縁基板に設けた穴に導電材を埋め込んでなる埋込みビアと,該埋込みビアの開口周縁部に接合した金属層とを有するプリント配線板であって,
上記金属層における上記埋込みビアと接合している接合部の上端及び下端は,上記埋込みビアの内壁に沿ってその内部に進入しており,
また該接合部の厚みは,上記金属層における他の一般部の厚みよりも大きく,
かつ,上記金属層における上記一般部の厚みtは4〜70μmであり,また上記接合部の厚みTは少なくとも5μmであることを特徴とするプリント配線板である。
【0006】
本発明において,埋込みビアは,その開口周縁部において金属層と接合している。金属層における埋込みビアとの接合部の厚みTは,他の一般部の厚みtよりも大きい。このため,金属層と埋込みビアとの間の接触面積が増え,両者間の接合強度が高くなる。したがって,両者間の接続信頼性が高くなり,導電性が向上する。
【0007】
金属層における上記接合部の厚みTと,他の一般部の厚みtとの比(T/t)は1よりも大きく且つ絶縁基板厚みを越えないことが好ましい。1未満の場合には,金属層における埋込みビアとの接合部の厚みTが小さくなり,埋込みビアとの接続信頼性が低下するおそれがある。また,接合部の厚みTが絶縁基板厚みを超える場合には,絶縁基板から越えた接合部が突起状になって,脱離し易くなり,ショートなどの不良を引き起こすことになるおそれがある。
【0008】
本発明において,金属層における上記接合部の厚みTは少なくとも5μmである。5μm未満の場合には,埋込みビアとの接続信頼性が低下するおそれがある。
【0009】
また,金属層における他の一般部とは,金属層における埋込みビアと接合していない部分をいう。この一般部の厚みtは,4〜70μmである。4μm未満の場合には,金属層の強度が低下するおそれがあり,70μmを超える場合には微細配線を形成しにくくなるおそれがある。
【0010】
また,上記金属層における上記接合部の上端及び下端は,上記埋込みビアの内壁に沿ってその内部に進入している。これにより,金属層と埋込みビア内の導電材との接触面積が増え,金属層の接合部と埋込みビアとの接合強度が更に高くなる。
金属層は,配線パターン,パッド,ランドなどの様々な形状を持つ。
埋込みビアに埋め込まれている導電材は,たとえば,銅,アルミニウム,ニッケル,半田などである。
【0011】
絶縁基板は,エポキシ系樹脂,フェノール樹脂,ビスマレイミドトレアジン樹脂,ポリフェニレン樹脂,ポリフェニレンエーテル樹脂,ポリイミド系樹脂などの熱硬化性樹脂あるいはそれらの混合物を用いることができる。絶縁基板には,ガラスクロス,無機フィラーなどの補強材を含んでいてもよい。
絶縁基板に設けた穴は,例えば,後述する打抜き穴である。その他,ドリル,レーザ等により形成された穴等である場合もある。
【0012】
次に,請求項の発明は,上記請求項1のプリント配線板を製造する方法である。
即ち,本発明は,絶縁基板と,該絶縁基板に設けた穴に導電材を埋め込んでなる埋込みビアと,該埋込みビアの開口周縁部に接合した金属層とを有するプリント配線板であって,上記金属層における上記埋込みビアと接合している接合部の上端及び下端は,上記埋込みビアの内壁に沿ってその内部に進入しており,
また該接合部の厚みは,上記金属層における他の一般部の厚みよりも大きく,
かつ,上記金属層における上記一般部の厚みtは4〜70μmであり,また上記接合部の厚みTは少なくとも5μmであるプリント配線板を製造する方法において,
厚みtが4〜70μmの金属層を接着した絶縁基板の上に上記金属層を介して導電材を積層する工程と,
上記絶縁基板,上記金属層及び上記導電材を打抜いて,上記絶縁基板及び金属層に形成された打抜き穴に,上記導電材を打抜いて形成された打抜き片を埋め込むとともに,上記金属層の上記打抜き穴の開口周縁部を上記絶縁基板の上記打抜き穴の内壁に沿って進入させて上記接合部を形成し,該接合部と上記導電材の打抜き片とを接合させる工程とを含むことを特徴とするプリント配線板の製造方法である。
【0013】
本製造方法においては,絶縁基板に接着した金属層の上に導電材被覆し,これらの所定部位を局所的に,上方からパンチングなどにより打抜いている。このとき,金属層の延性は大きいため,金属層の打抜き部分は弓状に引き延ばされ,絶縁基板の打抜き穴内部に進入する。この金属層の進入部分の厚みは,他の一般部の厚みよりも大きくなる。更に上方からの押圧力によって,導電材の打抜き片が,絶縁基板の打抜き穴内に埋め込まれる。
【0014】
導電材の打抜き片は,絶縁基板の打抜き穴内において,金属層の進入部分と接合する。この進入部分と打抜き穴内の導電材との接合厚みは,金属層の他の一般部の厚みよりも大きい。このため,本製法方法によれば,ビアホールと導体回路との間の接続信頼性に優れたプリント配線板を得ることができる。
また,埋込みビアは,打抜きという簡易な作業により形成することができるため,生産性が高い。
導電材の被覆側に配置されている金属層について,その導電材との接合部の厚みTが,その他の一般部の厚みtよりも大きい。これにより,金属層と埋込みビアとの接続信頼性が向上する。

【0015】
【発明の実施の形態】
実施形態例1
本発明の実施形態に係るプリント配線板及びその製造方法について,図1〜図4を用いて説明する。
本例のプリント配線板は,図1に示すごとく,絶縁基板8と,絶縁基板8に設けた打抜き穴80に導電材7を埋め込んでなる埋込みビア6とを有する。埋込みビア6の開口周縁部には,金属層5が接合されている。金属層5における埋込みビア6と接合している接合部51の厚みTは,35μmであり,他の一般部52の厚みtは18μmであって,Tはtよりも大きい。
【0016】
金属層5における接合部51の上端511及び下端512は,埋込みビア6の中に進入している。接合部51の上端511は,金属層5の一般部52の表面よりも低い位置にある。
図2に示すごとく,金属層5は,ランド55及び配線パターン56などを有する。ランド55は,埋込みビア6を囲んでいる。
【0017】
次に,本例のプリント配線板の製造方法について説明する。
まず,図3(a)に示すごとく,絶縁基板8として,厚み80μmのガラスエポキシ基板を準備し,これには金属層5としての厚み18μmの銅箔が片側に接着してある。
次に,導電材7としての厚み98μmの銅箔を,前記金属層5の上に配置する。
【0018】
次に,図3(b)に示すごとく,金属層5及び導電材7を積層した絶縁基板8を,ダイ31の上に載置する。ダイ31は径が155μmであるガイド穴30を有する。それに対向して,打抜き用の上パンチ33が上下方向に可動なように,導電材7の上に配置されている。打抜き前の段階では,上パンチ33は,ダイ31よりも上側に配置させる。上パンチ33の径は145μmでダイ31とのクリアランスを片側で5μmとってある。
【0019】
ここでダイ31と上パンチ33のクリアランスを小さくすると金属層5の厚い部分である接合部の厚みTは小さくなるため,少なくともクリアランスは片側で2μmは必要である。逆にクリアランスが大きいと絶縁基板8の変形が起こり易くなり,金属層5は延びること無く切れてしまい,Tを大きくすることはできない。クリアランスは大きくても片側30μmであることが好ましい。この方法は金属層の延びを利用したものであり,延性が高く,比較的硬度が小さなものが好ましい。このような金属として,中でも銅,半田,金が好ましい。
【0020】
次に,図4(c)に示すごとく,上パンチ33を下方に移動させて,金属層5,導電材7及び絶縁基板8の打抜き部分を押圧する。すると,図4(d)に示すごとく,その打抜き部分に円筒状の打抜き穴50,70,80が形成されるとともに,そこから円柱状の打抜き片501,701,801が打抜かれる。
このとき,金属層5の打抜き穴50の周縁部は,上方からの圧力により延びて,ガイド穴30内に若干進入する。導電材7の打抜き片701は,絶縁基板8の打抜き穴80の中に埋め込まれ,金属層5の進入部分と接合する。
これにより,導電材7の打抜き片701を埋め込んでなる埋込みビア6が形成される。
その後,絶縁基板8上の導電材7を取り去り,金属層5にパターン形成する。
以上により,図1,図2に示すプリント配線板が得られる。
【0021】
本例においては,図4(c)に示すごとく,金属層5及び導電材7により絶縁基板8を被覆し,その上から上パンチ33などにより打抜いている。打抜きの際,打抜き穴80の開口周縁部が上方向からの圧力によってテーパー状に変形する。また,金属層5がダイ31と上パンチ33のクリアランスによって引き延ばされ,打抜き穴80の内壁に沿ってその内部に進入する。従って進入部分の厚みは,他の一般部の厚みよりも大きくなる。
【0022】
そして,この金属層5の上記進入部分は,打抜き穴80内において,導電材7の打抜き片701と接合して,接合部51を形成する。このように進入部分から形成された接合部51の厚みTは,金属層5の他の一般部52の厚みtよりも大きい。このため,本製法方法によれば,埋込みビア6と金属層5との間の接続信頼性に優れたプリント配線板を得ることができる。
また,埋込みビア6は,導電材7の打抜きという簡易な作業により形成することができるため,生産性が高い。
【0023】
【発明の効果】
本発明によれば,ビアホールと導体回路との間の接続信頼性に優れたプリント配線板及びその製造方法を提供することができる。
【図面の簡単な説明】
【図1】実施形態例1のプリント配線板の断面図。
【図2】実施形態例1の埋込みビア周辺を示すためのプリント配線板の斜視図。
【図3】実施形態例1における,プリント配線板の製造方法を示すための説明図(a)〜(b)。
【図4】図3に続くプリント配線板の製造方法を示すための説明図(c)〜(d)。
【符号の説明】
30...ガイド穴,
31...ダイ,
33...上パンチ,
5...金属層,
50,70,80...打抜き穴,
51...接合部,
52...一般部,
501,701,801...打抜き片,
511...上端,
512...下端,
6...埋込みビア,
7...導電材,
8...絶縁基板,
[0001]
【Technical field】
The present invention relates to a printed wiring board used for mounting electronic parts and the like and a method for manufacturing the same.
[0002]
[Prior art]
On the printed wiring board, conductor circuits are formed in layers. Electrical conduction between the layers is performed through a via hole covered with metal plating or a via hole filled with a conductive material. The periphery of the via hole is surrounded by a land, and the via hole and the conductor circuit are connected via this land.
[0003]
[Problems to be solved]
However, in the conventional via hole, a connection failure may occur between the via hole and the land surrounding the via hole.
[0004]
In view of the conventional problems, the present invention intends to provide a printed wiring board excellent in connection reliability between a via hole and a conductor circuit, and a manufacturing method thereof.
[0005]
[Means for solving problems]
The invention of claim 1 is a printed wiring board having an insulating substrate, a buried via formed by embedding a conductive material in a hole provided in the insulated substrate, and a metal layer bonded to the opening peripheral edge of the buried via. ,
The upper end and the lower end of the joint portion of the metal layer that is joined to the buried via enter the inside along the inner wall of the buried via,
The thickness of the joint portion is much larger than the thickness of the other general portion of the metal layer,
And the thickness t of the said general part in the said metal layer is 4-70 micrometers, and the thickness T of the said junction part is at least 5 micrometers, It is a printed wiring board characterized by the above-mentioned .
[0006]
In the present invention, the buried via is joined to the metal layer at the peripheral edge of the opening. The thickness T of the junction with the buried via in the metal layer is larger than the thickness t of the other general part. For this reason, the contact area between the metal layer and the buried via is increased, and the bonding strength between the two is increased. Therefore, the connection reliability between the two is increased and the conductivity is improved.
[0007]
The ratio (T / t) between the thickness T of the joint in the metal layer and the thickness t of the other general part is preferably greater than 1 and does not exceed the thickness of the insulating substrate. If it is less than 1, the thickness T of the joint portion between the metal layer and the buried via becomes small, and the connection reliability with the buried via may be lowered. In addition, when the thickness T of the bonded portion exceeds the thickness of the insulating substrate, the bonded portion exceeding the insulating substrate becomes a protrusion, which is easily detached and may cause a defect such as a short circuit.
[0008]
In the present invention, the thickness T of the joint portions in the metal layer is Ru least 5μm der. If it is less than 5 μm, the connection reliability with the buried via may be lowered.
[0009]
Further, the other general part in the metal layer refers to a part of the metal layer that is not joined to the buried via. The thickness t of this general part, Ru 4~70μm der. If the thickness is less than 4 μm, the strength of the metal layer may be reduced, and if it exceeds 70 μm, it may be difficult to form fine wiring.
[0010]
Further, upper and lower ends of the joint portions in the metal layer, that have entered the inside along the inner wall of the buried vias. As a result, the contact area between the metal layer and the conductive material in the embedded via is increased, and the bonding strength between the junction of the metal layer and the embedded via is further increased.
The metal layer has various shapes such as a wiring pattern, a pad, and a land.
The conductive material embedded in the embedded via is, for example, copper, aluminum, nickel, solder or the like.
[0011]
For the insulating substrate, a thermosetting resin such as epoxy resin, phenol resin, bismaleimide torazine resin, polyphenylene resin, polyphenylene ether resin, polyimide resin, or a mixture thereof can be used. The insulating substrate may contain a reinforcing material such as glass cloth or inorganic filler.
The hole provided in the insulating substrate is, for example, a punching hole described later. In addition, it may be a hole formed by a drill, a laser, or the like.
[0012]
Next, the invention of claim 2 is a method of manufacturing the printed wiring board of claim 1.
That is, the present invention is a printed wiring board having an insulating substrate, an embedded via formed by embedding a conductive material in a hole provided in the insulating substrate, and a metal layer bonded to the peripheral edge of the opening of the embedded via, The upper end and the lower end of the joint portion of the metal layer that is joined to the buried via enter the inside along the inner wall of the buried via,
The thickness of the joint is larger than the thickness of the other general part in the metal layer,
In the method of manufacturing a printed wiring board, the thickness t of the general part in the metal layer is 4 to 70 μm, and the thickness T of the joint is at least 5 μm.
A step of laminating a conductive material on the insulating substrate to which a metal layer having a thickness t of 4 to 70 μm is bonded via the metal layer;
The insulating substrate, the metal layer, and the conductive material are punched, and a punched piece formed by punching the conductive material is embedded in a punched hole formed in the insulating substrate and the metal layer. Including the step of causing the opening peripheral edge of the punched hole to enter along the inner wall of the punched hole of the insulating substrate to form the bonded portion, and bonding the bonded portion and the punched piece of the conductive material. It is the manufacturing method of the printed wiring board characterized .
[0013]
In this manufacturing method, a conductive material is coated on a metal layer bonded to an insulating substrate , and these predetermined portions are locally punched from above by punching or the like. At this time, since the ductility of the metal layer is large, the punched portion of the metal layer is stretched in a bow shape and enters the punched hole of the insulating substrate. The thickness of the entrance portion of the metal layer is larger than the thickness of other general portions. Further, the punching piece of the conductive material is embedded in the punching hole of the insulating substrate by the pressing force from above.
[0014]
The punched piece of the conductive material is joined to the entry portion of the metal layer in the punched hole of the insulating substrate. The joining thickness between the entry portion and the conductive material in the punched hole is larger than the thickness of the other general portion of the metal layer. For this reason, according to this manufacturing method, the printed wiring board excellent in the connection reliability between a via hole and a conductor circuit can be obtained.
Moreover, since the embedded via can be formed by a simple operation of punching, the productivity is high.
For the metal layer disposed on the coated side of the conductive material, the thickness T of the junction between the conductive material, not larger than the other general portion of the thickness t. This improves the connection reliability between the metal layer and the buried via.

[0015]
DETAILED DESCRIPTION OF THE INVENTION
Embodiment 1
A printed wiring board and a manufacturing method thereof according to an embodiment of the present invention will be described with reference to FIGS.
As shown in FIG. 1, the printed wiring board of this example includes an insulating substrate 8 and embedded vias 6 in which a conductive material 7 is embedded in a punched hole 80 provided in the insulating substrate 8. A metal layer 5 is bonded to the peripheral edge of the opening of the buried via 6. The thickness T of the joint portion 51 joined to the buried via 6 in the metal layer 5 is 35 μm, the thickness t of the other general portion 52 is 18 μm, and T is larger than t.
[0016]
An upper end 511 and a lower end 512 of the joint portion 51 in the metal layer 5 enter the embedded via 6. The upper end 511 of the joint portion 51 is at a position lower than the surface of the general portion 52 of the metal layer 5.
As shown in FIG. 2, the metal layer 5 includes lands 55 and wiring patterns 56. The land 55 surrounds the embedded via 6.
[0017]
Next, the manufacturing method of the printed wiring board of this example is demonstrated.
First, as shown in FIG. 3A, a glass epoxy substrate having a thickness of 80 μm is prepared as the insulating substrate 8, and a copper foil having a thickness of 18 μm as the metal layer 5 is bonded to one side.
Next, a copper foil having a thickness of 98 μm as the conductive material 7 is disposed on the metal layer 5.
[0018]
Next, as shown in FIG. 3B, the insulating substrate 8 in which the metal layer 5 and the conductive material 7 are stacked is placed on the die 31. The die 31 has a guide hole 30 having a diameter of 155 μm. Opposing to this, the upper punch 33 for punching is arranged on the conductive material 7 so as to be movable in the vertical direction. In the stage before punching, the upper punch 33 is disposed above the die 31. The diameter of the upper punch 33 is 145 μm, and the clearance from the die 31 is 5 μm on one side.
[0019]
Here, if the clearance between the die 31 and the upper punch 33 is reduced, the thickness T of the joined portion, which is a thick portion of the metal layer 5, is reduced, so at least the clearance needs to be 2 μm on one side. On the contrary, if the clearance is large, the insulating substrate 8 is likely to be deformed, and the metal layer 5 is cut without extending, and T cannot be increased. Even if the clearance is large, it is preferably 30 μm on one side. This method utilizes elongation of the metal layer, and preferably has high ductility and relatively low hardness. Among these metals, copper, solder, and gold are preferable.
[0020]
Next, as shown in FIG. 4C, the upper punch 33 is moved downward to press the punched portions of the metal layer 5, the conductive material 7 and the insulating substrate 8. Then, as shown in FIG. 4 (d), cylindrical punching holes 50, 70, 80 are formed in the punched portion, and cylindrical punching pieces 501, 701, 801 are punched therefrom.
At this time, the peripheral edge portion of the punched hole 50 in the metal layer 5 extends due to the pressure from above and slightly enters the guide hole 30. The punched piece 701 of the conductive material 7 is embedded in the punched hole 80 of the insulating substrate 8 and joined to the entry portion of the metal layer 5.
As a result, the buried via 6 is formed by embedding the punched piece 701 of the conductive material 7.
Thereafter, the conductive material 7 on the insulating substrate 8 is removed and a pattern is formed on the metal layer 5.
Thus, the printed wiring board shown in FIGS. 1 and 2 is obtained.
[0021]
In this example, as shown in FIG. 4C, the insulating substrate 8 is covered with the metal layer 5 and the conductive material 7 and punched out from above with the upper punch 33 or the like. At the time of punching, the opening peripheral edge of the punching hole 80 is deformed into a taper shape by the pressure from above. Further, the metal layer 5 is stretched by the clearance between the die 31 and the upper punch 33 and enters the inside along the inner wall of the punching hole 80. Therefore, the thickness of the entrance portion is larger than the thickness of other general portions.
[0022]
And the said approach part of this metal layer 5 joins with the punching piece 701 of the electrically-conductive material 7 in the punching hole 80, and forms the junction part 51. FIG. Thus, the thickness T of the joint portion 51 formed from the entry portion is larger than the thickness t of the other general portion 52 of the metal layer 5. For this reason, according to this manufacturing method, the printed wiring board excellent in the connection reliability between the embedded via | veer 6 and the metal layer 5 can be obtained.
Further, since the buried via 6 can be formed by a simple operation of punching the conductive material 7, the productivity is high.
[0023]
【The invention's effect】
ADVANTAGE OF THE INVENTION According to this invention, the printed wiring board excellent in the connection reliability between a via hole and a conductor circuit, and its manufacturing method can be provided.
[Brief description of the drawings]
1 is a cross-sectional view of a printed wiring board according to Embodiment 1;
FIG. 2 is a perspective view of a printed wiring board for showing the periphery of a buried via according to the first embodiment.
FIGS. 3A and 3B are explanatory views (a) to (b) for illustrating a method for manufacturing a printed wiring board in Embodiment 1. FIG.
4A to 4D are explanatory views (c) to (d) for illustrating a method for manufacturing a printed wiring board following FIG. 3;
[Explanation of symbols]
30. . . Guide holes,
31. . . Die,
33. . . Top punch,
5). . . Metal layer,
50, 70, 80. . . Punching holes,
51. . . Joint,
52. . . General Department,
501,701,801. . . Punched piece,
511. . . Top,
512. . . lower end,
6). . . Buried vias,
7). . . Conductive material,
8). . . Insulating substrate,

Claims (2)

絶縁基板と,該絶縁基板に設けた穴に導電材を埋め込んでなる埋込みビアと,該埋込みビアの開口周縁部に接合した金属層とを有するプリント配線板であって,
上記金属層における上記埋込みビアと接合している接合部の上端及び下端は,上記埋込みビアの内壁に沿ってその内部に進入しており,
また該接合部の厚みは,上記金属層における他の一般部の厚みよりも大きく,
かつ,上記金属層における上記一般部の厚みtは4〜70μmであり,また上記接合部の厚みTは少なくとも5μmであることを特徴とするプリント配線板。
A printed wiring board having an insulating substrate, an embedded via formed by embedding a conductive material in a hole provided in the insulating substrate, and a metal layer bonded to an opening peripheral edge of the embedded via,
The upper end and the lower end of the joint portion of the metal layer that is joined to the buried via enter the inside along the inner wall of the buried via,
The thickness of the joint portion is much larger than the thickness of the other general portion of the metal layer,
In the printed wiring board, the thickness t of the general portion in the metal layer is 4 to 70 μm, and the thickness T of the joint portion is at least 5 μm .
絶縁基板と,該絶縁基板に設けた穴に導電材を埋め込んでなる埋込みビアと,該埋込みビアの開口周縁部に接合した金属層とを有するプリント配線板であって,上記金属層における上記埋込みビアと接合している接合部の上端及び下端は,上記埋込みビアの内壁に沿ってその内部に進入しており,A printed wiring board having an insulating substrate, an embedded via formed by embedding a conductive material in a hole provided in the insulating substrate, and a metal layer bonded to the peripheral edge of the opening of the embedded via, wherein the embedded in the metal layer The upper and lower ends of the joint joined to the via enter the interior along the inner wall of the embedded via,
また該接合部の厚みは,上記金属層における他の一般部の厚みよりも大きく,  The thickness of the joint is larger than the thickness of the other general part in the metal layer,
かつ,上記金属層における上記一般部の厚みtは4〜70μmであり,また上記接合部の厚みTは少なくとも5μmであるプリント配線板を製造する方法において,  In the method of manufacturing a printed wiring board, the thickness t of the general part in the metal layer is 4 to 70 μm, and the thickness T of the joint is at least 5 μm.
厚みtが4〜70μmの金属層を接着した絶縁基板の上に上記金属層を介して導電材を積層する工程と,  A step of laminating a conductive material on the insulating substrate to which a metal layer having a thickness t of 4 to 70 μm is bonded via the metal layer;
上記絶縁基板,上記金属層及び上記導電材を打抜いて,上記絶縁基板及び金属層に形成された打抜き穴に,上記導電材を打抜いて形成された打抜き片を埋め込むとともに,上記金属層の上記打抜き穴の開口周縁部を上記絶縁基板の上記打抜き穴の内壁に沿って進入させて上記接合部を形成し,該接合部と上記導電材の打抜き片とを接合させる工程とを含むことを特徴とするプリント配線板の製造方法。  The insulating substrate, the metal layer, and the conductive material are punched, and a punched piece formed by punching the conductive material is embedded in a punched hole formed in the insulating substrate and the metal layer. Including the step of causing the opening peripheral edge of the punched hole to enter along the inner wall of the punched hole of the insulating substrate to form the bonded portion, and bonding the bonded portion and the punched piece of the conductive material. A method for producing a printed wiring board.
JP2000333248A 2000-10-31 2000-10-31 Printed wiring board and manufacturing method thereof Expired - Fee Related JP4483069B2 (en)

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